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公开(公告)号：US20230159347A1
公开(公告)日：2023-05-25
申请号：US18094542
申请日：2023-01-09
Applicant: FUJIMI INCORPORATED
Inventor： Shogo TSUBOTA , Robert HEPBURN
CPC classification number: C01G25/02 , C01F7/36 , C01P2006/12 , C01P2006/14 , C01P2006/16
Abstract: Provided is a method for producing a porous metal oxide. The method includes: preparing a slurry by mixing a metal source, a pore forming agent and an aqueous solvent; drying the slurry to obtain a metal oxide precursor; and sintering the metal oxide precursor to generate a porous metal oxide. The metal source is an organometallic compound or hydrolyzate thereof containing a metal that makes up the porous metal oxide; the pore forming agent is an inorganic compound that generates a gas by decomposing at a temperature equal to or lower than a temperature at which the metal oxide precursor is sintered; and the slurry is prepared using 50 parts by weight or more of the pore forming agent with respect to 100 parts by weight of the metal source.
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公开(公告)号：US20200308009A1
公开(公告)日：2020-10-01
申请号：US16818114
申请日：2020-03-13
Applicant: FUJIMI INCORPORATED
Inventor： Yusuke KAWASAKI , Shogo TSUBOTA , Masaaki ITO , Jun SHINODA , Keiji ASHITAKA
IPC: C01B33/145
Abstract: The present invention provides a means capable of suppressing the formation of fine particles in a method for producing a silica sol. The present invention relates to a method for producing a silica sol, including synthesizing a silica sol by, in a reaction liquid containing an alkoxysilane or a condensate thereof, water, and an alkali catalyst, allowing the alkoxysilane or condensate thereof to react with the water in the presence of the alkali catalyst, wherein the alkali catalyst is not additionally supplied after the start of the synthesis until the finish time of the synthesis, and during 90% or more of the time between when 5 minutes have elapsed from the time point when the electrical conductivity of the reaction liquid reaches a local maximum for the first time and the finish time of the synthesis, the proportion of the value of the electrical conductivity of the reaction liquid is more than 90% relative to the value of the electrical conductivity at the time when 5 minutes have elapsed from the time point when the local maximum is reached.
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公开(公告)号：US20240262698A1
公开(公告)日：2024-08-08
申请号：US18429695
申请日：2024-02-01
Applicant: FUJIMI INCORPORATED
Inventor： Shogo TSUBOTA , Masaaki ITO , Keiji ASHITAKA , Yusuke KAWASAKI , Kazuaki IWASAKI
IPC: C01B33/141
CPC classification number: C01B33/141 , C01P2004/64 , C01P2006/22 , C01P2006/80
Abstract: A silica sol which does not gelate, has a high purity, and contains a high concentration of silica particles is provided. A silica sol containing silica particles and water, wherein a product of an average primary particle size of the silica particles and an average circularity of the silica particles is 15.0 or more and 31.2 or less, a concentration of the silica particles is 20 mass % or more, a total organic carbon amount per silica particle is less than 10 mass ppm, when the concentration of the silica particles is 20 mass %, a viscosity at 25° C. is 300 mPa·s or less, and a concentration of a metal impurity is less than 1 mass ppm.
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公开(公告)号：US20230313011A1
公开(公告)日：2023-10-05
申请号：US18122961
申请日：2023-03-17
Applicant: FUJIMI INCORPORATED
Inventor： Shogo TSUBOTA , Keiji ASHITAKA , Masaaki ITO , Tatsuhiko HIRANO , Shota SUZUKI
CPC classification number: C09K3/1436 , C09G1/02
Abstract: The present invention provides a means capable of further improving stability and washability under acidic conditions. The present invention is sulfonic acid-modified colloidal silica having an amount of sulfonic acid groups per 1 g of particles of 1.5 μmol/g or more and 13.0 μmol/g or less.
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5.发明申请公开(公告)号：US20190309190A1
公开(公告)日：2019-10-10
申请号：US16448992
申请日：2019-06-21
Applicant: FUJIMI INCORPORATED
Inventor： Keiji ASHITAKA , Shogo TSUBOTA
IPC: C09G1/02 , C01B33/148 , C01B33/146 , C09K3/14 , H01L21/304 , C07F7/02 , H01L21/3105 , B24B37/04 , B24B37/00 , C01B33/149
Abstract: To provide modified colloidal silica capable of improving the stability of the polishing speed with time when used as abrasive grains in a polishing composition for polishing a polishing object that contains a material to which charged modified colloidal silica easily adheres, such as a SiN wafer, and to provide a method for producing the modified colloidal silica.Modified colloidal silica, being obtained by modifying raw colloidal silica, wherein the raw colloidal silica has a number distribution ratio of 10% or less of microparticles having a particle size of 40% or less relative to a volume average particle size based on Heywood diameter (equivalent circle diameter) as determined by image analysis using a scanning electron microscope.
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Patent Agency Ranking
公开(公告)号：US20230321628A1
公开(公告)日：2023-10-12
申请号：US18019663
申请日：2021-08-05
Applicant: FUJIMI INCORPORATED
Inventor： Robert HEPBURN , Shogo TSUBOTA
CPC classification number: B01J20/08 , B01D15/00 , B01J20/28011 , B01J20/28061 , B01J20/28083 , C01F7/02 , C01P2006/12 , C01P2006/16 , C01P2006/32
Abstract: Provided is an absorption method of an element belonging to periods 4 to 6 and groups 3 to 15 of the periodic table. The method includes: preparing mesoporous alumina that satisfies at least one of the following items:
(1) a surface hydroxyl content is 3.5 mmol/g or more;
(2) a low-temperature CO2 desorption amount in CO2 thermal desorption amount spectrometry is 5 µmol/g or more; and
(3) a low-temperature NH3 desorption amount in NH3 thermal desorption amount spectrometry is 25 µmol/g or more; and
bringing a liquid containing an absorption target element in contact with the mesoporous alumina to absorb the absorption target element in the mesoporous alumina. The absorption target element is at least one type selected from the group consisting of an element belonging to periods 4 to 6 and groups 3 to 15 of the periodic table.-
公开(公告)号：US20230056027A1
公开(公告)日：2023-02-23
申请号：US17950784
申请日：2022-09-22
Applicant: FUJIMI INCORPORATED
Inventor： Yusuke KAWASAKI , Shogo TSUBOTA , Masaaki ITO , Jun SHINODA , Keiji ASHITAKA
IPC: C01B33/145 , C01B33/141
Abstract: The present invention provides a means capable of suppressing the formation of fine particles in a method for producing a silica sol. The present invention relates to a method for producing a silica sol, including synthesizing a silica sol by, in a reaction liquid containing an alkoxysilane or a condensate thereof, water, and an alkali catalyst, allowing the alkoxysilane or condensate thereof to react with the water in the presence of the alkali catalyst, wherein the alkali catalyst is not additionally supplied after the start of the synthesis until the finish time of the synthesis, and during 90% or more of the time between when 5 minutes have elapsed from the time point when the electrical conductivity of the reaction liquid reaches a local maximum for the first time and the finish time of the synthesis, the proportion of the value of the electrical conductivity of the reaction liquid is more than 90% relative to the value of the electrical conductivity at the time when 5 minutes have elapsed from the time point when the local maximum is reached.
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公开(公告)号：US20190144728A1
公开(公告)日：2019-05-16
申请号：US16245030
申请日：2019-01-10
Applicant: FUJIMI INCORPORATED
Inventor： Keiji ASHITAKA , Shogo TSUBOTA
IPC: C09K3/14 , B24B37/04 , C09G1/02 , H01L21/3105
CPC classification number: C09K3/1463 , B24B37/044 , C09G1/02 , C09K3/1436 , H01L21/31053
Abstract: Disclosed herein is a polishing composition comprising a pH of 6 or less, sulfonic acid-modified colloidal silica obtained by immobilizing sulfonic acid on surfaces of silica particles, and water, wherein the sulfonic acid-modified colloidal silica is derived from sulfonic acid-modified aqueous anionic silica sol produced by a production method comprising: a first reaction step of obtaining a reactant by heating raw colloidal silica having a number distribution ratio of 10% or less of microparticles having a particle diameter of 40% or less relative to a volume average particle diameter based on Heywood diameter (equivalent circle diameter) as determined by image analysis using a scanning electron microscope in the presence of a silane coupling agent having a functional group chemically convertible to a sulfonic acid group; and a second reaction step of converting the functional group to a sulfonic acid group by treating the reactant.
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公开(公告)号：US20170342304A1
公开(公告)日：2017-11-30
申请号：US15544425
申请日：2016-01-19
Applicant: FUJIMI INCORPORATED
Inventor： Keiji ASHITAKA , Shogo TSUBOTA
IPC: C09K3/14 , B24B37/04 , C09G1/02 , H01L21/3105
Abstract: To provide a technique with which in a case where sulfonic acid-modified aqueous anionic sol is used as abrasive grain, in a polishing composition for polishing an object to be polished that contains SiN, the stability of the SiN polishing rate with time can be improved, and the content of hydrogen peroxide can be decreased.In a polishing composition having a pH of 6 or less, sulfonic acid-modified colloidal silica obtained by immobilizing sulfonic acid on surfaces of silica particles, and water are allowed to be contained, at this time, as the sulfonic acid-modified colloidal silica, the one derived from sulfonic acid-modified aqueous anionic silica sol produced by a production method including a first reaction step of obtaining a reactant by heating raw colloidal silica having a number distribution ratio of 10% or less of microparticles having a particle diameter of 40% or less relative to a volume average particle diameter based on Heywood diameter (equivalent circle diameter) as determined by image analysis using a scanning electron microscope in the presence of a silane coupling agent having a functional group chemically convertible to a sulfonic acid group; and a second reaction step of converting the functional group to a sulfonic acid group by treating the reactant is used.
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公开(公告)号：US20210139342A1
公开(公告)日：2021-05-13
申请号：US16071214
申请日：2017-01-19
Applicant: FUJIMI INCORPORATED
Inventor： Shogo TSUBOTA , Robert HEPBURN
Abstract: Provided is a method for producing a porous metal oxide. The method includes: preparing a slurry by mixing a metal source, a pore forming agent and an aqueous solvent; drying the slurry to obtain a metal oxide precursor; and sintering the metal oxide precursor to generate a porous metal oxide. The metal source is an organometallic compound or hydrolyzate thereof containing a metal that makes up the porous metal oxide; the pore forming agent is an inorganic compound that generates a gas by decomposing at a temperature equal to or lower than a temperature at which the metal oxide precursor is sintered; and the slurry is prepared using 50 parts by weight or more of the pore forming agent with respect to 100 parts by weight of the metal source.
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