公开(公告)号：US5436464A

公开(公告)日：1995-07-25

申请号：US044197

申请日：1993-04-08

申请人： Fuminori Hayano ,  Hideyuki Tashiro ,  Tsuneyuki Hagiwara ,  Hajime Moriya

发明人： Fuminori Hayano ,  Hideyuki Tashiro ,  Tsuneyuki Hagiwara ,  Hajime Moriya

IPC分类号： G01N21/94 ,  G01N21/88

CPC分类号： G01N21/94

摘要： In a foreign particle inspecting method and apparatus in which a polarized beam is applied to a surface to be inspected through a light transmitting member mounted thereon, in which scattered light from a foreign particle on the surface to be inspected is received by a light receiving device through the light transmitting member, and in which the foreign particle is discriminated based on a detection signal from the light receiving device, the detection signal is corrected in conformity with the transmittance of the light transmitting member for polarized incident scanning light and the transmittance of the light transmitting member for non-polarized light scattered from the foreign particle, for various angles of incidence of the polarized light and emergence of the non-polarized light. Foreign particle data may be indicated by a mapping method.

摘要翻译： 在通过安装在其上的透光构件将偏振光束施加到被检查表面的异物检测方法和装置中，其中待检测表面上的异物的散射光被光接收装置接收 通过透光构件，并且根据来自光接收装置的检测信号鉴别异物，检测信号根据用于偏振入射扫描光的透光构件的透射率和 用于从异物散射的非偏振光的透光构件，用于偏振光的各种入射角和非偏振光的出射。 外来粒子数据可以用映射方法表示。

公开(公告)号：US5623340A

公开(公告)日：1997-04-22

申请号：US391602

申请日：1995-02-21

申请人： Kenji Yamamoto ,  Fuminori Hayano ,  Tsuneyuki Hagiwara ,  Hideyuki Tashiro

发明人： Kenji Yamamoto ,  Fuminori Hayano ,  Tsuneyuki Hagiwara ,  Hideyuki Tashiro

IPC分类号： G01N21/88 ,  G01N21/94 ,  G01N21/956 ,  G06T1/00

CPC分类号： G01N21/8806

摘要： A foreign particle inspection apparatus, for detecting a foreign particle on a reticle or the like includes an illumination system for irradiating an inspection area on a specimen with inspecting light, and plural light-receiving systems adapted to condense the scattered light from a foreign particle in the inspection area and having respective light-receiving areas on the specimen, each smaller than the inspection area. Each of the light-receiving areas of the plural light-receiving systems overlaps partially with at least one of the other light-receiving areas. The plural light-receiving systems are so arranged that any point in the inspection area is covered by the light-receiving areas of at least two of the plural light-receiving systems. A foreign particle in the inspection area is detected by a detection system, based on the lights condensed by the plural light receiving systems.

摘要翻译： 用于检测掩模版等上的异物的异物检查装置包括：用于用检查光照射检体的检查区域的照明系统，以及适于将来自异物的散射光聚集的多个受光系统 检查区域，并且在样本上具有各自小于检查区域的各个光接收区域。 多个光接收系统的每个光接收区域与其它光接收区域中的至少一个部分地重叠。 多个光接收系统被布置成使得检查区域中的任何点都被多个光接收系统中的至少两个的光接收区域覆盖。 基于由多个光接收系统会聚的光，由检测系统检测检查区域中的异物。

公开(公告)号：US5363187A

公开(公告)日：1994-11-08

申请号：US76697

申请日：1993-06-15

申请人： Tsuneyuki Hagiwara ,  Fuminori Hayano

发明人： Tsuneyuki Hagiwara ,  Fuminori Hayano

IPC分类号： G01N21/94 ,  G01N21/88

CPC分类号： G01N21/94 ,  G01N2021/4711 ,  G01N21/4788

摘要： A foreign particle detecting apparatus comprises a light source for radiating coherent light onto an object to be detected on a surface of which a circuit pattern is formed, a focusing device for focusing the light emitted from the light source onto the object to be detected at a predetermined angular aperture, a device for moving the incident light focused at the predetermined angular aperture relative to the object to be detected, and a detector for receiving scattered light produced upon incidence of the focused light onto the object to be detected, and which detects foreign matter on the object to be detected on the basis of an output signal from the detector. Foreign matter is discriminated from the circuit pattern on the basis of the output signal from the detector means. The detector comprises at least two light-receiving elements, separated by a spatial angle substantially equal to or slightly larger than the angular aperture of the incident light, for individually outputting signals.

摘要翻译： 异物检测装置包括用于在形成有电路图案的表面上将相干光辐射到待检测物体上的光源，用于将从光源发射的光聚焦到待检测物体的聚焦装置， 预定的角度孔，用于使聚焦在预定角度孔的入射光相对于待检测物体移动的装置，以及用于接收在聚焦光入射到被检测物上时产生的散射光的检测器，并且检测外部 在基于来自检测器的输出信号的待检测物体上的物质。 基于来自检测器装置的输出信号，异物与电路图案区分开。 检测器包括至少两个光接收元件，其被基本上等于或稍大于入射光的角孔径的空间角度分开，用于单独地输出信号。

公开(公告)号：US5149982A

公开(公告)日：1992-09-22

申请号：US825811

申请日：1992-01-21

申请人： Tsuneyuki Hagiwara ,  Fuminori Hayano

发明人： Tsuneyuki Hagiwara ,  Fuminori Hayano

IPC分类号： G01N21/94

CPC分类号： G01N21/94

摘要： In a foreign particle inspection apparatus for detecting foreign particles present on a transparent object, a light beam is applied obliquely to one surface of the object, and the object and the light beam are moved relatively to scan an area of the surface. A photoelectric converter has a light receiving surface disposed to oppose the surface of the object and at least one end of the object. The converter receives scattered light from the foreign particles incident on the light receiving surface and outputs an electrical signal. A light intercepting member is disposed to intercept light propagated in the object from the scanning area toward the end of the object, that would otherwise be transmitted through the end of the object and travel externally of the object to the light receiving surface.

摘要翻译： 在用于检测存在于透明物体上的异物的异物检测装置中，将光束倾斜地施加到物体的一个表面，并且使物体和光束相对移动以扫描表面的区域。 光电转换器具有设置成与物体的表面和物体的至少一端相对设置的光接收表面。 转换器接收来自入射在光接收表面上的异物的散射光并输出电信号。 遮光构件被设置成将从物体的扫描区域传播的光线朝向物体的端部截取，否则其将通过物体的端部传播并且将物体向外移动到光接收表面。

公开(公告)号：US06381004B1

公开(公告)日：2002-04-30

申请号：US09672850

申请日：2000-09-29

申请人： Tsuneyuki Hagiwara ,  Hideyuki Tashiro

发明人： Tsuneyuki Hagiwara ,  Hideyuki Tashiro

IPC分类号： G03B2742

CPC分类号： G03F7/70358 ,  G03B27/42

摘要： In the case the first selection criteria is set, a plurality of detection points are selected to control the pitching and rolling of the wafer, whereas in the case the second selection criteria is set, priority is put to control the rolling on the wafer. The exposure apparatus has a selection unit to choose between these criteria, and on scanning exposure the controller adjusts the wafer position in the optical axis direction, pitching, rolling or the wafer position in the optical axis direction and rolling according to the selection criteria. Accordingly, by precisely adjusting the wafer surface position in the optical axis direction and rolling that greatly affects defocus, the critical dimension variation by a macroscopic observation, which is caused by defocus, can be prevented. Moreover, by performing an alternate scanning on the entire shot area including shot areas to be exposed on the circumferential portion, throughput can be maintained extremely high.

摘要翻译： 在设定了第一选择标准的情况下，选择多个检测点来控制晶片的俯仰和滚动，而在设定了第二选择标准的情况下，优先考虑控制晶片上的滚动。 曝光装置具有选择单元，在这些标准之间进行选择，并且在扫描曝光时，控制器根据选择标准调整在光轴方向上的晶片位置，俯仰，滚动或光轴方向上的晶片位置。 因此，通过精确地调整光轴方向的晶片表面位置和大大影响散焦的滚动，可以防止由散焦引起的通过宏观观察的临界尺寸变化。 此外，通过在包括要在周向部分上露出的拍摄区域的整个拍摄区域上执行交替扫描，可以非常高地保持通过量。

公开(公告)号：US5907396A

公开(公告)日：1999-05-25

申请号：US934454

申请日：1997-09-19

申请人： Koichiro Komatsu ,  Hideyuki Tashiro ,  Tsuneyuki Hagiwara

发明人： Koichiro Komatsu ,  Hideyuki Tashiro ,  Tsuneyuki Hagiwara

IPC分类号： G01N21/88 ,  G01N21/94 ,  G01N21/956 ,  H01L21/66 ,  G01N21/00

CPC分类号： G01N21/94

摘要： An optical detection system capable of detecting even small particles or defects on a specimen such as a mask with high sensitivity and being unaffected by diffracted light from the edges of the pattern even when inspecting a thick specimen. The optical detection system includes a light emission means for illuminating a pattern surface on the specimen with light, a first light reception optical system placed on the pattern surface side of the specimen for receiving scattered light emanating from the pattern surface, a second light reception optical system placed on the glass side of the specimen in symmetry with the first light reception optical system relative to the pattern surface for receiving scattered light emanating from the pattern surface through the specimen and a corrective optical element for correcting for differences in the aberration states of the first and second light reception optical systems.

摘要翻译： 光学检测系统即使在检查厚样品时，也能够高灵敏度地检测诸如掩模的样品上的甚至小的颗粒或缺陷，并且不受来自图案的边缘的衍射光的影响。 光学检测系统包括用光照射样本上的图案表面的发光装置，放置在样本的图案表面侧的第一光接收光学系统，用于接收从图案表面发出的散射光，第二光接收光 系统相对于图案表面放置在与第一光接收光学系统对称的样本的玻璃面上，用于接收从图案表面通过样本发出的散射光;以及校正光学元件，用于校正色差状态的差异 第一和第二光接收光学系统。

公开(公告)号：US07791718B2

公开(公告)日：2010-09-07

申请号：US11576379

申请日：2005-09-30

申请人： Tsuneyuki Hagiwara

发明人： Tsuneyuki Hagiwara

IPC分类号： G01B9/00

CPC分类号： G03F7/7085 ,  G03F7/70591 ,  G03F7/70666 ,  G03F7/70683 ,  G03F7/70941

摘要： Light is irradiated on a light-shielding pattern on an object surface side of a projection optical system, and light intensity distribution of the light having passed through the projection optical system and slits is detected while slits of an aerial image measuring unit on the image plane side of the projection optical system are moved within a plane perpendicular to the optical axis of the projection optical system, The information concerning the flare of the projection optical system is computed from the light intensity distribution, so that the influence of resist coated on a wafer used in a conventional exposing method can be eliminated, and highly accurate measurement of information concerning the flare can be realized. Further, measurement of information concerning the flare can be performed in a short time comparing to the exposing method because development process or the like of the wafer is not necessary.

摘要翻译： 光照射在投影光学系统的物体表面上的遮光图案上，并且在图像平面上检测通过投影光学系统和狭缝的光的光强度分布，同时空间图像测量单元的狭缝 投影光学系统的一侧在与投影光学系统的光轴垂直的平面内移动。根据光强度分布计算与投影光学系统的闪光有关的信息，使得涂覆在晶片上的抗蚀剂的影响 可以消除以常规曝光方法使用的方法，并且可以实现关于闪光的信息的高精度测量。 此外，由于不需要晶片的显影处理等，因此可以在与曝光方法相比较的短时间内进行关于闪光的信息的测量。

公开(公告)号：US07344808B2

公开(公告)日：2008-03-18

申请号：US10896946

申请日：2004-07-23

申请人： Tsuneo Numanami ,  Masayuki Nakatsu ,  Masayuki Mogi ,  Tsuneyuki Hagiwara ,  Naoto Kondo

发明人： Tsuneo Numanami ,  Masayuki Nakatsu ,  Masayuki Mogi ,  Tsuneyuki Hagiwara ,  Naoto Kondo

IPC分类号： G03F1/00

CPC分类号： G03F1/60

摘要： A photomask blank substrate is made by polishing a starting substrate to a specific flatness in a principal surface region on a top surface of the substrate so as to form a polished intermediate product, then additionally polishing the intermediate product. Substrates made in this way exhibit a good surface flatness at the time of wafer exposure. When a photomask fabricated from a blank obtained from such a substrate is held on the mask stage of a wafer exposure system with a vacuum chuck, the substrate surface undergoes minimal warping, enabling exposure patterns of small geometry to be written onto wafers to good position and linewidth accuracies.

摘要翻译： 通过将起始基板研磨到基板顶面的主表面区域中的特定平坦度，制成光掩模坯料，以形成抛光的中间产品，然后另外抛光中间产品。 以这种方式制成的基板在晶片曝光时表现出良好的表面平坦度。 当从由这种基板获得的坯料制成的光掩模被保持在具有真空卡盘的晶片曝光系统的掩模台上时，基板表面经历最小的翘曲，使得几何形状的曝光图案能够被写入晶片到良好的位置， 线宽精度。

公开(公告)号：US20080042068A1

公开(公告)日：2008-02-21

申请号：US11896447

申请日：2007-08-31

申请人： Hisashi Nishinaga ,  Ikuo Hikima ,  Mitsunori Toyoda ,  Masahiro Nakagawa ,  Tsuneyuki Hagiwara ,  Yasushi Mizuno ,  Naonori Kita ,  Osamu Tanitsu ,  Nozomu Emura

发明人： Hisashi Nishinaga ,  Ikuo Hikima ,  Mitsunori Toyoda ,  Masahiro Nakagawa ,  Tsuneyuki Hagiwara ,  Yasushi Mizuno ,  Naonori Kita ,  Osamu Tanitsu ,  Nozomu Emura

IPC分类号： G01T1/24

CPC分类号： G03F7/7015 ,  G03F7/70058 ,  G03F7/70341 ,  G03F7/706 ,  G03F7/7085

摘要： A sensor is used at a substrate level in a lithographic projection apparatus having a projection system with a numeric aperture that is greater than 1 and is configured to project a patterned radiation beam onto a target portion of a substrate The sensor includes a radiation-detector; a transmissive plate having a front surface and a back surface, the transmissive plate being positioned such that radiation projected by the projection system passes into the front surface of the transmissive plate and out of the back surface thereof to the radiation detector; and a luminescent layer provided on the back surface of the transmissive plate, the luminescent layer absorbing the radiation and emitting luminescent radiation of a different wavelength, wherein the back surface is rough.

摘要翻译： 在具有数值孔径大于1的投影系统的光刻投影设备中使用传感器，并且被配置为将图案化的辐射束投影到基板的目标部分上。传感器包括辐射检测器; 具有前表面和后表面的透射板，所述透射板被定位成使得由所述投影系统投影的辐射进入所述透射板的前表面并且从其背表面延伸到所述辐射探测器; 以及设置在所述透射板的背面上的发光层，所述发光层吸收所述辐射并发射不同波长的发光辐射，其中所述背面粗糙。

公开(公告)号：US07329475B2

公开(公告)日：2008-02-12

申请号：US10896968

申请日：2004-07-23

申请人： Masayuki Nakatsu ,  Tsuneo Numanami ,  Masayuki Mogi ,  Masamitsu Itoh ,  Tsuneyuki Hagiwara ,  Naoto Kondo

发明人： Masayuki Nakatsu ,  Tsuneo Numanami ,  Masayuki Mogi ,  Masamitsu Itoh ,  Tsuneyuki Hagiwara ,  Naoto Kondo

IPC分类号： G03F1/00

CPC分类号： G03F1/60

摘要： Provided that a pair of strip-like regions extend from 2 mm to 10 mm inside each of a pair of opposing sides along an outer periphery of a top surface of a substrate on which a mask pattern is to be formed, with a 2 mm edge portion excluded at each end in a lengthwise direction thereof, the height from a least squares plane for the strip-like regions on the substrate top surface to the strip-like regions is measured at intervals of 0.05-0.35 mm in horizontal and vertical directions, and a substrate in which the difference between the maximum and minimum values for the height among all the measurement points is νoτ μoρε τηαν 0.5 μm is selected.

摘要翻译： 假设一对条状区域沿着要形成掩模图案的基板的顶表面的外周的一对相对侧的每一个内部从2mm延伸到10mm，具有2mm的边缘 在其长度方向上的每一端排除的部分，在水平和垂直方向上以0.05-0.35mm的间隔测量从衬底顶表面上的带状区域到条状区域的最小二乘平面的高度， 并且选择其中所有测量点中的高度的最大值和最小值之间的差值为0.5微米的磷酸三钙的基底。