METHOD OF BAKING CHAMBER OF GAS LASER APPARATUS AND ELECTRONIC DEVICE MANUFACTURING METHOD

    公开(公告)号:US20240399510A1

    公开(公告)日:2024-12-05

    申请号:US18799424

    申请日:2024-08-09

    Inventor: Takahiro TATSUMI

    Abstract: A method of baking a chamber of a gas laser apparatus provided with a cooling passage configured to make a cooling medium that cools the chamber flow on an outer side of a wall surface in contact with an internal space of the chamber for generating light in the internal space includes a heating step of heating the internal space via the wall surface by making a heating medium flow through the cooling passage before generating the light in the internal space, and an exhaust step of exhausting a gas in the heated internal space to an external space of the chamber.

    BEAM DELIVERY SYSTEM, FOCAL LENGTH SELECTING METHOD, AND ELECTRONIC DEVICE MANUFACTURING METHOD

    公开(公告)号:US20210149185A1

    公开(公告)日:2021-05-20

    申请号:US17036412

    申请日:2020-09-29

    Abstract: A beam delivery system according to an aspect of the present disclosure is used for an extreme ultraviolet light generation apparatus and includes a propagation mirror disposed on an optical path between a laser apparatus and a condensation optical system and configured to change the propagation direction of a pulse laser beam, and a curvature mirror disposed on an optical path between the propagation mirror and the condensation optical system and having a concave reflective surface configured to convert the pulse laser beam to be incident on the condensation optical system into a convergent beam. The curvature mirror has a focal length selected so that the beam spread angle of the pulse laser beam from the curvature mirror is constant irrespective of thermal deformation of the propagation mirror or constant with change in a predetermined allowable range irrespective of thermal deformation of the propagation mirror.

Patent Agency Ranking