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1.发明申请公开(公告)号：US20180329295A1
公开(公告)日：2018-11-15
申请号：US16043433
申请日：2018-07-24
Applicant: FUJIFILM Corporation
Inventor： Seongmu BAK , Naotsugu MURO , Yoshinori TAGUCHI , Akiko YOSHII , Yousuke MURAKAMI
CPC classification number: G03F7/0007 , C08G59/40 , C09B29/33 , C09B29/335 , C09B45/22 , C09B47/04 , C09D17/00 , G02B5/20 , G02F1/1335 , G03F7/0295 , G03F7/033
Abstract: Provided is a coloring composition capable of producing a cured film having suppressed color unevenness even in a case where the coloring composition is used after being stored for a long period of time. In addition, provided are a color filter, a pattern forming method, a solid-state imaging device, and an image display device. The coloring composition includes a halogenated zinc phthalocyanine pigment, a maleimide compound, a curable compound other than the maleimide compound, and a solvent, in which the molecular weight of the maleimide compound is 100 to 400, and the content of the maleimide compound is 0.08 to 0.8 parts by mass with respect to 100 parts by mass of the halogenated zinc phthalocyanine pigment.
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公开(公告)号：US20170269270A1
公开(公告)日：2017-09-21
申请号：US15614742
申请日：2017-06-06
Applicant: FUJIFILM Corporation
Inventor： Yoshinori TAGUCHI , Tetsuya KAMIMURA , Akiko YOSHII
CPC classification number: G02B5/223 , C08G18/284 , C08G18/329 , C08G18/348 , C08G18/8116 , C09B29/33 , C09B57/04 , C09B67/0033 , C09B67/0034 , G02F1/133514 , G03F7/0007 , G03F7/004 , G03F7/032 , G03F7/033 , G03F7/0388 , G03F7/105
Abstract: A coloring composition includes Color Index Pigment Red 264, a graft resin having an acid group, a photopolymerizable compound, and a photopolymerization initiator.
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Patent Agency Ranking
3.发明申请公开(公告)号：US20130244443A1
公开(公告)日：2013-09-19
申请号：US13770282
申请日：2013-02-19
Applicant: FUJIFILM CORPORATION
Inventor： Atsushi MIZUTANI , Tetsuya KAMIMURA , Akiko YOSHII , Tetsuya SHIMIZU
IPC: C09K13/08 , H01L21/306
CPC classification number: C09K13/08 , H01L21/28158 , H01L21/30604 , H01L21/31111
Abstract: A method for manufacturing a semiconductor substrate product having: providing an etching liquid containing water, a hydrofluoric acid compound and an organic solvent, and applying the etching liquid to a semiconductor substrate, the semiconductor substrate having a silicon layer and a silicon oxide layer, the silicon layer containing an impurity, and thereby selectively etching the silicon oxide layer.
Abstract translation: 一种制造半导体衬底产品的方法，其具有：提供含有水，氢氟酸化合物和有机溶剂的蚀刻液，并将蚀刻液施加到半导体衬底，所述半导体衬底具有硅层和氧化硅层， 含有杂质的硅层，从而选择性地蚀刻氧化硅层。
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公开(公告)号：US20180348630A1
公开(公告)日：2018-12-06
申请号：US16058441
申请日：2018-08-08
Applicant: FUJIFILM Corporation
Inventor： Yoshinori TAGUCHI , Naotsugu MURO , Yousuke MURAKAMI , Seongmu BAK , Akiko YOSHII
CPC classification number: C08F2/50 , C08K5/23 , C08K5/3417 , C08K5/3447 , C08L63/00 , C08L101/00 , C09B47/04 , G02B5/20 , G02F1/1335 , G03F7/004 , G03F7/40
Abstract: Provided are a curable coloring composition which is suitable for the production of a cured film in cyan color, having good moisture resistance, a color filter, an image sensor, and a method for producing a cured film. The curable coloring composition includes a coloring agent including a phthalocyanine pigment having Al as a central metal, a basic pigment derivative, and a curable compound, in which the coloring agent includes 80% by mass or more of the phthalocyanine pigments, and the content of the phthalocyanine pigment having Al as a central metal among the phthalocyanine pigments is 30% by mass or more.
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5.发明申请公开(公告)号：US20150179471A1
公开(公告)日：2015-06-25
申请号：US14624860
申请日：2015-02-18
Applicant: FUJIFILM Corporation
Inventor： Atsushi MIZUTANI , Akiko YOSHII , Tetsuya KAMIMURA , Tetsuya SHIMIZU
IPC: H01L21/311 , H01L21/28
CPC classification number: H01L21/31111 , C09K13/08 , H01L21/28158 , H01L21/30604
Abstract: A method of producing a semiconductor substrate product, having the steps of: providing an etching liquid containing water, a hydrofluoric acid compound, and a water-soluble polymer; and applying the etching liquid to a semiconductor substrate, the semiconductor substrate having a silicon layer and a silicon oxide layer, the silicon layer containing an impurity, and thereby selectively etching the silicon oxide layer.
Abstract translation: 一种制造半导体衬底产品的方法，具有以下步骤：提供含有水，氢氟酸化合物和水溶性聚合物的蚀刻液; 并且将蚀刻液施加到半导体衬底，所述半导体衬底具有硅层和氧化硅层，所述硅层含有杂质，从而选择性地蚀刻氧化硅层。
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6.发明申请公开(公告)号：US20180252852A1
公开(公告)日：2018-09-06
申请号：US15970087
申请日：2018-05-03
Applicant: FUJIFILM Corporation
Inventor： Naotsugu MURO , Seongmu BAK , Akiko YOSHII , Yoshinori TAGUCHI , Yousuke MURAKAMI
Abstract: Provided are a coloring composition capable of producing a film having fewer defects generated, and the like even in a case where the coloring composition is stored for a long period of time in an environment with variations in temperature, a color filter, a pattern forming method, a solid-state imaging device, and an image display device. The coloring composition includes a heterocycle-containing coloring agent such as a compound represented by Formula (1), a phthalimide compound, a solvent, and a resin. In Formula (1), R1 to R13 each independently represent a hydrogen atom or a substituent, and adjacent groups of R1 to R8 may be bonded to each other to form a ring, provided that at least one of the pairs of adjacent two groups of R1 to R8 is bonded to each other to form an aromatic ring.
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公开(公告)号：US20130244444A1
公开(公告)日：2013-09-19
申请号：US13770409
申请日：2013-02-19
Applicant: FUJIFILM CORPORATION
Inventor： Atsushi MIZUTANI , Akiko YOSHII , Tetsuya KAMIMURA , Tetsuya SHIMIZU
IPC: C09K13/08 , H01L21/306
CPC classification number: H01L21/31111 , C09K13/08 , H01L21/28158 , H01L21/30604
Abstract: A method of producing a semiconductor substrate product, having the steps of: providing an etching liquid containing water, a hydrofluoric acid compound, and a water-soluble polymer; and applying the etching liquid to a semiconductor substrate, the semiconductor substrate having a silicon layer and a silicon oxide layer, the silicon layer containing an impurity, and thereby selectively etching the silicon oxide layer.
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