METHOD OF FABRICATING A SEMICONDUCTOR DEVICE
    3.
    发明申请
    METHOD OF FABRICATING A SEMICONDUCTOR DEVICE 有权
    制造半导体器件的方法

    公开(公告)号:US20100178736A1

    公开(公告)日:2010-07-15

    申请号:US12353432

    申请日:2009-01-14

    IPC分类号: H01L21/56

    摘要: One method includes fabricating a semiconductor device including providing a dielectric layer. At least one semiconductor chip is provided defining a first surface including contact elements and a second surface opposite to the first surface. The semiconductor chip is placed onto the dielectric layer with the first surface facing the dielectric layer. An encapsulant material is applied over the second surface of the semiconductor chip in a reel-to-reel process.

    摘要翻译: 一种方法包括制造包括提供介电层的半导体器件。 提供至少一个半导体芯片,其限定包括接触元件的第一表面和与第一表面相对的第二表面。 半导体芯片被放置在电介质层上,第一表面面向电介质层。 密封剂材料以卷到盘的方式施加在半导体芯片的第二表面上。

    Method of fabricating a semiconductor device
    6.
    发明授权
    Method of fabricating a semiconductor device 有权
    制造半导体器件的方法

    公开(公告)号:US08119452B2

    公开(公告)日:2012-02-21

    申请号:US12353432

    申请日:2009-01-14

    IPC分类号: H01L21/00

    摘要: One method includes fabricating a semiconductor device including providing a dielectric layer. At least one semiconductor chip is provided defining a first surface including contact elements and a second surface opposite to the first surface. The semiconductor chip is placed onto the dielectric layer with the first surface facing the dielectric layer. An encapsulant material is applied over the second surface of the semiconductor chip in a reel-to-reel process.

    摘要翻译: 一种方法包括制造包括提供介电层的半导体器件。 提供至少一个半导体芯片,其限定包括接触元件的第一表面和与第一表面相对的第二表面。 半导体芯片被放置在电介质层上,第一表面面向电介质层。 密封剂材料以卷到盘的方式施加在半导体芯片的第二表面上。