METHOD AND STRUCTURE FOR DIVIDING A SUBSTRATE INTO INDIVIDUAL DEVICES
    3.
    发明申请
    METHOD AND STRUCTURE FOR DIVIDING A SUBSTRATE INTO INDIVIDUAL DEVICES 有权
    将基板分解成个体设备的方法和结构

    公开(公告)号:US20110201179A1

    公开(公告)日:2011-08-18

    申请号:US13095584

    申请日:2011-04-27

    IPC分类号: H01L21/78

    CPC分类号: H01L21/78

    摘要: A method for obtaining individual dies from a semiconductor structure is disclosed. The semiconductor structure includes a device layer, and the device layer in turn includes active regions separated by predefined spacings. Thick metal is selectively formed on backside of the device layer such that thick metal is formed on backside of active regions but not on backside of the predefined spacings. The semiconductor structure is then cut along the predefined spacings to separate the active regions with thick metal on their backside into individual dies.

    摘要翻译: 公开了一种从半导体结构获得单个管芯的方法。 半导体结构包括器件层,器件层又包括由预定间隔隔开的有源区。 在器件层的背侧选择性地形成厚金属,使得在有源区的背面形成厚金属,而不在预定间隔的背面形成厚金属。 然后沿着预定的间隔切割半导体结构,以将其背面的厚金属的活性区域分离成单独的管芯。

    Method and Structure for Dividing a Substrate into Individual Devices
    7.
    发明申请
    Method and Structure for Dividing a Substrate into Individual Devices 有权
    将基板划分为单个设备的方法和结构

    公开(公告)号:US20090181520A1

    公开(公告)日:2009-07-16

    申请号:US12174863

    申请日:2008-07-17

    IPC分类号: H01L21/78

    CPC分类号: H01L21/78

    摘要: A method for obtaining individual dies from a semiconductor structure is disclosed. The semiconductor structure includes a device layer, and the device layer in turn includes active regions separated by predefined spacings. Thick metal is selectively formed on backside of the device layer such that thick metal is formed on backside of active regions but not on backside of the predefined spacings. The semiconductor structure is then cut along the predefined spacings to separate the active regions with thick metal on their backside into individual dies.

    摘要翻译: 公开了一种从半导体结构获得单个管芯的方法。 半导体结构包括器件层,器件层又包括由预定间隔隔开的有源区。 在器件层的背侧选择性地形成厚金属,使得在有源区的背面形成厚金属,而不在预定间隔的背面形成厚金属。 然后沿着预定的间隔切割半导体结构,以将其背面的厚金属的活性区域分离成单独的管芯。

    Method and structure for dividing a substrate into individual devices
    8.
    发明授权
    Method and structure for dividing a substrate into individual devices 有权
    将基板分割为各个装置的方法和结构

    公开(公告)号:US08343852B2

    公开(公告)日:2013-01-01

    申请号:US13095584

    申请日:2011-04-27

    IPC分类号: H01L21/00

    CPC分类号: H01L21/78

    摘要: A method for obtaining individual dies from a semiconductor structure is disclosed. The semiconductor structure includes a device layer, and the device layer in turn includes active regions separated by predefined spacings. Thick metal is selectively formed on backside of the device layer such that thick metal is formed on backside of active regions but not on backside of the predefined spacings. The semiconductor structure is then cut along the predefined spacings to separate the active regions with thick metal on their backside into individual dies.

    摘要翻译: 公开了一种从半导体结构获得单个管芯的方法。 半导体结构包括器件层,器件层又包括由预定间隔隔开的有源区。 在器件层的背侧选择性地形成厚金属,使得在有源区的背面形成厚金属,而不在预定间隔的背面形成厚金属。 然后沿着预定的间隔切割半导体结构,以将其背面的厚金属的活性区域分离成单独的管芯。

    Method and structure for dividing a substrate into individual devices
    9.
    发明授权
    Method and structure for dividing a substrate into individual devices 有权
    将基板分割为各个装置的方法和结构

    公开(公告)号:US07951688B2

    公开(公告)日:2011-05-31

    申请号:US12174863

    申请日:2008-07-17

    IPC分类号: H01L21/30 H01L21/46

    CPC分类号: H01L21/78

    摘要: A method for obtaining individual dies from a semiconductor structure is disclosed. The semiconductor structure includes a device layer, and the device layer in turn includes active regions separated by predefined spacings. Thick metal is selectively formed on backside of the device layer such that thick metal is formed on backside of active regions but not on backside of the predefined spacings. The semiconductor structure is then cut along the predefined spacings to separate the active regions with thick metal on their backside into individual dies.

    摘要翻译: 公开了一种从半导体结构获得单个管芯的方法。 半导体结构包括器件层,器件层又包括由预定间隔隔开的有源区。 在器件层的背侧选择性地形成厚金属,使得在有源区的背面形成厚金属,而不在预定间隔的背面形成厚金属。 然后沿着预定的间隔切割半导体结构,以将其背面的厚金属的活性区域分离成单独的管芯。