公开(公告)号：US5436464A

公开(公告)日：1995-07-25

申请号：US044197

申请日：1993-04-08

申请人： Fuminori Hayano ,  Hideyuki Tashiro ,  Tsuneyuki Hagiwara ,  Hajime Moriya

发明人： Fuminori Hayano ,  Hideyuki Tashiro ,  Tsuneyuki Hagiwara ,  Hajime Moriya

IPC分类号： G01N21/94 ,  G01N21/88

CPC分类号： G01N21/94

摘要： In a foreign particle inspecting method and apparatus in which a polarized beam is applied to a surface to be inspected through a light transmitting member mounted thereon, in which scattered light from a foreign particle on the surface to be inspected is received by a light receiving device through the light transmitting member, and in which the foreign particle is discriminated based on a detection signal from the light receiving device, the detection signal is corrected in conformity with the transmittance of the light transmitting member for polarized incident scanning light and the transmittance of the light transmitting member for non-polarized light scattered from the foreign particle, for various angles of incidence of the polarized light and emergence of the non-polarized light. Foreign particle data may be indicated by a mapping method.

摘要翻译： 在通过安装在其上的透光构件将偏振光束施加到被检查表面的异物检测方法和装置中，其中待检测表面上的异物的散射光被光接收装置接收 通过透光构件，并且根据来自光接收装置的检测信号鉴别异物，检测信号根据用于偏振入射扫描光的透光构件的透射率和 用于从异物散射的非偏振光的透光构件，用于偏振光的各种入射角和非偏振光的出射。 外来粒子数据可以用映射方法表示。

公开(公告)号：US5623340A

公开(公告)日：1997-04-22

申请号：US391602

申请日：1995-02-21

申请人： Kenji Yamamoto ,  Fuminori Hayano ,  Tsuneyuki Hagiwara ,  Hideyuki Tashiro

发明人： Kenji Yamamoto ,  Fuminori Hayano ,  Tsuneyuki Hagiwara ,  Hideyuki Tashiro

IPC分类号： G01N21/88 ,  G01N21/94 ,  G01N21/956 ,  G06T1/00

CPC分类号： G01N21/8806

摘要： A foreign particle inspection apparatus, for detecting a foreign particle on a reticle or the like includes an illumination system for irradiating an inspection area on a specimen with inspecting light, and plural light-receiving systems adapted to condense the scattered light from a foreign particle in the inspection area and having respective light-receiving areas on the specimen, each smaller than the inspection area. Each of the light-receiving areas of the plural light-receiving systems overlaps partially with at least one of the other light-receiving areas. The plural light-receiving systems are so arranged that any point in the inspection area is covered by the light-receiving areas of at least two of the plural light-receiving systems. A foreign particle in the inspection area is detected by a detection system, based on the lights condensed by the plural light receiving systems.

摘要翻译： 用于检测掩模版等上的异物的异物检查装置包括：用于用检查光照射检体的检查区域的照明系统，以及适于将来自异物的散射光聚集的多个受光系统 检查区域，并且在样本上具有各自小于检查区域的各个光接收区域。 多个光接收系统的每个光接收区域与其它光接收区域中的至少一个部分地重叠。 多个光接收系统被布置成使得检查区域中的任何点都被多个光接收系统中的至少两个的光接收区域覆盖。 基于由多个光接收系统会聚的光，由检测系统检测检查区域中的异物。

公开(公告)号：US5363187A

公开(公告)日：1994-11-08

申请号：US76697

申请日：1993-06-15

申请人： Tsuneyuki Hagiwara ,  Fuminori Hayano

发明人： Tsuneyuki Hagiwara ,  Fuminori Hayano

IPC分类号： G01N21/94 ,  G01N21/88

CPC分类号： G01N21/94 ,  G01N2021/4711 ,  G01N21/4788

摘要： A foreign particle detecting apparatus comprises a light source for radiating coherent light onto an object to be detected on a surface of which a circuit pattern is formed, a focusing device for focusing the light emitted from the light source onto the object to be detected at a predetermined angular aperture, a device for moving the incident light focused at the predetermined angular aperture relative to the object to be detected, and a detector for receiving scattered light produced upon incidence of the focused light onto the object to be detected, and which detects foreign matter on the object to be detected on the basis of an output signal from the detector. Foreign matter is discriminated from the circuit pattern on the basis of the output signal from the detector means. The detector comprises at least two light-receiving elements, separated by a spatial angle substantially equal to or slightly larger than the angular aperture of the incident light, for individually outputting signals.

摘要翻译： 异物检测装置包括用于在形成有电路图案的表面上将相干光辐射到待检测物体上的光源，用于将从光源发射的光聚焦到待检测物体的聚焦装置， 预定的角度孔，用于使聚焦在预定角度孔的入射光相对于待检测物体移动的装置，以及用于接收在聚焦光入射到被检测物上时产生的散射光的检测器，并且检测外部 在基于来自检测器的输出信号的待检测物体上的物质。 基于来自检测器装置的输出信号，异物与电路图案区分开。 检测器包括至少两个光接收元件，其被基本上等于或稍大于入射光的角孔径的空间角度分开，用于单独地输出信号。

公开(公告)号：US5149982A

公开(公告)日：1992-09-22

申请号：US825811

申请日：1992-01-21

申请人： Tsuneyuki Hagiwara ,  Fuminori Hayano

发明人： Tsuneyuki Hagiwara ,  Fuminori Hayano

IPC分类号： G01N21/94

CPC分类号： G01N21/94

摘要： In a foreign particle inspection apparatus for detecting foreign particles present on a transparent object, a light beam is applied obliquely to one surface of the object, and the object and the light beam are moved relatively to scan an area of the surface. A photoelectric converter has a light receiving surface disposed to oppose the surface of the object and at least one end of the object. The converter receives scattered light from the foreign particles incident on the light receiving surface and outputs an electrical signal. A light intercepting member is disposed to intercept light propagated in the object from the scanning area toward the end of the object, that would otherwise be transmitted through the end of the object and travel externally of the object to the light receiving surface.

摘要翻译： 在用于检测存在于透明物体上的异物的异物检测装置中，将光束倾斜地施加到物体的一个表面，并且使物体和光束相对移动以扫描表面的区域。 光电转换器具有设置成与物体的表面和物体的至少一端相对设置的光接收表面。 转换器接收来自入射在光接收表面上的异物的散射光并输出电信号。 遮光构件被设置成将从物体的扫描区域传播的光线朝向物体的端部截取，否则其将通过物体的端部传播并且将物体向外移动到光接收表面。

公开(公告)号：US5473426A

公开(公告)日：1995-12-05

申请号：US427738

申请日：1995-04-24

申请人： Fuminori Hayano ,  Hitoshi Hamada ,  Hideyuki Tashiro

发明人： Fuminori Hayano ,  Hitoshi Hamada ,  Hideyuki Tashiro

IPC分类号： G01N21/89

CPC分类号： G01N21/8901

摘要： An apparatus includes a light source for emitting a light beam, a light beam expander for expanding the light beam in a predetermined direction, and radiating the expanded light beam onto an object to be inspected, a scanning device for moving the object to be inspected relative to the light beam to be radiated onto the object to be inspected, and a photodetector for photoelectrically converting scattered light generated from a defect (including foreign matter) on the object to be inspected, and inspects the defect on the basis of a photoelectric conversion signal obtained from the photodetector. A light-shielding plate having a plurality of edges for limiting the light beam expanded by the light beam expander at the two end portions, in the expansion direction, of the light beam is arranged, and at least one of the plurality of edges is formed to be transverse to the relative scanning direction (Y direction).

摘要翻译： 一种装置，包括用于发射光束的光源，用于沿预定方向扩展光束的光束扩展器，以及将扩展的光束照射到被检查物体上;扫描装置，用于移动被检查物体相对于 涉及要被照射到待检查物体上的光束;以及光电检测器，用于将由待检查物体上的缺陷（包括异物）产生的散射光光电转换，并且基于光电转换信号检查缺陷 从光电检测器获得。 布置有多个边缘的遮光板，用于限制由光束扩展器在光束的膨胀方向上的两个端部处扩展的光束，形成多个边缘中的至少一个边缘 横向于相对扫描方向（Y方向）。

公开(公告)号：US5719405A

公开(公告)日：1998-02-17

申请号：US595347

申请日：1996-02-01

申请人： Fuminori Hayano

发明人： Fuminori Hayano

IPC分类号： G01N21/956 ,  G01N21/88

CPC分类号： G01N21/95623

摘要： A particle inspecting apparatus capable of detecting only particles without depending on conditions such as a density, a configuration, etc. of an original pattern of an object to be inspected is provided. The apparatus includes a light irradiating device for irradiating the inspected object with a beam of light and a condensing optical system for condensing the beam from the inspected object. The apparatus also includes a light limiting device, disposed in the vicinity of a Fourier transform plane for the inspected object in the condensing optical system, for admitting a passage of the beam corresponding to only a part of a Fourier transform pattern of the beam from the inspected object, a relative position shiftable device for shifting relative positions of the Fourier transform pattern of the beam from the inspected object and the light limiting device and a detecting device for detecting the particle on the basis of the beam passing through the light limiting device.

摘要翻译： 提供一种能够仅依赖于待检查对象的原始图案的密度，配置等条件来检测粒子的粒子检查装置。 该装置包括用光束照射被检查物体的光照射装置和用于冷凝被检查物体的光束的聚光光学系统。 该装置还包括限定光束装置，该光限制装置设置在聚光光学系统中被检查物体的傅立叶变换平面附近，用于允许对应于来自光束的光束的傅立叶变换图案的一部分的光束的通过 相对位置可移动装置，用于移动来自检查对象的光束的傅立叶变换图案的相对位置和限光装置;以及用于基于通过限光装置的光束检测粒子的检测装置。

公开(公告)号：US5663569A

公开(公告)日：1997-09-02

申请号：US318551

申请日：1994-10-05

申请人： Fuminori Hayano

发明人： Fuminori Hayano

IPC分类号： G01N21/94 ,  G01N21/86

CPC分类号： G01N21/94

摘要： In a defect inspection method, inspection light is irradiated onto the surface to be inspected of an object to be inspected, a defect on the surface to be inspected is detected on the basis of a signal obtained by photoelectrically converting scattered light of the inspection light from the surface to be inspected, and the size of the detected defect is determined. When a plurality of defects are detected, the detected defects are observed at a predetermined magnification in the order from larger defects on the basis of the determination result. When a defective portion is found as a result of the observation, defect inspection of the object to be inspected is terminated.

摘要翻译： 在缺陷检查方法中，将检查光照射到待检查对象的被检查面上，根据通过光检测来自检查对象的散射光的光信号， 要检查的表面和检测到的缺陷的尺寸被确定。 当检测到多个缺陷时，基于确定结果，以大的缺陷的顺序以预定的倍率观察检测到的缺陷。 当作为观察结果发现缺陷部分时，终止对被检查对象的缺陷检查。

公开(公告)号：US4966457A

公开(公告)日：1990-10-30

申请号：US298920

申请日：1989-01-19

申请人： Fuminori Hayano ,  Kazunori Imamura ,  Sunao Murata

发明人： Fuminori Hayano ,  Kazunori Imamura ,  Sunao Murata

IPC分类号： G01N21/88 ,  G01N21/31 ,  G01N21/94 ,  G01N21/956 ,  G01N21/958 ,  G03F1/84

CPC分类号： G03F1/84 ,  G01N21/94 ,  G03F1/62 ,  G01N2021/556 ,  G01N21/314 ,  G01N2201/103

摘要： A defect inspecting apparatus for determining the presence of a defect element adhering to either of the front and back surfaces of a thin film-like object to be inspected (the object having a light-transmitting property) applies two light beams of different wavelengths to a surface of the object and varies the incident angle of the light beams. A first photoelectric detector receives light of the two light beams reflected by or transmitted by the object, and a second photoelectric detector receives light of the two light beams scattered by the defect element. A discriminator determines the surface of the object to which the defect element adheres based on detection outputs of the photoelectric detectors.

摘要翻译： 用于确定粘附在待检查的薄膜状物体（具有透光性的物体）的前表面和后表面中的任一个的缺陷元件的存在的缺陷检查装置将两个不同波长的光束施加到 物体的表面并改变光束的入射角。 第一光电检测器接收被物体反射或透射的两个光束的光，第二光电检测器接收由缺陷元件散射的两个光束的光。 鉴别器基于光电检测器的检测输出来确定缺陷元件粘附到的物体的表面。

公开(公告)号：US5072128A

公开(公告)日：1991-12-10

申请号：US554839

申请日：1990-07-20

申请人： Fuminori Hayano ,  Sunao Murata

发明人： Fuminori Hayano ,  Sunao Murata

IPC分类号： G01J3/51 ,  G01N21/896 ,  G01N21/94

CPC分类号： G01N21/94 ,  G01J3/36 ,  G01N2021/8845 ,  G01N2021/887 ,  G01N2021/8967

摘要： A defect inspecting apparatus for discriminating one of two surfaces of a flat transparent object such as a pericle. The flat object is irradiated with a beam of light which is supplied from a light source and which is multiple-color light having predetermined wavelength ranges or white light of a broad band, scattered light from the defect is received by an optical element having wavelength selectivity, and scattered lights thereby separated with respect to the particular wavelength ranges are photoelectrically detected. The intensities of photoelectric signals thereby obtained are compared with each other.

摘要翻译： 用于鉴别平面透明物体（例如微孔）的两个表面之一的缺陷检查装置。 用从光源供给的光束照射平坦物体，该光束是具有预定波长范围的多色光或宽带的白光，来自缺陷的散射光被具有波长选择性的光学元件接收 并且相对于特定波长范围分离的散射光被光电检测。 将由此获得的光电信号的强度彼此进行比较。

公开(公告)号：US08269969B2

公开(公告)日：2012-09-18

申请号：US13212930

申请日：2011-08-18

申请人： Fuminori Hayano

发明人： Fuminori Hayano

IPC分类号： G01J4/00

CPC分类号： G01B11/24 ,  G01B2210/56 ,  G01N21/9501 ,  G01N21/956 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

摘要： There is provided a surface inspection device configured to detect the surface state of the wafer, such as a defect in the uppermost layer and a variation of the CD value, using even diffracted light influenced by the baselayer. The surface inspection device is configured so that an illumination section illuminates the surface of a wafer with a first illuminating light at a high incident angle which is sensitive to a variation of the surface state of the wafer and a second illuminating light at a low incident angle which is insensitive thereto, a detection section detects diffracted light caused by the high and low incident angles, respectively, and a computing unit determines the CD value after correcting the influence of the baselayer of the wafer based on the information relating to the diffracted lights due to the high and low incident angles.

摘要翻译： 提供了一种表面检查装置，其被配置为使用受基底层影响的均匀的衍射光来检测晶片的表面状态，例如最上层的缺陷和CD值的变化。 表面检查装置被配置为使得照明部分以对入射角较小的第一照明光以高的入射角照射晶片的表面状态，第二照明光以低入射角照射 检测部分分别检测由高低入射角引起的衍射光，并且计算单元基于与衍射光有关的信息校正晶片基底层的影响来确定CD值 到高低入射角。