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    PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE
    1.
    发明申请
    PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE 审中-公开
    图案形成方法，抗紫外线敏感性或辐射敏感性树脂组合物，电阻膜，制造电子器件的方法和电子器件

    公开(公告)号：US20150301451A1

    公开(公告)日：2015-10-22

    申请号：US14754017

    申请日：2015-06-29

    Applicant: FUJIFILM Corporation

    Inventor： Kaoru IWATO

    IPC: G03F7/038 ,  G03F7/20

    CPC classification number: G03F7/038 ,  G03F7/0045 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/2041 ,  G03F7/325

    Abstract: A pattern forming method of the present invention includes (a) forming a film using an actinic ray-sensitive or radiation-sensitive resin composition which contains (A) to (C) below, (A) a resin where polarity increases due to an action of acid and solubility decreases with respect to a developer which includes an organic solvent, (B) a compound which generates acid when irradiated with actinic rays or radiation, and (C) a compound which has a cation site and an anion site in the same molecule and where the cation site and the anion site are linked with each other by a covalent bond, (b) exposing the film, and (c) forming a negative tone pattern by developing the exposed film using a developer which includes an organic solvent.

    Abstract translation: 本发明的图案形成方法包括：（a）使用含有下述（A）〜（C）的光化射线敏感性或辐射敏感性树脂组合物形成膜，（A）由于作用引起极性增加的树脂 相对于包含有机溶剂的显影剂，酸和溶解度降低，（B）当用光化射线或辐射照射时产生酸的化合物，和（C）具有阳离子位点和阴离子位点的化合物 分子，其中阳离子位点和阴离子部位通过共价键彼此连接，（b）使膜暴露，和（c）通过使用包含有机溶剂的显影剂显影曝光的膜来形成负色调图案。

    ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND, RESIST FILM, PATTERN FORMING METHOD, ELECTRONIC DEVICE MANUFACTURING METHOD, AND ELECTRONIC DEVICE, EACH USING THE COMPOSITION
    3.
    发明申请
    ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND, RESIST FILM, PATTERN FORMING METHOD, ELECTRONIC DEVICE MANUFACTURING METHOD, AND ELECTRONIC DEVICE, EACH USING THE COMPOSITION 有权
    化学敏感性或辐射敏感性树脂组合物，耐蚀膜，图案形成方法，电子设备制造方法和电子设备，每个使用组合物

    公开(公告)号：US20140287363A1

    公开(公告)日：2014-09-25

    申请号：US14297948

    申请日：2014-06-06

    Applicant: FUJIFILM Corporation

    Inventor： Akinori SHIBUYA ,  Kaoru IWATO

    IPC: G03F7/004 ,  G03F7/20

    CPC classification number: G03F7/004 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/20 ,  G03F7/2041

    Abstract: Disclosed are an actinic ray-sensitive or radiation-sensitive resin composition including (A) a compound capable of generating an acid by irradiation of actinic rays or radiation, and (B) a resin of which solubility in an alkali developer increases by being decomposed by the action of an acid, and, a resist film, a pattern forming method, an electronic device manufacturing method, and an electronic device, each using the composition, wherein the actinic ray-sensitive or radiation-sensitive resin composition contains at least one type of a specific compound represented by General Formula (A-I) and at least one type of a specific compound represented by General Formula (A-II) as the compound (A).

    Abstract translation: 公开了一种光化射线敏感性或辐射敏感性树脂组合物，其包含（A）能够通过光化射线或辐射的照射产生酸的化合物，和（B）通过分解由碱显影剂溶解度增加的树脂 各种使用该组合物的酸和抗蚀剂膜，图案形成方法，电子器件制造方法和电子器件的作用，其中光化射线敏感性或辐射敏感性树脂组合物含有至少一种 的由通式（A1）表示的具体化合物和至少一种由通式（A-II）表示的特定化合物作为化合物（A）。

    ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM, PATTERN FORMING METHOD, ELECTRONIC DEVICE MANUFACTURING METHOD, AND ELECTRONIC DEVICE, EACH USING THE COMPOSITION
    5.
    发明申请
    ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM, PATTERN FORMING METHOD, ELECTRONIC DEVICE MANUFACTURING METHOD, AND ELECTRONIC DEVICE, EACH USING THE COMPOSITION 审中-公开
    丙烯酸类敏感性或辐射敏感性树脂组合物，耐蚀膜，图案形成方法，电子设备制造方法和电子设备，每种使用组合物

    公开(公告)号：US20130136900A1

    公开(公告)日：2013-05-30

    申请号：US13687897

    申请日：2012-11-28

    Applicant: FUJIFILM Corporation

    Inventor： Akinori SHIBUYA ,  Kaoru IWATO

    IPC: G03F7/004

    CPC classification number: G03F7/004 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/2041 ,  Y10T428/24628

    Abstract: Disclosed are an actinic ray-sensitive or radiation-sensitive resin composition including (A) a compound capable of generating an acid by irradiation of actinic rays or radiation, and (B) a resin of which solubility in an alkali developer is increased by being decomposed by the action of an acid, a resist film using the composition, a pattern forming method, an electronic device manufacturing method, and an electronic device, wherein the actinic ray-sensitive or radiation-sensitive resin composition contains a combination composed of the two types of specific compounds of (A-1) or a combination of the two types of specific compounds of (A-2) as the compound (A).

    Abstract translation: 公开了一种光化射线敏感性或辐射敏感性树脂组合物，其包含（A）能够通过光化射线或辐射的照射产生酸的化合物，和（B）通过分解增加其在碱性显影剂中的溶解度的树脂 通过酸的作用，使用该组合物的抗蚀剂膜，图案形成方法，电子器件制造方法和电子器件，其中光化射线敏感或辐射敏感性树脂组合物包含由两种类型组成的组合 的（A-1）的具体化合物或作为化合物（A）的两种类型的（A-2）的具体化合物的组合。

    PATTERN FORMING METHOD, ELECTRON BEAM-SENSITIVE OR EXTREME ULTRAVIOLET-SENSITIVE COMPOSITION, RESIST FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE USING THE SAME, AND ELECTRONIC DEVICE
    8.
    发明申请
    PATTERN FORMING METHOD, ELECTRON BEAM-SENSITIVE OR EXTREME ULTRAVIOLET-SENSITIVE COMPOSITION, RESIST FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE USING THE SAME, AND ELECTRONIC DEVICE 有权
    图案形成方法，电子束敏感或极端超敏感组合物，耐蚀膜，使用其制造电子器件的方法和电子器件

    公开(公告)号：US20140212796A1

    公开(公告)日：2014-07-31

    申请号：US14227344

    申请日：2014-03-27

    Applicant: FUJIFILM CORPORATION

    Inventor： Hiroo TAKIZAWA ,  Kaoru IWATO ,  Hideaki TSUBAKI

    IPC: G03F7/038

    CPC classification number: G03F7/0388 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/038 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/2041 ,  G03F7/325 ,  G03F7/405

    Abstract: There is provided a pattern forming method comprising (1) a step of forming a film by using an electron beam-sensitive or extreme ultraviolet-sensitive resin composition, (2) a step of exposing the film by using an electron beam or an extreme ultraviolet ray, and (3) a step of developing the exposed film by using an organic solvent-containing developer, wherein the electron beam-sensitive or extreme ultraviolet-sensitive resin composition contains (A) a resin containing (R) a repeating unit having a structural moiety capable of decomposing upon irradiation with an electron beam or an extreme ultraviolet ray to generate an acid, and (B) a solvent.

    Abstract translation: 提供了一种图案形成方法，其包括（1）通过使用电子束敏感或极紫外线敏感性树脂组合物形成膜的步骤，（2）通过使用电子束或极紫外线曝光该膜的步骤 （3）通过使用含有机溶剂的显影剂显影曝光膜的步骤，其中电子束敏感性或极紫外线敏感性树脂组合物含有（A）含有（R）重复单元的树脂，其具有 能够在用电子束或极紫外线照射时分解以产生酸的结构部分，和（B）溶剂。

    PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION AND RESIST FILM
    10.
    发明申请
    PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION AND RESIST FILM 有权
    图案形成方法，化学放大电阻组合物和电阻膜

    公开(公告)号：US20130045365A1

    公开(公告)日：2013-02-21

    申请号：US13656960

    申请日：2012-10-22

    Applicant: FUJIFILM CORPORATION

    Inventor： Keita KATO ,  Shinji TARUTANI ,  Sou KAMIMURA ,  Yuichiro ENOMOTO ,  Kaoru IWATO

    IPC: G03F7/20 ,  B32B3/30 ,  G03F7/004

    CPC classification number: G03F7/0397 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0382 ,  G03F7/2041 ,  G03F7/325

    Abstract: A pattern forming method comprising: (i) a step of forming a film from a chemical amplification resist composition, (ii) a step of exposing the film, and (iii) a step of developing the exposed film by using an organic solvent-containing developer, wherein the resist composition contains: (A) a resin, (B) a nonionic compound capable of generating an acid upon irradiation with an actinic ray or radiation, (C) a crosslinking agent, and (D) a solvent.

    Abstract translation: 一种图案形成方法，包括：（i）从化学放大抗蚀剂组合物形成膜的步骤，（ii）曝光所述膜的步骤，和（iii）通过使用含有机溶剂的显影膜的步骤 显影剂，其中抗蚀剂组合物包含：（A）树脂，（B）在用光化射线或辐射照射时能够产生酸的非离子化合物，（C）交联剂和（D）溶剂。

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