摘要:
A semiconductor integrated circuit device capable of having a high integration density and excellent performance and a method of fabricating the semiconductor integrated circuit device are disclosed. In this semiconductor integrated circuit device, a connecting conductor for connecting gate wiring which is formed on a field oxide film and extended from the gate of a MOSFET, to the source/drain region of another MOSFET is interposed between the gate wiring and one of two side space layers for defining the width of the gate wiring.
摘要:
A semiconductor switching device for an inverter includes a first conductivity type, low impurity concentration, semiconductor substrate having a band gap equal to or greater than 2.0 eV, a first conductivity type first region formed in a first plane of the substrate having a resistance lower than the substrate, a first electrode formed in another plane of the first region, a first conductivity type second region formed in a second plane of the substrate, and a second electrode formed on the second region. A trench is formed in the second plane, a control region is formed from a bottom of the trench into the substrate and a control electrode of a different conductivity type is formed on the control region. The second electrode is formed over the control electrode through an insulator film, and the control electrode is formed on the trench sidewalls so the control region contacts the second region.
摘要:
An exposure control device includes an area setting circuit which sets a light measuring area on a part of an image sensing plane; a judging circuit which detects a back light image plane on the basis of a difference in level between video signals corresponding to the inside and the outside of the light measuring area; a high luminance detecting circuit which detects a high luminance part of the image sensing plane on the basis of the video signals; and a control circuit arranged to have the light measuring area set on the image sensing plane excluding the high luminance part from the light measuring area by controlling the area setting circuit on the basis of the output of the high luminance detection circuit when the image sensing plane is judged to be a back light image plane by the judging circuit. The device is arranged to attach weight to the average levels of the signals of the inside and the outside of the light measuring area according to the result of comparison of these signals, to add the weighted average signal levels together and to perform exposure control according to the result of addition.
摘要:
An exposure control device for performing exposure control on the basis of a video signal obtained from a light measuring area set within an image sensing plane is provided with a determining circuit which determines the position of a photographed object within the image sensing plane from the values of a specific component of the video signal obtained from the inside and outside of a detection area the position of which is variably set within the image sensing plane. The light measuring area is set in the object's position within the image sensing plane detected by the determining circuit. The exposure control device is provided further with a changing circuit which detects the size of the object on the image sensing plane and changes the size of the light measuring area accordingly, and a weighting circuit which performs for light measurement a weighting operation on video signals obtained from the inside and outside of the light measuring area.
摘要:
An illuminating device includes a light-condensing sheet, a light-emitting portion, and a control unit. The light-condensing sheet includes a plurality of lenses each with a light-condensing function ranged on a light transmittance substrate. The light-emitting portion is opposed to the light-condensing sheet and includes light-emitting areas with respective dimensions. The control unit switches a luminous state of the light-emitting area to a non-luminous state or vice versa. A display device is provided with the illuminating device described above.
摘要:
An exposure control device for performing exposure control on the basis of a video signal obtained from a light measuring area set within an image sensing plane is provided with a determining circuit which determines the position of a photographed object within the image sensing plane from the values of a specific component of the video signal obtained from the inside and outside of a detection area the position of which is variably set within the image sensing plane. The light measuring area is set in the object's position within the image sensing plane detected by the determining circuit. The exposure control device is provided further with a changing circuit which detects the size of the object on the image sensing plane and changes the size of the light measuring area accordingly, and a weighting circuit which performs for light measurement a weighting operation on video signals obtained from the inside and outside of the light measuring area.
摘要:
An image processing apparatus has a memory device for storing pixel image data including both halftone image data such as data of image of a photograph having a gradation and line image data such as data of text containing characters. The storage is conducted on the basis of blocks each having a predetermined number of pixels. The mean information quantity of the halftone image data per pixel stored in the memory means is not greater than the information quantity of the line image data per pixel stored in the memory means. The halftone image data being compressed on the basis of the block. Therefore, both the halftone image data and line image data can be stored in a small memory by using common addresses, without causing any degradation of the image quality.
摘要:
A method of fabricating a semiconductor device includes the steps of: forming at least one first semiconductor region of a first conductivity type and at least one second semiconductor region of a second conductivity type in a main surface of a semiconductor layer of the first conductivity type; forming a three-layer film having a desired shape on each of the first and second semiconductor regions, the three-layer film being made up of a bottom layer which is a conductive film, an intermediate layer which is a silicon nitride film, and a top layer which is a polycrystalline silicon film doped with one of arsenic and phosphorus; forming a first insulating layer on the side wall of the three-layer film; forming a second polycrystalline silicon film on the whole surface, and diffusing one of arsenic and phosphorus from the first polycrystalline silicon film into the second polycrystalline silicon film; selectively etching off the first polycrystalline silicon film and that portion of the second polycrystalline silicon film, in which one of arsenic and phosphorus has been diffused; forming a second insulating layer at least on the surface of the portion of the second polycrystalline silicon film which exists on the second semiconductor region; removing the silicon nitride film and the conductive film which exist on the second semiconductor region, while using the second insulating layer as a mask, to form an aperture; and forming a third polycrystalline silicone film so that the aperture is covered by the third polycrystalline silicon film.
摘要:
An illuminating device includes a light-condensing sheet, a light-emitting portion, and a control unit. The light-condensing sheet includes a plurality of lenses each with a light-condensing function ranged on a light transmittance substrate. The light-emitting portion is opposed to the light-condensing sheet and includes light-emitting areas with respective dimensions. The control unit switches a luminous state of the light-emitting area to a non-luminous state or vice versa. A display device is provided with the illuminating device described above.
摘要:
A semiconductor device includes a trench formed on a source side of a drift region, a p-type gate region and a gate formed at the bottom of the trench, and the source formed over the entire surface of the unit device through an insulating film. The narrowest portion of a channel of the device is deeper than one-half the junction depth of the p-type gate region. This allows the width of the channel on the drain side to be reduced even when a lower energy ion implantation manufacturing process is used.