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    Power-controlled, fractal laser system
    1.
    发明授权
    Power-controlled, fractal laser system 失效
    功率控制，分形激光系统

    公开(公告)号：US5729568A

    公开(公告)日：1998-03-17

    申请号：US655555

    申请日：1996-05-30

    申请人： Hans Opower ,  Helmut Huegel ,  Adolf Giesen ,  Friedrich Dausinger

    发明人： Hans Opower ,  Helmut Huegel ,  Adolf Giesen ,  Friedrich Dausinger

    IPC分类号： B23K26/06 ,  G02B6/04 ,  G02B6/42 ,  H01S5/40 ,  H01S5/42 ,  H01S3/08

    CPC分类号： B23K26/0613 ,  B23K26/032 ,  B23K26/06 ,  B23K26/0604 ,  B23K26/064 ,  B23K26/0643 ,  B23K26/0648 ,  B23K26/0665 ,  G02B6/4214 ,  G02B6/4249 ,  H01S5/4025 ,  G02B6/04 ,  H01S5/4012 ,  H01S5/42 ,  H01S5/423

    摘要： In order to improve a semiconductor laser system with a plurality of semiconductor laser units comprising a laser oscillator, laser radiation exiting from each of these units, a light-conducting fiber associated with each semiconductor laser unit, a coupling element for coupling the laser radiation exiting from the respective semiconductor laser unit into the respective light-conducting fiber, and a fiber bundle comprising the fibers as light conductor system, a total laser radiation formed by the sum of the coherent laser radiation generated by the respective semiconductor laser units exiting from one end of the fiber bundle, this total laser radiation illuminating a target surface on an object to be irradiated during laser activity of all the semiconductor laser units, such that complex irradiation tasks can be performed with this system in a simple and as effective a manner as possible it is suggested that a control be provided for controlling the power of each individual semiconductor laser unit in a defined manner, and that an irradiation of different surface elements of the target surface with an intensity individually definable for each surface element be specifiable to the control.

    摘要翻译： 为了改进具有包括激光振荡器的多个半导体激光器单元的半导体激光器系统，从这些单元中的每一个排出的激光辐射，与每个半导体激光器单元相关联的导光纤维，用于耦合离开的激光辐射的耦合元件 从相应的半导体激光单元到相应的导光纤维，以及包含作为光导体系统的光纤的光纤束，由从一端离开的各个半导体激光器单元产生的相干激光辐射之和形成的总激光辐射 的全部激光辐射照射在所有半导体激光器单元的激光活动期间要照射的物体上的目标表面，使得可以以该系统以简单且有效的方式执行复杂的照射任务 建议提供用于控制每个单独半导体的功率的控制 以定义的方式对激光单元进行激光照射，并且可以将具有对于每个表面元件分别定义的强度的目标表面的不同表面元件的照射指定为该控制。

    Laser beam surface treatment process for materials of large reflectivity
    2.
    发明授权
    Laser beam surface treatment process for materials of large reflectivity 失效
    激光束表面处理工艺的材料具有较大的反射率

    公开(公告)号：US4414038A

    公开(公告)日：1983-11-08

    申请号：US396138

    申请日：1982-07-07

    申请人： Friedrich Dausinger ,  Werner Muller ,  Peter Arnold

    发明人： Friedrich Dausinger ,  Werner Muller ,  Peter Arnold

    IPC分类号： B23K26/00 ,  B23K26/18 ,  C21D1/09

    CPC分类号： C21D1/09 ,  B23K26/18 ,  B23K2203/04

    摘要： Directing a laser beam at a surface to be treated, such as a metallic surface which is likely to reflect much of the energy, results in a high proportion of absorbed energy if the laser beam has an oblique incidence, particularly if the laser beam is polarized in a direction parallel to the plane of incidence (defined as the plane which contains the axis of the laser beam and the perpendicular to the surface at the center of the spot of incidence). In the case of iron and steel surfaces the absorbtion is markedly increased at angles of incidence greater than 45.degree. and just short of glancing incidence, with a maximum near 80.degree..

    摘要翻译： 将激光束定向在待处理的表面，例如可能反射很多能量的金属表面，如果激光束具有倾斜入射，则导致高比例的吸收能量，特别是如果激光束是偏振的 在平行于入射平面的方向（被定义为包含激光束轴线的平面和与入射点中心处的表面垂直）的方向上。 在钢铁表面的情况下，吸收率大于45°的入射角显着增加，并且短时间内出现短暂的发光，最大接近80°。