Production Method of High Purity Silver Tetrafluoroborate
    1.
    发明申请
    Production Method of High Purity Silver Tetrafluoroborate 失效
    高纯度四氟硼酸银的生产方法

    公开(公告)号:US20090274604A1

    公开(公告)日:2009-11-05

    申请号:US11887324

    申请日:2006-06-09

    IPC分类号: C01B35/00

    CPC分类号: C01B35/061

    摘要: A production method of high purity silver tetrafluoroborate, capable of producing silver tetrafluoroborate (AgBF4) at purity higher than the conventional, without using an organic solvent. The production method of the present invention is characterized in that the method comprises the step of: reacting silver fluoride with boron trifluoride in the presence of anhydrous hydrofluoric acid. Boron trifluoride is delivered into a solution obtained by dissolving or suspending silver fluoride in an anhydrous hydrofluoric acid solution.

    摘要翻译: 高纯度四氟硼酸银的制备方法,其能够生产纯度高于常规的四氟硼酸银(AgBF 4),而不使用有机溶剂。 本发明的制备方法的特征在于该方法包括在无水氢氟酸存在下使氟化银与三氟化硼反应的步骤。 将三氟化硼输送到通过将氟化银溶解或悬浮在无水氢氟酸溶液中获得的溶液中。

    Production method of high purity silver tetrafluoroborate
    2.
    发明授权
    Production method of high purity silver tetrafluoroborate 失效
    高纯度四氟硼酸银的生产方法

    公开(公告)号:US08501138B2

    公开(公告)日:2013-08-06

    申请号:US11887324

    申请日:2006-06-09

    IPC分类号: C01B35/00 C01B15/12 C01B35/06

    CPC分类号: C01B35/061

    摘要: A production method of high purity silver tetrafluoroborate, capable of producing silver tetrafluoroborate (AgBF4) at purity higher than the conventional, without using an organic solvent. The production method of the present invention is characterized in that the method comprises the step of: reacting silver fluoride with boron trifluoride in the presence of anhydrous hydrofluoric acid. Boron trifluoride is delivered into a solution obtained by dissolving or suspending silver fluoride in an anhydrous hydrofluoric acid solution.

    摘要翻译: 高纯度四氟硼酸银的制备方法,其能够生产纯度高于常规的四氟硼酸银(AgBF 4),而不使用有机溶剂。 本发明的制备方法的特征在于该方法包括在无水氢氟酸存在下使氟化银与三氟化硼反应的步骤。 将三氟化硼输送到通过将氟化银溶解或悬浮在无水氢氟酸溶液中获得的溶液中。

    Method of removing calcium from water containing calcium hydrogen carbonate in high concentration
    3.
    发明授权
    Method of removing calcium from water containing calcium hydrogen carbonate in high concentration 失效
    从含有高浓度碳酸氢钙的水中除去钙的方法

    公开(公告)号:US06905606B1

    公开(公告)日:2005-06-14

    申请号:US09890470

    申请日:2000-01-28

    IPC分类号: C02F1/58 C02F1/52 C02F1/66

    摘要: A method for removing calcium from water containing a high concentration of calcium bicarbonate, permitting a reduction of the calcium bicarbonate equivalent to 200-500 ppm calcium to the level in accordance with the water quality standards for industrial use, not by a method using a large amount of heat and power as heating and deairing, but by a simple chemical treatment. Calcium hydroxide is added to waste water containing a high concentration of calcium in a form of calcium bicarbonate for making them react with each other, and removing calcium by fixing it to calcium bicarbonate.

    摘要翻译: 一种从含有高浓度碳酸氢钙的水中除去钙的方法,允许将等于200-500ppm钙的碳酸氢钙相对于工业用水的水质标准降低到水平,而不是使用大的方法 热量和热量作为加热和脱气,而是通过简单的化学处理。 将氢氧化钙加入到含有高浓度碳酸钙形式的钙的废水中,以使它们彼此反应,并通过将其固定为碳酸氢钙来除去钙。

    SURFACE TREATING FLUID FOR FINE PROCESSING OF MULTI-COMPONENT GLASS SUBSTRATE
    5.
    发明申请
    SURFACE TREATING FLUID FOR FINE PROCESSING OF MULTI-COMPONENT GLASS SUBSTRATE 审中-公开
    用于精细加工多组分玻璃基材的表面处理流体

    公开(公告)号:US20070215835A1

    公开(公告)日:2007-09-20

    申请号:US10488036

    申请日:2002-09-02

    IPC分类号: C09K13/08

    CPC分类号: C03C15/00 C03C15/02

    摘要: A surface treatment solution for finely processing a glass substrate containing multiple ingredients like the one used for the construction of a liquid crystal-based or organic electroluminescence-based flat panel display device, without evoking crystal precipitation and surface roughness. An etching solution of the invention contains, in addition to hydrofluoric acid (HF), at least one acid whose dissociation constant is larger than that of HF. The concentration of the acid in the solution is adjusted.

    摘要翻译: 一种表面处理溶液,用于微细加工含有用于构建液晶或有机电致发光的平板显示装置的多种成分的玻璃基板,而不会引起晶体析出和表面粗糙度。 除了氢氟酸(HF)外,本发明的蚀刻溶液还含有至少一种其解离常数大于HF的酸。 调节溶液中酸的浓度。

    Surface treating solution for fine processing of glass base plate having a plurality of components
    6.
    发明申请
    Surface treating solution for fine processing of glass base plate having a plurality of components 审中-公开
    具有多个部件的玻璃基板的精加工用表面处理液

    公开(公告)号:US20070029519A1

    公开(公告)日:2007-02-08

    申请号:US10487770

    申请日:2002-08-26

    IPC分类号: C09K13/00

    CPC分类号: C03C15/00

    摘要: A surface treatment solution for finely processing a glass substrate containing multiple ingredients is used for the construction of liquid crystal-based or organic electroluminescence-based flat panel display devices without invoking crystal precipitation and/or increasing surface roughness. An etching solution of the invention contains, in addition to hydrofluoric acid (HF) and ammonium fluoride (NH4F), at least one acid whose dissociation constant is larger than that of HF. The concentration of the acid in the solution can advantageously be adjusted to maximize the etching rate.

    摘要翻译: 用于精细加工含有多种成分的玻璃基板的表面处理溶液用于构建基于液晶或有机电致发光的平板显示装置,而不会引起晶体沉淀和/或增加表面粗糙度。 除氢氟酸(HF)和氟化铵(NH 4 F F)外,本发明的蚀刻溶液含有至少一种其解离常数大于HF的酸。 可以有利地调节溶液中酸的浓度以最大化蚀刻速率。

    Surface treatment solution for the fine surface processing of a glass substrate containing multiple ingredients
    8.
    发明授权
    Surface treatment solution for the fine surface processing of a glass substrate containing multiple ingredients 失效
    表面处理溶液,用于对含有多种成分的玻璃基材的精细表面加工

    公开(公告)号:US08066898B2

    公开(公告)日:2011-11-29

    申请号:US12237981

    申请日:2008-09-25

    IPC分类号: B44C1/22

    CPC分类号: C03C15/00

    摘要: A surface treatment solution for finely processing a glass substrate containing multiple ingredients is used for the construction of liquid crystal-based or organic electroluminescence-based flat panel display devices without invoking crystal precipitation and/or increasing surface roughness. An etching solution of the invention contains, in addition to hydrofluoric acid (HF) and ammonium fluoride (NH4F), at least one acid whose dissociation constant is larger than that of HF. The concentration of the acid in the solution can advantageously be adjusted to maximize the etching rate.

    摘要翻译: 用于精细加工含有多种成分的玻璃基板的表面处理溶液用于构建基于液晶或有机电致发光的平板显示装置,而不会引起晶体沉淀和/或增加表面粗糙度。 本发明的蚀刻溶液除氢氟酸(HF)和氟化铵(NH4F)外还含有至少一种离子常数大于HF的酸。 可以有利地调节溶液中酸的浓度以最大化蚀刻速率。

    Method for fixing fluorine and phosphorus in waste water containing fluorophosphoric acid-derived compound to remove them
    9.
    发明授权
    Method for fixing fluorine and phosphorus in waste water containing fluorophosphoric acid-derived compound to remove them 失效
    在含有氟磷酸衍生化合物的废水中固定氟和磷的方法以除去它们

    公开(公告)号:US06666973B1

    公开(公告)日:2003-12-23

    申请号:US09890754

    申请日:2002-02-12

    IPC分类号: C02F104

    摘要: A method is provided for fixing and eliminating fluorine and phosphorus in waste water wherein the waste water includes a fluorophosphate compound in which hydrochloric acid is added to the waste water including the fluorophosphate compound. The waste water to which hydrochloric acid has been added is heated in order to decompose the fluorophosphate compound into hydrogen fluoride and phosphoric acid, while hydrogen chloride gas located within a treating vessel in which the waste water is contained is introduced into a condenser provided outside of the treating vessel, and then a calcium salt is added to the waste water after decomposition in order to fix and eliminate fluorine and phosphorus.

    摘要翻译: 提供了一种用于固定和除去废水中的氟和磷的方法,其中废水包括其中向包含氟磷酸盐化合物的废水中加入盐酸的氟磷酸盐化合物。 加入盐酸的废水被加热,以将氟磷酸盐化合物分解为氟化氢和磷酸,而位于其中含有废水的处理容器内的氯化氢气体被引入设置在 处理容器,然后在分解后将钙盐加入到废水中,以固定和消除氟和磷。

    Surface treatment for micromachining
    10.
    发明授权
    Surface treatment for micromachining 失效
    表面处理微加工

    公开(公告)号:US6027571A

    公开(公告)日:2000-02-22

    申请号:US66354

    申请日:1998-06-29

    CPC分类号: H01L21/31111 H01L21/32134

    摘要: A fine surface treatment for micromachining having an etching speed whose difference is smaller to oxide films each obtained by a different method as well as conditions of forming film or having different concentration of various impurities such as P, B and As in the film, and also having a practical etching speed to each of the films. The surface treatment for micromachining contains 0.1 to 8 weight percent of hydrogen fluoride and not less than 40 weight percent to not more than 47 weight percent of ammonium fluoride. It should be noted that it is preferable the surface treatment agent contains 0.001 to 1 weight percent of surfactant.

    摘要翻译: PCT No.PCT / JP97 / 02978第 371日期:1998年4月28日 102(e)1998年4月28日PCT PCT 1997年8月27日PCT公布。 公开号WO98 / 09320 日期1998年3月5日对于通过不同的方法获得的氧化膜的蚀刻速度差异小的微加工的微细加工的表面处理以及形成膜或不同浓度的各种杂质如P,B和As的条件 膜,并且还具有对每个膜的实际蚀刻速度。 微加工的表面处理包含0.1至8重量%的氟化氢和不少于40重量%至不超过47重量%的氟化铵。 另外,表面处理剂优选含有0.001〜1重量%的表面活性剂。