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公开(公告)号：US20210135164A1
公开(公告)日：2021-05-06
申请号：US16685968
申请日：2019-11-15
申请人： Gang Yu , Chung-Chia Chen , Wan-Yu Lin , Hyunsung Bang , Lisong Xu , Byung Sung Kwak , Robert Jan Visser
发明人： Gang Yu , Chung-Chia Chen , Wan-Yu Lin , Hyunsung Bang , Lisong Xu , Byung Sung Kwak , Robert Jan Visser
摘要： An organic light-emitting diode (OLED) structure includes a stack of OLED layers that includes a light emission zone having a planar portion, and a light extraction layer formed of a UV-cured ink disposed over the light emission zone of the stack of OLED layers. The light extraction layer has a gradient in index of refraction along an axis normal to the planar portion.
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公开(公告)号：US20120152727A1
公开(公告)日：2012-06-21
申请号：US13301718
申请日：2011-11-21
申请人： Byung Sung Kwak , Stefan Bangert , Michael Koenig , Florian Ries , Ralf Hofmann
发明人： Byung Sung Kwak , Stefan Bangert , Michael Koenig , Florian Ries , Ralf Hofmann
IPC分类号： C23C14/34
CPC分类号： C23C14/564 , C23C14/3407 , H01J37/34 , H01J37/3426
摘要： A deposition system for alkali and alkaline earth metals may include a metal sputter target including cooling channels, a substrate holder configured to hold a substrate facing and parallel to the metal sputter target, and multiple power sources configured to apply energy to a plasma ignited between the substrate and the metal sputter target. The target may have a cover configured to fit over the target material, the cover may include a handle for automated removal and replacement of the cover within the deposition system, and a valve for providing access to the volume between the target material and the cover for pumping, purging or pressurizing the gas within the volume. Sputter gas may include noble gas with an atomic weight less than that of the metal target.
摘要翻译： 用于碱金属和碱土金属的沉积系统可以包括包括冷却通道的金属溅射靶，被配置为保持面向并平行于金属溅射靶的衬底的衬底保持器，以及被配置为将能量施加到在 基板和金属溅射靶。 目标物可以具有被配置成装配在目标材料上的盖，盖可以包括用于在沉积系统内自动移除和更换盖的手柄，以及用于提供对目标材料和盖之间的体积的通路的阀，用于 泵送，清洗或加压体积内的气体。 溅射气体可以包括原子量小于金属靶的原子量的惰性气体。
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公开(公告)号：US08693078B2
公开(公告)日：2014-04-08
申请号：US13461750
申请日：2012-05-01
申请人： Byung Sung Kwak , Nety Krishna
发明人： Byung Sung Kwak , Nety Krishna
CPC分类号： G02F1/1533 , G02F1/1523 , G02F1/155 , G02F2001/1536
摘要： This invention contemplates integrating laser scribing/patterning the component layers of electrochromic devices by directly removing (ablating) the material of the component layers. To minimize redeposition of laser ablated material and particulate formation on device surfaces a number of approaches may be used: (1) ablated material generated by the focused laser patterning may be removed by vacuum suction and/or application of an inert gas jet in the vicinity of the laser ablation of device material; (2) spatial separation of the edges of layers and patterning of lower layers prior to deposition of upper layers; and (3) the laser patterning step may be performed by a laser beam focused directly on the deposited layers from above, by a laser beam directed through the transparent substrate, or by a combination of both.
摘要翻译： 本发明考虑通过直接去除（消融）组分层的材料来集成激光划线/图案化电致变色器件的组件层。 为了最小化激光烧蚀材料的再沉积和器件表面上的颗粒形成，可以使用许多方法：（1）通过聚焦激光图案形成产生的消融材料可以通过在附近的真空抽吸和/或施加惰性气体射流来去除 的器件材料的激光烧蚀; （2）在沉积上层之前层的边缘的空间分离和下层的图案化; 和（3）激光图案化步骤可以通过从上方直接聚焦在沉积层上的激光束，通过引导通过透明衬底的激光束，或通过两者的组合进行。
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公开(公告)号：US20120218620A1
公开(公告)日：2012-08-30
申请号：US13461750
申请日：2012-05-01
申请人： Byung Sung Kwak , Nety Krishna
发明人： Byung Sung Kwak , Nety Krishna
IPC分类号： G02F1/15
CPC分类号： G02F1/1533 , G02F1/1523 , G02F1/155 , G02F2001/1536
摘要： This invention contemplates integrating laser scribing/patterning the component layers of electrochromic devices by directly removing (ablating) the material of the component layers. To minimize redeposition of laser ablated material and particulate formation on device surfaces a number of approaches may be used: (1) ablated material generated by the focused laser patterning may be removed by vacuum suction and/or application of an inert gas jet in the vicinity of the laser ablation of device material; (2) spatial separation of the edges of layers and patterning of lower layers prior to deposition of upper layers; and (3) the laser patterning step may be performed by a laser beam focused directly on the deposited layers from above, by a laser beam directed through the transparent substrate, or by a combination of both.
摘要翻译： 本发明考虑通过直接去除（消融）组分层的材料来集成激光划线/图案化电致变色器件的组件层。 为了最小化激光烧蚀材料的再沉积和器件表面上的颗粒形成，可以使用许多方法：（1）通过聚焦激光图案形成产生的消融材料可以通过在附近的真空抽吸和/或施加惰性气体射流来去除 的器件材料的激光烧蚀; （2）在沉积上层之前层的边缘的空间分离和下层的图案化; 和（3）激光图案化步骤可以通过从上方直接聚焦在沉积层上的激光束，通过引导通过透明衬底的激光束，或通过两者的组合进行。
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公开(公告)号：US20090148764A1
公开(公告)日：2009-06-11
申请号：US12257049
申请日：2008-10-23
CPC分类号： H01M10/0585 , H01M6/40 , H01M10/0436 , H01M10/052 , H01M2300/0068
摘要： Concepts and methods are provided to reduce the cost and complexity of thin film battery (TFB) high volume manufacturing by eliminating and/or minimizing the use of conventional physical (shadow) masks. Laser scribing and other alternative physical maskless patterning techniques meet certain or all of the patterning requirements. In one embodiment, a method of manufacturing thin film batteries comprises providing a substrate, depositing layers corresponding to a thin film battery structure on the substrate, the layers including, in order of deposition, a cathode, an electrolyte and an anode, wherein at least one of the deposited layers is unpatterned by a physical mask during deposition, depositing a protective coating, and scribing the layers and the protective coating. Further, the edges of the layers may be covered by an encapsulation layer. Furthermore, the layers may be deposited on two substrates and then laminated to form the thin film battery.
摘要翻译： 提供了概念和方法，以通过消除和/或最小化常规物理（阴影）掩模的使用来降低薄膜电池（TFB）大批量制造的成本和复杂性。 激光划线和其他可选的物理无掩模图案化技术满足某些或所有图案化要求。 在一个实施例中，制造薄膜电池的方法包括提供衬底，在衬底上沉积与薄膜电池结构相对应的层，所述层按沉积顺序包括阴极，电解质和阳极，其中至少 沉积层中的一个在沉积期间由物理掩模未图案化，沉积保护涂层，以及划刻层和保护涂层。 此外，层的边缘可以被封装层覆盖。 此外，可以将这些层沉积在两个基板上，然后层压以形成薄膜电池。
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公开(公告)号：US08168318B2
公开(公告)日：2012-05-01
申请号：US12257049
申请日：2008-10-23
CPC分类号： H01M10/0585 , H01M6/40 , H01M10/0436 , H01M10/052 , H01M2300/0068
摘要： Concepts and methods are provided to reduce the cost and complexity of thin film battery (TFB) high volume manufacturing by eliminating and/or minimizing the use of conventional physical (shadow) masks. Laser scribing and other alternative physical maskless patterning techniques meet certain or all of the patterning requirements. In one embodiment, a method of manufacturing thin film batteries comprises providing a substrate, depositing layers corresponding to a thin film battery structure on the substrate, the layers including, in order of deposition, a cathode, an electrolyte and an anode, wherein at least one of the deposited layers is unpatterned by a physical mask during deposition, depositing a protective coating, and scribing the layers and the protective coating. Further, the edges of the layers may be covered by an encapsulation layer. Furthermore, the layers may be deposited on two substrates and then laminated to form the thin film battery.
摘要翻译： 提供了概念和方法，以通过消除和/或最小化常规物理（阴影）掩模的使用来降低薄膜电池（TFB）大批量制造的成本和复杂性。 激光划线和其他可选的物理无掩模图案化技术满足某些或所有图案化要求。 在一个实施例中，制造薄膜电池的方法包括提供衬底，在衬底上沉积与薄膜电池结构相对应的层，所述层按沉积顺序包括阴极，电解质和阳极，其中至少 沉积层中的一个在沉积期间由物理掩模未图案化，沉积保护涂层，以及划刻层和保护涂层。 此外，层的边缘可以被封装层覆盖。 此外，可以将这些层沉积在两个基板上，然后层压以形成薄膜电池。
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公开(公告)号：US08168265B2
公开(公告)日：2012-05-01
申请号：US12134437
申请日：2008-06-06
申请人： Byung Sung Kwak , Nety Krishna
发明人： Byung Sung Kwak , Nety Krishna
CPC分类号： G02F1/1533 , G02F1/1523 , G02F1/155 , G02F2001/1536
摘要： This invention contemplates the use of laser patterning/scribing in electrochromic device manufacture, anywhere during the manufacturing process as deemed appropriate and necessary for electrochromic device manufacturability, yield and functionality, while integrating the laser scribing so as to ensure the active layers of the device are protected to ensure long term reliability. It is envisaged that the laser is used to pattern the component layers of electrochromic devices by directly removing (ablating) the material of the component layers. The invention includes a manufacturing method for an electrochromic device comprising one or more focused laser patterning steps. To minimize redeposition of laser ablated material and particulate formation on device surfaces a number of approaches may be used: (1) ablated material generated by the focused laser patterning may be removed by vacuum suction and/or application of an inert gas jet in the vicinity of the laser ablation of device material; (2) spatial separation of the edges of layers and patterning of lower layers prior to deposition of upper layers; and (3) the laser patterning step may be performed by a laser beam focused directly on the deposited layers from above, by a laser beam directed through the transparent substrate, or by a combination of both.
摘要翻译： 本发明考虑了在制造过程中的任何地方，在电致变色器件的可制造性，成品率和功能性中被认为是合适的和必要的，在电致变色器件制造中使用激光图案/划线，同时整合激光刻划以确保器件的有源层是 保护以确保长期可靠性。 可以设想，激光器用于通过直接去除（消融）组分层的材料来对电致变色器件的组件层进行图案化。 本发明包括一种用于电致变色器件的制造方法，其包括一个或多个聚焦激光器图案化步骤。 为了最小化激光烧蚀材料的再沉积和器件表面上的颗粒形成，可以使用许多方法：（1）通过聚焦激光图案形成产生的消融材料可以通过在附近的真空抽吸和/或施加惰性气体射流来去除 的器件材料的激光烧蚀; （2）在沉积上层之前层的边缘的空间分离和下层的图案化; 和（3）激光图案化步骤可以通过从上方直接聚焦在沉积层上的激光束，通过引导通过透明衬底的激光束，或通过两者的组合进行。
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公开(公告)号：US20090288943A1
公开(公告)日：2009-11-26
申请号：US12124918
申请日：2008-05-21
申请人： Byung Sung Kwak , Michael Stowell , Nety Krishna
发明人： Byung Sung Kwak , Michael Stowell , Nety Krishna
IPC分类号： C23C14/34
CPC分类号： C23C14/088 , C23C14/3414 , H01M4/0426 , H01M4/1391 , H01M4/525 , H01M4/5825 , H01M6/40 , H01M10/052 , H01M10/0585
摘要： A method of fabricating a layer of a thin film battery comprises providing a sputtering target and depositing the layer on a substrate using a physical vapor deposition process enhanced by a combination of plasma processes. The deposition process may include: (1) generation of a plasma between the target and the substrate; (2) sputtering the target; (3) supplying microwave energy to the plasma; and (4) applying radio frequency power to the substrate. A sputtering target for a thin film battery cathode layer has an average composition of LiMaNbZc, wherein 0.20>{b/(a+b)}>0 and the ratio of a to c is approximately equal to the stoichiometric ratio of a desired crystalline structure of the cathode layer, N is an alkaline earth element, M is selected from the group consisting of Co, Mn, Al, Ni and V, and Z is selected from the group consisting of (PO4), O, F and N.
摘要翻译： 制造薄膜电池层的方法包括提供溅射靶并使用通过等离子体处理的组合增强的物理气相沉积工艺将该层沉积在衬底上。 沉积过程可以包括：（1）在靶和衬底之间产生等离子体; （2）溅射目标; （3）向等离子体提供微波能量; 和（4）向基板施加射频功率。 用于薄膜电池阴极层的溅射靶具有LiMaNbZc的平均组成，其中0.20> {b /（a + b）}> 0，并且a与c的比值近似等于所需晶体结构的化学计量比 的阴极层，N是碱土金属元素，M选自Co，Mn，Al，Ni和V，Z选自（PO4），O，F和N.
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公开(公告)号：US20140072699A1
公开(公告)日：2014-03-13
申请号：US14078261
申请日：2013-11-12
申请人： Byung Sung Kwak , Nety M. Krishna
发明人： Byung Sung Kwak , Nety M. Krishna
IPC分类号： H01M4/139
CPC分类号： H01M4/139 , H01M4/0421 , H01M4/13 , H01M4/62 , H01M6/40 , H01M10/0404 , H01M10/0436 , H01M10/052 , H01M10/0562 , H01M10/0585
摘要： Thin-film battery methods for complexity reduction are described. Processing equipment arrangements suitable to support thin-film battery methods for complexity reduction are also described. Cluster tools to support thin-film battery methods for complexity reduction are also described.
摘要翻译： 描述了用于复杂度降低的薄膜电池方法。 还描述了适于支持用于复杂性降低的薄膜电池方法的处理设备布置。 还描述了用于支持用于复杂度降低的薄膜电池方法的集群工具。
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公开(公告)号：US08568571B2
公开(公告)日：2013-10-29
申请号：US12124918
申请日：2008-05-21
申请人： Byung Sung Kwak , Michael Stowell , Nety Krishna
发明人： Byung Sung Kwak , Michael Stowell , Nety Krishna
IPC分类号： C23C14/00
CPC分类号： C23C14/088 , C23C14/3414 , H01M4/0426 , H01M4/1391 , H01M4/525 , H01M4/5825 , H01M6/40 , H01M10/052 , H01M10/0585
摘要： A method of fabricating a layer of a thin film battery comprises providing a sputtering target and depositing the layer on a substrate using a physical vapor deposition process enhanced by a combination of plasma processes. The deposition process may include: (1) generation of a plasma between the target and the substrate; (2) sputtering the target; (3) supplying microwave energy to the plasma; and (4) applying radio frequency power to the substrate. A sputtering target for a thin film battery cathode layer has an average composition of LiMaNbZc, wherein 0.20>{b/(a+b)}>0 and the ratio of a to c is approximately equal to the stoichiometric ratio of a desired crystalline structure of the cathode layer, N is an alkaline earth element, M is selected from the group consisting of Co, Mn, Al, Ni and V, and Z is selected from the group consisting of (PO4), O, F and N.
摘要翻译： 制造薄膜电池层的方法包括提供溅射靶并使用通过等离子体处理的组合增强的物理气相沉积工艺将该层沉积在衬底上。 沉积过程可以包括：（1）在靶和衬底之间产生等离子体; （2）溅射目标; （3）向等离子体提供微波能量; 和（4）向基板施加射频功率。 用于薄膜电池阴极层的溅射靶具有LiMaNbZc的平均组成，其中0.20> {b /（a + b）}> 0，并且a与c的比值近似等于所需晶体结构的化学计量比 的阴极层，N是碱土金属元素，M选自Co，Mn，Al，Ni和V，Z选自（PO4），O，F和N.
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