公开(公告)号：US20150293454A1

公开(公告)日：2015-10-15

申请号：US14749035

申请日：2015-06-24

Applicant: FUJIFILM Corporation

Inventor： Yuichiro ENOMOTO ,  Shinji TARUTANI ,  Sou KAMIMURA ,  Kaoru IWATO ,  Keita KATO ,  Kana FUJII

IPC: G03F7/42

CPC classification number: G03F7/325 ,  G03F7/0046 ,  G03F7/0382 ,  G03F7/0397 ,  G03F7/20 ,  G03F7/2041 ,  G03F7/422

Abstract: Provided is a method of forming a pattern, including (a) forming a chemically amplified resist composition into a film, (b) exposing the film to light, and (c) developing the exposed film with a developer containing an organic solvent, wherein the developer contains an alcohol compound (X) at a content of 0 to less than 500 ppm based on the total mass of the developer.

Abstract translation: 提供一种形成图案的方法，包括（a）将化学放大的抗蚀剂组合物形成为膜，（b）将膜曝光，和（c）用含有机溶剂的显影剂显影曝光的膜，其中 显影剂含有基于显影剂总质量为0至小于500ppm的醇化合物（X）。

公开(公告)号：US20150185606A1

公开(公告)日：2015-07-02

申请号：US14643512

申请日：2015-03-10

Applicant: FUJIFILM Corporation

Inventor： Hirotaka KITAGAWA ,  Yuichiro GOTO ,  Yuichiro ENOMOTO

IPC: G03F7/031 ,  G03F7/00 ,  H01L21/308 ,  G03F7/004

CPC classification number: G03F7/031 ,  C08F2/44 ,  C08F2/48 ,  C09D11/101 ,  C09D11/30 ,  G03F7/0002 ,  G03F7/0035 ,  G03F7/0046 ,  G03F7/027 ,  G03F7/0388 ,  H01L21/3081 ,  H01L21/3086 ,  H01L21/3088 ,  Y10T428/24355 ,  Y10T428/24802

Abstract: Provided is a curable composition for photo imprints excellent in the mold releasability and the ink jettability. THe curable composition for photo imprints, comprising: a polymerizable compound (A); a photo-polymerization initiator (B); and a mold releasing agent (C), the mold releasing agent (C) being represented by the formula (I) below. Rf represents a C1-8 fluorine-containing alkyl group having two or more fluorine atoms; m represents 1 or 2; L represents a single bond or divalent linking group; n represents 1 or 2; X represents a single bond, oxygen atom, sulfur atom, or nitrogen atom; R1 represents a C1-8 substituent being free from a polymerizable group; R2 represents a hydrogen atom, C1-8 substituent, or divalent linking group; p represents 1 or 2, q represents 0 or 1, and r represents 1 or 2; R1 and R2 may combine with each other to form a ring.

Abstract translation: 本发明提供了一种在脱模性和油墨喷射性方面优异的光印的可固化组合物。 一种用于光印的可固化组合物，包括：可聚合化合物（A）; 光聚合引发剂（B）; 和脱模剂（C），脱模剂（C）由下式（I）表示。 Rf表示具有两个以上氟原子的C 1-8含氟烷基; m表示1或2; L表示单键或二价连接基团; n表示1或2; X表示单键，氧原子，硫原子或氮原子; R1表示不含可聚合基团的C1-8取代基; R2表示氢原子，C1-8取代基或二价连接基团; p表示1或2，q表示0或1，r表示1或2; R1和R2可以相互结合形成环。

公开(公告)号：US20220171285A1

公开(公告)日：2022-06-02

申请号：US17672701

申请日：2022-02-16

Applicant: FUJIFILM Corporation

Inventor： Kazuomi INOUE ,  Yuichiro ENOMOTO ,  Kazuto SHIMADA

IPC: G03F7/037 ,  C08G73/10 ,  G03F7/075

Abstract: There are provided a method of manufacturing a cured film, including a first exposure step of exposing a part of a photocurable film formed from a photocurable resin composition, a development step of developing the photocurable film after the exposure with a developing solution to obtain a pattern, and a second exposure step of exposing the pattern with light including light having a wavelength different from a wavelength of light used in the first exposure step, where the photocurable resin composition has a specific constitution, a photocurable resin composition that is used in the method of manufacturing the cured film, a method of manufacturing a laminate including the method of manufacturing a cured film, and a method of manufacturing an electronic device, which includes the method of manufacturing the cured film.

公开(公告)号：US20150228498A1

公开(公告)日：2015-08-13

申请号：US14696535

申请日：2015-04-27

Applicant: FUJIFILM CORPORATION

Inventor： Akiko HATTORI ,  Tadashi OOMATSU ,  Hirotaka KITAGAWA ,  Yuichiro ENOMOTO

IPC: H01L21/308 ,  C09J133/14 ,  C09J7/02

CPC classification number: H01L21/3086 ,  C08F8/10 ,  C09J4/06 ,  C09J7/20 ,  C09J133/14 ,  C09J2433/00 ,  G03F7/0002 ,  G03F7/09 ,  H01L21/3081 ,  H01L21/3085 ,  H01L21/3088 ,  Y10T428/24355 ,  C08F220/14 ,  C08F220/06

Abstract: To obtain a good pattern having a good profile of etched pattern. A method for manufacturing an adhesive film for imprints, the method comprising applying an adhesive composition for imprints in a base, and then rinsing the adhesive composition for imprints.

Abstract translation: 以获得具有蚀刻图案的良好轮廓的良好图案。 一种压印用粘合膜的制造方法，其特征在于，将印刷用粘合剂组合物涂布在基材中，然后冲洗粘合剂组合物进行印刷。

公开(公告)号：US20170102618A1

公开(公告)日：2017-04-13

申请号：US15386731

申请日：2016-12-21

Applicant: FUJIFILM Corporation

Inventor： Keita KATO ,  Sou KAMIMURA ,  Yuichiro ENOMOTO ,  Kaoru IWATO ,  Shohei KATAOKA ,  Shoichi SAITOH

IPC: G03F7/32 ,  G03F7/40 ,  G03F7/004 ,  G03F7/039 ,  G03F7/16 ,  G03F7/38 ,  G03F7/038 ,  G03F7/20 ,  G03F7/09

CPC classification number: G03F7/325 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0382 ,  G03F7/0397 ,  G03F7/091 ,  G03F7/16 ,  G03F7/168 ,  G03F7/20 ,  G03F7/2006 ,  G03F7/2041 ,  G03F7/38 ,  G03F7/40

Abstract: Provided is a method of forming pattern including (a) forming a chemically amplified resist composition into a film, (b) exposing the film to light, and (c) developing the exposed film with a developer containing a first organic solvent, wherein in the developer, particles each having a diameter of 0.3 μm or greater amount to a density of 30 particles/ml or less.

公开(公告)号：US20160349620A1

公开(公告)日：2016-12-01

申请号：US15235675

申请日：2016-08-12

Applicant: FUJIFILM Corporation

Inventor： Yuichiro ENOMOTO ,  Shinji TARUTANI ,  Sou KAMIMURA ,  Kaoru IWATO ,  Keita KATO ,  Kana FUJII

IPC: G03F7/32 ,  G03F7/20

CPC classification number: G03F7/325 ,  G03F7/0046 ,  G03F7/0382 ,  G03F7/0397 ,  G03F7/20 ,  G03F7/2041 ,  G03F7/422

Abstract: Provided is a method of forming a pattern, including (a) forming a chemically amplified resist composition into a film, (b) exposing the film to light, and (c) developing the exposed film with a developer containing an organic solvent, wherein the developer contains an alcohol compound (X) at a content of 0 to less than 500 ppm based on the total mass of the developer.

公开(公告)号：US20150079804A1

公开(公告)日：2015-03-19

申请号：US14549068

申请日：2014-11-20

Applicant: FUJIFILM Corporation

Inventor： Hirotaka KITAGAWA ,  Akiko HATTORI ,  Yuichiro ENOMOTO

IPC: C08F220/32 ,  H01L21/02 ,  B29C59/00 ,  C08F220/28 ,  C08F220/18

CPC classification number: C08F220/32 ,  B29C59/005 ,  B29K2033/12 ,  C08F220/18 ,  C08F220/28 ,  C08F2220/281 ,  C08F2220/325 ,  G03F7/0002 ,  H01L21/02356

Abstract: An under layer film having excellent surface planarity is provided. In one aspect, the under layer film-forming composition for imprints includes a (meth)acrylic resin (A) containing an ethylenic unsaturated group (P) and a nonionic hydrophilic group (Q), and having a weight average molecular weight of 1,000 or larger; and a solvent (B), the resin (A) having an acid value of smaller than 1.0 mmol/g. In another aspect, the under layer film-forming composition for imprints includes a (meth)acrylic resin (A2) containing an ethylenic unsaturated group (P), and containing, as a nonionic hydrophilic group (Q), a cyclic substituent (Q2) having a carbonyl group in the cyclic structure thereof, with a weight average molecular weight of 1,000 or larger; and a solvent (B).

Abstract translation: 提供了具有优异的表面平面度的底层膜。 一方面，用于印记的底层成膜组合物包括含有乙烯性不饱和基团（P）和非离子亲水基团（Q）的（甲基）丙烯酸树脂（A），其重均分子量为1,000或 较大 和溶剂（B），所述树脂（A）的酸值小于1.0mmol / g。 另一方面，用于印记的底层成膜组合物包含含有烯属不饱和基团（P）的（甲基）丙烯酸树脂（A2），并且含有作为非离子亲水基团（Q）的环状取代基（Q2） 在其环状结构中具有羰基，重均分子量为1,000以上; 和溶剂（B）。

公开(公告)号：US20160026083A1

公开(公告)日：2016-01-28

申请号：US14873700

申请日：2015-10-02

Applicant: FUJIFILM CORPORATION

Inventor： Naohiro TANGO ,  Yuichiro ENOMOTO

IPC: G03F7/16 ,  G03F7/32 ,  G03F7/20

CPC classification number: G03F7/16 ,  G03F7/0397 ,  G03F7/091 ,  G03F7/11 ,  G03F7/20 ,  G03F7/2041 ,  G03F7/32 ,  G03F7/322 ,  G03F7/325

Abstract: The present invention has an object to provide a pattern forming method, in which even when a pattern which is fine and has a high aspect ratio is formed, the collapse or peeling of the pattern is inhibited; a method for manufacturing an electronic device, including the pattern forming method; and an electronic device manufactured by the manufacturing method. The pattern forming method of the present invention includes an adhesion aiding layer forming step of forming an adhesion aiding layer containing a polymerizable group and having a light transmittance of 80% or more at a wavelength of 193 nm on a substrate; a resist film forming step of applying a radiation-sensitive resin composition onto the adhesion aiding layer to form a resist film; an exposing step of exposing the resist film; and a developing step of developing the exposed resist film to form a pattern.

Abstract translation: 本发明的目的是提供一种图案形成方法，其中即使形成精细且具有高纵横比的图案，也可以抑制图案的塌陷或剥离; 包括图案形成方法的电子装置的制造方法; 以及通过该制造方法制造的电子装置。 本发明的图案形成方法包括粘附辅助层形成工序，在基板上形成含有可聚合基团并且在193nm波长下的透光率为80％以上的粘附助剂层; 抗敏剂膜形成步骤，将辐射敏感性树脂组合物施加到粘附辅助层上以形成抗蚀剂膜; 暴露所述抗蚀剂膜的曝光步骤; 以及显影步骤，使曝光的抗蚀剂膜显影以形成图案。

公开(公告)号：US20160009945A1

公开(公告)日：2016-01-14

申请号：US14865949

申请日：2015-09-25

Applicant: FUJIFILM Corporation

Inventor： Yuichiro ENOMOTO ,  Hirotaka KITAGAWA ,  Tadashi OOMATSU ,  Yuichiro GOTO

IPC: C09D133/14 ,  H01L21/02 ,  C09D133/08

CPC classification number: C09D133/14 ,  C08F290/06 ,  C08F299/02 ,  C08F2222/1093 ,  C09D4/00 ,  C09D133/08 ,  G03F7/0002 ,  G03F7/11 ,  H01L21/02345

Abstract: Provided is a composition capable of producing an underlying film which demonstrates a good adhesiveness between a substrate and a layer to be imprinted, showing a good in-plane uniformity of the thickness, and a small defect density. The composition includes a polymerizable compound, a first solvent, and a second solvent, the first solvent having a boiling point at 1 atm of 160° C. or higher, the second solvent having a boiling point at 1 atm of lower than 160° C., and the content of the polymerizable compound in the composition being less than 1% by mass.

Abstract translation: 本发明提供一种能够生产下面的膜的组合物，其表现出基板和待印刷层之间良好的粘合性，表现出良好的厚度的面内均匀性和小的缺陷密度。 所述组合物包含可聚合化合物，第一溶剂和第二溶剂，所述第一溶剂的沸点在1atm下为160℃以上，所述第二溶剂的沸点在1atm以下，低于160℃ ，组合物中的聚合性化合物的含量小于1质量％。

公开(公告)号：US20150079793A1

公开(公告)日：2015-03-19

申请号：US14550473

申请日：2014-11-21

Applicant: FUJIFILM CORPORATION

Inventor： Akiko HATTORI ,  Hirotaka KITAGAWA ,  Yuichiro ENOMOTO

IPC: H01L21/308 ,  C09J163/10

CPC classification number: H01L21/3086 ,  C08F299/02 ,  C09J163/10 ,  G03F7/0002 ,  G03F7/0388 ,  H01L21/3088 ,  H01L2924/0002 ,  Y10T428/24802 ,  H01L2924/00

Abstract: Provided is an adhesion-promoting composition between a curable composition for imprints and a substrate, which excellent in adhesiveness and can control pattern failure. An adhesion-promoting composition used between a curable composition for imprints and a substrate, which comprises a compound having a molecular weight of 500 or larger and having a reactive group, and has a content of a compound, with a molecular weight of 200 or smaller, of more than 1% by mass and not more than 10% by mass of a total solid content.

Abstract translation: 提供了一种用于印记的可固化组合物和基材之间的粘合促进组合物，其粘合性优异并且可以控制图案破坏。 在用于印记的可固化组合物和基材之间使用的粘合促进组合物，其包含分子量为500以上并具有反应性基团的化合物，并且具有分子量为200以下的化合物 ，超过总固体含量的1质量％且不超过10质量％。