MULTIMODE OPTICAL FIBER AND OPTICAL BACKPLANE USING MULTIMODE OPTICAL FIBER
    1.
    发明申请
    MULTIMODE OPTICAL FIBER AND OPTICAL BACKPLANE USING MULTIMODE OPTICAL FIBER 审中-公开
    使用多模光纤的多模光纤和光背面

    公开(公告)号:US20130039626A1

    公开(公告)日:2013-02-14

    申请号:US13311950

    申请日:2011-12-06

    Abstract: An optical backplane system is provided. The optical backplane system includes at least one transceiver, at least one optical connector, and a plurality of multimode optical fibers coupled to the at least one optical connector. Each multimode optical fiber includes a graded index glass core having a diameter in the range of 24 microns to 40 microns, a graded index having an alpha less than 2.12 and a maximum relative refractive index in the range between 0.6 percent and 1.9 percent. The optical backplane further includes a cladding surrounding and in contact with the core. The cladding includes a depressed-index annular portion. The fiber has an overfilled bandwidth greater than 2.0 GHz-km at 1310 nm.

    Abstract translation: 提供光背板系统。 光学背板系统包括至少一个收发器,至少一个光学连接器以及耦合到该至少一个光学连接器的多个多模光纤。 每个多模光纤包括直径在24微米至40微米范围内的分级折射率玻璃芯,具有小于2.12的α的渐变折射率和在0.6%和1.9%之间的范围内的最大相对折射率。 光学背板还包括围绕并与芯接触的包层。 包层包括凹陷折射率的环形部分。 光纤在1310nm处具有超过2.0GHz-km的过满的带宽。

    Low bend loss optical fiber
    3.
    发明授权
    Low bend loss optical fiber 有权
    低弯曲损耗光纤

    公开(公告)号:US08953917B2

    公开(公告)日:2015-02-10

    申请号:US13680641

    申请日:2012-11-19

    Abstract: According to some embodiments a single mode fiber includes: a germania doped central core region having outer radius r1 and relative refractive index Δ1; and a cladding region comprising (i) a first inner cladding region having an outer radius r2>6 microns and relative refractive index Δ2 and 0.3≦r1/r2≦0.85; and (ii) a second inner cladding region having an outer radius r3>9 microns and comprising a minimum relative refractive index Δ3, wherein said second inner cladding region has at least one region with a relative refractive index delta that becomes more negative with increasing radius; and (iii) an outer cladding region surrounding the second inner cladding region and comprising relative refractive index Δ4, wherein Δ1>Δ2>Δ3, Δ3

    Abstract translation: 根据一些实施例,单模光纤包括:具有外半径r1和相对折射率&Dgr; 1的掺杂锗的中心芯区域; 包括区域,其包括(i)具有外半径r2> 6微米的第一内包层区域和相对折射率< Dgr; 2和0.3& nlE; r1 / r2≦̸ 0.85; 和(ii)外半径r3> 9微米并且包括最小相对折射率< Dgr; 3的第二内包层区域,其中所述第二内包层区域具有至少一个相对折射率Δδ的区域变得更为负, 半径增加 4,一种包围第二内包层区域的外包层区,包括相对折射率&Dgr; 4,其中&Dgr; 1&Dgr; 2&Dgr; 3,&Dgr; 3&

    Solid type polarization maintaining fiber and apparatus
    5.
    发明授权
    Solid type polarization maintaining fiber and apparatus 失效
    固体型保偏纤维及其设备

    公开(公告)号:US07177512B2

    公开(公告)日:2007-02-13

    申请号:US11239788

    申请日:2005-09-29

    CPC classification number: G02B6/03627 G02B6/024 G02B6/0281 G02B6/03694

    Abstract: Disclosed is an optical fiber (20) having a centermost laterally-elongated core (30) having a short dimension (a), a long dimension (b) and a first refractive index (n1), a moat (40) surrounding the central laterally-elongated core, the moat (40) having a second refractive index (n2), an outer dimension (c) and an outer dimension (d), and a cladding (50) surrounding the moat (40), the cladding (50) having a third refractive index (n3), wherein n1>n3>n2, a ratio of b/a is between 1.5 and 5.0, and a ratio of d/a is between 2.0 and 7.0. The fiber exhibits polarization maintaining properties in a PMB situated below (i.e., at shorter wavelength than SPB), such that beat length normalized to 1550 nm wavelength is preferably less than 10 mm. The fiber (20) may be coupled to optical components in apparatus where single polarization or polarization maintaining properties are desired.

    Abstract translation: 公开了一种光纤(20),其具有具有短尺寸(a),长尺寸(b)和第一折射率(n <1> 1)的中心横向细长芯部(30), 围绕中央横向细长的芯的护城河(40),护城河(40)具有第二折射率(n 2/2),外部尺寸(c)和外部尺寸(d),以及 围绕护城河(40)的包层(50),包层(50)具有第三折射率(n 3/3),其中n 1 n 3 < / SUB >> n 2,b / a的比例在1.5和5.0之间,d / a的比率在2.0和7.0之间。 纤维在位于低于(即在比SPB更短的波长)的PMB中表现出极化保持性能,使得标准化为1550nm波长的拍子长度优选小于10mm。 光纤(20)可以耦合到需要单极化或偏振保持特性的装置中的光学部件。

    Projection lithography photomask blanks, preforms and method of making
    9.
    发明授权
    Projection lithography photomask blanks, preforms and method of making 失效
    投影光刻光掩模坯料,预成型件和制造方法

    公开(公告)号:US06783898B2

    公开(公告)日:2004-08-31

    申请号:US09876194

    申请日:2001-06-06

    Abstract: The invention includes methods of making lithography photomask blanks. The invention also includes lithography photomask blanks and preforms for producing lithography photomask. The method of making a lithography photomask blank includes providing a soot deposition surface, producing SiO2 soot particles and projecting the SiO2 soot particles toward the soot deposition surface. The method includes successively depositing layers of the SiO2 soot particle on the deposition surface to form a coherent SiO2 porous glass preform body comprised of successive layers of the SiO2 soot particles and dehydrating the coherent SiO2 glass preform body to remove OH from the preform body. The SiO2 is exposed to and reacted with a fluorine containing compound and consolidated into a nonporous silicon oxyfluoride glass body with parallel layers of striae. The method further includes forming the consolidated silicon oxyfluoride glass body into a photomask blank having a planar surface with the orientation of the striae layer parallel to the photomask blank planar surface.

    Abstract translation: 本发明包括制造光刻光掩模坯料的方法。 本发明还包括光刻光掩模坯料和用于生产光刻光掩模的预成型件。 制造光刻光掩模坯料的方法包括提供烟灰沉积表面,产生SiO 2烟灰颗粒并将SiO 2烟灰颗粒投射到烟灰沉积表面。 该方法包括在沉积表面上依次沉积SiO 2烟灰颗粒的层,以形成由SiO 2烟灰颗粒的连续层组成的粘结SiO 2多孔玻璃预制体,并使相干的SiO 2玻璃预制体脱水以从预成型体中去除OH。 将SiO 2暴露于含氟化合物并与其反应,并固化成具有平行的条纹层的无孔氟氧化硅玻璃体。 该方法还包括将固化的氟氧化硅玻璃体形成为具有平坦表面的光掩模坯料,其中条纹层的取向平行于光掩模坯料平面。

    Projection lithography photomasks and method of making
    10.
    发明授权
    Projection lithography photomasks and method of making 失效
    投影光刻光掩模和制作方法

    公开(公告)号:US06689516B2

    公开(公告)日:2004-02-10

    申请号:US09935990

    申请日:2001-08-23

    Abstract: The present invention is a method of making a lithography photomask and photomask blank. The method of making the lithography photomask and photomask blank includes providing a silicon oxyfluoride glass tube having an OH content less than 50 ppm. The method further includes cutting the silicon oxyfluoride glass tube, flattening the silicon oxyfluoride glass tube, and forming the flattened cut silicon oxyfluoride glass tube into a photomask blank having a planar surface. The present invention includes a glass lithography mask preform. The glass lithography mask preform is a longitudinal silicon oxyfluoride glass tube that has an OH content ≦10 ppm, a F wt. % concentration ≧0.5 wt. %.

    Abstract translation: 本发明是制造光刻光掩模和光掩模坯料的方法。 制造光刻光掩模和光掩模坯料的方法包括提供OH含量低于50ppm的氟氧化硅玻璃管。 该方法还包括切割氟氧化硅玻璃管,使氟氧化硅玻璃管扁平化,并将扁平切割的氟氧化硅玻璃管形成具有平坦表面的光掩模坯料。 本发明包括玻璃光刻掩模预制件。 玻璃光刻掩模预制件是具有OH含量<= 10ppm的纵向硅氧氟化物玻璃管,F wt。 %浓度> = 0.5wt。 %。

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