公开(公告)号：US06875359B2

公开(公告)日：2005-04-05

申请号：US10305796

申请日：2002-11-27

申请人： Shu Ogawa ,  Yasuyuki Kobayakawa ,  Yoshiya Kitagawa ,  Makoto Kikukawa

发明人： Shu Ogawa ,  Yasuyuki Kobayakawa ,  Yoshiya Kitagawa ,  Makoto Kikukawa

IPC分类号： C02F1/44 ,  B01D61/00 ,  B01D61/14 ,  B01D61/58 ,  B01D63/06 ,  H01L21/027 ,  H01L21/306

CPC分类号： B01D61/142 ,  B01D63/063

摘要： A developer liquid regenerating system is provided with a storage tank storing a TAAH (such as TMAH)- and photoresist-containing developer waste liquid, first separating means with NF membrane, connected to the waste liquid storage tank through conduits, a storage tank connected to the first separating means through a conduit, and second separating means with NF membrane, connected to the storage tank through conduits. The developer liquid regenerating system is also connected to a developing apparatus through a conduit connected to the storage tank, and to a developer liquid control/supply apparatus through a conduit connected to the storage tank.

摘要翻译： 显影液再生系统设有储存有TAAH（例如TMAH）和含光致抗蚀剂的显影剂废液的储罐，具有NF膜的第一分离装置，通过导管连接到废液储罐，储罐连接到 通过管道的第一分离装置和具有NF膜的第二分离装置通过管道连接到储存罐。 显影剂液体再生系统还通过连接到储罐的导管连接到显影装置，并且通过连接到储罐的导管连接到显影剂液体控制/供给装置。

公开(公告)号：US07101517B2

公开(公告)日：2006-09-05

申请号：US10342769

申请日：2003-01-15

申请人： Toshimoto Nakagawa ,  Yuko Katagiri ,  Shu Ogawa ,  Yasuyuki Kobayakawa ,  Makoto Kikukawa ,  Yutaka Saito ,  Yoshitaka Nishijima

发明人： Toshimoto Nakagawa ,  Yuko Katagiri ,  Shu Ogawa ,  Yasuyuki Kobayakawa ,  Makoto Kikukawa ,  Yutaka Saito ,  Yoshitaka Nishijima

IPC分类号： B01J19/08

CPC分类号： C09G1/02 ,  C23F1/08 ,  C25D7/123 ,  C25D21/20

摘要： A processing solution preparation and supply apparatus includes a dissolving preparation bath to which a material powder and ultrapure water are supplied. This dissolving preparation bath is connected to a substrate processing apparatus via a pipe, and a processing solution prepared from the material powder on-site is supplied to the processing apparatus. To reduce an increase in the microorganism concentration in the ultrapure water, this ultrapure water is circulated substantially constantly. This suppresses deterioration and concentration fluctuations of a processing solution for use in processing of a semiconductor substrate, when this processing solution is supplied to the use side. This also reduces particles and improves the economical efficiency.

公开(公告)号：US06623183B2

公开(公告)日：2003-09-23

申请号：US10068809

申请日：2002-02-06

申请人： Toshimoto Nakagawa ,  Shu Ogawa ,  Satoru Morita ,  Makoto Kikukawa ,  Takahiro Hozan

发明人： Toshimoto Nakagawa ,  Shu Ogawa ,  Satoru Morita ,  Makoto Kikukawa ,  Takahiro Hozan

IPC分类号： G03D302

CPC分类号： G03D3/00 ,  Y10T137/0329

摘要： The developer producing equipment of the present invention is connected via piping to working equipment in which electronic circuits, on which fine working is performed, are formed, and produces an alkali type developer used in the abovementioned working equipment. This developer producing equipment comprises a preparation tank to which a developer stock solution and pure water are supplied, and in which these are agitated, first liquid amount measuring means for measuring the amount of the alkali type developer inside the preparation tank, first alkali concentration measuring means for measuring the alkali concentration of the abovementioned alkali type developer, first liquid amount control means for adjusting the amount of the alkali type developer inside the preparation tank on the basis of the measured value obtained by the abovementioned first liquid amount measuring means the abovementioned first alkali concentration measuring means, and liquid supply control means.

摘要翻译： 本发明的显影剂生产设备通过管道连接到其上形成精细加工的电子电路的工作设备，并且生产用于上述工作设备中的碱型显影剂。 该显影剂制造装置包括：供给显影剂储备液和纯水的制剂槽，搅拌其中的第一液量测量装置，用于测量制备罐内的碱式显影剂的量，第一碱浓度测定 用于测量上述碱性显影剂的碱浓度的装置，用于根据由上述第一液量测量装置获得的测量值调节制备罐内的碱式显影剂的量的第一液量控制装置， 碱浓度测量装置和液体供应控制装置。

公开(公告)号：US06302600B1

公开(公告)日：2001-10-16

申请号：US09577045

申请日：2000-05-24

申请人： Hideo Nagase ,  Shu Ogawa ,  Kiyoshi Kamibayashi ,  Makoto Kikukawa ,  Takahiro Houzan ,  Toshimoto Nakagawa ,  Mitsumoto Nakagawa

发明人： Hideo Nagase ,  Shu Ogawa ,  Kiyoshi Kamibayashi ,  Makoto Kikukawa ,  Takahiro Houzan ,  Toshimoto Nakagawa ,  Mitsumoto Nakagawa

IPC分类号： G03D500

CPC分类号： G03D5/04 ,  G03F7/3071 ,  G03F7/3092 ,  G03F7/422

摘要： The apparatus for treating surface of boards includes treating means for treating surface of boards by supplying sequentially a treating solution and a rinse liquid on boards placed on a treating table; solution collecting means for collecting waste treating solution separately from waste rinse liquid; waste solution storing, concentrating detecting and solution supplementing means for storing the waste treating solution, detecting the concentration of at least one ingredient in the waste treating solution by an electric conductivity meter and/or an absorption photometer, supplementing treating solution for adjusting containing necessary ingredients depending on the detected value, and adjusting the treating solution; and treating solution feed means for feeding the adjusted treating solution into the treating means. By thus constructing, the treating solution can be recycled, and if recycling is repeated, the performance of the treating solution itself can be maintained.

摘要翻译： 用于处理板表面的设备包括处理装置，用于通过在放置在处理台上的板上依次提供处理溶液和冲洗液来处理板的表面; 用于从废液冲洗液中分离收集废物处理液的溶液收集装置; 用于存储废物处理溶液的废液储存，浓缩检测和溶液补充装置，通过电导率计和/或吸收光度计检测废物处理溶液中至少一种成分的浓度，补充处理溶液以调节含有必需成分 取决于检测值，并调整处理液; 以及处理溶液进料装置，用于将经调节的处理溶液进料到处理装置中。 通过这样构成，处理溶液可以再循环，如果重复循环，则可以维持处理液本身的性能。

公开(公告)号：US07109037B2

公开(公告)日：2006-09-19

申请号：US10183833

申请日：2002-06-25

申请人： Toshimoto Nakagawa ,  Yuko Katagiri ,  Shu Ogawa ,  Satoru Morita ,  Makoto Kikukawa

发明人： Toshimoto Nakagawa ,  Yuko Katagiri ,  Shu Ogawa ,  Satoru Morita ,  Makoto Kikukawa

IPC分类号： G01N33/18 ,  G01N35/08 ,  G01N27/00 ,  G01N21/00

CPC分类号： H01L21/67253 ,  G03F7/422 ,  Y10T436/12

摘要： The water-based resist stripping liquid management apparatus according to the present invention manages in an adjusting bath a water-based resist stripping liquid that is used in resist stripping equipment. In this apparatus, an absorptiometer that measures the water concentration in the water-based resist stripping liquid and an electrical conductivity meter that measures the degraded component concentration in the water-based resist stripping liquid are connected to a resist stripping treatment bath (adjusting bath) via pipelines, and at least one of a resist stripping stock liquid, a resist stripping reclaimed liquid, pure water, and a premixed resist stripping new liquid are fed into the resist stripping treatment bath in accordance with the measurement values obtained. As a result, the resist stripping performance of the water-based resist stripping liquid can be stably maintained, the amount of liquid used can be reduced, and the time for which operation is shut down can be reduced.

公开(公告)号：US06588927B2

公开(公告)日：2003-07-08

申请号：US10068810

申请日：2002-02-06

申请人： Toshimoto Nakagawa ,  Shu Ogawa ,  Satoru Morita ,  Makoto Kikukawa ,  Takahiro Hozan

发明人： Toshimoto Nakagawa ,  Shu Ogawa ,  Satoru Morita ,  Makoto Kikukawa ,  Takahiro Hozan

IPC分类号： B01F1502

CPC分类号： G03F7/30 ,  B01F3/088 ,  B01F15/00155 ,  B01F15/0022 ,  B01F15/0408 ,  B01F2003/0896 ,  B01F2215/0093

摘要： The developer producing equipment of the present invention is equipped with a preparation tank to which a developer stock solution and pure water are supplied, and in which these ingredients are agitated, and a leveling tank which is connected to this preparation tank. The leveling tank is connected via piping to working equipment in which electronic circuits are formed. Furthermore, the preparation tank and leveling tank have first and second alkali concentration measuring means for measuring the alkali concentrations of the alkali type developer inside the respective tanks. In the preparation tank, either the amount of developer stock solution that is supplied to the tank or the amount of pure water that is supplied to the tank, or both, are adjusted on the basis of the measured value obtained by the first alkali concentration measuring means, so that an alkali type developer is prepared. This alkali type developer is fed into the leveling tank, where the alkali concentration is evened out, after which the alkali type developer is fed into the working equipment via piping.

公开(公告)号：US06752545B2

公开(公告)日：2004-06-22

申请号：US10216661

申请日：2002-08-09

申请人： Toshimoto Nakagawa ,  Yuko Katagiri ,  Shu Ogawa ,  Satoru Morita ,  Makoto Kikukawa ,  Takahiro Hozan

发明人： Toshimoto Nakagawa ,  Yuko Katagiri ,  Shu Ogawa ,  Satoru Morita ,  Makoto Kikukawa ,  Takahiro Hozan

IPC分类号： G03D500

CPC分类号： G03F7/30 ,  G03F7/3021 ,  G03F7/322

摘要： A treating liquid adjusting equipment for adjusting an alkali-based treating liquid for use in treating an organic film applied onto a substrate, which includes an adjusting portion. The adjusting portion for adjusting an alkalinity of the alkali-based treating liquid is such that a concentration of a first component contained in the alkali-based treating liquid and constituting an organic film of a same type as or different type from the organic film is in a range of 0.0001 to 2.0 mass %, and a concentration of an alkali component contained in the alkali-based treating liquid is in a range of 0.05 to 2.5 mass %.

摘要翻译： 一种处理液体调节设备，用于调节用于处理施加到基底上的有机膜的碱性处理液，其包括调节部分。 用于调节碱处理液的碱度的调节部分使得碱性处理液中包含的和构成与有机膜相同类型或不同类型的有机膜的第一成分的浓度为 0.0001〜2.0质量％的范围，碱系处理液中所含的碱成分浓度在0.05〜2.5质量％的范围。

公开(公告)号：US5810070A

公开(公告)日：1998-09-22

申请号：US773946

申请日：1996-12-30

申请人： Shiro Osada ,  Heiji Kato ,  Shuzo Takahashi ,  Shu Ogawa

发明人： Shiro Osada ,  Heiji Kato ,  Shuzo Takahashi ,  Shu Ogawa

IPC分类号： B22D11/06

CPC分类号： B22D11/066

摘要： To suppress wear of side surfaces of end closures due to rotation of cooling rolls in a twin roll strip caster, a pair of housings 11 are provided, each arranged to face on end faces of one or the other ends of cooling rolls 1a and 1b, which are arranged substantially horizontally and in parallel with each other, so that it may be displaced toward and away from the end faces, rolling members 12 rotatably supported by each of said housings 11 so that they may contact the corresponding end faces of the rolls 1a and 1b, a thruster body 21 supported on each of the housings 11 so that it may be displaced toward and away from the corresponding end faces of the rolls 1a and 1b, and an end closure 3 loaded on each of the thruster bodies 21 so that it may closely contact upper portions of the end faces of the rolls 1a and 1b. When the end closure 3 is worn to a predetermined extent, then the rolling members 12 contact the end faces of the rolls 1a and 1b to thereby suppress wear of the end closure 3.

公开(公告)号：US5896874A

公开(公告)日：1999-04-27

申请号：US810816

申请日：1997-03-06

申请人： Toshimoto Nakagawa ,  Kouzo Tsukada ,  Shu Ogawa ,  Takahiro Houzan ,  Yoshitaka Nishijima

发明人： Toshimoto Nakagawa ,  Kouzo Tsukada ,  Shu Ogawa ,  Takahiro Houzan ,  Yoshitaka Nishijima

IPC分类号： G03F7/42 ,  G05D11/13 ,  H01L21/027 ,  H01L21/306 ,  B08B3/04

CPC分类号： G03F7/425 ,  G05D11/138

摘要： In a semiconductor manufacturing process or a liquid crystal board manufacturing process, a resist stripping solution blending an organic alkali and an organic solvent is used for stripping the resist completely from the board. An apparatus for controlling this resist stripping solution comprises a resist stripping solution discharge device for discharging the resist stripping solution by detecting the dissolved resist concentration in the resist stripping solution by using an absorption photometer, a source solution and water replenishing device for replenishing the resist stripping source solution and pure water by detecting the liquid level of the resist stripping solution by a liquid level gauge, and a source solution and/or water replenishing device for replenishing at least one of the resist stripping source solution pure water by detecting the water concentration of the resist stripping solution by using an another absorption photometer. As a result, in an apparatus for controlling a resist stripping solution used in resist stripping in a semiconductor manufacturing process or a liquid crystal board manufacturing process, the quality of the resist stripping solution is controlled constantly, the solution consumption is saved, the operation down time is reduced, and the cost is lowered.

摘要翻译： 在半导体制造工艺或液晶板制造工艺中，使用混合有机碱和有机溶剂的抗蚀剂剥离溶液来完全剥离抗蚀剂。 用于控制该抗蚀剂剥离溶液的装置包括：抗蚀剂剥离溶液排出装置，用于通过使用吸收光度计，用于补充抗蚀剂剥离的源溶液和水补充装置检测抗蚀剂剥离溶液中溶解的抗蚀剂浓度来排出抗蚀剂剥离溶液 源液和纯水，通过液位计检测抗蚀剂剥离溶液的液面，以及源溶液和/或水补充装置，用于通过检测抗蚀剂剥离源溶液纯水中的至少一种来补充至少一种抗蚀剂剥离源溶液纯水 通过使用另一种吸收光度计的抗蚀剂剥离溶液。 结果，在半导体制造工序或液晶板制造工序中，在抗蚀剂剥离中使用的抗蚀剂剥离液的控制装置中，不断地控制抗蚀剂剥离液的质量，节省溶液消耗，降低操作 时间缩短，成本降低。

公开(公告)号：US5871039A

公开(公告)日：1999-02-16

申请号：US979479

申请日：1997-11-26

申请人： Shiro Osada ,  Heiji Kato ,  Shuzo Takahashi ,  Shu Ogawa

发明人： Shiro Osada ,  Heiji Kato ,  Shuzo Takahashi ,  Shu Ogawa

IPC分类号： B22D11/06

CPC分类号： B22D11/066

摘要： To suppress wear of side surfaces of end closures due to rotation of cooling rolls in a twin roll strip caster, a pair of housings 11 are provided, each arranged to face on end faces of one or the other ends of cooling rolls 1a and 1b, which are arranged substantially horizontally and in parallel with each other, so that it may be displaced toward and away from the end faces, rolling members 12 rotatably supported by each of said housings 11 so that they may contact the corresponding end faces of the rolls 1a and 1b, a thruster body 21 supported on each of the housings 11 so that it may be displaced toward and away from the corresponding end faces of the rolls 1a and 1b, and an end closure 3 loaded on each of the thruster bodies 21 so that it may closely contact upper portions of the end faces of the rolls 1a and 1b. When the end closure 3 is worn to a predetermined extent, then the rolling members 12 contact the end faces of the rolls 1a and 1b to thereby suppress wear of the end closure 3.

摘要翻译： 为了抑制由于双辊带式连铸机中的冷却辊的旋转导致的端盖的侧面的磨损，设置有一对壳体11，每个壳体11布置成面对冷却辊1a和1b的一端或另一端的端面， 它们基本上水平并且彼此平行地布置，使得其可以朝向和远离端面移动，滚动构件12由每个所述壳体11可旋转地支撑，使得它们可以接触辊1a的相应端面 1b是支撑在每个壳体11上的推进器主体21，使得其可以朝向和远离辊1a和1b的相应端面移动，并且装在每个推进器主体21上的端盖3，使得 它可能紧密接触辊1a和1b的端面的上部。 当端盖3被磨损到预定的程度时，滚动体12接触辊1a和1b的端面，从而抑制端盖3的磨损。