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1.发明授权Interference suppression method and apparatus in multi-point coordinated transmission system 有权多点协调传输系统中的干扰抑制方法和装置公开(公告)号：US09258823B2
公开(公告)日：2016-02-09
申请号：US13977995
申请日：2012-01-04
申请人： Fanglei Sun , Qinglin Luo , Wei Fang
发明人： Fanglei Sun , Qinglin Luo , Wei Fang
CPC分类号： H04W72/082 , H04B7/024 , H04B7/026 , H04W28/04 , H04W72/1226
摘要： The present invention provides an apparatus for suppressing interference in a coordinated multi-point CoMP transmission system, comprising: frame configuration conflicting detection unit configured to detect conflicting frame configurations; frame configuration conflicting notification unit configured to give a notification of conflicting frame configurations; and interference suppression unit configured to suppress interference between a first CoMP cluster and a second CoMP cluster that are adjacent in the CoMP transmission system when detecting conflicting frame configurations. The present invention further provides a method of suppressing interference in a coordinated multi-point CoMP transmission system. The present invention provides a novel solution that may suppress inter-cell UL/DL ICI by adopting coordinated beamforming (CBF) and coordinated scheduling (CS) in a TDD CoMP system, while maintaining sound implementation of CoMP and flexibility of frame configuration in the TDD system.
摘要翻译： 本发明提供了一种用于抑制协调多点CoMP传输系统中的干扰的装置，包括：帧配置冲突检测单元，被配置为检测冲突帧配置; 帧配置冲突通知单元，被配置为给出冲突帧配置的通知; 以及干扰抑制单元，被配置为当检测到冲突帧配置时，抑制在所述CoMP传输系统中相邻的第一CoMP群集和第二CoMP群集之间的干扰。 本发明还提供一种抑制协调多点CoMP传输系统中的干扰的方法。 本发明提供了一种可以通过在TDD CoMP系统中采用协调波束成形（CBF）和协调调度（CS）来抑制小区间UL / DL ICI的新颖解决方案，同时在TDD中保持CoMP的声音实现和帧配置的灵活性 系统。
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2.发明申请INTERFERENCE SUPPRESSION METHOD AND APPARATUS IN MULTI-POINT COORDINATED TRANSMISSION SYSTEM 有权多点协调传输系统中的干扰抑制方法和装置公开(公告)号：US20130273950A1
公开(公告)日：2013-10-17
申请号：US13977995
申请日：2012-01-04
申请人： Fanglei Sun , Qinglin Luo , Wei Fang
发明人： Fanglei Sun , Qinglin Luo , Wei Fang
IPC分类号： H04W72/08
CPC分类号： H04W72/082 , H04B7/024 , H04B7/026 , H04W28/04 , H04W72/1226
摘要： The present invention provides an apparatus for suppressing interference in a coordinated multi-point CoMP transmission system, comprising: frame configuration conflicting detection unit configured to detect conflicting frame configurations; frame configuration conflicting notification unit configured to give a notification of conflicting frame configurations; and interference suppression unit configured to suppress interference between a first CoMP cluster and a second CoMP cluster that are adjacent in the CoMP transmission system when detecting conflicting frame configurations. The present invention further provides a method of suppressing interference in a coordinated multi-point CoMP transmission system. The present invention provides a novel solution that may suppress inter-cell UL/DL ICI by adopting coordinated beamforming (CBF) and coordinated scheduling (CS) in a TDD CoMP system, while maintaining sound implementation of CoMP and flexibility of frame configuration in the TDD system.
摘要翻译： 本发明提供了一种用于抑制协调多点CoMP传输系统中的干扰的装置，包括：帧配置冲突检测单元，被配置为检测冲突帧配置; 帧配置冲突通知单元，被配置为给出冲突帧配置的通知; 以及干扰抑制单元，被配置为当检测到冲突帧配置时，抑制在所述CoMP传输系统中相邻的第一CoMP群集和第二CoMP群集之间的干扰。 本发明还提供一种抑制协调多点CoMP传输系统中的干扰的方法。 本发明提供了一种可以通过在TDD CoMP系统中采用协调波束成形（CBF）和协调调度（CS）来抑制小区间UL / DL ICI的新颖解决方案，同时在TDD中保持CoMP的声音实现和帧配置的灵活性 系统。
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公开(公告)号：US08937281B2
公开(公告)日：2015-01-20
申请号：US13541618
申请日：2012-07-03
CPC分类号： H01J37/265 , H01J37/28 , H01J2237/2817
摘要： A method for examining a sample with a scanning charged particle beam imaging apparatus. First, an image area and a scan area are specified on a surface of the sample. Herein, the image area is entirely overlapped within the scan area. Next, the scan area is scanned by using a charged particle beam along a direction neither parallel nor perpendicular to an orientation of the scan area. It is possible that only a portion of the scan area overlapped with the image area is exposed to the charged particle beam. It also is possible that both the shape and the size of the image area are essentially similar with that of the scan area, such that the size of the area projected by the charged particle beam is almost equal to the size of the image area.
摘要翻译： 一种用扫描带电粒子束成像装置检查样品的方法。 首先，在样品的表面上指定图像区域和扫描区域。 这里，图像区域在扫描区域内完全重叠。 接下来，通过使用带电粒子束沿着既不平行也不垂直于扫描区域的取向的方向来扫描扫描区域。 可能的是，与图像区域重叠的扫描区域的仅一部分暴露于带电粒子束。 图像区域的形状和尺寸也可能与扫描区域的形状和尺寸基本相同，使得由带电粒子束投射的区域的尺寸几乎等于图像区域的尺寸。
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公开(公告)号：US08884224B2
公开(公告)日：2014-11-11
申请号：US12420200
申请日：2009-04-08
CPC分类号： H01J37/28 , H01J37/026 , H01J2237/004 , H01J2237/0044 , H01J2237/0048
摘要： A method for enhancing the quality of a charged particle microscopic image of a sample is disclosed. The image is formed by a charged particle beam imaging system. The method comprising: scanning, using a first scanning beam, a surface of the sample in at least one first scan line; and scanning, using a second scanning beam, the sample surface in at least one second scan line, wherein said second scanning beam is scanned across said sample surface during a time interval between the end of said first scan lines and the beginning of the next said first scan lines. Application of the proposed method as a charged particle beam imaging system is also disclosed.
摘要翻译： 公开了一种提高样品带电粒子显微镜图像质量的方法。 该图像由带电粒子束成像系统形成。 该方法包括：使用第一扫描光束在至少一个第一扫描线中扫描样品的表面; 以及使用第二扫描光束扫描至少一个第二扫描线中的样品表面，其中所述第二扫描光束在所述第一扫描线的末端与所述第一扫描线的开始之间的时间间隔期间跨越所述样品表面扫描 第一条扫描线。 还公开了所提出的方法作为带电粒子束成像系统的应用。
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公开(公告)号：US08805054B2
公开(公告)日：2014-08-12
申请号：US13269038
申请日：2011-10-07
申请人： Wei Fang , Zhao-Li Zhang , Jack Jau
发明人： Wei Fang , Zhao-Li Zhang , Jack Jau
IPC分类号： G06K9/00
CPC分类号： G06T7/0008 , G06T7/001 , G06T2207/20081 , G06T2207/30148
摘要： A method of classifying the defects on a wafer having some same chips and corresponding system is provided. After receiving images formed by scanning the wafer using a charged particle beam, these images are examined such that both defective images and defect-free images are found. Then, the defect-free images are translated into a simulated layout of the chip, or a database is used to provide the simulated layout of the chip. Finally, the defects on the defective images are classified by comparing the images with the simulated layout of the chip. The system has some modules separately corresponds to the steps of the method.
摘要翻译： 提供了在具有相同芯片和相应系统的晶片上分类缺陷的方法。 在接收到通过使用带电粒子束扫描晶片形成的图像之后，检查这些图像，使得发现缺陷图像和无缺陷图像。 然后，将无缺陷图像转换为芯片的模拟布局，或者使用数据库来提供芯片的模拟布局。 最后，通过将图像与芯片的模拟布局进行比较来分类缺陷图像上的缺陷。 系统有一些模块分别对应于该方法的步骤。
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6.发明授权Method and system for filtering noises in an image scanned by charged particles 有权用于过滤由带电粒子扫描的图像中的噪声的方法和系统公开(公告)号：US08712184B1
公开(公告)日：2014-04-29
申请号：US13311043
申请日：2011-12-05
申请人： Chad Liao , Futang Peng , Chuan Li , Alina Wang , Zhao-Li Zhang , Wei Fang , Jack Jau
发明人： Chad Liao , Futang Peng , Chuan Li , Alina Wang , Zhao-Li Zhang , Wei Fang , Jack Jau
CPC分类号： G06K9/40 , G01N23/225 , G06K9/036 , G06T5/002 , G06T7/0002 , G06T2207/20012 , G06T2207/30148 , G06T2207/30168
摘要： A method for filtering noises in an image scanned by charged particles includes steps of grouping pixels with similar types in the image into a plurality of pixel groups; and removing noises for each pixel group in the image according to a corresponding noise model to obtain the scanned image with better quality and/or contrast. A system for filtering noises in an image scanned by charged particles is also disclosed.
摘要翻译： 用于对由带电粒子扫描的图像中的噪声进行滤波的方法包括将图像中具有相似类型的像素分组为多个像素组的步骤; 并且根据相应的噪声模型去除图像中的每个像素组的噪声，以获得具有更好质量和/或对比度的扫描图像。 还公开了一种用于过滤由带电粒子扫描的图像中的噪声的系统。
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7.发明申请Method for Inspecting Overlay Shift Defect during Semiconductor Manufacturing and Apparatus Thereof 有权半导体制造过程中检查覆盖偏移缺陷的方法及其设备公开(公告)号：US20100278416A1
公开(公告)日：2010-11-04
申请号：US12433762
申请日：2009-04-30
CPC分类号： H01L21/67242 , G03F7/70633
摘要： A method of inspecting for overlay shift defects during semiconductor manufacturing is disclosed. The method can include the steps of providing a charged particle microscopic image of a sample, identifying an inspection pattern period in the charged particle microscopic image, averaging the charged particle microscopic image by using the inspection pattern period to form an averaged inspection pattern period, estimating an average width from the averaged inspection pattern period, and comparing the average width with a predefined threshold value to determine the presence of an overlay shift defect.
摘要翻译： 公开了一种在半导体制造期间检查覆盖偏移缺陷的方法。 该方法可以包括以下步骤：提供样品的带电粒子显微镜图像，识别带电粒子显微镜图像中的检查图案周期，通过使用检查图案周期平均化带电粒子显微镜图像以形成平均检查图案周期，估计 从平均检查图案周期的平均宽度，以及将平均宽度与预定义的阈值进行比较，以确定覆盖位移缺陷的存在。
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公开(公告)号：US07713085B2
公开(公告)日：2010-05-11
申请号：US11357642
申请日：2006-02-17
申请人： Hongbin Wu , Dong Yang , Wei Fang , Fengwei Tian , Facan Feng
发明人： Hongbin Wu , Dong Yang , Wei Fang , Fengwei Tian , Facan Feng
IPC分类号： H01R13/60
CPC分类号： H01R12/716 , H01R13/6215 , H01R13/6456
摘要： The present invention provides a connector interface comprising a connector socket interface and a connector plug interface, the connector socket interface comprising metal shell, insulator, band-shaped recess provided on said insulator and metal contacts and the connector plug interface comprising metal shell, insulator, and band-shaped protrusion provided on said insulator and metal contacts, said connector socket interface and said connector plug interface being able to be coupled together, wherein: said connector socket interface has a plurality of band-shaped recesses and said connector plug interface has a plurality of band-shaped protrusions. In a connector interface with the same number of metal pieces according to an embodiment of the present invention, the footprint of the coupling part is reduced, the footprint per pair of contacts is reduced, and the objective of increasing the pin density of the contacts in a connector is achieved.
摘要翻译： 本发明提供了一种连接器接口，其包括连接器插座接口和连接器插头接口，所述连接器插座接口包括金属壳，绝缘体，设置在所述绝缘体上的带状凹部和金属触点以及包括金属壳，绝缘体， 以及设置在所述绝缘体和金属触点上的带状突起，所述连接器插座接口和所述连接器插头接口能够耦合在一起，其中：所述连接器插座接口具有多个带状凹部，并且所述连接器插头接口具有 多个带状突起。 在根据本发明的实施例的具有相同数量的金属片的连接器接口中，耦合部分的占地面积减小，每对触点的占地面积减小，并且增加触点的引脚密度 实现连接器。
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公开(公告)号：US20080132111A1
公开(公告)日：2008-06-05
申请号：US11357642
申请日：2006-02-17
申请人： Hongbin Wu , Dong Yang , Wei Fang , Fengwei Tian , Facan Feng
发明人： Hongbin Wu , Dong Yang , Wei Fang , Fengwei Tian , Facan Feng
CPC分类号： H01R12/716 , H01R13/6215 , H01R13/6456
摘要： The present invention provides a connector interface comprising a connector socket interface and a connector plug interface, the connector socket interface comprising metal shell, insulator, band-shaped recess provided on said insulator and metal contacts and the connector plug interface comprising metal shell, insulator, and band-shaped protrusion provided on said insulator and metal contacts, said connector socket interface and said connector plug interface being able to be coupled together, wherein: said connector socket interface has a plurality of band-shaped recesses and said connector plug interface has a plurality of band-shaped protrusions. In a connector interface with the same number of metal pieces according to an embodiment of the present invention, the footprint of the coupling part is reduced, the footprint per pair of contacts is reduced, and the objective of increasing the pin density of the contacts in a connector is achieved.
摘要翻译： 本发明提供了一种连接器接口，其包括连接器插座接口和连接器插头接口，所述连接器插座接口包括金属壳，绝缘体，设置在所述绝缘体上的带状凹部和金属触点以及包括金属壳，绝缘体， 以及设置在所述绝缘体和金属触点上的带状突起，所述连接器插座接口和所述连接器插头接口能够耦合在一起，其中：所述连接器插座接口具有多个带状凹部，并且所述连接器插头接口具有 多个带状突起。 在根据本发明的实施例的具有相同数量的金属片的连接器接口中，耦合部分的占地面积减小，每对触点的占地面积减小，并且增加触点的引脚密度 实现连接器。
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