公开(公告)号：US20150293454A1

公开(公告)日：2015-10-15

申请号：US14749035

申请日：2015-06-24

Applicant: FUJIFILM Corporation

Inventor： Yuichiro ENOMOTO ,  Shinji TARUTANI ,  Sou KAMIMURA ,  Kaoru IWATO ,  Keita KATO ,  Kana FUJII

IPC: G03F7/42

CPC classification number: G03F7/325 ,  G03F7/0046 ,  G03F7/0382 ,  G03F7/0397 ,  G03F7/20 ,  G03F7/2041 ,  G03F7/422

Abstract: Provided is a method of forming a pattern, including (a) forming a chemically amplified resist composition into a film, (b) exposing the film to light, and (c) developing the exposed film with a developer containing an organic solvent, wherein the developer contains an alcohol compound (X) at a content of 0 to less than 500 ppm based on the total mass of the developer.

Abstract translation: 提供一种形成图案的方法，包括（a）将化学放大的抗蚀剂组合物形成为膜，（b）将膜曝光，和（c）用含有机溶剂的显影剂显影曝光的膜，其中 显影剂含有基于显影剂总质量为0至小于500ppm的醇化合物（X）。

公开(公告)号：US20140255662A1

公开(公告)日：2014-09-11

申请号：US14212807

申请日：2014-03-14

Applicant: FUJIFILM CORPORATION

Inventor： Yuichiro ENOMOTO ,  Kunihiko KODAMA ,  Shinji TARUTANI

IPC: C09D11/00 ,  B41J11/00

CPC classification number: C09D11/38 ,  B41J11/0015 ,  B41J11/002 ,  C08F2/44 ,  C08F2/50 ,  C08L33/00 ,  C09D11/101 ,  C09D11/30 ,  C09D133/16 ,  C09D183/06 ,  G03F7/0046 ,  G03F7/0048 ,  G03F7/027 ,  Y10T428/24802

Abstract: Provide a curable composition for imprint, which is improved in the surface roughness of the cured film. A curable composition for imprint comprising a polymerizable compound (A), a polymerization initiator (B), and a non-polymerizable compound (C), the non-polymerizable compound (C) comprising at least one species of surfactant (C1) which contains 20% by mass or more of fluorine atom, and, at least one species of polymer (C2) which contains 3% by mass or more and less than 20% by mass of fluorine atom and/or 5% by mass or more and less than 40% by mass of silicon atom, and has a weight-average molecular weight (Mw) of 1,000 to 100,000.

Abstract translation: 提供用于印记的可固化组合物，其改善了固化膜的表面粗糙度。 一种包含可聚合化合物（A），聚合引发剂（B）和不可聚合化合物（C））的用于印迹的可固化组合物，所述非可聚合化合物（C）包含至少一种表面活性剂（C1） 20质量％以上的氟原子和至少1种含有3质量％以上且小于20质量％的氟原子和/或5质量％以上的聚合物（C2） 超过40质量％的硅原子，并且具有1,000至100,000的重均分子量（Mw）。

公开(公告)号：US20130045365A1

公开(公告)日：2013-02-21

申请号：US13656960

申请日：2012-10-22

Applicant: FUJIFILM CORPORATION

Inventor： Keita KATO ,  Shinji TARUTANI ,  Sou KAMIMURA ,  Yuichiro ENOMOTO ,  Kaoru IWATO

IPC: G03F7/20 ,  B32B3/30 ,  G03F7/004

CPC classification number: G03F7/0397 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0382 ,  G03F7/2041 ,  G03F7/325

Abstract: A pattern forming method comprising: (i) a step of forming a film from a chemical amplification resist composition, (ii) a step of exposing the film, and (iii) a step of developing the exposed film by using an organic solvent-containing developer, wherein the resist composition contains: (A) a resin, (B) a nonionic compound capable of generating an acid upon irradiation with an actinic ray or radiation, (C) a crosslinking agent, and (D) a solvent.

Abstract translation: 一种图案形成方法，包括：（i）从化学放大抗蚀剂组合物形成膜的步骤，（ii）曝光所述膜的步骤，和（iii）通过使用含有机溶剂的显影膜的步骤 显影剂，其中抗蚀剂组合物包含：（A）树脂，（B）在用光化射线或辐射照射时能够产生酸的非离子化合物，（C）交联剂和（D）溶剂。

公开(公告)号：US20140227493A1

公开(公告)日：2014-08-14

申请号：US14255490

申请日：2014-04-17

Applicant: FUJIFILM CORPORATION

Inventor： Yuichiro ENOMOTO ,  Kunihiko KODAMA ,  Shinji TARUTANI

IPC: C09D11/00

CPC classification number: C09D11/30 ,  B82Y10/00 ,  B82Y40/00 ,  C08F2/50 ,  G03F7/0002 ,  Y10T428/24802 ,  C08F2222/102 ,  C08F220/24 ,  C08F2222/245 ,  C08F2220/1875 ,  C08F2220/1891

Abstract: Provide is a curable composition for imprints, capable of effectively suppressing chipping of the cured pattern. A curable composition for imprints comprising (A) curable compound and (B) photo-polymerization initiator, having a moisture content ratio, relative to the total weight of all components excluding solvent, of less than 0.8% by weight.

Abstract translation: 提供一种用于印记的可固化组合物，能够有效地抑制固化图案的碎裂。 包含（A）可固化化合物和（B）光聚合引发剂的压印用可固化组合物，相对于不包括溶剂的所有组分的总重量，水分含量比小于0.8重量％。

公开(公告)号：US20140220353A1

公开(公告)日：2014-08-07

申请号：US14245491

申请日：2014-04-04

Applicant: FUJIFILM CORPORATION

Inventor： Kunihiko KODAMA ,  Shinji TARUTANI ,  Yuichiro ENOMOTO ,  Tadashi OOMATSU ,  Takayuki ITO ,  Hirotaka KITAGAWA ,  Akiko HATTORI

IPC: G03F7/09

CPC classification number: G03F7/094 ,  G03F7/0002 ,  Y10T428/31504

Abstract: Provided is the pattern formability and line edge roughness of the resultant substrate.An underlay film composition for imprints comprising a compound (A) and a solvent (B), the compound (A) having at least either one of a group (Ka) capable of covalently bonding and/or interacting with a substrate, and, a group (Kb) capable of covalently bonding and/or interacting with a curable composition for imprints, an Ohnishi parameter (Z) calculated from (equation 1) of 3.8 or larger, and a molecular weight of 400 or larger: the Ohnishi parameter=(total number of atoms)/(number of carbon atoms−number of oxygen atoms)  (Equation 1)

Abstract translation: 提供了所得基板的图案成形性和线边缘粗糙度。 包含化合物（A）和溶剂（B）的印迹用底胶膜组合物，具有能够与底物共价键合和/或相互作用的基团（Ka）中的至少一种的化合物（A），和 能够与用于印记的可固化组合物共价键合和/或相互作用的组（Kb），由（式1）计算为3.8或更大，分子量为400或更大的Ohnishi参数（Z）：Ohnishi参数=（ 总原子数）/（碳原子数 - 氧原子数）（式1）

公开(公告)号：US20160349620A1

公开(公告)日：2016-12-01

申请号：US15235675

申请日：2016-08-12

Applicant: FUJIFILM Corporation

Inventor： Yuichiro ENOMOTO ,  Shinji TARUTANI ,  Sou KAMIMURA ,  Kaoru IWATO ,  Keita KATO ,  Kana FUJII

IPC: G03F7/32 ,  G03F7/20

CPC classification number: G03F7/325 ,  G03F7/0046 ,  G03F7/0382 ,  G03F7/0397 ,  G03F7/20 ,  G03F7/2041 ,  G03F7/422

Abstract: Provided is a method of forming a pattern, including (a) forming a chemically amplified resist composition into a film, (b) exposing the film to light, and (c) developing the exposed film with a developer containing an organic solvent, wherein the developer contains an alcohol compound (X) at a content of 0 to less than 500 ppm based on the total mass of the developer.