公开(公告)号：US20170158905A1

公开(公告)日：2017-06-08

申请号：US15441716

申请日：2017-02-24

Applicant: FUJIFILM Corporation

Inventor： Tadashi OOMATSU ,  Hirotaka KITAGAWA ,  Yuichiro GOTO

IPC: C09D151/00 ,  B29C59/00 ,  H01L21/3105 ,  B29C59/16 ,  H01L21/02 ,  G03F7/00 ,  B29C59/02

CPC classification number: C09D151/003 ,  B29C59/005 ,  B29C59/02 ,  B29C59/16 ,  B29K2033/08 ,  B32B27/00 ,  C08F222/10 ,  C08F290/142 ,  C08F2438/02 ,  C09D5/00 ,  C09D5/32 ,  C09D7/40 ,  C09D7/65 ,  C09D135/02 ,  C09D151/08 ,  C09D201/02 ,  G03F7/0002 ,  G03F7/0752 ,  G03F7/094 ,  H01L21/02118 ,  H01L21/02282 ,  H01L21/02345 ,  H01L21/31058 ,  C08F220/32 ,  C08F2220/325 ,  C08F220/18 ,  C08F220/28 ,  C08F2220/283 ,  C08F220/06 ,  C08F220/20 ,  C08F220/14 ,  C08F2222/1026 ,  C08F2220/185 ,  C08F2220/1858 ,  C08F222/22 ,  C08F2220/281 ,  C08F220/24 ,  C08F2220/1875 ,  C08L33/14

Abstract: Provided are a resin composition for underlayer film formation with which a variation hardly occurs in the line width distribution after processing due to a small thickness of a residual film after mold pressing, a layered product, a method for forming a pattern, an imprint forming kit, and a process for producing a device.Disclosed is a resin composition for underlayer film formation which is used to form an underlayer film by being applied onto a base material, including a first resin having a radical reactive group in the side chain, a second resin containing at least one selected from a fluorine atom and a silicon atom, and a solvent. The second resin is preferably a resin containing a fluorine atom. The radical reactive group of the first resin is preferably a (meth)acryloyl group.

公开(公告)号：US20150228498A1

公开(公告)日：2015-08-13

申请号：US14696535

申请日：2015-04-27

Applicant: FUJIFILM CORPORATION

Inventor： Akiko HATTORI ,  Tadashi OOMATSU ,  Hirotaka KITAGAWA ,  Yuichiro ENOMOTO

IPC: H01L21/308 ,  C09J133/14 ,  C09J7/02

CPC classification number: H01L21/3086 ,  C08F8/10 ,  C09J4/06 ,  C09J7/20 ,  C09J133/14 ,  C09J2433/00 ,  G03F7/0002 ,  G03F7/09 ,  H01L21/3081 ,  H01L21/3085 ,  H01L21/3088 ,  Y10T428/24355 ,  C08F220/14 ,  C08F220/06

Abstract: To obtain a good pattern having a good profile of etched pattern. A method for manufacturing an adhesive film for imprints, the method comprising applying an adhesive composition for imprints in a base, and then rinsing the adhesive composition for imprints.

Abstract translation: 以获得具有蚀刻图案的良好轮廓的良好图案。 一种压印用粘合膜的制造方法，其特征在于，将印刷用粘合剂组合物涂布在基材中，然后冲洗粘合剂组合物进行印刷。

公开(公告)号：US20160009945A1

公开(公告)日：2016-01-14

申请号：US14865949

申请日：2015-09-25

Applicant: FUJIFILM Corporation

Inventor： Yuichiro ENOMOTO ,  Hirotaka KITAGAWA ,  Tadashi OOMATSU ,  Yuichiro GOTO

IPC: C09D133/14 ,  H01L21/02 ,  C09D133/08

CPC classification number: C09D133/14 ,  C08F290/06 ,  C08F299/02 ,  C08F2222/1093 ,  C09D4/00 ,  C09D133/08 ,  G03F7/0002 ,  G03F7/11 ,  H01L21/02345

Abstract: Provided is a composition capable of producing an underlying film which demonstrates a good adhesiveness between a substrate and a layer to be imprinted, showing a good in-plane uniformity of the thickness, and a small defect density. The composition includes a polymerizable compound, a first solvent, and a second solvent, the first solvent having a boiling point at 1 atm of 160° C. or higher, the second solvent having a boiling point at 1 atm of lower than 160° C., and the content of the polymerizable compound in the composition being less than 1% by mass.

Abstract translation: 本发明提供一种能够生产下面的膜的组合物，其表现出基板和待印刷层之间良好的粘合性，表现出良好的厚度的面内均匀性和小的缺陷密度。 所述组合物包含可聚合化合物，第一溶剂和第二溶剂，所述第一溶剂的沸点在1atm下为160℃以上，所述第二溶剂的沸点在1atm以下，低于160℃ ，组合物中的聚合性化合物的含量小于1质量％。

公开(公告)号：US20140220353A1

公开(公告)日：2014-08-07

申请号：US14245491

申请日：2014-04-04

Applicant: FUJIFILM CORPORATION

Inventor： Kunihiko KODAMA ,  Shinji TARUTANI ,  Yuichiro ENOMOTO ,  Tadashi OOMATSU ,  Takayuki ITO ,  Hirotaka KITAGAWA ,  Akiko HATTORI

IPC: G03F7/09

CPC classification number: G03F7/094 ,  G03F7/0002 ,  Y10T428/31504

Abstract: Provided is the pattern formability and line edge roughness of the resultant substrate.An underlay film composition for imprints comprising a compound (A) and a solvent (B), the compound (A) having at least either one of a group (Ka) capable of covalently bonding and/or interacting with a substrate, and, a group (Kb) capable of covalently bonding and/or interacting with a curable composition for imprints, an Ohnishi parameter (Z) calculated from (equation 1) of 3.8 or larger, and a molecular weight of 400 or larger: the Ohnishi parameter=(total number of atoms)/(number of carbon atoms−number of oxygen atoms)  (Equation 1)

Abstract translation: 提供了所得基板的图案成形性和线边缘粗糙度。 包含化合物（A）和溶剂（B）的印迹用底胶膜组合物，具有能够与底物共价键合和/或相互作用的基团（Ka）中的至少一种的化合物（A），和 能够与用于印记的可固化组合物共价键合和/或相互作用的组（Kb），由（式1）计算为3.8或更大，分子量为400或更大的Ohnishi参数（Z）：Ohnishi参数=（ 总原子数）/（碳原子数 - 氧原子数）（式1）

公开(公告)号：US20210139231A1

公开(公告)日：2021-05-13

申请号：US17139045

申请日：2020-12-31

Applicant: FUJIFILM Corporation

Inventor： Tetsuya KAMIMURA ,  Satomi TAKAHASHI ,  Tadashi OOMATSU ,  Tetsuya SHIMIZU

IPC: B65D85/00 ,  B65D25/14 ,  B65D81/26 ,  G03F7/32

Abstract: The present invention provides a chemical liquid having excellent defect suppressing properties. The present invention further provides a chemical liquid storage body containing the chemical liquid. The chemical liquid of the present invention is a chemical liquid containing a compound other than an alkane and an alkene, and one or more organic solvents selected from the group consisting of decane and undecane, in which the chemical liquid further contains one or more organic components selected from the group consisting of alkanes having 12 to 50 carbon atoms and alkenes having 12 to 50 carbon atoms, and a content of the organic component is 0.10 to 1,000,000 mass ppt with respect to a total mass of the chemical liquid.

公开(公告)号：US20170200639A1

公开(公告)日：2017-07-13

申请号：US15468911

申请日：2017-03-24

Applicant: FUJIFILM Corporation

Inventor： Yuichiro GOTO ,  Tadashi OOMATSU

IPC: H01L21/768 ,  B29C44/12 ,  H01L23/532 ,  H01L23/522 ,  H01L23/528 ,  B29C44/02 ,  H01L21/02

CPC classification number: H01L21/76817 ,  B29C37/0053 ,  B29C44/02 ,  B29C44/12 ,  B29C44/1219 ,  B29K2033/12 ,  B29K2105/0002 ,  B29K2105/0094 ,  B29K2105/041 ,  B29K2105/045 ,  B29K2909/02 ,  B29K2995/0006 ,  B29L2031/3406 ,  H01L21/02118 ,  H01L21/02203 ,  H01L21/311 ,  H01L21/76807 ,  H01L21/7682 ,  H01L21/76877 ,  H01L23/5226 ,  H01L23/5283 ,  H01L23/53228 ,  H01L23/5329 ,  H01L2221/1047 ,  H01L2924/0002 ,  H01L2924/00

Abstract: Provided are a method of manufacturing a porous body capable of easily manufacturing a porous body, a porous body, a method of manufacturing a device, a device, a method of manufacturing a wiring structure, and a wiring structure.A photocurable composition including a condensing gas and a polymerizable compound is applied to a substrate or a mold, the photocurable composition is sandwiched between the substrate and the mold and then the photocurable composition is irradiated with light to cure the photocurable composition, and the mold is released from a surface of the cured photocurable composition.

公开(公告)号：US20210132503A1

公开(公告)日：2021-05-06

申请号：US17144259

申请日：2021-01-08

Applicant: FUJIFILM Corporation

Inventor： Tadashi OOMATSU ,  Tetsuya KAMIMURA ,  Tetsuya SHIMIZU ,  Satomi TAKAHASHI ,  Akihiko OHTSU

IPC: G03F7/40 ,  G03F7/32 ,  C11D3/43 ,  C11D3/20 ,  C11D3/04 ,  C11D3/12 ,  C11D3/34 ,  C11D11/00

Abstract: An object of the present invention is to provide a chemical liquid which exhibits excellent defect inhibition performance even after long-term preservation, a kit, a pattern forming method, a chemical liquid manufacturing method, and a chemical liquid storage body. The chemical liquid according to an embodiment of the present invention is a chemical liquid containing an organic solvent, an acid component, and a metal component. The content of the acid component is equal to or greater than 1 mass ppt and equal to or smaller than 15 mass ppm with respect to the total mass of the chemical liquid. The content of the metal component is 0.001 to 100 mass ppt with respect to the total mass of the chemical liquid.

公开(公告)号：US20180002561A1

公开(公告)日：2018-01-04

申请号：US15702065

申请日：2017-09-12

Applicant: FUJIFILM Corporation

Inventor： Tadashi OOMATSU ,  Hirotaka KITAGAWA ,  Yuichiro GOTO

IPC: C09D133/14 ,  B29C59/02 ,  C08F8/00 ,  G03F7/00 ,  C09D7/12 ,  B29K105/00

CPC classification number: C09D133/14 ,  B29C59/022 ,  B29K2105/0014 ,  C08F8/00 ,  C08K5/19 ,  C08K5/34 ,  C08K5/50 ,  C09D5/002 ,  C09D7/40 ,  C09D7/63 ,  C09D201/00 ,  G03F7/0002 ,  G11B5/855 ,  H01L21/027

Abstract: Disclosed herein are a resin composition for underlayer film formation which is capable of forming an underlayer film having good adhesiveness to a base material and good surface state, an imprint forming kit, a laminate, a pattern forming method, and a method for producing a device. Provided is a resin composition for underlayer film formation, including a resin, a nucleophilic catalyst, and a solvent, in which the content of the nucleophilic catalyst is 0.01 to 0.3 mass % with respect to the solid content of the resin composition for underlayer film formation.

公开(公告)号：US20170146907A1

公开(公告)日：2017-05-25

申请号：US15423734

申请日：2017-02-03

Applicant: FUJIFILM Corporation

Inventor： Tadashi OOMATSU ,  Hirotaka KITAGAWA ,  Yuichiro GOTO

IPC: G03F7/11 ,  B29C59/02 ,  G03F7/004 ,  G03F7/00 ,  C09D133/14 ,  C09D133/08 ,  B29C59/00 ,  B29C35/08

CPC classification number: G03F7/11 ,  B29C35/0805 ,  B29C59/005 ,  B29C59/022 ,  B32B27/00 ,  C09D5/002 ,  C09D7/40 ,  C09D133/08 ,  C09D133/14 ,  C09D201/02 ,  C09D201/06 ,  G03F7/0002 ,  G03F7/0045 ,  H01L21/027

Abstract: Provided are a resin composition for underlayer film formation with which a variation hardly occurs in the line width distribution after processing due to a small thickness of a residual film after mold pressing, a layered product, a method for forming a pattern, an imprint forming kit, and a process for producing a device.A resin composition for underlayer film formation includes a resin having a group represented by General Formula (A) and at least one group selected from a group represented by General Formula (B), an oxiranyl group and an oxetanyl group, a nonionic surfactant and a solvent. Ra1 represents a hydrogen atom or a methyl group, Rb1 and Rb2 each independently represent a group selected from an unsubstituted linear or branched alkyl group having 1 to 20 carbon atoms and an unsubstituted cycloalkyl group having 3 to 20 carbon atoms, Rb3 represents a group selected from an unsubstituted linear or branched alkyl group having 2 to 20 carbon atoms and an unsubstituted cycloalkyl group having 3 to 20 carbon atoms, and Rb2 and Rb3 may be bonded to each other to form a ring.

公开(公告)号：US20150014819A1

公开(公告)日：2015-01-15

申请号：US14495289

申请日：2014-09-24

Applicant: FUJIFILM Corporation

Inventor： Akiko HATTORI ,  Hirotaka KITAGAWA ,  Yuichiro ENOMOTO ,  Tadashi OOMATSU

IPC: C08F122/10 ,  C08F120/30 ,  C08L35/02 ,  H01L21/027 ,  C08K5/3445 ,  C08K5/21 ,  B29C35/08 ,  H01L29/06 ,  C08F120/28 ,  C08L33/14

CPC classification number: C08F122/105 ,  B29C35/0805 ,  B29C2035/0827 ,  B29L2011/00 ,  B29L2031/34 ,  C08F120/28 ,  C08F120/30 ,  C08K5/0025 ,  C08K5/21 ,  C08K5/3445 ,  C08L33/14 ,  C08L35/02 ,  G03F7/0002 ,  G03F7/038 ,  H01L21/0271 ,  H01L29/06 ,  Y10T428/31935

Abstract: Provided is an underlying film composition for imprints showing a good adhesiveness with a base and capable of reducing failure or defect of resist pattern. The underlying film composition for imprints comprising a curable main component and a urea-based crosslinking agent.

Abstract translation: 提供了一种用于印记的底层膜组合物，其显示出与基材的良好粘附性并且能够减少抗蚀剂图案的失效或缺陷。 用于印痕的底层膜组合物包含可固化主要组分和脲基交联剂。