公开(公告)号：US20110024651A1

公开(公告)日：2011-02-03

申请号：US12741978

申请日：2008-11-07

申请人： Hendrikus Gijsbertus Schimmel ,  Tjarko Adriaan Rudolf Van Empel ,  Gerardus Hubertus Petrus Maria Swinkels ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Dzmitry Labetski

发明人： Hendrikus Gijsbertus Schimmel ,  Tjarko Adriaan Rudolf Van Empel ,  Gerardus Hubertus Petrus Maria Swinkels ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Dzmitry Labetski

IPC分类号： H05G2/00 ,  G21K5/04 ,  G02B5/26 ,  G02B5/18

CPC分类号： G03F7/70916 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70175 ,  G03F7/70575 ,  G03F7/70983 ,  G21K1/10 ,  G21K2201/061 ,  H05G2/003

摘要： A radiation system configured to generate a radiation beam, the radiation system including a chamber including: a radiation source configured to generate radiation; a radiation beam emission aperture; a radiation collector configured to collect radiation generated by the source, and to transmit the collected radiation to the radiation beam emission aperture; and a spectral purity filter configured to enhance a spectral purity of the radiation to be emitted via the aperture, wherein the spectral purity filter is configured to divide the chamber into a high pressure region and a low pressure region.

摘要翻译： 一种被配置为产生辐射束的辐射系统，所述辐射系统包括腔室，所述腔室包括：被配置为产生辐射的辐射源; 辐射束发射孔; 辐射收集器，被配置为收集由源产生的辐射，并将收集的辐射传送到辐射束发射孔; 以及光谱纯度滤光器，其被配置为增强经由所述孔发射的辐射的光谱纯度，其中所述光谱纯度滤光器被配置为将所述室分成高压区域和低压区域。

公开(公告)号：US08901521B2

公开(公告)日：2014-12-02

申请号：US12197693

申请日：2008-08-25

申请人： Tjarko Adriaan Rudolf Van Empel ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevich Ivanov ,  Erik Roelof Loopstra ,  Johannes Hubertus Josephina Moors ,  Jan Bernard Plechelmus Van Schoot ,  Yuri Johannes Gabriël Van De Vijver ,  Gerardus Hubertus Petrus Maria Swinkels ,  Hendrikus Gijsbertus Schimmel ,  Dzmitry Labetski

发明人： Tjarko Adriaan Rudolf Van Empel ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevich Ivanov ,  Erik Roelof Loopstra ,  Johannes Hubertus Josephina Moors ,  Jan Bernard Plechelmus Van Schoot ,  Yuri Johannes Gabriël Van De Vijver ,  Gerardus Hubertus Petrus Maria Swinkels ,  Hendrikus Gijsbertus Schimmel ,  Dzmitry Labetski

IPC分类号： G01J3/10 ,  G03F7/20 ,  H05G2/00

CPC分类号： H05G2/008 ,  G03F7/70175 ,  G03F7/70891 ,  G03F7/70916 ,  G03F7/70983 ,  H05G2/003 ,  H05G2/006 ,  H05K7/2039

摘要： A module for producing extreme ultraviolet radiation includes a supply configured to supply droplets of an ignition material to a predetermined target ignition position and a laser arranged to be focused on the predetermined target ignition position and to produce a plasma by hitting such a droplet which is located at the predetermined target ignition position in order to change the droplet into an extreme ultraviolet producing plasma. Also, the module includes a collector mirror having a mirror surface constructed and arranged to reflect the radiation in order to focus the radiation on a focal point. A fluid supply is constructed and arranged to form a gas flow flowing away from the mirror surface in a direction transverse with respect to the mirror surface in order to mitigate particle debris produced by the plasma.

摘要翻译： 用于产生极紫外线辐射的模块包括被配置为将点火材料的液滴供应到预定的目标点火位置的电源和布置成聚焦在预定的目标点火位置上的激光器，并且通过击打位于 在预定的目标点火位置，以便将液滴变成极紫外线产生等离子体。 此外，模块包括收集器反射镜，其具有构造和布置成反射辐射的镜面，以便将辐射聚焦在焦点上。 流体供应器被构造和布置成在相对于镜面横向的方向上形成从镜面流出的气流，以便减轻由等离子体产生的颗粒碎片。

公开(公告)号：US08115900B2

公开(公告)日：2012-02-14

申请号：US11898933

申请日：2007-09-17

申请人： Yuri Johannes Gabriël Van De Vijver ,  Jan Bernard Plechelmus Van Schoot ,  Gerardus Hubertus Petrus Maria Swinkels ,  Hendrikus Gijsbertus Schimmel ,  Dzmitry Labetski ,  Tjarko Adriaan Rudolf Van Empel

发明人： Yuri Johannes Gabriël Van De Vijver ,  Jan Bernard Plechelmus Van Schoot ,  Gerardus Hubertus Petrus Maria Swinkels ,  Hendrikus Gijsbertus Schimmel ,  Dzmitry Labetski ,  Tjarko Adriaan Rudolf Van Empel

IPC分类号： G03B27/52

CPC分类号： G03F7/70033 ,  B82Y10/00 ,  G03F7/70841 ,  G03F7/70908 ,  G03F7/70916 ,  G03F7/70933 ,  H05G2/003 ,  H05G2/008

摘要： A lithographic apparatus is arranged to project a pattern from a patterning device onto a substrate is disclosed. The lithographic apparatus includes an illumination system and an outlet connected to a pumping system to pump away gas from between an inner wall and outer wall of the illumination system or, if a radiation source is present, between the inner wall of the illumination system and an inner wall of the radiation source.

摘要翻译： 公开了一种光刻设备，用于将图案从图案形成装置突出到衬底上。 光刻设备包括照明系统和连接到泵送系统的出口，以从照明系统的内壁和外壁之间泵送气体，或者如果存在辐射源，则在照明系统的内壁和 辐射源的内壁。

公开(公告)号：US20090073396A1

公开(公告)日：2009-03-19

申请号：US11898933

申请日：2007-09-17

申请人： Yuri Johannes Gabriel Van De Vijver ,  Tjarko Adriaan Rudolf Van Empel ,  Jan Bernard Plechelmus Van Schoot ,  Gerardus Hubertus Petrus Maria Swinkels ,  Hendrikus Gijsbertus Schimmel ,  Dzmitry Labetski

发明人： Yuri Johannes Gabriel Van De Vijver ,  Tjarko Adriaan Rudolf Van Empel ,  Jan Bernard Plechelmus Van Schoot ,  Gerardus Hubertus Petrus Maria Swinkels ,  Hendrikus Gijsbertus Schimmel ,  Dzmitry Labetski

IPC分类号： G03B27/52

CPC分类号： G03F7/70033 ,  B82Y10/00 ,  G03F7/70841 ,  G03F7/70908 ,  G03F7/70916 ,  G03F7/70933 ,  H05G2/003 ,  H05G2/008

摘要： A lithographic apparatus is arranged to project a pattern from a patterning device onto a substrate is disclosed. The lithographic apparatus includes an illumination system and an outlet connected to a pumping system to pump away gas from between an inner wall and outer wall of the illumination system or, if a radiation source is present, between the inner wall of the illumination system and an inner wall of the radiation source.

摘要翻译： 公开了一种光刻设备，用于将图案从图案形成装置突出到衬底上。 光刻设备包括照明系统和连接到泵送系统的出口，以从照明系统的内壁和外壁之间泵送气体，或者如果存在辐射源，则在照明系统的内壁和 辐射源的内壁。

公开(公告)号：US08711325B2

公开(公告)日：2014-04-29

申请号：US12742009

申请日：2008-11-06

申请人： Hendrikus Gijsbertus Schimmel ,  Tjarko Adriaan Rudolf Van Empel ,  Hans Johannes Maria Freriks ,  Yuri Johannes Gabriël Van De Vijver ,  Gerardus Hubertus Petrus Maria Swinkels ,  Marc Antonius Maria Haast ,  Wendelin Johanna Maria Versteeg ,  Peter Gerardus Jonkers ,  Dzmitry Labetski

发明人： Hendrikus Gijsbertus Schimmel ,  Tjarko Adriaan Rudolf Van Empel ,  Hans Johannes Maria Freriks ,  Yuri Johannes Gabriël Van De Vijver ,  Gerardus Hubertus Petrus Maria Swinkels ,  Marc Antonius Maria Haast ,  Wendelin Johanna Maria Versteeg ,  Peter Gerardus Jonkers ,  Dzmitry Labetski

IPC分类号： G03B27/52

CPC分类号： G03F7/70916 ,  G03F7/70841 ,  G03F7/70908

摘要： The invention relates to a method for determining a suppression factor of a suppression system. The suppression system is arranged to suppress migration of a contaminant gas out of a first system. The suppression factor is an indication of the performance of the suppression system. The method includes introducing a tracer gas in the sub-system, providing a detection system configured to detect the amount of tracer gas that has migrated out of the first system, determining a first suppression factor for the suppression system for the tracer gas. The method further includes determining a second suppression factor for the suppression system for the contaminant gas based on the first suppression factor.

摘要翻译： 本发明涉及一种确定抑制系统抑制因子的方法。 抑制系统被布置成抑制污染气体从第一系统中的迁移。 抑制因子表示抑制系统的性能。 该方法包括在子系统中引入示踪气体，提供检测系统，其被配置为检测已经从第一系统迁出的示踪气体的量，确定示踪气体的抑制系统的第一抑制因子。 该方法还包括基于第一抑制因子确定用于污染气体的抑制系统的第二抑制因子。

公开(公告)号：US20110261329A1

公开(公告)日：2011-10-27

申请号：US12742009

申请日：2008-11-06

申请人： Hendrikus Gijsbertus Schimmel ,  Tjarko Adriaan Rudolf Van Empel ,  Hans Johannes Maria Freriks ,  Yuri Johannes Gabriël Van De Vijver ,  Gerardus Hubertus Petrus Maria Swinkels ,  Marc Antonius Maria Haast ,  Wendelin Johanna Maria Versteeg ,  Peter Gerardus Jonkers ,  Dzmitry Labetski

发明人： Hendrikus Gijsbertus Schimmel ,  Tjarko Adriaan Rudolf Van Empel ,  Hans Johannes Maria Freriks ,  Yuri Johannes Gabriël Van De Vijver ,  Gerardus Hubertus Petrus Maria Swinkels ,  Marc Antonius Maria Haast ,  Wendelin Johanna Maria Versteeg ,  Peter Gerardus Jonkers ,  Dzmitry Labetski

IPC分类号： G01M3/04 ,  G03B27/52

CPC分类号： G03F7/70916 ,  G03F7/70841 ,  G03F7/70908

摘要： The invention relates to a method for determining a suppression factor of a suppression system. The suppression system is arranged to suppress migration of a contaminant gas out of a first system. The suppression factor is an indication of the performance of the suppression system. The method includes introducing a tracer gas in the sub-system, providing a detection system configured to detect the amount of tracer gas that has migrated out of the first system, determining a first suppression factor for the suppression system for the tracer gas. The method further includes determining a second suppression factor for the suppression system for the contaminant gas based on the first suppression factor.

摘要翻译： 本发明涉及一种确定抑制系统抑制因子的方法。 抑制系统被布置成抑制污染气体从第一系统中的迁移。 抑制因子表示抑制系统的性能。 该方法包括在子系统中引入示踪气体，提供检测系统，其被配置为检测已经从第一系统迁出的示踪气体的量，确定示踪气体的抑制系统的第一抑制因子。 该方法还包括基于第一抑制因子确定用于污染气体的抑制系统的第二抑制因子。

公开(公告)号：US20090090877A1

公开(公告)日：2009-04-09

申请号：US12197693

申请日：2008-08-25

申请人： Tjarko Adriaan Rudolf Van Empel ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevich Ivanov ,  Erik Roelof Loopstra ,  Johannes Hubertus Josephina Moors ,  Jan Bernard Plechelmus Van Schoot ,  Yuri Johannes Gabriel Van De Vijver ,  Gerardus Hubertus Petrus Maria Swinkels ,  Hendrikus Gijsbertus Schimmel ,  Dzmitry Labetski

发明人： Tjarko Adriaan Rudolf Van Empel ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevich Ivanov ,  Erik Roelof Loopstra ,  Johannes Hubertus Josephina Moors ,  Jan Bernard Plechelmus Van Schoot ,  Yuri Johannes Gabriel Van De Vijver ,  Gerardus Hubertus Petrus Maria Swinkels ,  Hendrikus Gijsbertus Schimmel ,  Dzmitry Labetski

IPC分类号： G01J3/10 ,  G03B27/54

CPC分类号： H05G2/008 ,  G03F7/70175 ,  G03F7/70891 ,  G03F7/70916 ,  G03F7/70983 ,  H05G2/003 ,  H05G2/006 ,  H05K7/2039

摘要： A module for producing extreme ultraviolet radiation includes a supply configured to supply droplets of an ignition material to a predetermined target ignition position and a laser arranged to be focused on the predetermined target ignition position and to produce a plasma by hitting such a droplet which is located at the predetermined target ignition position in order to change the droplet into an extreme ultraviolet producing plasma. Also, the module includes a collector mirror having a mirror surface constructed and arranged to reflect the radiation in order to focus the radiation on a focal point. A fluid supply is constructed and arranged to form a gas flow flowing away from the mirror surface in a direction transverse with respect to the mirror surface in order to mitigate particle debris produced by the plasma.

摘要翻译： 用于产生极紫外线辐射的模块包括被配置为将点火材料的液滴供应到预定的目标点火位置的电源和布置成聚焦在预定的目标点火位置上的激光器，并且通过击打位于 在预定的目标点火位置，以便将液滴变成极紫外线产生等离子体。 此外，模块包括收集器反射镜，其具有构造和布置成反射辐射的镜面，以便将辐射聚焦在焦点上。 流体供应器被构造和布置成在相对于镜面横向的方向上形成从镜面流出的气流，以便减轻由等离子体产生的颗粒碎片。

公开(公告)号：US08749756B2

公开(公告)日：2014-06-10

申请号：US13361545

申请日：2012-01-30

申请人： Yuri Johannes Gabrial Van De Vijver ,  Jan Bernard Plechelmus Van Schoot ,  Gerardus Hubertus Petrus Maria Swinkels ,  Hendrikus Gijsbertus Schimmel ,  Dzmitry Labetski ,  Tjarko Adriaan Rudolf Van Empel

发明人： Yuri Johannes Gabrial Van De Vijver ,  Jan Bernard Plechelmus Van Schoot ,  Gerardus Hubertus Petrus Maria Swinkels ,  Hendrikus Gijsbertus Schimmel ,  Dzmitry Labetski ,  Tjarko Adriaan Rudolf Van Empel

IPC分类号： G03B27/52 ,  H05G2/00 ,  G03F7/20

CPC分类号： G03F7/70033 ,  B82Y10/00 ,  G03F7/70841 ,  G03F7/70908 ,  G03F7/70916 ,  G03F7/70933 ,  H05G2/003 ,  H05G2/008

摘要： A lithographic apparatus is arranged to project a pattern from a patterning device onto a substrate is disclosed. The lithographic apparatus includes an illumination system and an outlet connected to a pumping system to pump away gas from between an inner wall and outer wall of the illumination system or, if a radiation source is present, between the inner wall of the illumination system and an inner wall of the radiation source.

摘要翻译： 公开了一种光刻设备，用于将图案从图案形成装置突出到衬底上。 光刻设备包括照明系统和连接到泵送系统的出口，以从照明系统的内壁和外壁之间泵送气体，或者如果存在辐射源，则在照明系统的内壁和 辐射源的内壁。

公开(公告)号：US07397538B2

公开(公告)日：2008-07-08

申请号：US11602475

申请日：2006-11-21

申请人： Wilhelmus Josephus Box ,  Derk Jan Wilfred Klunder ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Niels Machiel Driessen ,  Hendrikus Gijsbertus Schimmel

发明人： Wilhelmus Josephus Box ,  Derk Jan Wilfred Klunder ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Niels Machiel Driessen ,  Hendrikus Gijsbertus Schimmel

IPC分类号： G03B27/54 ,  G03B27/42 ,  G21G5/00

CPC分类号： G03F7/70916 ,  G03F7/70858

摘要： The invention relates to a radiation system for generating a beam of radiation. The radiation system includes an extreme ultraviolet source constructed and arranged to generate extreme ultraviolet radiation, a contamination barrier constructed and arranged to trap contamination from the radiation source, and a temperature sensor constructed and arranged to sense a temperature of the contamination barrier.

摘要翻译： 本发明涉及一种用于产生辐射束的辐射系统。 辐射系统包括构造和布置成产生极紫外辐射的极紫外光源，被构造和布置以捕获来自辐射源的污染物的污染屏障，以及构造和布置成感测污染屏障的温度的温度传感器。

公开(公告)号：US09310689B2

公开(公告)日：2016-04-12

申请号：US14241378

申请日：2012-07-31

申请人： Hendrikus Gijsbertus Schimmel ,  Johan Frederik Dijksman ,  Dzmitry Labetski

发明人： Hendrikus Gijsbertus Schimmel ,  Johan Frederik Dijksman ,  Dzmitry Labetski

IPC分类号： G03F7/20 ,  H05G2/00

CPC分类号： G03F7/70033 ,  H05G2/003 ,  H05G2/005 ,  H05G2/006

摘要： Methods and apparatus are provided for promoting the coalescence of fuel droplets in a stream generated by a radiation source droplet stream generator for use in lithographic apparatus. Various examples are described in which a modulating voltage source is applied to the emitter so that the electrical characteristics of the droplets may be controlled. This results in acceleration and deceleration of droplets in the stream which causes them to merge and promotes coalescence.

摘要翻译： 提供了用于促进由用于光刻设备的辐射源液滴发生器产生的流中的燃料液滴聚结的方法和装置。 描述了各种示例，其中将调制电压源施加到发射器，使得可以控制液滴的电特性。 这导致流中液滴的加速和减速，这导致它们合并并促进聚结。