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公开(公告)号：US11760012B2
公开(公告)日：2023-09-19
申请号：US17758158
申请日：2020-01-29
IPC分类号： B29C64/165 , B33Y10/00 , B33Y70/10 , B29K75/00 , B29K77/00 , B29K475/00 , B29K507/04
CPC分类号： B29C64/165 , B33Y10/00 , B33Y70/10 , B29K2075/00 , B29K2077/00 , B29K2475/02 , B29K2507/04
摘要： A three-dimensional printing kit can include a polymeric build material and a fusing agent. The polymeric build material can include polymer particles having a D50 particle size from about 2 μm to about 150 μm. The fusing agent can include an aqueous liquid vehicle including water and an organic co-solvent, a radiation absorber to generate heat from absorbed electromagnetic radiation, and from about 2 wt % to about 15 wt % of a carbamide-containing compound.
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公开(公告)号：US20190047045A1
公开(公告)日：2019-02-14
申请号：US16073173
申请日：2016-04-19
发明人： Mohammed S. Shaarawi , James McKinnell , Vladek Kasperchik , David A. Champion , Greg Scott Long
摘要： In a three-dimensional printing method example, a liquid functional agent is selectively applied. The liquid functional agent includes an alloying agent. A metallic build material is applied. The liquid functional agent is selectively applied before the metallic build material, after the metallic build material, or both before and after the metallic build material. The liquid functional agent patterns the metallic build material to form a composite layer. At least some of the metallic build material is exposed to energy to melt the at least some of the metallic build material to form a layer. Upon contact or after energy exposure, the alloying agent and the build material alter a composition of the composite layer.
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公开(公告)号：US09557288B2
公开(公告)日：2017-01-31
申请号：US13873199
申请日：2013-04-29
IPC分类号： C23C14/00 , C23C14/32 , G01N27/403 , C23C14/34
CPC分类号： G01N27/403 , C23C14/34
摘要： A well is formed in a body of dielectric material and has a chamfered edge about a top side of the well. A top electrode layer is on a top face of the body and on the chamfered edge of the well. A bottom electrode is on a floor of the well.
摘要翻译： 在电介质材料体中形成一个阱，并且具有围绕阱的顶侧的倒角边缘。 顶部电极层位于主体的顶面和井的倒角边缘上。 底部电极位于井的地板上。
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公开(公告)号：US11318537B2
公开(公告)日：2022-05-03
申请号：US16074457
申请日：2017-01-31
摘要： A system and method for additive manufacturing (AM) including forming a product via AM, placing a resonator adjacent the product as the product is being formed in the AM, and determining a property of the product. The resonator operates over a microwave frequency spectrum and emanates electromagnetic energy.
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公开(公告)号：US20190100007A1
公开(公告)日：2019-04-04
申请号：US16067788
申请日：2016-06-24
申请人： HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. , The State of Oregon State Board of Higher Education on behalf of Oregon State University
发明人： James Elmer Abbott, Jr. , John M McGlone , Kristopher Olsen , Roberto A Pugliese , Greg Scott Long , Douglas A Keszler , John Wager
CPC分类号： B41J2/14129 , B41J2/1606 , B41J2/1646 , B41J2202/03 , C22C1/002 , C22C45/00 , C22C45/10 , C23C14/0036 , C23C14/08 , C23C14/185 , C23C28/04 , H01B1/02
摘要： An amorphous thin metal film can include a combination of metals or metalloids including: 5 at % to 74 at % of a metalloid selected from the group of carbon, silicon, and boron; 5 at % to 74 at % of a first metal; 5 at % to 74 at % of a second metal; and 5 at % to 70 at % of a dopant. The first and second metals can be independently selected from the group of titanium, vanadium, chromium, iron, cobalt, nickel, zirconium, niobium, molybdenum, ruthenium, rhodium, palladium, hafnium, tantalum, tungsten, osmium, iridium, or platinum, wherein the first metal and the second metal can be different metals. The dopant can be selected from the group of oxygen, nitrogen, or combinations thereof. The metalloid, first metal, second metal, and dopant can account for at least 70 at % of the amorphous thin metal film.
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公开(公告)号：US09469107B2
公开(公告)日：2016-10-18
申请号：US14787729
申请日：2013-07-12
CPC分类号： B41J2/14129 , B41J2/14016 , B41J2/14088 , B41J2/14112 , B41J2/1601 , B41J2/164 , B41J2/1642 , B41J2/1646 , B41J2202/03 , B41J2202/11 , H01C1/148 , H01C7/006 , H01C17/0652 , H01C17/06526 , H01L27/11582 , H01L28/00
摘要： The present disclosure is drawn to a thermal inkjet printhead stack with an amorphous metal resistor, including an insulated substrate and a resistor applied to the insulated substrate. The resistor can include from 5 atomic % to 90 atomic % of a metalloid of carbon, silicon, or boron; and from 5 atomic % to 90 atomic % each of a first and second metal of titanium, vanadium, chromium, cobalt, nickel, zirconium, niobium, molybdenum, rhodium, palladium, hafnium, tantalum, tungsten, iridium, or platinum, where the second metal is different than the first metal. The metalloid, the first metal, and the second metal can account for at least 70 atomic % of the amorphous thin metal film.
摘要翻译： 本公开涉及具有非晶金属电阻器的热喷墨打印头堆叠，其包括绝缘基板和施加到绝缘基板的电阻器。 电阻器可以包括5原子％至90原子％的碳，硅或硼准金属; 和钛，钒，铬，钴，镍，锆，铌，钼，铑，钯，铪，钽，钨，铱或铂的第一和第二金属的5原子％至90原子％ 第二金属与第一金属不同。 准金属，第一金属和第二金属可以占非晶金属薄膜的至少70原子％。
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公开(公告)号：US20140318957A1
公开(公告)日：2014-10-30
申请号：US13873199
申请日：2013-04-29
IPC分类号： G01N27/26
CPC分类号： G01N27/403 , C23C14/34
摘要： A well is formed in a body of dielectric material and has a chamfered edge about a top side of the well. A top electrode layer is on a top face of the body and on the chamfered edge of the well. A bottom electrode is on a floor of the well.
摘要翻译： 在电介质材料体中形成一个阱，并且具有围绕阱的顶侧的倒角边缘。 顶部电极层位于主体的顶面和孔的倒角边缘上。 底部电极位于井的地板上。
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公开(公告)号：US20240278488A1
公开(公告)日：2024-08-22
申请号：US18689061
申请日：2021-09-29
IPC分类号： B29C64/165 , B29K77/00 , B29K105/16 , B29K507/04 , B29K509/04 , B33Y10/00 , B33Y30/00 , B33Y70/00
CPC分类号： B29C64/165 , B33Y70/00 , B29K2077/00 , B29K2105/16 , B29K2507/045 , B29K2509/04 , B29K2995/0013 , B33Y10/00 , B33Y30/00
摘要： A particulate build material for three-dimensional printing can include from about 80 wt % to about 99.5 wt % of a polyamide particles, and from about 0.5 w % to about 7.5 wt % of thermally conductive particles including cubic lattice structured particles of carbon, cubic lattice structured particles of boron and nitrogen, or a combination thereof.
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公开(公告)号：US11279129B2
公开(公告)日：2022-03-22
申请号：US16067945
申请日：2016-06-24
申请人： HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. , The State of Oregon State Board of Higher Education on behalf of Oregon State University
发明人： James Elmer Abbott, Jr. , John M McGlone , Kristopher Olsen , Douglas A Keszler , John Wager , Roberto A Pugliese , William F Stickle , Greg Scott Long
摘要： An amorphous thin metal film can comprise a combination of three metals or metalloids including: 5 at % to 90 at % of a metalloid selected from the group of carbon, silicon, and boron; 5 at % to 90 at % of a first metal selected from the group of titanium, vanadium, chromium, iron, cobalt, nickel, zirconium, niobium, molybdenum, ruthenium, rhodium, palladium, hafnium, tantalum, tungsten, osmium, iridium, and platinum; and 1 at % to 90 at % of cerium. The three elements may account for at least 50 at % of the amorphous thin metal film.
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公开(公告)号：US20200270742A1
公开(公告)日：2020-08-27
申请号：US16067945
申请日：2016-06-24
申请人： HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. , The State of Oregon State Board of Higher Education on behalf of Oregon State University
发明人： James Elmer Abbott, Jr. , John M McGlone , Kristopher Olsen , Douglas A Keszler , John Wager , Roberto A Pugliese , William F Stickle , Greg Scott Long
摘要： An amorphous thin metal film can comprise a combination of three metals or metalloids including: 5 at % to 90 at % of a metalloid selected from the group of carbon, silicon, and boron; 5 at % to 90 at % of a first metal selected from the group of titanium, vanadium, chromium, iron, cobalt, nickel, zirconium, niobium, molybdenum, ruthenium, rhodium, palladium, hafnium, tantalum, tungsten, osmium, iridium, and platinum; and 1 at % to 90 at % of cerium. The three elements may account for at least 50 at % of the amorphous thin metal film.
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