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    Method of forming a tantalum carbon nitride layer and method of manufacturing a semiconductor device using the same
    6.
    发明申请
    Method of forming a tantalum carbon nitride layer and method of manufacturing a semiconductor device using the same 审中-公开
    形成钽碳氮化物层的方法和使用其制造半导体器件的方法

    公开(公告)号：US20070059929A1

    公开(公告)日：2007-03-15

    申请号：US11438941

    申请日：2006-05-23

    申请人： Hag-Ju Cho ,  Sang-Bom Kang ,  Seong-Geon Park ,  Taek-Soo Jeon ,  Hye-Lan Lee ,  Yu-Gyun Shin

    发明人： Hag-Ju Cho ,  Sang-Bom Kang ,  Seong-Geon Park ,  Taek-Soo Jeon ,  Hye-Lan Lee ,  Yu-Gyun Shin

    IPC分类号： H01L21/44

    CPC分类号： H01L21/28556 ,  C23C16/36 ,  H01L21/28088 ,  H01L21/76843 ,  H01L21/76856 ,  H01L21/823842 ,  H01L21/823857 ,  H01L27/10888 ,  H01L29/4966 ,  H01L29/66583

    摘要： In some embodiments of the present invention, methods of forming a tantalum carbon nitride layer include introducing a source gas including a tantalum metal complex onto a substrate, wherein one or more of the ligands of the tantalum metal complex include nitrogen and one or more of the ligands of the tantalum metal complex include carbon; and thermally decomposing the tantalum metal complex to form a tantalum carbon nitride layer on the substrate. In some embodiments, the tantalum metal complex includes Ta(NR1)(NR2R3)3, wherein R1, R2 and R3 are each independently H or a C1-C6 alkyl group. In some embodiments, the tantalum metal complex may be [Ta(═NC(CH3)2C2H5)(N(CH3)2)3]. Methods of forming a gate structure, methods of manufacturing dual gate electrodes and methods of manufacturing a capacitor including tantalum carbon nitride are also provided herein.

    摘要翻译： 在本发明的一些实施例中，形成氮化钽层的方法包括将包含钽金属络合物的源气体引入到基底上，其中一个或多个钽金属络合物的配体包括氮和一个或多个 钽金属络合物的配体包括碳; 并且在所述衬底上热分解所述钽金属络合物以形成钽碳氮化物层。 在一些实施方案中，钽金属络合物包括Ta（NR 1）3（NR 2 R 3）3， 其中R 1，R 2和R 3各自独立地为H或C 1 -C 3 - 6烷基。 在一些实施方案中，钽金属络合物可以是[Ta（-NC（CH 3）2）2 H 2 H 5， （N（CH 3）2）3）3。 形成栅极结构的方法，制造双栅电极的方法以及制造包括氮化钽的电容器的方法也在本文中提供。

    Gate electrode structure and method of forming the same, and semiconductor transistor having the gate electrode structure and method of manufacturing the same
    8.
    发明申请
    Gate electrode structure and method of forming the same, and semiconductor transistor having the gate electrode structure and method of manufacturing the same 审中-公开
    栅电极结构及其形成方法，以及具有栅电极结构的半导体晶体管及其制造方法

    公开(公告)号：US20070026596A1

    公开(公告)日：2007-02-01

    申请号：US11492400

    申请日：2006-07-25

    申请人： Hag-Ju Cho ,  Taek-Soo Jeon ,  Hye-Lan Lee ,  Yu-Gyun Shin ,  Sang-Bom Kang

    发明人： Hag-Ju Cho ,  Taek-Soo Jeon ,  Hye-Lan Lee ,  Yu-Gyun Shin ,  Sang-Bom Kang

    IPC分类号： H01L21/8234

    CPC分类号： H01L21/823828 ,  H01L21/823835 ,  H01L21/823842

    摘要： In a gate structure and a method of forming the same, a first conductive pattern is formed on a substrate and comprises a metal-containing material. A second conductive pattern is formed on the first conductive pattern, and the second conductive pattern comprises metal and silicon. A third conductive pattern is formed on the second conductive pattern, and the third conductive pattern comprises polysilicon. A gate conductive pattern of an n-type metal-oxide semiconductor (NMOS) transistor, a p-type MOS (PMOS) transistor and a complementary MOS (CMOS) transistor includes the gate structure. The second conductive pattern is interposed between the first and third conductive patterns and the third conductive pattern is prevented from making direct contact with the first conductive pattern, so that polysilicon in the third conductive pattern is sufficiently prevented from being chemically reacted with the metal in the first conductive pattern in advance, thereby improving electrical characteristics of the transistor.

    摘要翻译： 在栅极结构及其形成方法中，第一导电图案形成在基板上并且包括含金属的材料。 在第一导电图案上形成第二导电图案，并且第二导电图案包括金属和硅。 在第二导电图案上形成第三导电图案，并且第三导电图案包括多晶硅。 n型金属氧化物半导体（NMOS）晶体管，p型MOS（PMOS）晶体管和互补MOS（CMOS）晶体管的栅极导电图案包括栅极结构。 第二导电图案插入在第一和第三导电图案之间，并且防止第三导电图案与第一导电图案直接接触，使得充分防止第三导电图案中的多晶硅与金属在化学反应中 第一导电图案，从而改善晶体管的电特性。

    Semiconductor device with dual gates and method of manufacturing the same
    10.
    发明申请
    Semiconductor device with dual gates and method of manufacturing the same 有权
    具有双门的半导体器件及其制造方法

    公开(公告)号：US20070111453A1

    公开(公告)日：2007-05-17

    申请号：US11497998

    申请日：2006-08-01

    申请人： Hye-Lan Lee ,  Hag-Ju Cho ,  Taek-Soo Jeon ,  Yu-Gyun Shin ,  Sang-Bom Kang

    发明人： Hye-Lan Lee ,  Hag-Ju Cho ,  Taek-Soo Jeon ,  Yu-Gyun Shin ,  Sang-Bom Kang

    IPC分类号： H01L21/336 ,  H01L29/94

    CPC分类号： H01L21/823842

    摘要： In a semiconductor device with dual gates and a method of manufacturing the same, a dielectric layer and first and second metallic conductive layers are successively formed on the semiconductor substrate having first and second regions. The second metallic conductive layer which is formed on the first metallic conductive layer of the second region is etched to form a metal pattern. The first metallic conductive layer is etched using the metal pattern as an etching mask. A polysilicon layer is formed on the dielectric layer and the metal pattern. The first gate electrode is formed by etching portions of the polysilicon layer, the metal pattern, and the first metallic conductive layer of the first region. The second gate electrode is formed by etching a portion of the polysilicon layer formed directly on the dielectric layer of the second region.

    摘要翻译： 在具有双栅极的半导体器件及其制造方法中，在具有第一和第二区域的半导体衬底上依次形成电介质层和第一和第二金属导电层。 形成在第二区域的第一金属导电层上的第二金属导电层被蚀刻以形成金属图案。 使用金属图案作为蚀刻掩模蚀刻第一金属导电层。 在电介质层和金属图案上形成多晶硅层。 第一栅极通过蚀刻第一区域的多晶硅层，金属图案和第一金属导电层的部分而形成。 通过蚀刻直接形成在第二区域的电介质层上的多晶硅层的一部分来形成第二栅电极。