Wafer inspection method and wafer

    公开(公告)号:US11624902B2

    公开(公告)日:2023-04-11

    申请号:US16765529

    申请日:2018-11-09

    Abstract: A wafer includes a substrate layer, a first mirror layer having a plurality of two-dimensionally arranged first mirror portions, and a second mirror layer having a plurality of two-dimensionally arranged second mirror portions. In the wafer, a gap is formed between the first mirror portion and the second mirror portion so as to form a plurality of Fabry-Perot interference filter portions. A wafer inspection method according to an embodiment includes a step of performing faulty/non-faulty determination of each of the plurality of Fabry-Perot interference filter portions, and a step of applying ink to at least part of a portion overlapping the gap when viewed in a facing direction on the second mirror layer of the Fabry-Perot interference filter portion determined as faulty.

    Optical inspection device and optical inspection method

    公开(公告)号:US11422059B2

    公开(公告)日:2022-08-23

    申请号:US16765626

    申请日:2018-11-09

    Abstract: An optical inspection device includes: a wafer support unit configured to support a wafer in which a plurality of Fabry-Perot interference filter portions are formed, each of the plurality of filter portions in which a distance between the first mirror portion and the second mirror portion facing each other varies by an electrostatic force, the wafer support unit configured to support the wafer such that a direction in which the first mirror portion and the second mirror portion face each other follows along a reference line; a light emission unit configured to emit light to be incident on each of the plurality of filter portions along the reference line; and a light detection unit configured to detect light transmitted through each of the plurality of filter portions along the reference line. The wafer support unit has a light passage region that allows light to pass along the reference line.

    Production method for Fabry-Perot interference filter

    公开(公告)号:US11041755B2

    公开(公告)日:2021-06-22

    申请号:US16303688

    申请日:2017-05-26

    Abstract: A method of manufacturing a Fabry-Perot interference filter includes a forming step of forming a first mirror layer having a plurality of first mirror portions, a sacrificial layer having a plurality of portions expected to be removed, and a second mirror layer having a plurality of second mirror portions on a first main surface of a wafer which includes parts corresponding to a plurality of two-dimensionally arranged substrates and is expected to be cut into the plurality of substrates along each of a plurality of lines; a removing step of simultaneously removing the plurality of two-dimensionally arranged portions expected to be removed from the sacrificial layer through etching after the Ruining step; and a cutting step of cutting the wafer into the plurality of substrates along each of the plurality of lines after the removing step.

    Fabry-Perot interference filter
    8.
    发明授权

    公开(公告)号:US10185140B2

    公开(公告)日:2019-01-22

    申请号:US14901732

    申请日:2014-06-24

    Abstract: A Fabry-Perot interference filter 10A includes a first mirror 31; a second mirror 41 being opposite to the first mirror 31 with a gap S therebetween; a first electrode 17 formed in the first mirror 31 to surround a light transmission region 11; a second electrode 18 formed in the first mirror 31 to include the light transmission region 11; and a third electrode 19 formed in the second mirror 41 to be opposite to the first electrode 17 and the second electrode 18 and connected to the same potential as the second electrode 18. The second electrode 18 is positioned at the side of the third electrode 19 or the opposite side thereof with respect to the first electrode 17 in an opposite direction D where the first mirror 31 and the second mirror 41 are opposite each other.

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