摘要:
A radiation curing apparatus comprises a plurality of solid state radiation sources to generate radiation that cures a first material. The solid state radiation sources can be disposed in an array pattern. Optical concentrators, arranged in a corresponding array pattern, receive radiation from corresponding solid state radiation sources. The concentrated radiation is received by a plurality of optical waveguides, also arranged in a corresponding array pattern. Each optical waveguide includes a first end to receive the radiation and a second end to output the radiation. The curing apparatus can be utilized for continuous substrate, sheet, piece part, spot curing, and/or 3D radiation-cure processes.
摘要:
A radiation modifying apparatus comprises a plurality of solid state radiation sources to generate radiation that modifies a first material such as by curing or creating alignment through polarization. The solid state radiation sources can be disposed in an array pattern. Optical concentrators, arranged in a corresponding array pattern, receive radiation from corresponding solid state radiation sources. The concentrated radiation is received by a plurality of optical waveguides, also arranged in a corresponding array pattern. Each optical waveguide includes a first end to receive the radiation and a second end to output the radiation. The radiation modifying apparatus can be utilized for continuous substrate, sheet, piece part, spot curing, and/or 3D radiation-cure processes.
摘要:
A radiation modifying apparatus comprises a plurality of solid state radiation sources to generate radiation that modifies a first material such as by curing or creating alignment through polarization. The solid state radiation sources can be disposed in an array pattern. Optical concentrators, arranged in a corresponding array pattern, receive radiation from corresponding solid state radiation sources. The concentrated radiation is received by a plurality of optical waveguides, also arranged in a corresponding array pattern. Each optical waveguide includes a first end to receive the radiation and a second end to output the radiation. The radiation modifying apparatus can be utilized for continuous substrate, sheet, piece part, spot curing, and/or 3D radiation-cure processes.
摘要:
A radiation modifying apparatus comprises a plurality of solid state radiation sources to generate radiation that modifies a first material such as by curing or creating alignment through polarization. The solid state radiation sources can be disposed in an array pattern. Optical concentrators, arranged in a corresponding array pattern, receive radiation from corresponding solid state radiation sources. The concentrated radiation is received by a plurality of optical waveguides, also arranged in a corresponding array pattern. Each optical waveguide includes a first end to receive the radiation and a second end to output the radiation. The radiation modifying apparatus can be utilized for continuous substrate, sheet, piece part, spot curing, and/or 3D radiation-cure processes.
摘要:
A system(109) for altering charge of a dielectric material (90) uses ultraviolet radiation. The system includes a gas source (102) and an ultraviolet radiation source (104). The gas source (102) introduced a gas (103) to a region adjacent the dielectric material (90). The ultraviolet radiation source (104) is arranged to irradiate the region to adjust charge on the dielectric material. A method of altering charge on a dielectric material (90) is also disclosed in which a gas (103) is introduced to a region adjacent the dielectric materia (90)1. The region is then irradiated with the ultraviolet radiation (105) to alter charge on the dielectric material (90).
摘要:
An ultrasonic-assisted injection molding system and method for making precisely-shaped articles. A source of ultrasonic energy is positioned to apply vibrational energy to a mold cavity connected to at least one gate in flow communication with a source of molten (co)polymer. The mold is heated to a temperature of 104-116° C., and the molten (co)polymer is injected into the mold cavity. After cooling the mold until the molten (co)polymer within the gate has solidified, ultrasonic energy is applied to the mold without remelting the solidified (co)polymer within the gate until the temperature increases to 116-122° C., thereby substantially relieving flow induced stresses. The mold is then cooled until the temperature decreases to 101-107° C., and is thereafter heated until the temperature increases to 116-122° C., thereby substantially relieving any thermally induced stresses. The mold is cooled until the molten (co)polymer has solidified, thereby forming a precision molded plastic optical element.
摘要:
Methods and apparatus (40) to neutralize the charge on a moving web (42) by splitting the field present on the web (42). One portion of the field is removed by a grounded element (55a, 55) proximate to, and optionally contacting, one side of the web (42). Proximate the opposite side of the web, the apparatus includes an ion source (57a, 57b, 57c), which provides ions to the web (42) to neutralize the charge remaining on the web (42), and a second grounded element (50a, 50b, 50c) positioned between the ion source (57a, 57b,57c) and the web (42). The methods provide a web (42) that is net neutralized and is also dual-side or bipolar neutralized.
摘要:
Injection molding parts onto a carrier web located between mold halves, each mold half having a cavity, resulting in molded articles having parts on both sides of the carrier web. Polymer flow into the cavities is assisted by application of ultrasonic energy to the mold. After the molding operation, mold halves are separated, and the carrier web is advanced, or indexed, to a next position for another molding sequence. Articles produced include lenses with part of the carrier web between lens halves, and a carrier web bearing an array of molded parts.
摘要:
A system for applying a fluid coating onto a substrate includes forming a fluid wetting line by introducing a stream of fluid onto a first side of the substrate along a laterally disposed fluid-substrate contact area. An electrical force is created on the fluid from an electrical field (originating from electrical charges which are on the second side of the substrate) that is substantially at and downstream of the fluid wetting line. The electrical field can be generated by charges that have been transferred to the second side of the substrate from a remote charge generator.
摘要:
A method for applying a fluid coating onto a substrate includes forming a fluid wetting line by introducing a stream of fluid onto a first side of the substrate along a laterally disposed fluid-substrate contact area. An electrical force is created on the fluid from an electrical field (originating from electrical charges which are on the second side of the substrate) that is substantially at and downstream of the fluid wetting line. The electrical field can be generated by charges that have been transferred to the second side of the substrate from a remote charge generator.