TILT STAGE, EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS, AND ELECTRONIC DEVICE MANUFACTURING METHOD

    公开(公告)号:US20240248416A1

    公开(公告)日:2024-07-25

    申请号:US18537898

    申请日:2023-12-13

    CPC classification number: G03F7/70725

    Abstract: A tilt stage includes a mounting table on which a target supply device supplying a target to a predetermined region in a chamber is mounted, a rotation support portion supporting the mounting table rotatably about at least first and second axes, a first tilt support portion including a first ball and a first contact surface in contact with the first ball and supporting the mounting table, a first adjuster adjusting posture of the target supply device by moving one of the first ball and the first contact surface in a first direction, a second tilt support portion including a second ball and a second contact surface in contact with the first ball and supporting the mounting table, and a second adjuster adjusting the posture of the target supply device by moving one of the second ball and the second contact surface in a second direction.

    BEARING APPARATUS AND LASER APPARATUS COMPRISING BEARING APPARATUS

    公开(公告)号:US20240035514A1

    公开(公告)日:2024-02-01

    申请号:US18357356

    申请日:2023-07-24

    CPC classification number: F16C32/047 H01S3/036

    Abstract: An object of the invention is to provide a bearing apparatus which is superior in corrosion resistance against a fluorine gas, and superior in dimensional accuracy and durability. For achieving the object, a bearing apparatus for use in an environment where a fluorine gas exists is provided. The bearing apparatus comprises: a magnetic bearing comprising a magnetic member and an electromagnetic coil; and a touchdown bearing for protecting the magnetic bearing, wherein the touchdown bearing comprises an inner ring, an outer ring, and plural rolling members arranged between the inner ring and the outer ring, wherein the inner ring and the outer ring in the touchdown bearing are constructed by using a NiCrAl alloy.

    EXTREME ULTRAVIOLET LIGHT GENERATION DEVICE
    3.
    发明申请

    公开(公告)号:US20180077785A1

    公开(公告)日:2018-03-15

    申请号:US15807067

    申请日:2017-11-08

    CPC classification number: H05G2/005 H05G2/00 H05G2/006 H05G2/008

    Abstract: Output timing of laser light is controlled with high accuracy. An extreme ultraviolet light generation device may include a chamber in which plasma is generated to generate extreme ultraviolet light, a window provided in the chamber, an optical path pipe connected to the chamber, a light source disposed in the optical path pipe and configured to output light into the chamber via the window, a gas supply unit configured to supply gas into the optical path pipe, and an exhaust port configured to discharge the gas in the optical path pipe to an outside of the optical path pipe.

    EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS
    4.
    发明申请
    EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS 有权
    极光紫外线发光装置

    公开(公告)号:US20160192470A1

    公开(公告)日:2016-06-30

    申请号:US15062896

    申请日:2016-03-07

    CPC classification number: H05G2/008 G03F7/70908 H05G2/005

    Abstract: An extreme ultraviolet light generation apparatus may include: a chamber in which extreme ultraviolet light is generated when a target is irradiated with a laser beam inside the chamber; a target supply part configured to supply the target into the chamber; and a target collector configured to collect the target which is supplied by the target supply part but is not irradiated with the laser beam in a collection container, by receiving the target on a receiving surface having a contact angle of greater than 90 degrees with the target.

    Abstract translation: 极紫外光发生装置可以包括:当在室内的激光束照射靶时在其中产生极紫外光的室; 目标供给部构造成将所述目标物供给到所述室内; 以及目标集电器,其被配置为将目标供给部提供但不被激光束照射的目标物收集在收集容器中,通过在具有大于90度的接触角的接收表面上接收目标, 。

    LASER CHAMBER APPARATUS, GAS LASER APPARATUS, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE

    公开(公告)号:US20210336404A1

    公开(公告)日:2021-10-28

    申请号:US17372210

    申请日:2021-07-09

    Abstract: A laser chamber apparatus may include a pipe, an inner electrode extending along a longitudinal direction of the pipe and disposed in a through hole in the pipe, an outer electrode including a contact plate extending along the longitudinal direction of the pipe and being in contact with an outer circumferential surface of the pipe and a ladder section formed of bar members each having one end connected to the contact plate and juxtaposed along a longitudinal direction of the contact plate, and a leaf spring extending along the longitudinal direction of the pipe and configured to press the outer electrode against the pipe. The leaf spring may include leaf spring pieces separated by slits, and the leaf spring pieces may each include a bent section bent along the edge and are configured to press the bar members in a position shifted from the bent sections toward the edge.

    EXTREME ULTRAVIOLET LIGHT SENSOR UNIT AND EXTREME ULTRAVIOLET LIGHT GENERATION DEVICE

    公开(公告)号:US20190021159A1

    公开(公告)日:2019-01-17

    申请号:US16121340

    申请日:2018-09-04

    Abstract: An extreme ultraviolet light sensor unit according to one aspect of the present disclosure includes a mirror configured to reflect extreme ultraviolet light, a filter configured to transmit the extreme ultraviolet light reflected by the mirror, an optical sensor configured to detect the extreme ultraviolet light having passed through the filter, a purge gas supply unit disposed to supply purge gas to a space between the mirror and the filter, and a pipe part configured to allow plasma light including the extreme ultraviolet light entering from an opening to pass therethrough toward the mirror and allow the purge gas flowing to the space between the mirror and the filter to flow out of the opening.

    EXTREME UV LIGHT GENERATOR
    8.
    发明申请
    EXTREME UV LIGHT GENERATOR 审中-公开
    极光UV灯发电机

    公开(公告)号:US20170064799A1

    公开(公告)日:2017-03-02

    申请号:US15351988

    申请日:2016-11-15

    CPC classification number: H05G2/006 G03F7/70033 G21F3/00 H05G2/008

    Abstract: An extreme ultraviolet light generation apparatus may include: a chamber in which extreme ultraviolet light is generated from plasma generated by irradiating a target supplied into the chamber with a laser beam; a target generator that supplies the target into the chamber as a droplet; a droplet measurement unit that measures the droplet supplied from the target generator into the chamber; and a shielding member that shields the droplet measurement unit from electromagnetic waves emitted from the plasma, the droplet measurement unit including: a light source that emits continuous light to the droplet; a window provided in the chamber to allow the continuous light to transmit therethrough; and an optical sensor that receives the continuous light via the window. The shielding member includes a shielding body provided on the chamber side with respect to the window and configured to cover an optical path of the continuous light.

    Abstract translation: 极紫外光发生装置可以包括:通过用激光束照射供给到室中的靶产生的等离子体产生极紫外光的室; 目标发生器,其将目标作为液滴供应到所述腔室中; 液滴测量单元,其测量从所述目标发生器供应到所述室中的液滴; 以及屏蔽部件,其将所述液滴测量单元与所述等离子体发射的电磁波进行屏蔽,所述液滴测量单元包括:向所述液滴发射连续光的光源; 设置在所述室中以允许所述连续光透过其中的窗口; 以及经由窗口接收连续光的光学传感器。 屏蔽构件包括屏蔽体,该屏蔽体相对于窗口设置在室侧,并且构造成覆盖连续光的光路。

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