DEFECT-FREE HETEROGENEOUS SUBSTRATES
    3.
    发明申请

    公开(公告)号:US20180247812A1

    公开(公告)日:2018-08-30

    申请号:US15756577

    申请日:2015-09-03

    Inventor: Di LIANG

    Abstract: In example implementations of a heterogeneous substrate, the heterogeneous substrate includes a first material having an air trench, a second material coupled to the first material, a dielectric mask on a first portion of the second material and an active region that is grown on a remaining portion of the second material. An air gap may be formed in the air trench by the second material coupled to the first material. Defects in the second material may be contained to an area below the dielectric mask and the active region may remain defect free.

    DEFECT-FREE HETEROGENEOUS SUBSTRATES
    4.
    发明申请

    公开(公告)号:US20200273702A1

    公开(公告)日:2020-08-27

    申请号:US15930688

    申请日:2020-05-13

    Inventor: Di LIANG

    Abstract: In example implementations of a heterogeneous substrate, the heterogeneous substrate includes a first material having an air trench, a second material coupled to the first material, a dielectric mask on a first portion of the second material and an active region that is grown on a remaining portion of the second material. An air gap may be formed in the air trench by the second material coupled to the first material. Defects in the second material may be contained to an area below the dielectric mask and the active region may remain defect free.

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