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1.发明授权Lithographic apparatus and component with repeating structure having increased thermal accommodation coefficient 有权具有重复结构的光刻设备和组件具有增加的热调节系数公开(公告)号：US08970818B2
公开(公告)日：2015-03-03
申请号：US13478888
申请日：2012-05-23
申请人： Han-Kwang Nienhuys , Franciscus Johannes Joseph Janssen , Sven Pekelder , Roger Wilhelmus Antonius Henricus Schmitz , Alexander Marinus Arnoldus Huijberts , Paulus Albertus Maria Gasseling
发明人： Han-Kwang Nienhuys , Franciscus Johannes Joseph Janssen , Sven Pekelder , Roger Wilhelmus Antonius Henricus Schmitz , Alexander Marinus Arnoldus Huijberts , Paulus Albertus Maria Gasseling
CPC分类号： G03F7/70883
摘要： A lithographic apparatus includes a substrate table constructed to hold a substrate, and a projection system configured to project a patterned radiation beam onto a target portion of the substrate. A surface of a component of the lithographic apparatus that is in a vacuum environment in use is provided with a repeating structure configured to increase the effective thermal accommodation coefficient of the surface.
摘要翻译： 光刻设备包括构造成保持衬底的衬底台和被配置为将图案化的辐射束投影到衬底的目标部分上的投影系统。 在使用中的真空环境中的光刻设备的部件的表面设置有重复结构，其被配置为增加表面的有效热调节系数。
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公开(公告)号：US08797504B2
公开(公告)日：2014-08-05
申请号：US13408471
申请日：2012-02-29
申请人： Han-Kwang Nienhuys , Martinus Agnes Willem Cuijpers , Leon Martin Levasier , Jan Bernard Plechelmus Van Schoot , Yuri Johannes Gabriël Van De Vijver , Oleg Viacheslavovich Voznyi , Franciscus Johannes Joseph Janssen , Danny Maria Hubertus Philips , Marcio Alexandre Cano Miranda , Oleksiy Galaktionov , Manish Ranjan , Albert Pieter Rijpma , Kursat Bal , Roger Wilhelmus Antonius Henricus Schmitz , Alain Louis Claude Leroux
发明人： Han-Kwang Nienhuys , Martinus Agnes Willem Cuijpers , Leon Martin Levasier , Jan Bernard Plechelmus Van Schoot , Yuri Johannes Gabriël Van De Vijver , Oleg Viacheslavovich Voznyi , Franciscus Johannes Joseph Janssen , Danny Maria Hubertus Philips , Marcio Alexandre Cano Miranda , Oleksiy Galaktionov , Manish Ranjan , Albert Pieter Rijpma , Kursat Bal , Roger Wilhelmus Antonius Henricus Schmitz , Alain Louis Claude Leroux
CPC分类号： G03F7/70933 , G03F7/70875 , G03F7/70891
摘要： A lithographic apparatus includes a substrate table constructed to hold a substrate, a projection system configured to project a patterned radiation beam through an opening and onto a target portion of the substrate, and a conduit having an outlet in the opening. The conduit is configured to deliver gas to the opening. The lithographic apparatus further includes a cooling apparatus controlled by a control system. The cooling apparatus is configured to cool the gas such that gas which travels from the opening to the substrate has a predetermined temperature when the gas is incident upon the substrate.
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公开(公告)号：US20120229782A1
公开(公告)日：2012-09-13
申请号：US13408471
申请日：2012-02-29
申请人： Han-Kwang Nienhuys , Martinus Anges Willem Cuijpers , Leon Martin Levasier , Jan Bernard Plechelmus Van Schoot , Yuri Johannes Gabriël Van De Vijver , Oleg Viacheslavovich Voznyi , Franciscus Johannes Joseph Janssen , Danny Maria Hubertus Philips , Marcio Alexandre Cano Miranda , Olesksiy Galaktionov , Manish Ranjan , Albert Pieter Rijpma , Kursat Bal , Roger Wilhelmus Antonius Henricus Schmitz , Alain Louis Claude Leroux
发明人： Han-Kwang Nienhuys , Martinus Anges Willem Cuijpers , Leon Martin Levasier , Jan Bernard Plechelmus Van Schoot , Yuri Johannes Gabriël Van De Vijver , Oleg Viacheslavovich Voznyi , Franciscus Johannes Joseph Janssen , Danny Maria Hubertus Philips , Marcio Alexandre Cano Miranda , Olesksiy Galaktionov , Manish Ranjan , Albert Pieter Rijpma , Kursat Bal , Roger Wilhelmus Antonius Henricus Schmitz , Alain Louis Claude Leroux
IPC分类号： G03B27/52
CPC分类号： G03F7/70933 , G03F7/70875 , G03F7/70891
摘要： A lithographic apparatus includes a substrate table constructed to hold a substrate, a projection system configured to project a patterned radiation beam through an opening and onto a target portion of the substrate, and a conduit having an outlet in the opening. The conduit is configured to deliver gas to the opening. The lithographic apparatus further includes a cooling apparatus controlled by a control system. The cooling apparatus is configured to cool the gas such that gas which travels from the opening to the substrate has a predetermined temperature when the gas is incident upon the substrate.
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公开(公告)号：US08730448B2
公开(公告)日：2014-05-20
申请号：US13409752
申请日：2012-03-01
申请人： Han-Kwang Nienhuys , Martinus Agnes Willem Cuijpers , Nicolaas Ten Kate , Leon Martin Levasier , Jan Bernard Plechelmus Van Schoot , Yuri Johannes Gabriël Van De Vijver , Oleg Viacheslavovich Voznyi , Franciscus Johannes Joseph Janssen , Danny Maria Hubertus Philips , Marcio Alexandre Cano Miranda , Oleksiy Galaktionov , Manish Ranjan , Albert Pieter Rijpma , Kursat Bal , Laurentius Johannes Adrianus Van Bokhoven , Roger Wilhelmus Antonius Henricus Schmitz , Alain Louis Claude Leroux
发明人： Han-Kwang Nienhuys , Martinus Agnes Willem Cuijpers , Nicolaas Ten Kate , Leon Martin Levasier , Jan Bernard Plechelmus Van Schoot , Yuri Johannes Gabriël Van De Vijver , Oleg Viacheslavovich Voznyi , Franciscus Johannes Joseph Janssen , Danny Maria Hubertus Philips , Marcio Alexandre Cano Miranda , Oleksiy Galaktionov , Manish Ranjan , Albert Pieter Rijpma , Kursat Bal , Laurentius Johannes Adrianus Van Bokhoven , Roger Wilhelmus Antonius Henricus Schmitz , Alain Louis Claude Leroux
CPC分类号： G03F7/70933 , G03F7/70875 , G03F7/70891
摘要： A lithographic apparatus includes a substrate table constructed to hold a substrate, a projection system configured to project a patterned radiation beam through an opening and onto a target portion of the substrate, and a conduit having an outlet in the opening. The conduit is configured to deliver gas to the opening. The lithographic apparatus further includes a cooling apparatus controlled by a control system. The cooling apparatus is configured to cool the gas such that gas which travels from the opening to the substrate has a predetermined temperature when the gas is incident upon the substrate.
摘要翻译： 光刻设备包括被构造成保持基板的基板台，配置成将图案化的辐射束投射通过开口并到达基板的目标部分的投影系统，以及在开口中具有出口的导管。 导管构造成将气体输送到开口。 光刻设备还包括由控制系统控制的冷却装置。 冷却装置构造成冷却气体，使得当气体入射到基板上时，从开口行进到基板的气体具有预定温度。
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公开(公告)号：US20120229783A1
公开(公告)日：2012-09-13
申请号：US13409752
申请日：2012-03-01
申请人： Han-Kwang Nienhuys , Martinus Agnes Willem Cuijpers , Nicolaas Ten Kate , Leon Martin Levasier , Jan Bernard Plechelmus Van Schoot , Yuri Johannes Gabriël Van De Vijver , Oleg Viacheslavovich Voznyi , Franciscus Johannes Joseph Janssen , Danny Maria Hubertus Philips , Marcio Alexandre Cano Miranda , Oleksiy Galaktionov , Manish Ranjan , Albert Pieter Rijpma , Kursat Bal , Laurentius Johannes Adrianus Van Bokhoven , Roger Wilhelmus Antonius Henricus Schmitz , Alain Louis Claude Leroux
发明人： Han-Kwang Nienhuys , Martinus Agnes Willem Cuijpers , Nicolaas Ten Kate , Leon Martin Levasier , Jan Bernard Plechelmus Van Schoot , Yuri Johannes Gabriël Van De Vijver , Oleg Viacheslavovich Voznyi , Franciscus Johannes Joseph Janssen , Danny Maria Hubertus Philips , Marcio Alexandre Cano Miranda , Oleksiy Galaktionov , Manish Ranjan , Albert Pieter Rijpma , Kursat Bal , Laurentius Johannes Adrianus Van Bokhoven , Roger Wilhelmus Antonius Henricus Schmitz , Alain Louis Claude Leroux
IPC分类号： G03B27/52
CPC分类号： G03F7/70933 , G03F7/70875 , G03F7/70891
摘要： A lithographic apparatus includes a substrate table constructed to hold a substrate, a projection system configured to project a patterned radiation beam through an opening and onto a target portion of the substrate, and a conduit having an outlet in the opening. The conduit is configured to deliver gas to the opening. The lithographic apparatus further includes a cooling apparatus controlled by a control system. The cooling apparatus is configured to cool the gas such that gas which travels from the opening to the substrate has a predetermined temperature when the gas is incident upon the substrate.
摘要翻译： 光刻设备包括被构造成保持基板的基板台，配置成将图案化的辐射束投射通过开口并到达基板的目标部分的投影系统，以及在开口中具有出口的导管。 导管构造成将气体输送到开口。 光刻设备还包括由控制系统控制的冷却装置。 冷却装置构造成冷却气体，使得当气体入射到基板上时，从开口行进到基板的气体具有预定温度。
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6.发明授权Lithographic apparatus configured to suppress contamination from passing into the projection system and method 有权被配置为抑制污染物进入投影系统的方法的平版印刷装置公开(公告)号：US08625068B2
公开(公告)日：2014-01-07
申请号：US12975898
申请日：2010-12-22
IPC分类号： G03B27/52
CPC分类号： G03F7/70916 , G03F7/70233 , G03F7/70833 , G03F7/70883 , G03F7/70908
摘要： A lithographic apparatus includes a projection system configured to project a patterned beam of radiation onto a substrate. The projection system being provided with an opening through which the patterned beam of radiation may pass. At least part of the opening comprises a sloped surface of a wall of the projection system and a sloped surface of a mirror of the projection system.
摘要翻译： 光刻设备包括投影系统，该投影系统配置成将图案化的辐射束投射到基板上。 该投影系统设置有一个开口，图案化的辐射束可以穿过该开口。 开口的至少一部分包括投影系统的壁的倾斜表面和投影系统的反射镜的倾斜表面。
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公开(公告)号：US20120002182A1
公开(公告)日：2012-01-05
申请号：US12975898
申请日：2010-12-22
IPC分类号： G03B27/42
CPC分类号： G03F7/70916 , G03F7/70233 , G03F7/70833 , G03F7/70883 , G03F7/70908
摘要： A lithographic apparatus includes a projection system configured to project a patterned beam of radiation onto a substrate. The projection system being provided with an opening through which the patterned beam of radiation may pass. At least part of the opening comprises a sloped surface of a wall of the projection system and a sloped surface of a mirror of the projection system.
摘要翻译： 光刻设备包括投影系统，该投影系统配置成将图案化的辐射束投射到基板上。 该投影系统设置有一个开口，图案化的辐射束可以穿过该开口。 开口的至少一部分包括投影系统的壁的倾斜表面和投影系统的反射镜的倾斜表面。
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公开(公告)号：US20120281193A1
公开(公告)日：2012-11-08
申请号：US13442458
申请日：2012-04-09
IPC分类号： G03B27/54
CPC分类号： G03F7/70916 , G03F7/70808 , G03F7/70933
摘要： A lithographic apparatus includes a projection system that includes a plurality of reflective optics. One of the reflective optics is provided with an opening which passes through the reflective optic. The opening is closed by a covering layer that is substantially transparent to EUV radiation. The covering layer prevents contamination from entering the projection system, while allowing patterned EUV radiation to pass from the projection system onto a substrate.
摘要翻译： 光刻设备包括包括多个反射光学元件的投影系统。 反射光学器件中的一个设置有穿过反射光学器件的开口。 开口由对EUV辐射基本透明的覆盖层封闭。 覆盖层防止污染物进入投影系统，同时允许图案化的EUV辐射从投影系统传递到基底上。
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公开(公告)号：US08917380B2
公开(公告)日：2014-12-23
申请号：US13442458
申请日：2012-04-09
CPC分类号： G03F7/70916 , G03F7/70808 , G03F7/70933
摘要： A lithographic apparatus includes a projection system that includes a plurality of reflective optics. One of the reflective optics is provided with an opening which passes through the reflective optic. The opening is closed by a covering layer that is substantially transparent to EUV radiation. The covering layer prevents contamination from entering the projection system, while allowing patterned EUV radiation to pass from the projection system onto a substrate.
摘要翻译： 光刻设备包括包括多个反射光学元件的投影系统。 反射光学器件中的一个设置有穿过反射光学器件的开口。 开口由对EUV辐射基本透明的覆盖层封闭。 覆盖层防止污染物进入投影系统，同时允许图案化的EUV辐射从投影系统传递到基底上。
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