SEPARATOR FOR ELECTROCHEMICAL DEVICE, AND ELECTROCHEMICAL DEVICE INCLUDING SAME
    3.
    发明申请
    SEPARATOR FOR ELECTROCHEMICAL DEVICE, AND ELECTROCHEMICAL DEVICE INCLUDING SAME 审中-公开
    电化学装置用分离装置及其电化学装置

    公开(公告)号:US20120094184A1

    公开(公告)日:2012-04-19

    申请号:US13377496

    申请日:2010-06-10

    摘要: The separator for an electrochemical device of the present invention includes inorganic fine particles and a fibrous material or microporous film. Primary particles of the inorganic fine particles can be approximated to a geometric shape, and a difference between a theoretical specific surface area and an actual specific surface area of the inorganic fine particles is within ±15% relative to the theoretical specific surface area, where the theoretical specific surface area of the inorganic fine particles is calculated from a surface area, a volume and a true density of the primary particles of the inorganic fine particles, which are determined through approximation of the primary particles of the inorganic fine particles to the geometric shape, and the actual specific surface area of the inorganic fine particles is measured by the BET method.

    摘要翻译: 本发明的电化学装置用隔膜包括无机微粒,纤维状或微孔膜。 无机细颗粒的初级颗粒可以近似为几何形状,并且无机细颗粒的理论比表面积和实际比表面积之间的差异相对于理论比表面积在±15%以内,其中 无机细颗粒的理论比表面积由无机细颗粒的一次颗粒的几何形状确定的无机细颗粒的一次颗粒的表面积,体积和真密度计算出来 ,通过BET法测定无机微粒的实际比表面积。

    EXHAUST GAS TREATMENT DEVICE
    6.
    发明申请
    EXHAUST GAS TREATMENT DEVICE 有权
    排气处理装置

    公开(公告)号:US20110120085A1

    公开(公告)日:2011-05-26

    申请号:US12996879

    申请日:2009-08-18

    IPC分类号: F01N3/08

    摘要: An engaging groove (47) with which a gasket (42) is engaged is provided in each of a front side projecting portion (44) and a rear side projecting portion (46) formed in a filter accommodating cylinder (37) to be positioned on an outer peripheral surface (44A, 46A) of each projecting portion (44, 46). Therefore, when the gasket (42) latches on each of the projecting portion (44; 46) to be fitted thereon from an outside, the gasket (42) can be engaged with the engaging groove (47) provided in each of the projecting portions (44, 46). In consequence, at the time of mounting and removing the filter accommodating cylinder (37), the falling-off of the gasket (42) can be prevented, and, for example, an inspection operation, a cleaning operation and the like of an accommodated particulate matter removing filter (41) can be easily performed.

    摘要翻译: 在形成在过滤器容纳筒(37)中的前侧突出部(44)和后侧突出部(46)中的每一个中设置有与垫圈(42)接合的接合槽(47),以定位在 每个突出部分(44,46)的外周表面(44A,46A)。 因此,当垫圈(42)从外部闩锁在每个突出部分(44; 46)上时,垫圈(42)可与设置在每个突出部分中的接合槽(47)接合 (44,46)。 因此,在安装和移除过滤器容纳筒(37)时,可以防止垫圈(42)的脱落,并且例如可以防止容纳的过滤器的检查操作,清洁操作等 可以容易地进行颗粒物去除过滤器(41)。

    ELECTROCHEMICAL DEVICE AND METHOD FOR PRODUCTION THEREOF
    7.
    发明申请
    ELECTROCHEMICAL DEVICE AND METHOD FOR PRODUCTION THEREOF 审中-公开
    电化学装置及其生产方法

    公开(公告)号:US20090325058A1

    公开(公告)日:2009-12-31

    申请号:US12524332

    申请日:2008-05-08

    IPC分类号: H01M10/50 H01M10/04

    摘要: An electrochemical device of the present invention includes a positive electrode, a negative electrode, a non-aqueous electrolyte, and a separator. The separator includes a first porous layer composed mainly of a thermoplastic resin and a second porous layer composed mainly of insulating particles with a heat-resistant temperature of 150° C. or higher. The first porous layer is disposed to face the negative electrode.

    摘要翻译: 本发明的电化学装置包括正极,负极,非水电解质和隔膜。 隔板包括主要由热塑性树脂构成的第一多孔层和主要由耐热温度为150℃或更高的绝缘颗粒组成的第二多孔层。 第一多孔层设置成面对负极。

    Method for forming resist pattern
    10.
    发明授权
    Method for forming resist pattern 失效
    形成抗蚀剂图案的方法

    公开(公告)号:US4461825A

    公开(公告)日:1984-07-24

    申请号:US534938

    申请日:1983-09-26

    摘要: An improved method of forming a photoresist pattern in the photoengraving process. In the photoengraving process, after forming a photoresist layer, a non-photosensitive organic layer containing cyclized polyisoprene rubber as the major constituent is formed thereover. The organic layer is covered with a mask. The photoresist layer is selectively exposed to light through the organic layer. After developing and removing the organic layer, or together with the organic layer, the photoresist layer is developed.

    摘要翻译: 在光刻工艺中形成光致抗蚀剂图案的改进方法。 在光刻工序中,在形成光致抗蚀剂层之后,形成以环化聚异戊二烯橡胶为主要成分的非感光性有机层。 有机层被掩模覆盖。 光致抗蚀剂层通过有机层选择性地暴露于光。 在显影和除去有机层之后,或与有机层一起,显影光致抗蚀剂层。