Abstract:
An optical backplane system is provided. The optical backplane system includes at least one transceiver, at least one optical connector, and a plurality of multimode optical fibers coupled to the at least one optical connector. Each multimode optical fiber includes a graded index glass core having a diameter in the range of 24 microns to 40 microns, a graded index having an alpha less than 2.12 and a maximum relative refractive index in the range between 0.6 percent and 1.9 percent. The optical backplane further includes a cladding surrounding and in contact with the core. The cladding includes a depressed-index annular portion. The fiber has an overfilled bandwidth greater than 2.0 GHz-km at 1310 nm.
Abstract:
An optical fiber, comprising: (i) a rare earth doped silica based elongated core with a first refractive index (n1) with an aspect ratio of 1:5 to 1; (ii) a silica based moat abutting and at least substantially surrounding the core, the moat having a refractive index n2, wherein n2 n3; and n3>n2; (iv) a silica based outer cladding surrounding said inner cladding, the outer cladding having a fourth refractive index (n4), such that n4
Abstract translation:一种光纤,包括:(i)具有长宽比为1:5至1的第一折射率(n <1> 1)的稀土掺杂二氧化硅基细长芯; (ii)邻接并且至少基本上围绕所述芯的基于二氧化硅的护城河,所述护城河具有折射率n 2 N 2,其中n 2 ; (iii)围绕所述护城河的基于二氧化硅的内包层,所述内包层具有第三折射率(n 3/3),其中n 1 <3> n 3 < SUB>; 和n 3 3 sub> n 2; (iv)围绕所述内包层的基于二氧化硅的外包层,所述外包层具有第四折射率(n≥4 sub>),使得n 4 光纤在工作波长带表现出单极化。
Abstract:
According to some embodiments a single mode fiber includes: a germania doped central core region having outer radius r1 and relative refractive index Δ1; and a cladding region comprising (i) a first inner cladding region having an outer radius r2>6 microns and relative refractive index Δ2 and 0.3≦r1/r2≦0.85; and (ii) a second inner cladding region having an outer radius r3>9 microns and comprising a minimum relative refractive index Δ3, wherein said second inner cladding region has at least one region with a relative refractive index delta that becomes more negative with increasing radius; and (iii) an outer cladding region surrounding the second inner cladding region and comprising relative refractive index Δ4, wherein Δ1>Δ2>Δ3, Δ3
Abstract:
According to some embodiments, the optical fiber comprises: (i) a core having a first index of refraction n1; (ii) a cladding surrounding the core and having a second index of refraction n2, such that n1>n2, wherein cladding has at two sets of stress rods extending longitudinally through the length of the optical fiber, wherein the two sets of stress rods have CTE coefficients and/or softening points different from one another and different from that of cladding.
Abstract:
Disclosed is an optical fiber (20) having a centermost laterally-elongated core (30) having a short dimension (a), a long dimension (b) and a first refractive index (n1), a moat (40) surrounding the central laterally-elongated core, the moat (40) having a second refractive index (n2), an outer dimension (c) and an outer dimension (d), and a cladding (50) surrounding the moat (40), the cladding (50) having a third refractive index (n3), wherein n1>n3>n2, a ratio of b/a is between 1.5 and 5.0, and a ratio of d/a is between 2.0 and 7.0. The fiber exhibits polarization maintaining properties in a PMB situated below (i.e., at shorter wavelength than SPB), such that beat length normalized to 1550 nm wavelength is preferably less than 10 mm. The fiber (20) may be coupled to optical components in apparatus where single polarization or polarization maintaining properties are desired.
Abstract translation:公开了一种光纤(20),其具有具有短尺寸(a),长尺寸(b)和第一折射率(n <1> 1)的中心横向细长芯部(30), 围绕中央横向细长的芯的护城河(40),护城河(40)具有第二折射率(n 2/2),外部尺寸(c)和外部尺寸(d),以及 围绕护城河(40)的包层(50),包层(50)具有第三折射率(n 3/3),其中n 1 3> n 3 < / SUB >> n 2,b / a的比例在1.5和5.0之间,d / a的比率在2.0和7.0之间。 纤维在位于低于(即在比SPB更短的波长)的PMB中表现出极化保持性能,使得标准化为1550nm波长的拍子长度优选小于10mm。 光纤(20)可以耦合到需要单极化或偏振保持特性的装置中的光学部件。
Abstract:
The present invention is a method of making a lithography photomask and photomask blank. The method of making the lithography photomask and photomask blank includes providing a silicon oxyfluoride glass tube having an OH content less than 50 ppm. The method further includes cutting the silicon oxyfluoride glass tube, flattening the silicon oxyfluoride glass tube, and forming the flattened cut silicon oxyfluoride glass tube into a photomask blank having a planar surface. The present invention includes a glass lithography mask preform. The glass lithography mask preform is a longitudinal silicon oxyfluoride glass tube that has an OH content ≦10 ppm, a F wt. % concentration ≧0.5 wt. %.
Abstract:
Disclosed is an optical fiber having a silica-based core and a silica-based cladding, the core comprising germania, and oxides of an alkali metal and phosphorous. By appropriately selecting the concentration of alkali metal and phosphorous oxides, fibers exhibiting low attenuation and low hydrogen aged attenuation may be obtained. In a preferred embodiment, the alkali metal oxide is potassium oxide (K2O).
Abstract:
An optical fiber, comprising: a central core having a maximum dimension (A) greater than a minimum dimension (B) and a substantially elliptical shape, the fiber having at least one air hole positioned each opposite side of the central core wherein the optical fiber exhibits (i) single polarization propagation within a single polarization band and (ii) polarization maintaining property, such that the fiber beat length normalized at 1550 nm is less than 10 mm; and the polarization maintaining band is situated within wavelengths which are (a) adjacent to and below the single polarization band; and (b) above the higher order mode cutoff wavelength.
Abstract:
The invention includes methods of making lithography photomask blanks. The invention also includes lithography photomask blanks and preforms for producing lithography photomask. The method of making a lithography photomask blank includes providing a soot deposition surface, producing SiO2 soot particles and projecting the SiO2 soot particles toward the soot deposition surface. The method includes successively depositing layers of the SiO2 soot particle on the deposition surface to form a coherent SiO2 porous glass preform body comprised of successive layers of the SiO2 soot particles and dehydrating the coherent SiO2 glass preform body to remove OH from the preform body. The SiO2 is exposed to and reacted with a fluorine containing compound and consolidated into a nonporous silicon oxyfluoride glass body with parallel layers of striae. The method further includes forming the consolidated silicon oxyfluoride glass body into a photomask blank having a planar surface with the orientation of the striae layer parallel to the photomask blank planar surface.
Abstract:
The present invention is a method of making a lithography photomask and photomask blank. The method of making the lithography photomask and photomask blank includes providing a silicon oxyfluoride glass tube having an OH content less than 50 ppm. The method further includes cutting the silicon oxyfluoride glass tube, flattening the silicon oxyfluoride glass tube, and forming the flattened cut silicon oxyfluoride glass tube into a photomask blank having a planar surface. The present invention includes a glass lithography mask preform. The glass lithography mask preform is a longitudinal silicon oxyfluoride glass tube that has an OH content ≦10 ppm, a F wt. % concentration ≧0.5 wt. %.