Extreme UV light generation device and target recovery apparatus

    公开(公告)号:US10028366B2

    公开(公告)日:2018-07-17

    申请号:US15645295

    申请日:2017-07-10

    申请人: Gigaphoton Inc.

    IPC分类号: H05G2/00 G03F7/20

    摘要: An EUV light generation device generates EUV light stably. The EUV light generation device may include a chamber in which extreme ultraviolet light is generated when a target is irradiated with laser light in a predetermined region inside the chamber, a target supply device configured to output the target to the predetermined region in the chamber to thereby supply the target to the predetermined region, and a target recovery apparatus configured to recover the target output from the target supply device and not irradiated with the laser light. The target recovery apparatus may include a receiver disposed to be inclined with respect to a trajectory of the target output from the target supply device, the receiver being configured to receive the target by allowing the target not irradiated with the laser light to collide with the receiver, and an excitation device configured to vibrate the receiver.

    Target supply device, extreme ultraviolet light generating apparatus, and electronic device manufacturing method

    公开(公告)号:US11360391B2

    公开(公告)日:2022-06-14

    申请号:US16925567

    申请日:2020-07-10

    申请人: Gigaphoton Inc.

    IPC分类号: G03F7/20 H05G2/00

    摘要: A target supply device includes a tank body portion holding a target substance; a communication portion connected to the tank body portion and including a filter that filters the melted target substance and a nozzle that discharges the target substance having passed through the filter; a main heater that heats the tank body portion; a sub-heater that heats the communication portion; and a control unit, the control unit being configured to set the main heater to a temperature higher than a melting point of the target substance before the target substance is melted, to set the sub-heater to a temperature lower than the melting point of the target substance until the target substance in the tank body portion is melted, and to set the sub-heater to a temperature higher than the melting point of the target substance after the target substance in the tank body portion is melted.

    Laser apparatus and EUV light generation system

    公开(公告)号:US11043784B2

    公开(公告)日:2021-06-22

    申请号:US16595782

    申请日:2019-10-08

    申请人: Gigaphoton Inc.

    IPC分类号: H01S3/04 H01S3/23 H05G2/00

    摘要: A laser apparatus includes: a plurality of envelope blocks each provided with an optical element and a first temperature sensor and covering part of a laser beam path, the optical element being disposed on the laser beam path, the first temperature sensor being configured to measure a first temperature of gas at a position away from the optical element; an envelope body including the envelope blocks and covering the laser beam path; and a control unit connected with each first temperature sensor and configured to specify an envelope block at which increase of the first temperature is measured in the envelope body as an envelope block at which anomaly is occurring.

    Target producing apparatus
    6.
    发明授权

    公开(公告)号:US09883574B2

    公开(公告)日:2018-01-30

    申请号:US15161628

    申请日:2016-05-23

    申请人: GIGAPHOTON INC.

    IPC分类号: H05G2/00 G03F7/20

    摘要: An aspect of the present disclosure may include a gas lock cover secured to a nozzle holder and provided downstream of a nozzle. The gas lock cover may cover a periphery of an exit of the nozzle and be structured to guide gas supplied from a gas supply unit. The gas lock cover may include a hollow cylindrical part provided downstream of the nozzle and having an exit opening for outputting droplets that are outputted from the nozzle and pass through an internal cavity of the cylindrical part. The gas lock cover may include a channel for transmitting the gas supplied from the gas supply unit, the channel being structured to orient a flow of the transmitted gas so as to flow to the exit opening of the cylindrical part through the internal cavity of the cylindrical part.

    Extreme ultraviolet light generation apparatus

    公开(公告)号:US09854658B2

    公开(公告)日:2017-12-26

    申请号:US15152124

    申请日:2016-05-11

    申请人: Gigaphoton Inc.

    IPC分类号: H05G2/00

    摘要: An extreme ultraviolet light generation apparatus may include: a chamber in which extreme ultraviolet light is generated when a target is irradiated with a laser beam inside the chamber; a target supply part configured to supply the target into the chamber; and a target collector configured to collect the target which is supplied by the target supply part but is not irradiated with the laser beam in a collection container, by receiving the target on a receiving surface having a contact angle of equal to or smaller than 90 degrees with the target.

    Extreme ultraviolet light generation by polarized laser beam
    8.
    发明授权
    Extreme ultraviolet light generation by polarized laser beam 有权
    通过极化激光束产生极紫外光

    公开(公告)号:US09055657B2

    公开(公告)日:2015-06-09

    申请号:US13904117

    申请日:2013-05-29

    申请人: Gigaphoton Inc.

    IPC分类号: H05G2/00 G21K5/04

    摘要: An extreme ultraviolet light generation apparatus may include a droplet production device configured to produce a droplet of a target substance in a predetermined traveling direction, a first laser device configured to generate a first laser beam and irradiate the droplet with the first laser beam to diffuse the droplet, a second laser device configured to generate a second laser beam and irradiate the target substance diffused by irradiation of the first laser beam with the second laser beam to produce plasma of the diffused target substance and generate extreme ultraviolet light from the plasma of the target substance, and a beam shaping unit configured to elongate a beam spot of the first laser beam in the traveling direction of the droplet produced by the droplet production device.

    摘要翻译: 极紫外线发生装置可以包括:液滴制造装置,其被配置为在预定的行进方向上产生目标物质的液滴;第一激光装置,其被配置为产生第一激光束并用第一激光束照射液滴, 液滴,第二激光装置,被配置为产生第二激光束并且通过用第二激光束照射第一激光束来照射被扩散的目标物质,以产生扩散目标物质的等离子体并从目标的等离子体产生极紫外光 以及光束整形单元,其被配置为在由液滴产生装置产生的液滴的行进方向上拉长第一激光束的束斑。

    Target supply device, target supply method, and electronic device manufacturing method

    公开(公告)号:US11320740B2

    公开(公告)日:2022-05-03

    申请号:US17228000

    申请日:2021-04-12

    申请人: Gigaphoton Inc.

    IPC分类号: G03F7/20 H05G2/00 H01L21/027

    摘要: A target supply device may include a first container configured to contain a target substance, a second container configured to contain the target substance supplied from the first container, a first valve disposed between the first container and the second container, a first pipe connected to the second container and configured to supply pressurized gas to the second container, a third container configured to contain the target substance supplied from the second container, a second valve disposed between the second container and the third container, a second pipe connected to the third container and configured to supply pressurized gas to the third container, and a nozzle configured to output the target substance supplied from the third container.

    Target supply device, target supply method, and electronic device manufacturing method

    公开(公告)号:US11310899B2

    公开(公告)日:2022-04-19

    申请号:US17308182

    申请日:2021-05-05

    申请人: Gigaphoton Inc.

    IPC分类号: H05G2/00 G03F7/20

    摘要: A target supply device may include a first container configured to contain a solid target substance; a second container including a first connection port connected to the first container, a second connection port connected to a first pressurized gas supply line, and a third connection port connected to a target substance lead-out path; a moving body including a first recessed portion configured to contain the solid target substance supplied from the first container and move the first recessed portion inside the second container to cause an opening of the first recessed portion to be overlapped sequentially with the first to third connection ports; a third container connected to both a second pressurized gas supply line and the target substance lead-out path and configured to melt the solid target substance supplied from the third connection port; and a nozzle configured to output the melted target substance supplied from the third container.