Abstract:
There is provided an antireflective laminate including: a hard coat layer; and an antireflective layer adjacent to the hard coat layer, wherein the hard coat layer includes cellulose acylate in a region within 1 μm far from an interface with the antireflective layer in a film thickness direction, and the antireflective layer includes a binder resin and particles having an average primary particle diameter of 50 nm or more and 700 nm or less, and has a moth-eye structure by the particles on a surface opposite to the interface with the hard coat layer.
Abstract:
Provided is a manufacturing method of an electronic device, including a step of preparing an electronic substrate including a wiring board, an electronic component, and a ground electrode, a first step of forming an insulating layer on the electronic component, and a second step of forming, on the insulating layer and on the ground electrode, an electromagnetic wave shielding layer that covers the insulating layer and is electrically connected to the ground electrode, to obtain an electronic device, in which, in the first step, the insulating layer is formed by applying an ink for an insulating layer and performing an irradiation with active energy ray on the applied ink for an insulating layer, in the second step, the electromagnetic wave shielding layer is formed by applying an ink for an electromagnetic wave shielding layer, containing a metal compound, and a jetting temperature of the ink for an insulating layer is higher than a jetting temperature of the ink for an electromagnetic wave shielding layer by 10° C. to 40° C.
Abstract:
There is provided a manufacturing method of an electronic device, the method comprising: a step of preparing an electronic substrate; a step of forming an insulating layer; and a step of forming a conductive layer, in which the step of forming the insulating layer comprises a first step of applying an ink for forming a first insulating layer to a region where the electronic component is not disposed and irradiating the ink for forming a first insulating layer with a first active energy ray and a second step of applying an ink for forming a second insulating layer to a region which includes a region on an insulating layer formed in the first step and a region where the electronic component is disposed, and irradiating the ink for forming a second insulating layer with a second active energy ray.
Abstract:
There is provided an antireflective film, including: a plastic substrate; a infiltration layer; and an antireflective layer containing metallic oxide fine particles with an average primary particle diameter of 50 nm to 250 nm and a viscosity increasing compound, in this order, wherein the infiltration layer contains a polymer of a (meth)acrylate compound having a molecular weight of 400 or less, and the antireflective layer has a moth-eye structure including an uneven shape formed by the metallic oxide fine particles.
Abstract:
Provided are an ink set including a first ink including an ethylenic unsaturated compound and a photopolymerization initiator, the first ink not including a colorant or including a white colorant, and a second ink including an ethylenic unsaturated compound, a photopolymerization initiator, and a colorant, wherein the proportion of the amount of a monofunctional monomer to the total amount of the ethylenic unsaturated compound included in the first ink is 95.0% by mass or more, the proportion of the amount of a monofunctional monomer to the total amount of the ethylenic unsaturated compound included in the second ink is 95.0% by mass or more, and, when the static surface tension of the first ink at 25° C. is defined as T1 and the static surface tension of the second ink at 25° C. is defined as T2, the value calculated by subtracting T1 from T2 is 1 mN/m or more, and applications of the ink set.
Abstract:
Provided are an ink jet ink composition containing a monomer A represented by formula (A), a monomer B that is a radical-polymerizable monomer including an alicyclic structure and not including a heterocyclic structure, and a monomer C that is a radical-polymerizable monomer including a heterocyclic structure, the total content of the monomer A, the monomer B, and the monomer C being 60 mass % or more relative to the total amount of the composition, and applications thereof. R1 to R4 each independently represent a hydrogen atom or an organic group having 1 to 10 carbon atoms, and n represents an integer of 1 to 3. When n is 2 or 3, two or three R's may be the same or different, and two or three R4's may be the same or different.
Abstract:
Provided is a hardcoat film having a film thickness of 25 μm or less in which a polymerized substance of a compound having an energy ray-curable group and a resin are mixed across an entire region in a film thickness direction, in which a percentage of a mass concentration of the resin which is represented by the Expression (1) as defined herein has a distribution in which the percentage is maximized on at least one of two opposed surfaces, in the film thickness direction, of the hardcoat film or at a central part, in the film thickness direction, of the hardcoat film.