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    Robot arm with impact absorption structure
    3.
    发明申请
    Robot arm with impact absorption structure 审中-公开
    机械臂具有冲击吸收结构

    公开(公告)号：US20050103147A1

    公开(公告)日：2005-05-19

    申请号：US10954569

    申请日：2004-09-30

    申请人： Dai Lee ,  Jung Suh ,  Chang Lee ,  Tae Lim ,  Woo Chin ,  Hak Lee ,  Hui Hwang ,  Seung Lee ,  Byung Kim

    发明人： Dai Lee ,  Jung Suh ,  Chang Lee ,  Tae Lim ,  Woo Chin ,  Hak Lee ,  Hui Hwang ,  Seung Lee ,  Byung Kim

    IPC分类号： B25J18/06 ,  B25J18/00 ,  B25J19/00 ,  F16F7/00 ,  F16F7/12 ,  E02F3/00

    CPC分类号： F16F7/12 ,  B25J19/0091 ,  Y10T74/20305

    摘要： A robot arm has an impact absorption structure for absorbing impact energy caused by a collision to protect a person from injury and the robot arm from being damaged. The robot arm includes a plurality of rigid beams provided at both end portions thereof to define a frame of the robot arm, and side members made of an elastic material and provided between the plurality of rigid beams to define an appearance of the robot arm and absorb the impact energy. Each side member includes a sheet made of a plastic material, a foam or honeycomb structure, and a fiber reinforced composite material attached to the sheet.

    摘要翻译： 机器人臂具有用于吸收由碰撞引起的冲击能量的冲击吸收结构，以保护人免受伤害并且机器人手臂不被损坏。 机器人臂包括设置在其两个端部处的多个刚性梁，以限定机器人臂的框架，以及由弹性材料制成并设置在多个刚性梁之间的侧构件，以限定机器人手臂的外观并吸收 冲击能量。 每个侧构件包括由塑料材料，泡沫或蜂窝结构体制成的片材和附着到片材的纤维增强复合材料。

    Method and apparatus for producing microchannel plate using corrugated mold
    4.
    发明申请
    Method and apparatus for producing microchannel plate using corrugated mold 审中-公开
    用波纹模制造微通道板的方法和装置

    公开(公告)号：US20050136178A1

    公开(公告)日：2005-06-23

    申请号：US10741762

    申请日：2003-12-18

    申请人： Dai Lee ,  Po Kim ,  Hak Lee

    发明人： Dai Lee ,  Po Kim ,  Hak Lee

    IPC分类号： H01J1/30 ,  B05D3/00 ,  B05D5/12 ,  H01J9/00 ,  H01J9/12 ,  H01J43/24

    CPC分类号： H01J43/246 ,  H01J9/125

    摘要： Disclosed is a method and apparatus for producing a microchannel plate (MCP) using a corrugated mold, characterized in that each of corrugated substrates formed by the corrugated mold is coated with a secondary emitter and then layered, thereby easily producing a large area of the MCP and decreasing production costs of the MCP. The MCP producing method includes placing a first flat substrate on the corrugated mold, vacuum forming the first flat substrate so that both surfaces thereof are corrugated, coating a secondary emitter onto both surfaces of each of the first corrugated substrate and a second flat substrate, and alternately layering a plurality of the first corrugated substrates and a plurality of the second substrates each coated with the secondary emitter, to form microchannels.

    摘要翻译： 公开了一种使用波纹状模具制造微通道板（MCP）的方法和装置，其特征在于，由波纹状模具形成的每个波纹状基板均涂覆有二次发射极，然后层叠，由此容易地产生大面积的MCP 并降低MCP的生产成本。 MCP制造方法包括将第一平面基板放置在波纹状模具上，真空形成第一平坦基板，使得其两个表面是波纹状的，在第一波纹状基板和第二平坦基板的两个表面上涂覆二次发射体，以及 交替层叠多个第一波纹状基板和多个第二基板，每个第二基板均涂覆有二次发射体，以形成微通道。

    Source gas flow control and CVD using same
    6.
    发明申请
    Source gas flow control and CVD using same 审中-公开
    源气体流量控制和CVD使用相同

    公开(公告)号：US20050098906A1

    公开(公告)日：2005-05-12

    申请号：US10928517

    申请日：2004-08-27

    申请人： Kiyoshi Satoh ,  Hak Lee ,  Tomohisa Nishikawa ,  Akira Sasaki ,  Masahiro Nanbu

    发明人： Kiyoshi Satoh ,  Hak Lee ,  Tomohisa Nishikawa ,  Akira Sasaki ,  Masahiro Nanbu

    IPC分类号： C23C16/448 ,  C23C16/36 ,  C23C16/40 ,  C23C16/455 ,  H01L21/205 ,  C01B17/22 ,  C10K1/08 ,  C23C16/00 ,  F02M1/00 ,  F24F3/14 ,  H01L21/66

    CPC分类号： C23C16/401 ,  C23C16/36 ,  C23C16/455

    摘要： A source-gas supply apparatus for supplying a source gas into a CVD reactor includes: a reservoir for storing a liquid material; a gas flow path connected the reservoir and the CVD reactor; a sonic nozzle disposed in the gas flow path, through which the source gas is introduced into the CVD reactor; a pressure sensor disposed in the gas flow path upstream of the sonic nozzle; a flow control valve disposed in the gas flow path upstream of the pressure sensor; and a flow control circuit which receives a signal from the pressure sensor and outputs a signal to the flow control valve to adjust opening of the flow control valve as a function of the signal from the pressure sensor.

    摘要翻译： 用于将源气体供应到CVD反应器中的源气供给装置包括：用于储存液体材料的储存器; 连接储存器和CVD反应器的气体流路; 设置在所述气体流路中的声波喷嘴，所述源气体通过所述声波喷嘴被引入到所述CVD反应器中; 压力传感器，设置在声音喷嘴上游的气体流路中; 流量控制阀，设置在压力传感器上游的气体流路中; 以及流量控制电路，其接收来自压力传感器的信号，并将信号输出到流量控制阀，以根据来自压力传感器的信号来调节流量控制阀的开度。