公开(公告)号：US20170372878A1

公开(公告)日：2017-12-28

申请号：US15677260

申请日：2017-08-15

Applicant: Hitachi High-Technologies Corporation

Inventor： Masahito TOGAMI ,  Tatehito USUI ,  Kosa HIROTA ,  Satomi INOUE ,  Shigeru NAKAMOTO

IPC: H01J37/32

CPC classification number: H01J37/32972 ,  H01J37/32458 ,  H01J37/32908 ,  H01J37/32963 ,  H01J37/3299 ,  H01J2237/0266 ,  H01J2237/2445 ,  H01J2237/3341

Abstract: A plasma processing apparatus includes: a detector configured to detect a change in an intensity of light emission from plasma formed inside a processing chamber; and a unit configured to adjust conditions for forming the plasma or processing a wafer arranged inside the processing chamber using an output from the detector, wherein the detector detects a signal of the intensity of light emission at plural time instants before an arbitrary time instant during processing, and wherein the adjusting unit removes the component of a temporal change of a long cycle of the intensity of light emission from this detected signal and detects the component of a short temporal change of the intensity of light emission, and adjusts the conditions for forming the plasma or processing a wafer arranged inside the processing chamber based on the short temporal change of the detected intensity of light emission.

公开(公告)号：US20170178874A1

公开(公告)日：2017-06-22

申请号：US15277272

申请日：2016-09-27

Applicant: Hitachi High-Technologies Corporation

Inventor： Yohei KAWAGUCHI ,  Tatehito USUI ,  Masahito TOGAMI ,  Satomi INOUE ,  Shigeru NAKAMOTO

IPC: H01J37/32 ,  H01L21/3065 ,  H01L21/66 ,  G01N21/84 ,  G01B11/06

CPC classification number: H01J37/32972 ,  G01B11/0616 ,  G01N21/84 ,  H01J37/32715 ,  H01J37/32834 ,  H01J37/32935 ,  H01J37/32963 ,  H01J2237/334 ,  H01L21/3065 ,  H01L22/26

Abstract: A plasma processing device performing etching processing to a sample disposed in a processing chamber disposed in a vacuum vessel by using plasma formed in the processing chamber includes a light detector, a component detector, and a determination unit. The light detector detects light intensity of a plurality of wavelengths from the inside of the processing chamber at a plurality of times during the sample processing. The component detector detects, by using a result of a principal component analysis of time-series data, a highly correlated component between the time-series data of a plurality of the wavelengths at a certain time in a plurality of the times obtained from output of the light detector. The determination unit determines an amount or an end point of the etching processing based on a change in light intensity of at least one of a plurality of the wavelengths detected by using the time-series data from which the highly correlated component is removed.

公开(公告)号：US20130228677A1

公开(公告)日：2013-09-05

申请号：US13760284

申请日：2013-02-06

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Yohei KAWAGUCHI ,  Yuichiro HASHIMOTO ,  Masuyuki SUGIYAMA ,  Shun KUMANO ,  Akihito KANEKO ,  Masahito TOGAMI ,  Kazushige NISHIMURA ,  Hiroyuki INOUE

IPC: H01J49/26

CPC classification number: H01J49/26 ,  H01J49/0031 ,  H01J49/0036

Abstract: There is a tendency of the intensity and the shape of a spectrum to be measured transitioning with the passage of measured time, depending on the volatility and the reactivity of a component. A mass spectrometric system includes: a mass spectrometric unit that measures a specimen and outputs a mass spectrum; and an estimator that has an estimation rule on content information, the estimation rule being assigned to each component and each measurement time. The estimator estimates, based on a mass spectrum output from the mass spectrometric unit, content information on each component of a plurality of components that may be contained in the specimen in accordance with the estimation rule.

Abstract translation: 根据组分的挥发性和反应性，测量光谱的强度和形状趋于随着测量时间的流逝而过渡。 质谱系统包括：测量样品并输出质谱的质谱单位; 以及估计器，其对内容信息具有估计规则，所述估计规则被分配给每个组件和每个测量时间。 估计器基于质谱单位输出的质谱估计根据估计规则可以包含在样本中的多个分量的每个分量的内容信息。