Abstract:
A target image-capture device may be configured to capture an image of a target that is made into plasma when irradiated with laser light and generates extreme-ultraviolet-light. The target image-capture device may include a droplet detector configured to detect passage of a droplet output as the target, and output a detection signal, an illumination light source, an image capturing element, a shutter device, and a controller configured to output, to the image capturing element, an exposure signal allowing the image capturing element to perform image capturing, and output, to the shutter device, a shutter open/close signal allowing a shutter to perform an open and close operation upon input of the detection signal. The controller may output the shutter open/close signal to the shutter device to make the shutter closed during when the droplet is irradiated with the laser light so that the plasma is generated.
Abstract:
A laser apparatus may include, a first frame and a second frame, a sleeve through-hole provided in the second frame, a sleeve insertion hole provided in the first frame, a bolt, a positioning sleeve that is formed in an approximately cylindrical shape into which the bolt can be inserted and that positions the first frame and the second frame by passing through the sleeve through-hole and being inserted into the sleeve insertion hole, a nut that is provided in the first frame and into which the bolt is screwed, and a fall prevention unit that is provided in the second frame and that prevents the bolt and the positioning sleeve from falling.
Abstract:
Provided is a laser annealing apparatus causing laser light to be radiated to processing receiving areas arranged, out of a first direction and a second direction perpendicular to the first direction, along at least the second direction and move a batch radiation area and a workpiece in the first direction, and the laser annealing apparatus includes an energy density measuring apparatus measuring the energy density at, out of first and second ends of the batch radiation area in the second direction, at least the second end, an energy density adjusting apparatus adjusting the energy density at the first end, and a controller controlling the energy density adjusting apparatus. The energy density at the first end when (N+1)-th scanning is performed is so adjusted that the energy density at the first end in an (N+1)-th scan area approaches the energy density at the second end in the N-th scan area.
Abstract:
An optical device may include: an optical module disposed in a beam delivery path of a laser beam; a beam adjusting unit disposed in the beam delivery path for adjusting the beam delivery path of the laser beam; a measuring unit disposed in the beam delivery path for detecting the beam delivery path; and a control unit for controlling the beam adjusting unit based on a detection result of the beam delivery path of the laser beam detected by the measuring unit.
Abstract:
An EUV light source device properly compensates the wave front of laser beam which is changed by heat. A wave front compensator and a sensor are provided in an amplification system which amplifies laser beam. The sensor detects and outputs changes in the angle (direction) of laser beam and the curvature of the wave front thereof. A wave front compensation controller outputs a signal to the wave front compensator based on the measurement results from the sensor. The wave front compensator corrects the wave front of the laser beam to a predetermined wave front according to an instruction from the wave front compensation controller.
Abstract:
A laser apparatus may include a master oscillator, a plurality of amplifiers, a photodetector device configured to detect a light beam traveling back along a laser beam path, and a controller. The photodetector device may include a first photodetector configured to detect energy of a light beam traveling back along the laser beam path and a second photodetector configured to detect power of the light beam traveling back along the laser beam path. The controller may be configured to determine that a return beam is generated when the intensity of the energy detection signal exceeds a first threshold. The controller may be configured to determine that a self-oscillation beam is generated when the intensity of the power detection signal exceeds a second threshold.
Abstract:
A target supply device is provided that may include a pair of rails arranged to face each other, the rails having electrically conductive properties, a target transport mechanism configured to supply a target material into a space between the rails and in contact with the rails, and a power supply connected to the rails and configured to supply a current to the target material through the rails. Methods and systems using the target supply device are also provided.
Abstract:
A filter may include: a first member having a first surface provided with a channel; and a second member set with a second surface thereof covering the channel. The first member may include a first passable portion that allows a fluid to pass between the first surface and a first space, which is defined beside a surface of the first member opposite to the first surface, through a first area of the channel. The second member may include a second passable portion that allows the fluid to pass between the second surface and a second space, which is defined beside a surface of the second member opposite to the second surface, through a second area of the channel distanced from the first area.
Abstract:
There may be provided a laser amplifier including: a chamber containing a laser medium; a first window provided on the chamber, and configured to allow a laser light beam inputted from outside of the chamber to enter the chamber; an excitation unit configured to amplify, by exciting the laser medium, the laser light beam that has entered the chamber; a second window provided on the chamber, and configured to allow the laser light beam that has been amplified by the excitation unit to exit from the chamber to the outside; a mirror provided on a laser light path between the first window and the second window; and a wavelength selection film provided on one or more of the first window, the second window, and the mirror, and configured to suppress propagation of light beams of one or more suppression target wavelengths different from a desired wavelength.
Abstract:
An extreme ultraviolet light generation system may comprise a chamber, a target supply unit configured to supply, to a predetermined region in the chamber, a target having an atomic density of 8.0×1017 atoms/cm3 or higher and 1.3×1018 atoms/cm3 or lower, and a laser apparatus configured to irradiate the predetermined region with a pulse laser beam having an energy density of 10.5 J/cm2 or higher and 52.3 J/cm2 or lower in the predetermined region.