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    EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS
    1.
    发明申请
    EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS 有权
    极光超光源光源装置

    公开(公告)号：US20120091893A1

    公开(公告)日：2012-04-19

    申请号：US13336749

    申请日：2011-12-23

    申请人： Tatsuya YANAGIDA ,  Akira Endo ,  Hiroshi Komori ,  Shinji Nagai ,  Kouji Kakizaki ,  Tamotsu Abe ,  Hideo Hoshino

    发明人： Tatsuya YANAGIDA ,  Akira Endo ,  Hiroshi Komori ,  Shinji Nagai ,  Kouji Kakizaki ,  Tamotsu Abe ,  Hideo Hoshino

    IPC分类号： H05H1/46

    CPC分类号： H05G2/003 ,  G03F7/70033 ,  G03F7/70916 ,  H05G2/005 ,  H05G2/008

    摘要： In an EUV light source apparatus, a collector mirror is protected from debris damaging a mirror coating. The EUV light source apparatus includes: a chamber in which extreme ultraviolet light is generated; a target supply unit for supplying a target material into the chamber; a plasma generation laser unit for irradiating the target material within the chamber with a plasma generation laser beam to generate plasma; an ionization laser unit for irradiating neutral particles produced at plasma generation with an ionization laser beam to convert the neutral particles into ions; a collector mirror for collecting the extreme ultraviolet light radiated from the plasma; and a magnetic field or electric field forming unit for forming a magnetic field or an electric field within the chamber so as to trap the ions.

    摘要翻译： 在EUV光源装置中，集光镜受到保护，不会损坏镜面涂层。 EUV光源装置包括：产生极紫外光的室; 目标供应单元，用于将目标材料供应到所述室中; 等离子体产生激光器单元，用于用等离子体产生激光束照射室内的目标材料以产生等离子体; 电离激光单元，用于用电离激光束照射在等离子体产生时产生的中性粒子，以将中性粒子转化为离子; 用于收集从等离子体辐射的极紫外光的收集镜; 以及用于在室内形成磁场或电场以捕获离子的磁场或电场形成单元。

    EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS
    2.
    发明申请
    EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS 有权
    极光超光源光源装置

    公开(公告)号：US20120119116A1

    公开(公告)日：2012-05-17

    申请号：US13293914

    申请日：2011-11-10

    申请人： Kouji KAKIZAKI ,  Shinji NAGAI ,  Tatsuya YANAGIDA

    发明人： Kouji KAKIZAKI ,  Shinji NAGAI ,  Tatsuya YANAGIDA

    IPC分类号： G21K5/00

    CPC分类号： G21K5/00 ,  G03F7/70033 ,  G03F7/70916 ,  H05G2/005 ,  H05G2/008

    摘要： An extreme ultraviolet light source apparatus in which a target material is irradiated with a laser beam and turned into plasma and extreme ultraviolet light is emitted from the plasma may include: a chamber in which the extreme ultraviolet light is generated; an electromagnetic field generation unit for generating at least one of an electric field and a magnetic field inside the chamber; and a cleaning unit for charging and separating debris adhered to an optical element inside the chamber.

    摘要翻译： 从等离子体射出目标材料被照射激光并变成等离子体和极紫外光的极紫外光源装置可以包括：产生极紫外光的室; 电磁场产生单元，用于产生腔室内的电场和磁场中的至少一个; 以及用于对粘附到腔室内的光学元件的碎屑进行充填和分离的清洁单元。

    EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS
    3.
    发明申请
    EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS 有权
    极光超光源光源装置

    公开(公告)号：US20100213395A1

    公开(公告)日：2010-08-26

    申请号：US12646075

    申请日：2009-12-23

    申请人： Yoshifumi UENO ,  Georg Soumagne ,  Shinji NAGAI ,  Akira ENDO ,  Tatsuya YANAGIDA

    发明人： Yoshifumi UENO ,  Georg Soumagne ,  Shinji NAGAI ,  Akira ENDO ,  Tatsuya YANAGIDA

    IPC分类号： H05G2/00

    CPC分类号： H05G2/003 ,  H05G2/008

    摘要： In an extreme ultraviolet light source apparatus generating an extreme ultraviolet light from a plasma generated by irradiating a target, which is a droplet D of molten Sn, with a laser light, and controlling the flow direction of ion generated at the generation of the extreme ultraviolet light by a magnetic field or an electric field, an ion collection cylinder 20 is arranged for collecting the ion, and ion collision surfaces Sa and Sb of the ion collection cylinder 20 are provided with or coated with Si, which is a metal whose sputtering rate with respect to the ion is less than one atom/ion.

    摘要翻译： 在极紫外光源装置中，通过用激光照射作为熔融Sn的液滴D而产生的等离子体产生极紫外光，并且控制在产生极紫外光时产生的离子的流动方向 通过磁场或电场照射光，离子收集筒20被布置成用于收集离子，离子收集筒20的离子碰撞表面Sa和Sb设置有或涂覆有Si，溅射速率 相对于离子小于一个原子/离子。