公开(公告)号：US20120281193A1

公开(公告)日：2012-11-08

申请号：US13442458

申请日：2012-04-09

申请人： Erik Roelof Loopstra ,  Sven Pekelder ,  Han-Kwang Nienhuys

发明人： Erik Roelof Loopstra ,  Sven Pekelder ,  Han-Kwang Nienhuys

IPC分类号： G03B27/54

CPC分类号： G03F7/70916 ,  G03F7/70808 ,  G03F7/70933

摘要： A lithographic apparatus includes a projection system that includes a plurality of reflective optics. One of the reflective optics is provided with an opening which passes through the reflective optic. The opening is closed by a covering layer that is substantially transparent to EUV radiation. The covering layer prevents contamination from entering the projection system, while allowing patterned EUV radiation to pass from the projection system onto a substrate.

摘要翻译： 光刻设备包括包括多个反射光学元件的投影系统。 反射光学器件中的一个设置有穿过反射光学器件的开口。 开口由对EUV辐射基本透明的覆盖层封闭。 覆盖层防止污染物进入投影系统，同时允许图案化的EUV辐射从投影系统传递到基底上。

公开(公告)号：US08917380B2

公开(公告)日：2014-12-23

申请号：US13442458

申请日：2012-04-09

申请人： Erik Roelof Loopstra ,  Sven Pekelder ,  Han-Kwang Nienhuys

发明人： Erik Roelof Loopstra ,  Sven Pekelder ,  Han-Kwang Nienhuys

IPC分类号： G03B27/54 ,  G03B27/42 ,  G03F7/20

CPC分类号： G03F7/70916 ,  G03F7/70808 ,  G03F7/70933

摘要： A lithographic apparatus includes a projection system that includes a plurality of reflective optics. One of the reflective optics is provided with an opening which passes through the reflective optic. The opening is closed by a covering layer that is substantially transparent to EUV radiation. The covering layer prevents contamination from entering the projection system, while allowing patterned EUV radiation to pass from the projection system onto a substrate.

摘要翻译： 光刻设备包括包括多个反射光学元件的投影系统。 反射光学器件中的一个设置有穿过反射光学器件的开口。 开口由对EUV辐射基本透明的覆盖层封闭。 覆盖层防止污染物进入投影系统，同时允许图案化的EUV辐射从投影系统传递到基底上。

公开(公告)号：US09091944B2

公开(公告)日：2015-07-28

申请号：US13497741

申请日：2010-09-24

申请人： Erik Roelof Loopstra ,  Vadim Yevgenyevich Banine ,  Gerardus Hubertus Petrus Maria Swinkels ,  Sven Pekelder ,  Dzmitry Labetski ,  Uwe Bruno Heini Stamm ,  William N. Partlo

发明人： Erik Roelof Loopstra ,  Vadim Yevgenyevich Banine ,  Gerardus Hubertus Petrus Maria Swinkels ,  Sven Pekelder ,  Dzmitry Labetski ,  Uwe Bruno Heini Stamm ,  William N. Partlo

IPC分类号： G03B27/54 ,  G03F7/20 ,  H05G2/00

CPC分类号： G03F7/70933 ,  G03F7/70033 ,  G03F7/70175 ,  G03F7/70808 ,  G03F7/70908 ,  G03F7/70916 ,  G03F7/70925 ,  H05G2/003 ,  H05G2/005

摘要： An EUV lithographic apparatus includes a source collector apparatus in which the extreme ultraviolet radiation is generated by exciting a fuel to provide a plasma emitting the radiation. The source collector apparatus includes a chamber in fluid communication with a guide way external to the chamber. A pump for circulating buffer gas is part of the guide way, and provides a closed loop buffer gas flow. The gas flowing through the guide way traverses a gas decomposer wherein a compound of fuel material and buffer gas material is decomposed, so that decomposed buffer gas material can be fed back into the closed loop flow path.

摘要翻译： EUV光刻设备包括源极收集器装置，其中通过激发燃料产生极紫外辐射以提供发射辐射的等离子体。 源极收集器装置包括与腔室外部的引导方式流体连通的腔室。 用于循环缓冲气体的泵是引导方式的一部分，并提供闭环缓冲气体流。 流过引导方式的气体穿过气体分解器，其中燃料和缓冲气体材料的化合物被分解，使得分解的缓冲气体材料可以反馈回闭环流动路径。

公开(公告)号：US20120182536A1

公开(公告)日：2012-07-19

申请号：US13497741

申请日：2010-09-24

申请人： Erik Roelof Loopstra ,  Vadim Yevgenyevich Banine ,  Gerardus Hubertus Petrus Maria Swinkels ,  Sven Pekelder ,  Dzmitry Labetski ,  Uwe Bruno Heini Stamm ,  William N. Partlo

发明人： Erik Roelof Loopstra ,  Vadim Yevgenyevich Banine ,  Gerardus Hubertus Petrus Maria Swinkels ,  Sven Pekelder ,  Dzmitry Labetski ,  Uwe Bruno Heini Stamm ,  William N. Partlo

IPC分类号： G03B27/54 ,  B01D46/42 ,  G03B27/32

CPC分类号： G03F7/70933 ,  G03F7/70033 ,  G03F7/70175 ,  G03F7/70808 ,  G03F7/70908 ,  G03F7/70916 ,  G03F7/70925 ,  H05G2/003 ,  H05G2/005

摘要： An EUV lithographic apparatus includes a source collector apparatus in which the extreme ultraviolet radiation is generated by exciting a fuel to provide a plasma emitting the radiation. The source collector apparatus includes a chamber in fluid communication with a guide way external to the chamber. A pump for circulating buffer gas is part of the guide way, and provides a closed loop buffer gas flow. The gas flowing through the guide way traverses a gas decomposer wherein a compound of fuel material and buffer gas material is decomposed, so that decomposed buffer gas material can be fed back into the closed loop flow path.

摘要翻译： EUV光刻设备包括源极收集器装置，其中通过激发燃料产生极紫外辐射以提供发射辐射的等离子体。 源极收集器装置包括与腔室外部的引导方式流体连通的腔室。 用于循环缓冲气体的泵是引导方式的一部分，并提供闭环缓冲气体流。 流过引导方式的气体穿过气体分解器，其中燃料和缓冲气体材料的化合物被分解，使得分解的缓冲气体材料可以反馈回闭环流动路径。

公开(公告)号：US09594306B2

公开(公告)日：2017-03-14

申请号：US14002000

申请日：2011-12-21

申请人： Vadim Yevgenyevich Banine ,  Wilhelmus Petrus De Boeij ,  Antonius Johannes Josephus Van Dijsseldonk Van Dijsseldonk ,  Erik Roelof Loopstra ,  Johannes Hubertus Josephina Moors ,  Jan Bernard Plechelmus Van Schoot ,  Gerardus Hubertus Petrus Maria Swinkels ,  Andrei Mikhailovich Yakunin

发明人： Vadim Yevgenyevich Banine ,  Wilhelmus Petrus De Boeij ,  Antonius Johannes Josephus Van Dijsseldonk Van Dijsseldonk ,  Erik Roelof Loopstra ,  Johannes Hubertus Josephina Moors ,  Jan Bernard Plechelmus Van Schoot ,  Gerardus Hubertus Petrus Maria Swinkels ,  Andrei Mikhailovich Yakunin

IPC分类号： G03F7/20 ,  B82Y10/00 ,  G21K1/06 ,  H05G2/00

CPC分类号： G03F7/70191 ,  B82Y10/00 ,  G02B1/11 ,  G02B5/1838 ,  G02B5/281 ,  G02B5/283 ,  G03F7/70008 ,  G03F7/702 ,  G03F7/70308 ,  G03F7/70575 ,  G21K1/062 ,  G21K1/067 ,  G21K2201/061 ,  G21K2201/067 ,  H05G2/003 ,  H05G2/005 ,  H05G2/008

摘要： A lithographic apparatus for patterning a beam of radiation and projecting it onto a substrate, comprising at least two spectral purity filters configured to reduce the intensity of radiation in the beam of radiation in at least one undesirable range of radiation wavelength, wherein the two spectral purity filters are provided with different radiation filtering structures from each other.

摘要翻译： 一种光刻设备，用于将辐射束图案化并将其投影到衬底上，包括至少两个光谱纯度滤光器，其被配置为在至少一个不期望的辐射波长范围内降低辐射束中的辐射强度，其中两个光谱纯度 过滤器具有彼此不同的辐射过滤结构。

公开(公告)号：US09414477B2

公开(公告)日：2016-08-09

申请号：US12540548

申请日：2009-08-13

申请人： Erik Roelof Loopstra ,  Jan Bernard Plechelmus Van Schoot ,  Gerardus Hubertus Petrus Maria Swinkels

发明人： Erik Roelof Loopstra ,  Jan Bernard Plechelmus Van Schoot ,  Gerardus Hubertus Petrus Maria Swinkels

IPC分类号： H05G2/00 ,  G03F7/20

CPC分类号： H05G2/001 ,  G03F7/70033 ,  G03F7/7085

摘要： A radiation source includes a beam generator configured to generate a radiation beam to be used to produce a radiation output of the radiation source, and a beam monitor, configured to monitor the radiation beam. A lithographic apparatus includes the radiation source. A device manufacturing method includes generating a first type of radiation by utilizing a beam of a second type of radiation, monitoring a quality of the second type of radiation, and projecting a patterned beam of the first type of radiation onto a substrate.

摘要翻译： 辐射源包括被配置为产生用于产生辐射源的辐射输出的辐射束的光束发生器，以及被配置为监视辐射束的光束监视器。 光刻设备包括辐射源。 一种器件制造方法包括通过利用第二类型的辐射束来产生第一类型的辐射，监测第二类型的辐射的质量，以及将第一类型的辐射的图案化的束投射到衬底上。

公开(公告)号：US09411250B2

公开(公告)日：2016-08-09

申请号：US13062872

申请日：2009-04-30

申请人： Vadim Yevgenyevich Banine ,  Erik Roelof Loopstra ,  Vladimir Vitalevich Ivanov ,  Vladimir Mihailovitch Krivtsun

发明人： Vadim Yevgenyevich Banine ,  Erik Roelof Loopstra ,  Vladimir Vitalevich Ivanov ,  Vladimir Mihailovitch Krivtsun

IPC分类号： G03F7/20 ,  H05G2/00

CPC分类号： G03F7/70916 ,  G03F7/70175 ,  G03F7/70858 ,  G03F7/70983 ,  H05G2/003 ,  H05G2/005

摘要： A radiation system is configured to generate a radiation beam. The radiation system includes a radiation source configured to generate a plasma that emits radiation and debris, and a radiation collector configured to direct collected radiation to a radiation beam emission aperture. A magnetic field generator is configured to generate a magnetic field with a gradient in magnetic field strength to direct the plasma away from the radiation collector.

摘要翻译： 辐射系统被配置为产生辐射束。 辐射系统包括被配置为产生发射辐射和碎屑的等离子体的辐射源，以及被配置为将收集的辐射引导到辐射束发射孔径的辐射收集器。 磁场发生器被配置为产生具有磁场强度梯度的磁场，以将等离子体引导离开辐射收集器。

公开(公告)号：US09268242B2

公开(公告)日：2016-02-23

申请号：US12869560

申请日：2010-08-26

申请人： Theodorus Petrus Maria Cadee ,  Johannes Henricus Wilhelmus Jacobs ,  Nicolaas Ten Kate ,  Erik Roelof Loopstra ,  Aschwin Lodewijk Hendricus Johannes Vermeer ,  Jeroen Johannes Sophia Maria Mertens ,  Christianus Gerardus Maria De Mol ,  Marcel Johannus Elisabeth Hubertus Muitjens ,  Antonius Johannus Van Der Net ,  Joost Jeroen Ottens ,  Johannes Anna Quaedackers ,  Mana Elisabeth Reuhman-Huisken ,  Marco Koert Stavenga ,  Patricius Aloysius Jacobus Tinnemans ,  Martinus Cornelis Maria Verhagen ,  Jacobus Johannus Leonardus Hendricus Verspay ,  Frederik Eduard De Jong ,  Koen Goorman ,  Boris Menchtchikov ,  Herman Boom ,  Stoyan Nihtianov ,  Richard Moerman ,  Martin Frans Pierre Smeets ,  Bart Leonard Peter Schoondermark ,  Franciscus Johannes Joseph Janssen ,  Michel Riepen

发明人： Theodorus Petrus Maria Cadee ,  Johannes Henricus Wilhelmus Jacobs ,  Nicolaas Ten Kate ,  Erik Roelof Loopstra ,  Aschwin Lodewijk Hendricus Johannes Vermeer ,  Jeroen Johannes Sophia Maria Mertens ,  Christianus Gerardus Maria De Mol ,  Marcel Johannus Elisabeth Hubertus Muitjens ,  Antonius Johannus Van Der Net ,  Joost Jeroen Ottens ,  Johannes Anna Quaedackers ,  Mana Elisabeth Reuhman-Huisken ,  Marco Koert Stavenga ,  Patricius Aloysius Jacobus Tinnemans ,  Martinus Cornelis Maria Verhagen ,  Jacobus Johannus Leonardus Hendricus Verspay ,  Frederik Eduard De Jong ,  Koen Goorman ,  Boris Menchtchikov ,  Herman Boom ,  Stoyan Nihtianov ,  Richard Moerman ,  Martin Frans Pierre Smeets ,  Bart Leonard Peter Schoondermark ,  Franciscus Johannes Joseph Janssen ,  Michel Riepen

IPC分类号： G03F7/20

CPC分类号： G03F7/70808 ,  G03F7/70341 ,  G03F7/70841 ,  G03F7/70875

摘要： A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and a heater.

摘要翻译： 描述了一种光刻设备，其具有液体供应系统，其被配置为至少部分地填充光刻设备的投影系统和具有液体的基板之间的空间，布置成基本上容纳该空间内的液体的阻挡构件和加热器。

公开(公告)号：US09152058B2

公开(公告)日：2015-10-06

申请号：US13194136

申请日：2011-07-29

申请人： Joeri Lof ,  Erik Theodorus Maria Bijlaart ,  Roelof Aeilko Siebrand Ritsema ,  Frank Van Schaik ,  Timotheus Franciscus Sengers ,  Klaus Simon ,  Joannes Theodoor De Smit ,  Arie Jeffrey Maria Den Boef ,  Hans Butler ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Marcus Adrianus Van De Kerkhof ,  Aleksey Yurievich Kolensnychenko ,  Mark Kroon ,  Erik Roelof Loopstra ,  Hendricus Johannes Maria Meijer ,  Jeroen Johannes Sophia Maria Mertens ,  Johannes Catharinus Hubertus Mulkens ,  Joost Jeroen Ottens ,  Alexander Straaijer ,  Bob Streefkerk ,  Helmar Van Santen

发明人： Joeri Lof ,  Erik Theodorus Maria Bijlaart ,  Roelof Aeilko Siebrand Ritsema ,  Frank Van Schaik ,  Timotheus Franciscus Sengers ,  Klaus Simon ,  Joannes Theodoor De Smit ,  Arie Jeffrey Maria Den Boef ,  Hans Butler ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Marcus Adrianus Van De Kerkhof ,  Aleksey Yurievich Kolensnychenko ,  Mark Kroon ,  Erik Roelof Loopstra ,  Hendricus Johannes Maria Meijer ,  Jeroen Johannes Sophia Maria Mertens ,  Johannes Catharinus Hubertus Mulkens ,  Joost Jeroen Ottens ,  Alexander Straaijer ,  Bob Streefkerk ,  Helmar Van Santen

IPC分类号： G03F7/20

CPC分类号： G03F7/70141 ,  G03F7/70341 ,  G03F7/7085 ,  G03F7/70883

摘要： An exposure apparatus including a movable table, a member, movably separate from the table and located on a top surface of the table, to provide a surface substantially co-planar with a top surface of an object in or on the table, a projection system configured to project a radiation beam onto a radiation-sensitive target portion of a substrate, and a liquid supply system configured to provide a liquid to a space between the projection system and the object.

摘要翻译： 一种曝光装置，包括可移动工作台，构件，可移动地与工作台分离并且位于工作台的顶表面上，以提供与桌子中或工作台上的物体的顶表面基本共面的表面;投影系统 被配置为将辐射束投射到基板的辐射敏感目标部分上，以及液体供应系统，其配置成向投影系统和物体之间的空间提供液体。

公开(公告)号：US09134632B2

公开(公告)日：2015-09-15

申请号：US13301712

申请日：2011-11-21

申请人： Marc Wilhelmus Maria Van Der Wijst ,  Hans Butler ,  Yim Bun Patrick Kwan ,  Erik Roelof Loopstra ,  Bernhard Geuppert ,  Marco Hendrikus Hermanus Oude Nijhuis ,  Rodolfo Guglielmi Rabe ,  Dick Antonius Hendrikus Laro

发明人： Marc Wilhelmus Maria Van Der Wijst ,  Hans Butler ,  Yim Bun Patrick Kwan ,  Erik Roelof Loopstra ,  Bernhard Geuppert ,  Marco Hendrikus Hermanus Oude Nijhuis ,  Rodolfo Guglielmi Rabe ,  Dick Antonius Hendrikus Laro

IPC分类号： G03F7/20

CPC分类号： G03F7/70141 ,  F16F15/022 ,  F16F15/08 ,  G03F7/708 ,  G03F7/709

摘要： Lithography apparatus and device manufacturing methods are disclosed in which means are provided for reducing the extent to which vibrations propagate between a first element of a projection system and a second element of a projection system. Approaches disclosed include the use of plural resilient members in series as part of a vibration isolation system, plural isolation frames for separately supporting first and second projection system frames, and modified connection positions for the interaction between the first and second projection system frames and the isolation frame(s).

摘要翻译： 公开了平版印刷设备和设备制造方法，其中提供了用于减少振动在投影系统的第一元件和投影系统的第二元件之间传播的程度的装置。 所公开的方法包括使用多个弹性构件串联作为隔振系统的一部分，用于分开支撑第一和第二投影系统框架的多个隔离框架以及用于第一和第二投影系统框架之间的相互作用的修改的连接位置以及隔离 框架。