利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

22 条记录 (耗时 0.045 秒)

    Tool of a surface-coated boron nitride sintered compact
    3.
    发明授权
    Tool of a surface-coated boron nitride sintered compact 有权
    表面涂覆氮化硼烧结体的工具

    公开(公告)号：US06623850B2

    公开(公告)日：2003-09-23

    申请号：US09943840

    申请日：2001-08-27

    申请人： Satoru Kukino ,  Michiko Ota ,  Hisanori Ohara ,  Haruyo Fukui

    发明人： Satoru Kukino ,  Michiko Ota ,  Hisanori Ohara ,  Haruyo Fukui

    IPC分类号： B32G900

    CPC分类号： C23C14/0015 ,  C04B41/009 ,  C04B41/52 ,  C04B41/89 ,  C23C14/025 ,  C23C14/0641 ,  C23C30/005 ,  Y10T428/24975 ,  Y10T428/265 ,  C04B41/4529 ,  C04B41/5133 ,  C04B41/5062 ,  C04B41/5068 ,  C04B41/522 ,  C04B35/5831

    摘要： In a surface-coated boron nitride sintered compact tool, at least a part of the tool edge related with cutting is based on a substrate of a high pressure phase type boron nitride, and a surface-coated layer is provided on the surface thereof. The surface-coated layer includes an intermediate layer present in a continuous manner at the interface of the high pressure phase boron nitride sintered compact substrate, and further includes a hard coated layer formed thereon. The intermediate layer consists of at least one element selected from the Groups 4a, 5a and 6a of the Periodic Table, and has a mean thickness of 0.005 to 0.05 &mgr;m. Thereby, a markedly improved adhesive strength of the hard coated layer on the substrate is achieved.

    摘要翻译： 在表面涂覆的氮化硼烧结压实工具中，与切割相关的刀具边缘的至少一部分是基于高压相型氮化硼的基底，并且在其表面上设置表面涂层。 表面被覆层包括在高压相氮化硼烧结体基板的界面处连续地存在的中间层，并且还包括形成在其上的硬涂层。 中间层由选自周期表第4a，5a和6a族的至少一种元素组成，平均厚度为0.005至0.05μm。 由此，实现了基板上的硬涂层的显着改善的粘合强度。

    Tool of a surface-coated boron nitride sintered compact
    4.
    发明授权
    Tool of a surface-coated boron nitride sintered compact 有权
    表面涂覆氮化硼烧结体的工具

    公开(公告)号：US06620491B2

    公开(公告)日：2003-09-16

    申请号：US09940338

    申请日：2001-08-27

    申请人： Satoru Kukino ,  Michiko Ota ,  Hisanori Ohara ,  Haruyo Fukui

    发明人： Satoru Kukino ,  Michiko Ota ,  Hisanori Ohara ,  Haruyo Fukui

    IPC分类号： B32B900

    CPC分类号： C04B41/009 ,  C04B41/52 ,  C04B41/89 ,  C23C14/024 ,  Y10T428/24917 ,  Y10T428/24975 ,  Y10T428/265 ,  C04B41/4529 ,  C04B41/4572 ,  C04B41/5133 ,  C04B41/5062 ,  C04B41/5068 ,  C04B41/522 ,  C04B35/5831

    摘要： In a surface-coated boron nitride sintered compact tool, at least a part of the tool edge related with cutting is based on a substrate of a high pressure phase type boron nitride, and a surface-coated layer is provided on the surface thereof. The surface-coated layer includes an intermediate layer present in a discontinuous manner or in the form of dispersed particles at the interface of the high pressure phase boron nitride sintered compact substrate, and further includes a hard coated layer formed thereon. The intermediate layer consists of at least one element selected from the Groups 4a, 5a and 6a of the Periodic Table, and has a thickness of at most 1 &mgr;m, or has a proportion of 1 to 20 vol % of particles with a particle diameter of 0.1 to less than 0.5 &mgr;m and at most 5 vol. % of particles with a particle diameter of at least 0.5 &mgr;m. Thereby, a markedly improved adhesive strength of the hard coated layer on the substrate is achieved.

    摘要翻译： 在表面涂覆的氮化硼烧结压实工具中，与切割相关的刀具边缘的至少一部分是基于高压相型氮化硼的基底，并且在其表面上设置表面涂层。 表面被覆层包括在高压相氮化硼烧结体基板的界面处以不连续的方式或以分散粒子的形式存在的中间层，并且还包括形成在其上的硬涂层。 中间层由选自周期表第4a，5a和6a族的至少一种元素组成，并且具有至多1um的厚度，或者具有1至20vol％的粒径为 0.1至小于0.5μm和至多5vol。 ％粒径至少为0.5μm的颗粒。 由此，实现了基板上的硬涂层的显着改善的粘合强度。

    Amorphous carbon film, process for producing the same and amorphous carbon film-coated material
    7.
    发明申请
    Amorphous carbon film, process for producing the same and amorphous carbon film-coated material 有权
    无定形碳膜，其制造方法和无定形碳膜涂覆材料

    公开(公告)号：US20060246290A1

    公开(公告)日：2006-11-02

    申请号：US10539649

    申请日：2003-02-26

    申请人： Kazuhiko Oda ,  Yoshiharu Utsumi ,  Hisanori Ohara

    发明人： Kazuhiko Oda ,  Yoshiharu Utsumi ,  Hisanori Ohara

    IPC分类号： C23C8/00 ,  B32B9/00

    CPC分类号： C23C14/024 ,  C23C14/0605 ,  Y10T428/24942 ,  Y10T428/24983 ,  Y10T428/265 ,  Y10T428/30

    摘要： An amorphous carbon film is provided with a density of 2.8-3.3 g/cm3. It would be preferable for the film to have: a spin density of 1×1018-1×1021 spins/cm3; a carbon concentration of at least 99.5 atomic percentage; a hydrogen concentration of no more than 0.5 atomic percentage; an inert gas element concentration of no more than 0.5 atomic percentage; and a Knoop hardness of 3000-7000. A mixed layer with a thickness of at least 0.5 nm and no more than 10 nm is formed from a parent material and at least material selected from: B, Al, Ti, V, Cr, Zr, Nb, Mo, Hf, Ta, and W. An amorphous carbon film is disposed on the mixed layer or a metallic intermediate layer formed on the mixed layer, thereby increasing adhesion. This amorphous carbon film is formed with solid carbon using sputtering, cathode-arc ion plating, or laser abrasion.

    摘要翻译： 无定形碳膜的密度为2.8-3.3g / cm 3。 优选的是，该膜具有：自旋密度为1×10 18 -1×10 21个/厘米3以上的自旋密度。 至少99.5原子百分比的碳浓度; 氢浓度不超过0.5原子百分比; 惰性气体元素浓度不超过0.5原子百分比; 诺克硬度3000-7000。 从母材和至少选自B，Al，Ti，V，Cr，Zr，Nb，Mo，Hf，Ta等的材料形成厚度为至少0.5nm且不大于10nm的混合层， 在混合层或形成在混合层上的金属中间层上配置无定形碳膜，由此增加粘合力。 该非晶碳膜通过溅射，阴极电弧离子电镀或激光磨损形成固体碳。

    Amorphous carbon film, process for producing the same and amorphous carbon film-coated material
    9.
    发明授权
    Amorphous carbon film, process for producing the same and amorphous carbon film-coated material 有权
    无定形碳膜，其制造方法和无定形碳膜涂覆材料

    公开(公告)号：US07416786B2

    公开(公告)日：2008-08-26

    申请号：US10539649

    申请日：2003-02-26

    申请人： Kazuhiko Oda ,  Yoshiharu Utsumi ,  Hisanori Ohara

    发明人： Kazuhiko Oda ,  Yoshiharu Utsumi ,  Hisanori Ohara

    IPC分类号： B32B9/00

    CPC分类号： C23C14/024 ,  C23C14/0605 ,  Y10T428/24942 ,  Y10T428/24983 ,  Y10T428/265 ,  Y10T428/30

    摘要： An amorphous carbon film is provided with a density of 2.8-3.3 g/cm3. It would be preferable for the film to have: a spin density of 1×1018-1×1021 spins/cm3; a carbon concentration of at least 99.5 atomic percentage; a hydrogen concentration of no more than 0.5 atomic percentage; an inert gas element concentration of no more than 0.5 atomic percentage; and a Knoop hardness of 3000-7000. A mixed layer with a thickness of at least 0.5 nm and no more than 10 nm is formed from a parent material and at least material selected from: B, Al, Ti, V, Cr, Zr, Nb, Mo, Hf, Ta, and W. An amorphous carbon film is disposed on the mixed layer or a metallic intermediate layer formed on the mixed layer, thereby increasing adhesion. This amorphous carbon film is formed with solid carbon using sputtering, cathode-arc ion plating, or laser abrasion.

    摘要翻译： 无定形碳膜的密度为2.8-3.3g / cm 3。 优选的是，该膜具有：自旋密度为1×10 18 -1×10 21个/厘米3以上的自旋密度。 至少99.5原子百分比的碳浓度; 氢浓度不超过0.5原子百分比; 惰性气体元素浓度不超过0.5原子百分比; 诺克硬度3000-7000。 从母材和至少选自B，Al，Ti，V，Cr，Zr，Nb，Mo，Hf，Ta等的材料形成厚度为至少0.5nm且不大于10nm的混合层， 在混合层或形成在混合层上的金属中间层上配置无定形碳膜，由此增加粘合力。 该非晶碳膜通过溅射，阴极电弧离子电镀或激光磨损形成固体碳。