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4 条记录 (耗时 0.017 秒)

    Chemical reaction velocity measuring apparatus
    1.
    发明授权
    Chemical reaction velocity measuring apparatus 失效
    化学反应速度测量仪

    公开(公告)号：US4063817A

    公开(公告)日：1977-12-20

    申请号：US641267

    申请日：1975-12-16

    申请人： Teruo Shimamura ,  Yoshio Fukami ,  Hidetoshi Mori

    发明人： Teruo Shimamura ,  Yoshio Fukami ,  Hidetoshi Mori

    IPC分类号： G01N21/75 ,  C12M1/34 ,  G01N21/27 ,  G01J3/42 ,  G01J3/46 ,  G01N21/22

    CPC分类号： G01N21/272 ,  Y10T436/113332

    摘要： An apparatus for measuring velocity of chemical reaction by detecting change in light absorbance which stands in proportional relation with time, which comprises arranging plural samples at regular spacings, advancing said samples intermittently at constant intervals, detecting the absorbances with two colorimetric detecting means crossing said samples and measuring the difference between the absorbences thereby determining the reaction velocity of said samples.

    摘要翻译： 通过检测与时间成比例关系的吸光度变化来测量化学反应速度的装置，其包括以规则间隔排列多个样品，以恒定间隔间歇地推进所述样品，用与所述样品交叉的两个比色检测装置检测吸光度 并测量吸光度之差，从而确定所述样品的反应速度。

    Chemical reaction velocity measuring apparatus
    3.
    发明授权
    Chemical reaction velocity measuring apparatus 失效
    化学反应速度测量仪

    公开(公告)号：US4035087A

    公开(公告)日：1977-07-12

    申请号：US641268

    申请日：1975-12-16

    申请人： Hidetoshi Mori ,  Teruo Shimamura ,  Yoshio Fukami

    发明人： Hidetoshi Mori ,  Teruo Shimamura ,  Yoshio Fukami

    IPC分类号： G01N21/27 ,  G01N21/22

    CPC分类号： G01N21/272

    摘要： An apparatus for measuring a chemical reaction velocity of a sample whose light absorbance changes in proportion to time, comprises a differential circuit for converting the absorbance signals at two different times into respective first-order differential signals, or an integrating circuit for integrating the variation of absorbance signal at two times into two integrated signals. A subtractor is provided to obtain the difference of the two differential signals or two integrated signals. The output of the subtractor is compared with a standard level by a comparing means so that abnormality signal is indicated when said difference does not fall into the standard level.

    摘要翻译： 用于测量吸光度与时间成比例地变化的样品的化学反应速度的装置包括用于将两个不同时间的吸光度信号转换成各个一阶差分信号的差分电路，或用于将变化 吸光度信号两次分为两个积分信号。 提供减法器以获得两个差分信号或两个积分信号的差。 通过比较装置将减法器的输出与标准电平进行比较，使得当所述差不落入标准电平时指示异常信号。

    Exposure apparatus
    4.
    发明授权
    Exposure apparatus 失效
    曝光装置

    公开(公告)号：US5617211A

    公开(公告)日：1997-04-01

    申请号：US515783

    申请日：1995-08-16

    申请人： Kei Nara ,  Toshio Matsuura ,  Muneyasu Yokota ,  Yukio Kakizaki ,  Yoshio Fukami ,  Seiji Miyazaki ,  Tsuyoshi Narabe

    发明人： Kei Nara ,  Toshio Matsuura ,  Muneyasu Yokota ,  Yukio Kakizaki ,  Yoshio Fukami ,  Seiji Miyazaki ,  Tsuyoshi Narabe

    IPC分类号： G03F7/20 ,  G03F9/00 ,  G01B11/00 ,  G01U21/86 ,  G06K7/015 ,  G03B27/52

    CPC分类号： G03F7/70241 ,  G03F7/70275 ,  G03F7/70358 ,  G03F9/70

    摘要： This invention relates to an exposure apparatus for synchronously scanning a mask and a photosensitive substrate with respect to a plurality of projection optical systems, thereby properly transferring an entire pattern area on the mask onto the photosensitive substrate. A plurality of sets of mask-side reference marks and substrate-side reference marks are arranged at positions corresponding to each other on the mask surface and the photosensitive substrate surface and at least at two positions conjugate with the plurality of projection optical systems. The displacement amount between an image of a mask-side reference mark or a substrate-side reference mark formed on the corresponding substrate-side reference mark or mask-side reference mark through the projection optical system and the position of the substrate-side reference mark and the mask-side reference mark is measured. The imaging characteristics of the plurality of projection optical systems are corrected in accordance with the displacement amount.

    摘要翻译： 本发明涉及一种用于相对于多个投影光学系统同时扫描掩模和感光基板的曝光装置，从而将掩模上的整个图案区域适当地转印到感光基板上。 多个掩模侧参考标记和基板侧参考标记组被布置在掩模表面和感光基板表面上并且至少在与多个投影光学系统共轭的两个位置处彼此对应的位置处。 掩模侧基准标记的图像或通过投影光学系统形成在相应的基板侧参考标记或掩模侧参考标记上的基板侧参考标记之间的位移量和基板侧参考标记的位置 并且测量掩模侧参考标记。 根据位移量校正多个投影光学系统的成像特性。