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公开(公告)号：US08289498B2
公开(公告)日：2012-10-16
申请号：US12483703
申请日：2009-06-12
申请人： Erik Roelof Loopstra , Petrus Rutgerus Bartray , Leon Martin Levasier , Bernardus Antonius Johannes Luttikhuis , Josephus Jacobus Smits , Anthonie Aantjes , Maurice Willem Jozef Etiënne Wijckmans , Johannes Bernardus Ridder , Andre Schreuder , Dennis Jozef Maria Paulussen , Peter Gerardus Jonkers , Hugues Poincelin , Fransiscus Theresia Noel Heusschen
发明人： Erik Roelof Loopstra , Petrus Rutgerus Bartray , Leon Martin Levasier , Bernardus Antonius Johannes Luttikhuis , Josephus Jacobus Smits , Anthonie Aantjes , Maurice Willem Jozef Etiënne Wijckmans , Johannes Bernardus Ridder , Andre Schreuder , Dennis Jozef Maria Paulussen , Peter Gerardus Jonkers , Hugues Poincelin , Fransiscus Theresia Noel Heusschen
CPC分类号： G03F7/709 , G03F7/70808
摘要： A lithographic apparatus includes a projection system configured to project an image onto a substrate, a substrate table configured to support the substrate, a first chamber that at least partially surrounds the projection system, and a second chamber that at least partially surrounds the substrate table and a first frame. The apparatus includes a base frame configured to support the second chamber, and an intermediate frame coupled to the base frame. The intermediate frame is configured to separate the first chamber and the second chamber. The apparatus includes a support coupled to the first frame. The support is configured to support the first chamber through a coupled opening in the intermediate frame and the second chamber.
摘要翻译： 光刻设备包括：投影系统，被配置为将图像投影到基板上;衬底台，其被配置为支撑所述基板;第一室，其至少部分地围绕所述投影系统;以及第二室，其至少部分地围绕所述基板台; 第一帧。 该装置包括被配置为支撑第二室的基座框架，以及耦合到该底座框架的中间框架。 中间框架构造成分离第一室和第二室。 该装置包括耦合到第一框架的支撑件。 支撑构造成通过中间框架和第二室中的联接开口支撑第一室。
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公开(公告)号：US20100002207A1
公开(公告)日：2010-01-07
申请号：US12483703
申请日：2009-06-12
申请人： Erik Roelof LOOPSTRA , Petrus Rutgerus Bartray , Leon Martin Levasier , Bernardus Antonius Johannes Luttikhuis , Josephus Jacobus Smits , Anthonie Aantjes , Maurice Willem Jozef Etienne Wijckmans , Johannes Bernardus Ridder , Andre Schreuder , Dennis Jozef Maria Paulussen , Peter Gerardus Jonkers , Hugues Poincelin , Fransiscus Theresia Noel Heusschen
发明人： Erik Roelof LOOPSTRA , Petrus Rutgerus Bartray , Leon Martin Levasier , Bernardus Antonius Johannes Luttikhuis , Josephus Jacobus Smits , Anthonie Aantjes , Maurice Willem Jozef Etienne Wijckmans , Johannes Bernardus Ridder , Andre Schreuder , Dennis Jozef Maria Paulussen , Peter Gerardus Jonkers , Hugues Poincelin , Fransiscus Theresia Noel Heusschen
IPC分类号： G03B27/52
CPC分类号： G03F7/709 , G03F7/70808
摘要： A lithographic apparatus includes a projection system configured to project an image onto a substrate, a substrate table configured to support the substrate, a first chamber that at least partially surrounds the projection system, and a second chamber that at least partially surrounds the substrate table and a first frame. The apparatus includes a base frame configured to support the second chamber, and an intermediate frame coupled to the base frame. The intermediate frame is configured to separate the first chamber and the second chamber. The apparatus includes a support coupled to the first frame. The support is configured to support the first chamber through a coupled opening in the intermediate frame and the second chamber.
摘要翻译： 光刻设备包括：投影系统，被配置为将图像投影到基板上;衬底台，其被配置为支撑所述基板;第一室，其至少部分地围绕所述投影系统;以及第二室，其至少部分地围绕所述基板台; 第一帧。 该装置包括被配置为支撑第二室的基座框架，以及耦合到该底座框架的中间框架。 中间框架构造成分离第一室和第二室。 该装置包括耦合到第一框架的支撑件。 支撑构造成通过中间框架和第二室中的联接开口支撑第一室。
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3.发明授权Lithographic apparatus configured to suppress contamination from passing into the projection system and method 有权被配置为抑制污染物进入投影系统的方法的平版印刷装置公开(公告)号：US08625068B2
公开(公告)日：2014-01-07
申请号：US12975898
申请日：2010-12-22
IPC分类号： G03B27/52
CPC分类号： G03F7/70916 , G03F7/70233 , G03F7/70833 , G03F7/70883 , G03F7/70908
摘要： A lithographic apparatus includes a projection system configured to project a patterned beam of radiation onto a substrate. The projection system being provided with an opening through which the patterned beam of radiation may pass. At least part of the opening comprises a sloped surface of a wall of the projection system and a sloped surface of a mirror of the projection system.
摘要翻译： 光刻设备包括投影系统，该投影系统配置成将图案化的辐射束投射到基板上。 该投影系统设置有一个开口，图案化的辐射束可以穿过该开口。 开口的至少一部分包括投影系统的壁的倾斜表面和投影系统的反射镜的倾斜表面。
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公开(公告)号：US20120002182A1
公开(公告)日：2012-01-05
申请号：US12975898
申请日：2010-12-22
IPC分类号： G03B27/42
CPC分类号： G03F7/70916 , G03F7/70233 , G03F7/70833 , G03F7/70883 , G03F7/70908
摘要： A lithographic apparatus includes a projection system configured to project a patterned beam of radiation onto a substrate. The projection system being provided with an opening through which the patterned beam of radiation may pass. At least part of the opening comprises a sloped surface of a wall of the projection system and a sloped surface of a mirror of the projection system.
摘要翻译： 光刻设备包括投影系统，该投影系统配置成将图案化的辐射束投射到基板上。 该投影系统设置有一个开口，图案化的辐射束可以穿过该开口。 开口的至少一部分包括投影系统的壁的倾斜表面和投影系统的反射镜的倾斜表面。
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5.发明授权Method and system for determining a suppression factor of a suppression system and a lithographic apparatus 失效用于确定抑制系统和光刻设备的抑制因子的方法和系统公开(公告)号：US08711325B2
公开(公告)日：2014-04-29
申请号：US12742009
申请日：2008-11-06
申请人： Hendrikus Gijsbertus Schimmel , Tjarko Adriaan Rudolf Van Empel , Hans Johannes Maria Freriks , Yuri Johannes Gabriël Van De Vijver , Gerardus Hubertus Petrus Maria Swinkels , Marc Antonius Maria Haast , Wendelin Johanna Maria Versteeg , Peter Gerardus Jonkers , Dzmitry Labetski
发明人： Hendrikus Gijsbertus Schimmel , Tjarko Adriaan Rudolf Van Empel , Hans Johannes Maria Freriks , Yuri Johannes Gabriël Van De Vijver , Gerardus Hubertus Petrus Maria Swinkels , Marc Antonius Maria Haast , Wendelin Johanna Maria Versteeg , Peter Gerardus Jonkers , Dzmitry Labetski
IPC分类号： G03B27/52
CPC分类号： G03F7/70916 , G03F7/70841 , G03F7/70908
摘要： The invention relates to a method for determining a suppression factor of a suppression system. The suppression system is arranged to suppress migration of a contaminant gas out of a first system. The suppression factor is an indication of the performance of the suppression system. The method includes introducing a tracer gas in the sub-system, providing a detection system configured to detect the amount of tracer gas that has migrated out of the first system, determining a first suppression factor for the suppression system for the tracer gas. The method further includes determining a second suppression factor for the suppression system for the contaminant gas based on the first suppression factor.
摘要翻译： 本发明涉及一种确定抑制系统抑制因子的方法。 抑制系统被布置成抑制污染气体从第一系统中的迁移。 抑制因子表示抑制系统的性能。 该方法包括在子系统中引入示踪气体，提供检测系统，其被配置为检测已经从第一系统迁出的示踪气体的量，确定示踪气体的抑制系统的第一抑制因子。 该方法还包括基于第一抑制因子确定用于污染气体的抑制系统的第二抑制因子。
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6.发明申请METHOD AND SYSTEM FOR DETERMINING A SUPPRESSION FACTOR OF A SUPPRESSION SYSTEM AND A LITHOGRAPHIC APPARATUS 失效用于确定抑制系统的抑制因子的方法和系统和光刻设备公开(公告)号：US20110261329A1
公开(公告)日：2011-10-27
申请号：US12742009
申请日：2008-11-06
申请人： Hendrikus Gijsbertus Schimmel , Tjarko Adriaan Rudolf Van Empel , Hans Johannes Maria Freriks , Yuri Johannes Gabriël Van De Vijver , Gerardus Hubertus Petrus Maria Swinkels , Marc Antonius Maria Haast , Wendelin Johanna Maria Versteeg , Peter Gerardus Jonkers , Dzmitry Labetski
发明人： Hendrikus Gijsbertus Schimmel , Tjarko Adriaan Rudolf Van Empel , Hans Johannes Maria Freriks , Yuri Johannes Gabriël Van De Vijver , Gerardus Hubertus Petrus Maria Swinkels , Marc Antonius Maria Haast , Wendelin Johanna Maria Versteeg , Peter Gerardus Jonkers , Dzmitry Labetski
CPC分类号： G03F7/70916 , G03F7/70841 , G03F7/70908
摘要： The invention relates to a method for determining a suppression factor of a suppression system. The suppression system is arranged to suppress migration of a contaminant gas out of a first system. The suppression factor is an indication of the performance of the suppression system. The method includes introducing a tracer gas in the sub-system, providing a detection system configured to detect the amount of tracer gas that has migrated out of the first system, determining a first suppression factor for the suppression system for the tracer gas. The method further includes determining a second suppression factor for the suppression system for the contaminant gas based on the first suppression factor.
摘要翻译： 本发明涉及一种确定抑制系统抑制因子的方法。 抑制系统被布置成抑制污染气体从第一系统中的迁移。 抑制因子表示抑制系统的性能。 该方法包括在子系统中引入示踪气体，提供检测系统，其被配置为检测已经从第一系统迁出的示踪气体的量，确定示踪气体的抑制系统的第一抑制因子。 该方法还包括基于第一抑制因子确定用于污染气体的抑制系统的第二抑制因子。
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