LASER PROCESSING METHOD AND CIRCUIT BOARD MANUFACTURING METHOD

    公开(公告)号:US20230071592A1

    公开(公告)日:2023-03-09

    申请号:US18053737

    申请日:2022-11-08

    Abstract: A laser processing method according to a viewpoint of the present disclosure includes radiating ultraviolet pulse laser light onto a workpiece having a stacked structure in which a conductor layer, an insulating layer, and a sacrificial layer are stacked on each other in the presented order, the pulse laser light radiated from the side facing the sacrificial layer, to change a laser ablation processing mode in the sacrificial layer and form a through hole in the sacrificial layer, radiating the pulse laser light onto the insulating layer through the through hole to form an opening in the insulating layer, and removing the sacrificial layer after the formation of the opening.

    DISCHARGE-PUMPED GAS LASER DEVICE
    3.
    发明申请
    DISCHARGE-PUMPED GAS LASER DEVICE 审中-公开
    排气泵气体激光装置

    公开(公告)号:US20150055672A1

    公开(公告)日:2015-02-26

    申请号:US14531876

    申请日:2014-11-03

    Abstract: A discharge-pumped gas laser device may include a laser chamber, a pair of discharge electrodes provided in the laser chamber, a fan with a magnetic bearing being provided in the laser chamber and configured to be capable of circulating a gas in the laser chamber, a housing configured to contain the laser chamber, and a magnetic bearing controller connected to the magnetic bearing electrically, being capable of controlling the magnetic bearing, and provided in the housing separately from the laser chamber.

    Abstract translation: 放电泵浦气体激光装置可以包括激光室,设置在激光室中的一对放电电极,具有磁性轴承的风扇设置在激光室中并且能够使激光室中的气体循环, 被配置为容纳激光室的壳体,以及与磁性轴承电连接的磁性轴承控制器,其能够控制磁性轴承,并且与激光室分开设置在壳体中。

    PRELIMINARY IONIZATION DISCHARGE DEVICE AND LASER APPARATUS
    4.
    发明申请
    PRELIMINARY IONIZATION DISCHARGE DEVICE AND LASER APPARATUS 有权
    初始离子放电装置和激光装置

    公开(公告)号:US20160172817A1

    公开(公告)日:2016-06-16

    申请号:US14956709

    申请日:2015-12-02

    CPC classification number: H01S3/09713 H01S3/0384 H01S3/08009 H01S3/0977

    Abstract: A preliminary ionization discharge device used in a laser chamber of a laser apparatus using preliminary ionization includes a dielectric pipe; a preliminary ionization inner electrode provided inside the dielectric pipe; and a preliminary ionization outer electrode provided outside the dielectric pipe. The preliminary ionization outer electrode includes: a contact plate part configured to contact the dielectric pipe; and an elastic part configured to exert a force in a direction in which the contact plate part pushes the dielectric pipe.

    Abstract translation: 在使用了初步电离的激光装置的激光室中使用的初步电离放电装置包括:电介质管; 设置在电介质管内的初级电离内电极; 以及设置在电介质管外侧的初电离电极。 所述预电离外电极包括:接触板部,被配置为接触所述电介质管; 以及弹性部,其构造成在所述接触板部推压所述电介质管的方向上施加力。

    TWO-BEAM INTERFERENCE APPARATUS AND TWO-BEAM INTERFERENCE EXPOSURE SYSTEM
    5.
    发明申请
    TWO-BEAM INTERFERENCE APPARATUS AND TWO-BEAM INTERFERENCE EXPOSURE SYSTEM 有权
    两束干扰装置和两束干扰曝光系统

    公开(公告)号:US20130135601A1

    公开(公告)日:2013-05-30

    申请号:US13681744

    申请日:2012-11-20

    CPC classification number: G03B27/522 G03F7/70408

    Abstract: A two-beam interference apparatus may include a wafer stage on which a wafer may be set, a beam splitter to split first laser light into second and third laser light having a beam intensity distribution elongated in a first direction within a surface of the wafer, and an optical system to guide the second and third laser light onto the wafer. The wafer is irradiated with the second laser light from a second direction perpendicular to the first direction, and the third laser light from a third direction perpendicular to the first direction but different from the second direction, to thereby cause interference of the second and third laser light on the wafer. This apparatus increases the accuracy of the two-beam interference exposure.

    Abstract translation: 双光束干涉装置可以包括其上可以设置晶片的晶片台,分束器,用于将第一激光分离成具有沿晶片表面内的第一方向延伸的光束强度分布的第二和第三激光, 以及将第二和第三激光引导到晶片上的光学系统。 从垂直于第一方向的第二方向照射第二激光,从与第一方向垂直但与第二方向不同的第三方向照射第三激光,从而引起第二和第三激光的干涉 光在晶圆上。 该装置增加了双光束干涉曝光的精度。

    CHAMBER DEVICE, GAS LASER DEVICE, AND ELECTRONIC DEVICE MANUFACTURING METHOD

    公开(公告)号:US20230387642A1

    公开(公告)日:2023-11-30

    申请号:US18447510

    申请日:2023-08-10

    CPC classification number: H01S3/036 G03F7/70025 G03F7/70891 H01S3/038

    Abstract: A chamber device includes a housing into which a laser gas is filled, a pair of discharge electrodes generating light from the laser gas when a voltage is applied thereto, a window arranged at a wall surface of the housing and transmitting the light therethrough, a first fan causing the laser gas to flow between the discharge electrodes, a filter, a second fan rotating together with the first fan by a drive force of a drive source of the first fan, a fan-side flow path causing the laser gas filtered by the filter to flow by the second fan and a part of the laser gas to flow in a direction away from the window, and a window-side flow path communicating with the fan-side flow path and causing the laser gas flowing from the fan-side flow path by the second fan to flow toward the window.

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