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公开(公告)号：US20130277554A1
公开(公告)日：2013-10-24
申请号：US13848854
申请日：2013-03-22
发明人： Weiming Ren , Xiaoli Guo , Xuedong Liu , Zhongwei Chen
IPC分类号： H01J37/26
CPC分类号： H01J37/261 , H01J37/04 , H01J37/28 , H01J2237/0475 , H01J2237/0492 , H01J2237/1538 , H01J2237/2449
摘要： The present invention provides a charged particle beam apparatus which employs LVSEM to inspect sample surface with a throughput much higher than the prior art. The high throughput is realized by providing a probe current and a FOV both several times of those of the prior art. Accordingly several means are proposed to avoid obvious degradation of image resolution due to the increases in Coulomb effect and geometric aberrations, and increase efficiency and uniformity of secondary charged particle collection.
摘要翻译： 本发明提供了一种带电粒子束装置，其使用LVSEM来检查样品表面，其生产量远高于现有技术。 通过提供几倍于现有技术的探针电流和FOV来实现高通量。 因此，提出了几种方法来避免由于库仑效应和几何像差的增加而引起的图像分辨率的明显降低，并且提高了二次带电粒子收集的效率和均匀性。
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公开(公告)号：US09177758B2
公开(公告)日：2015-11-03
申请号：US14564921
申请日：2014-12-09
发明人： Zhongwei Chen , Jack Jau , Weiming Ren , Chiyan Kuan , Yixiang Wang , Xiaoli Guo , Feng Cao
CPC分类号： H01J37/261 , H01J37/226 , H01J37/244 , H01J37/28 , H01J2237/063 , H01J2237/10 , H01J2237/24475 , H01J2237/24495 , H01J2237/24528 , H01J2237/2801 , H01J2237/2804 , H01J2237/2806 , H01J2237/2814
摘要： The present invention provides a dual-beam apparatus which employs the dark-field e-beam inspection method to inspect small particles on a surface of a sample such as wafer and mask with high throughput. The dual beam apparatus comprises two single-beam dark-field units placed in a same vacuum chamber and in two different orientations. The two single-beam dark-field units can perform the particle inspection separately or almost simultaneously by means of the alternately-scanning way. The invention also proposes a triple-beam apparatus for both inspecting and reviewing particles on a sample surface within the same vacuum chamber. The triple-beam apparatus comprises one foregoing dual-beam apparatus performing the particle inspection and one high-resolution SEM performing the particle review.
摘要翻译： 本发明提供一种双光束装置，其采用暗场电子束检查方法以高生产量检查诸如晶片和掩模的样品表面上的小颗粒。 双光束装置包括放置在相同真空室中并具有两个不同取向的两个单光束暗场单元。 两个单光束暗场单元可以通过交替扫描方式分别或几乎同时进行粒子检测。 本发明还提出了一种用于检查和检查在相同真空室内的样品表面上的颗粒的三光束装置。 三光束装置包括执行颗粒检查的一个前述双光束装置和执行颗粒检查的一个高分辨率SEM。
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公开(公告)号：US08618480B2
公开(公告)日：2013-12-31
申请号：US13848854
申请日：2013-03-22
发明人： Weiming Ren , Xiaoli Guo , Xuedong Liu , Zhongwei Chen
IPC分类号： H01J37/26 , H01J37/28 , H01J37/141
CPC分类号： H01J37/261 , H01J37/04 , H01J37/28 , H01J2237/0475 , H01J2237/0492 , H01J2237/1538 , H01J2237/2449
摘要： The present invention provides a charged particle beam apparatus which employs LVSEM to inspect sample surface with a throughput much higher than the prior art. The high throughput is realized by providing a probe current and a FOV both several times of those of the prior art. Accordingly several means are proposed to avoid obvious degradation of image resolution due to the increases in Coulomb effect and geometric aberrations, and increase efficiency and uniformity of secondary charged particle collection.
摘要翻译： 本发明提供了一种带电粒子束装置，其使用LVSEM来检查样品表面，其生产量远高于现有技术。 通过提供几倍于现有技术的探针电流和FOV来实现高通量。 因此，提出了几种方法来避免由于库仑效应和几何像差的增加而引起的图像分辨率的明显降低，并且提高了二次带电粒子收集的效率和均匀性。
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公开(公告)号：US20150144788A1
公开(公告)日：2015-05-28
申请号：US14564921
申请日：2014-12-09
发明人： Zhongwei Chen , Jack Jau , Weiming Ren , Chiyan Kuan , Yixiang Wang , Xiaoli Guo , Feng Cao
CPC分类号： H01J37/261 , H01J37/226 , H01J37/244 , H01J37/28 , H01J2237/063 , H01J2237/10 , H01J2237/24475 , H01J2237/24495 , H01J2237/24528 , H01J2237/2801 , H01J2237/2804 , H01J2237/2806 , H01J2237/2814
摘要： The present invention provides a dual-beam apparatus which employs the dark-field e-beam inspection method to inspect small particles on a surface of a sample such as wafer and mask with high throughput. The dual beam apparatus comprises two single-beam dark-field units placed in a same vacuum chamber and in two different orientations. The two single-beam dark-field units can perform the particle inspection separately or almost simultaneously by means of the alternately-scanning way. The invention also proposes a triple-beam apparatus for both inspecting and reviewing particles on a sample surface within the same vacuum chamber. The triple-beam apparatus comprises one foregoing dual-beam apparatus performing the particle inspection and one high-resolution SEM performing the particle review.
摘要翻译： 本发明提供一种双光束装置，其采用暗场电子束检查方法以高生产量检查诸如晶片和掩模的样品表面上的小颗粒。 双光束装置包括放置在相同真空室中并具有两个不同取向的两个单光束暗场单元。 两个单光束暗场单元可以通过交替扫描方式分别或几乎同时进行粒子检测。 本发明还提出了一种用于检查和检查在相同真空室内的样品表面上的颗粒的三光束装置。 三光束装置包括执行颗粒检查的一个前述双光束装置和执行颗粒检查的一个高分辨率SEM。
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