EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM AND ELECTRONIC DEVICE MANUFACTURING METHOD

    公开(公告)号:US20210026254A1

    公开(公告)日:2021-01-28

    申请号:US16894657

    申请日:2020-06-05

    Abstract: An extreme ultraviolet light generation system includes: a chamber; a target generation unit; a laser system configured to output a first pre-pulse laser beam, a second pre-pulse laser beam, and a main pulse laser beam so that fluence of the first pre-pulse laser beam is 1.5 J/cm2 to 16 J/cm2 inclusive at a position where a target is irradiated with the first pre-pulse laser beam; and a control unit configured to control the laser system so that a first delay time from a timing of irradiation of the target with the first pre-pulse laser beam to a timing of irradiation with the second pre-pulse laser beam and a second delay time from the timing of irradiation of the target with the second pre-pulse laser beam to a timing of irradiation with the main pulse laser beam have a following relation: the first delay time

    TARGET IMAGE-CAPTURE DEVICE, EXTREME-ULTRAVIOLET-LIGHT GENERATION DEVICE, AND EXTREME-ULTRAVIOLET-LIGHT GENERATION SYSTEM

    公开(公告)号:US20170358442A1

    公开(公告)日:2017-12-14

    申请号:US15671691

    申请日:2017-08-08

    CPC classification number: H01L21/027 G03F7/70558 H05G2/00 H05G2/006 H05G2/008

    Abstract: A target image-capture device may be configured to capture an image of a target that is made into plasma when irradiated with laser light and generates extreme-ultraviolet-light. The target image-capture device may include a droplet detector configured to detect passage of a droplet output as the target, and output a detection signal, an illumination light source, an image capturing element, a shutter device, and a controller configured to output, to the image capturing element, an exposure signal allowing the image capturing element to perform image capturing, and output, to the shutter device, a shutter open/close signal allowing a shutter to perform an open and close operation upon input of the detection signal. The controller may output the shutter open/close signal to the shutter device to make the shutter closed during when the droplet is irradiated with the laser light so that the plasma is generated.

    EXTREME ULTRAVIOLET LIGHT GENERATION METHOD, EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS, AND ELECTRONIC DEVICE MANUFACTURING METHOD

    公开(公告)号:US20230126340A1

    公开(公告)日:2023-04-27

    申请号:US17823049

    申请日:2022-08-29

    Abstract: An extreme ultraviolet light generation method includes a target supply step of outputting a droplet target into a chamber, a prepulse laser light irradiation step of irradiating the droplet target with prepulse laser light to generate a diffusion target, and a main pulse laser light irradiation step of irradiating the diffusion target with main pulse laser light to generate extreme ultraviolet light. Here, the main pulse laser light includes first main pulse laser light and second main pulse laser light, and in the main pulse laser light irradiation step, the diffusion target is irradiated with the first main pulse laser light having higher energy density at a central portion than at an outer peripheral portion and the second main pulse laser light having higher energy density at the outer peripheral portion than at the central portion.

    EXTREME ULTRAVIOLET LIGHT GENERATING APPARATUS

    公开(公告)号:US20180284618A1

    公开(公告)日:2018-10-04

    申请号:US16001091

    申请日:2018-06-06

    Inventor: Hirokazu HOSODA

    CPC classification number: G03F7/7055 G03F7/70033 H05G2/00

    Abstract: An extreme ultraviolet light generating apparatus may include: a chamber, within which extreme ultraviolet light is generated from a droplet which is supplied to a predetermined region therein; an image forming optical system that forms an image of the droplet supplied to the predetermined region; an imaging element that captures an image of the formed image; a stage that moves the image forming optical system and/or the imaging element in an optical axis direction of the image forming optical system; a light energy measuring unit that measures light energy which is generated when the extreme ultraviolet light is generated; and a control unit that controls the stage based on a measured value of the light energy measured by the light energy measuring unit such that an image formation plane of the image of the droplet formed by the image forming optical system matches an imaging surface of the imaging element.

    EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM AND ELECTRONIC DEVICE MANUFACTURING METHOD

    公开(公告)号:US20220035249A1

    公开(公告)日:2022-02-03

    申请号:US17337560

    申请日:2021-06-03

    Abstract: An extreme ultraviolet light generation system may include a laser system emitting first prepulse laser light, second prepulse laser light, and main pulse laser light in this order; a chamber including at least one window for introducing, into the chamber, the first prepulse laser light, the second prepulse laser light, and the main pulse laser light; a target supply unit supplying a target to a predetermined region in the chamber; and a processor controlling the laser system to irradiate the target with the first prepulse laser light, irradiate the target, having been irradiated with the first prepulse laser light, with the second prepulse laser light having a pulse time width longer than a pulse time width of the main pulse laser light, and irradiate the target, having been irradiated with the second prepulse laser light, with the main pulse laser light temporally separated from the second prepulse laser light.

    TARGET IMAGE CAPTURING DEVICE AND EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS

    公开(公告)号:US20210048752A1

    公开(公告)日:2021-02-18

    申请号:US17089143

    申请日:2020-11-04

    Inventor: Hirokazu HOSODA

    Abstract: A target image capturing device according to an aspect of the present disclosure includes a delay circuit configured to receive a timing signal from outside and output a first trigger signal at a timing delayed by a first delay time from the reception of the timing signal; an illumination light source configured to emit light based on the first trigger signal; an image capturing unit including a light amplification unit and disposed to capture an image of a shadow of a target to be observed, which is generated when the target is irradiated with the light emitted from the illumination light source; a processing unit configured to perform image processing including processing of measuring a background luminance from the image captured by the image capturing unit; and a control unit configured to perform control to adjust a gain of the light amplification unit based on the background luminance.

    EXTREME UV LIGHT GENERATOR
    7.
    发明申请
    EXTREME UV LIGHT GENERATOR 审中-公开
    极光UV灯发电机

    公开(公告)号:US20170064799A1

    公开(公告)日:2017-03-02

    申请号:US15351988

    申请日:2016-11-15

    CPC classification number: H05G2/006 G03F7/70033 G21F3/00 H05G2/008

    Abstract: An extreme ultraviolet light generation apparatus may include: a chamber in which extreme ultraviolet light is generated from plasma generated by irradiating a target supplied into the chamber with a laser beam; a target generator that supplies the target into the chamber as a droplet; a droplet measurement unit that measures the droplet supplied from the target generator into the chamber; and a shielding member that shields the droplet measurement unit from electromagnetic waves emitted from the plasma, the droplet measurement unit including: a light source that emits continuous light to the droplet; a window provided in the chamber to allow the continuous light to transmit therethrough; and an optical sensor that receives the continuous light via the window. The shielding member includes a shielding body provided on the chamber side with respect to the window and configured to cover an optical path of the continuous light.

    Abstract translation: 极紫外光发生装置可以包括:通过用激光束照射供给到室中的靶产生的等离子体产生极紫外光的室; 目标发生器,其将目标作为液滴供应到所述腔室中; 液滴测量单元,其测量从所述目标发生器供应到所述室中的液滴; 以及屏蔽部件,其将所述液滴测量单元与所述等离子体发射的电磁波进行屏蔽,所述液滴测量单元包括:向所述液滴发射连续光的光源; 设置在所述室中以允许所述连续光透过其中的窗口; 以及经由窗口接收连续光的光学传感器。 屏蔽构件包括屏蔽体,该屏蔽体相对于窗口设置在室侧,并且构造成覆盖连续光的光路。

    EXTREME ULTRAVIOLET LIGHT GENERATION DEVICE
    8.
    发明申请

    公开(公告)号:US20200033739A1

    公开(公告)日:2020-01-30

    申请号:US16593274

    申请日:2019-10-04

    Abstract: An extreme ultraviolet light generation device according to an aspect of the present disclosure includes: a chamber in which tin is irradiated with a laser beam to generate extreme ultraviolet light; a hydrogen gas supply path that connects the chamber and a hydrogen-gas output unit of a hydrogen gas supply device as a supply source of hydrogen gas to be supplied into the chamber, receives supply of the hydrogen gas from the hydrogen gas supply device, and supplies, to the chamber, the hydrogen gas supplied from the hydrogen gas supply device; a temperature adjustment unit connected with the hydrogen gas supply path and configured to adjust the temperature of the hydrogen gas to be equal to or lower than 16° C.; and a gas discharge unit connected with the chamber and configured to discharge gas including at least hydrogen gas inside the chamber to outside of the chamber.

    EXTREME ULTRAVIOLET LIGHT GENERATING APPARATUS

    公开(公告)号:US20180253010A1

    公开(公告)日:2018-09-06

    申请号:US15971073

    申请日:2018-05-04

    CPC classification number: G03F7/70033 G03F7/20 H01J37/32339 H05G2/008

    Abstract: An extreme ultraviolet light generating apparatus, may include: a chamber, in which extreme ultraviolet light is generated by plasma being generated in the interior thereof; a window provided in a wall of the chamber; a light source provided at the exterior of the chamber, configured to output illuminating light to the interior of the chamber via the window; a light sensor, configured to detect the illuminating light which is output to the interior of the chamber via the window; a shielding member having an opening that the illuminating light may pass through, that shields the window from emissions from the plasma, provided in the interior of the chamber; and a mirror provided along an optical path of the illuminating light in the interior of the chamber between the window and the shielding member, having a reflective surface that reflects the illuminating light, constituted by a surface of a metal layer.

    DROPLET DETECTOR AND EXTREME ULTRAVIOLET LIGHT GENERATING APPARATUS

    公开(公告)号:US20180007771A1

    公开(公告)日:2018-01-04

    申请号:US15697915

    申请日:2017-09-07

    CPC classification number: H05G2/008 G21K2201/06 H01S3/10 H05G2/005 H05G2/006

    Abstract: The stability of operations of an EUV light generating apparatus is improved. A droplet detector may include: a light source unit configured to emit illuminating light onto a droplet, which is output into a chamber and generate extreme ultraviolet light when irradiated with a laser beam; a light receiving unit configured to receive the illuminating light and to detect changes in light intensities; and a timing determining circuit configured to output a droplet detection signal that indicates that the droplet has been detected at a predetermined position within the chamber, based on a first timing at which the light intensity of the illuminating light decreases due to the droplet being irradiated therewith and a second timing at which the light intensity of the illuminating light increases.

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