公开(公告)号：US20070017379A1

公开(公告)日：2007-01-25

申请号：US11491568

申请日：2006-07-24

申请人： Hiroyuki Takizawa ,  Shinichi Furuhata ,  Shuhei Kashiwabara ,  Tesuhiko Shimizu ,  Hiroaki Wanikawa ,  Hiromi Uchiyama ,  Emiko Kubo ,  Yukio Izumi ,  Hiroki Ohno ,  Tetsuya Ozawa ,  Aya Koike

发明人： Hiroyuki Takizawa ,  Shinichi Furuhata ,  Shuhei Kashiwabara ,  Tesuhiko Shimizu ,  Hiroaki Wanikawa ,  Hiromi Uchiyama ,  Emiko Kubo ,  Yukio Izumi ,  Hiroki Ohno ,  Tetsuya Ozawa ,  Aya Koike

IPC分类号： A47J31/44

CPC分类号： A47J31/057 ,  A47J31/467

摘要： A beverage maker including an extract liquid receptacle for accumulating therein extract liquid which is extracted by a beverage extractor, and a cooling liquid reservoir for accommodating therein cooling liquid that contacts the extract liquid with the wall of the extract liquid receptacle in between; and the beverage maker further including a stirring vane for stirring the extract liquid inside the extract liquid receptacle, and a vane drive unit for driving the stirring vane.

摘要翻译： 一种饮料制造机，包括用于在其中积聚的提取液容器，其中提取液由饮料提取器提取;以及冷却液储存器，用于在其中容纳与提取液体接触的提取液体的冷却液体; 并且所述饮料制造机还包括用于搅拌所述提取液​​容器内部的提取液的搅拌叶片，以及驱动所述搅拌叶片的叶片驱动单元。

公开(公告)号：US20070017378A1

公开(公告)日：2007-01-25

申请号：US11491567

申请日：2006-07-24

申请人： Hiroyuki Takizawa ,  Shinichi Furuhata ,  Shuhei Kashiwabara ,  Tetsuhiko Shimizu ,  Hiroaki Kaneko ,  Hiroki Ohno ,  Yukio Izumi ,  Hiromi Uchiyama ,  Hiroaki Wanikawa

发明人： Hiroyuki Takizawa ,  Shinichi Furuhata ,  Shuhei Kashiwabara ,  Tetsuhiko Shimizu ,  Hiroaki Kaneko ,  Hiroki Ohno ,  Yukio Izumi ,  Hiromi Uchiyama ,  Hiroaki Wanikawa

IPC分类号： A47J31/44

CPC分类号： A47J31/057 ,  A47J31/46 ,  A47J31/50

摘要： A beverage maker including: a scatter 70 and an ice beverage extraction funnel 50 that are selectively held in a main body unit 10 in a rotatable manner; a hot beverage extraction funnel 76 held in the main body unit 10 in the hot beverage extraction mode for receiving hot water dripped by the scatter 70; a cooling liquid reservoir 52B held in the main body unit 10 in the ice beverage extraction mode for cooling an extract liquid collector unit 52A that receives hot extract liquid from the ice beverage extraction funnel 50 and for cooling the extract liquid; and rotatable stirring members 50A and 50B extending into at least one or other of the extract liquid collector unit 52A and cooling liquid reservoir 52B.

摘要翻译： 一种饮料制造机，包括：分散体70和冰饮料提取漏斗50，其以可旋转的方式选择性地保持在主体单元10中; 以热饮料提取模式保持在主体单元10中的热饮料提取漏斗76，用于接收由散射物70滴落的热水; 在冰饮料提取模式中保持在主体单元10中的冷却液储存器52B，用于冷却从冰饮料提取漏斗50接收热提取液并用于冷却提取液的提取液收集器单元52A; 以及可旋转的搅拌构件50A和50B，其延伸到提取液收集器单元52A和冷却液体储存器52B中的至少一个或另外。

公开(公告)号：US20070017382A1

公开(公告)日：2007-01-25

申请号：US11491571

申请日：2006-07-24

申请人： Hiroyuki Takizawa ,  Shinichi Furuhata ,  Shuhei Kashiwabara ,  Hiroki Ohno ,  Hiroaki Wanikawa

发明人： Hiroyuki Takizawa ,  Shinichi Furuhata ,  Shuhei Kashiwabara ,  Hiroki Ohno ,  Hiroaki Wanikawa

IPC分类号： A47J31/00

CPC分类号： A47G19/2288 ,  A47J31/057 ,  A47J31/467 ,  A47J31/50

摘要： A beverage maker including an extract liquid receptacle 52A for storing therein extract liquid extracted by beverage extraction means 50, and a cooling reservoir 52B for accommodating therein cooling liquid that contact the extract liquid with the walls of that extract liquid receptacle 52A in between, so that the extract liquid is cooled by the cooling reservoir 52B; wherein the extract liquid receptacle 52A and cooling reservoir 52B are integrated to form a cooling unit 52, a cooling material is sealed in the cooling reservoir 52B, so that the entire cooling unit 52 is cooled.

摘要翻译： 一种饮料制造商，其包括用于储存由饮料提取装置50提取的提取液的提取液容器52A和用于容纳其中的冷却液体的冷却液体52B，所述冷却液体与提取液体容器52A的壁接触， ，使得提取液被冷却储存器52B冷却; 其中提取液容器52A和冷却储存器52B被一体化以形成冷却单元52，冷却材料被密封在冷却储存器52B中，使得整个冷却单元52被冷却。

公开(公告)号：US20070017380A1

公开(公告)日：2007-01-25

申请号：US11491569

申请日：2006-07-24

申请人： Hiroyuki Takizawa ,  Shinichi Furuhata ,  Shuhei Kashiwabara ,  Hiroki Ohno

发明人： Hiroyuki Takizawa ,  Shinichi Furuhata ,  Shuhei Kashiwabara ,  Hiroki Ohno

IPC分类号： A47J31/44

CPC分类号： A47J31/4478 ,  A47J31/057

摘要： A beverage maker including a scatter 70, which is rotated relative to a beverage extraction funnel 76 about a vertical rotational center axis line above the beverage extraction funnel 76 and thus conduct hot water flowing out from a hot water pour-out port, and a rotational drive unit 22, which is for rotationally driving at least one or other of the scatter 70 and the beverage extraction funnel 76; and the scatter 70 has bottom surfaces 72 and 74 which vary in depth, and drip holes 72A and 74A are formed, in the bottom surfaces 72 and 74, at positions of differing depths and differing distances from the rotational center axis line.

摘要翻译： 一种饮料制造商，其包括分散体70，其相对于饮料提取漏斗76围绕饮料提取漏斗76上方的垂直旋转中心轴线旋转，并且因此传导从热水倾倒端口流出的热水，并且旋转 驱动单元22，其用于旋转地驱动散射物70和饮料提取漏斗76中的至少一个或多个; 并且分散体70具有深度不同的底表面72和74，并且在底表面72和74中，在与旋转中心轴线不同的深度和不同距离的位置处形成滴孔72A和74A。

公开(公告)号：US08771429B2

公开(公告)日：2014-07-08

申请号：US13420870

申请日：2012-03-15

申请人： Linan Ji ,  Hidekazu Hayashi ,  Hiroshi Tomita ,  Hisashi Okuchi ,  Yohei Sato ,  Takayuki Toshima ,  Mitsuaki Iwashita ,  Kazuyuki Mitsuoka ,  Gen You ,  Hiroki Ohno ,  Takehiko Orii

发明人： Linan Ji ,  Hidekazu Hayashi ,  Hiroshi Tomita ,  Hisashi Okuchi ,  Yohei Sato ,  Takayuki Toshima ,  Mitsuaki Iwashita ,  Kazuyuki Mitsuoka ,  Gen You ,  Hiroki Ohno ,  Takehiko Orii

IPC分类号： B08B7/00

CPC分类号： H01L21/02 ,  F26B21/10 ,  F26B21/14 ,  F26B23/028 ,  F26B2200/04 ,  H01L21/02052 ,  H01L21/02057 ,  H01L21/02101 ,  H01L21/67034

摘要： According to one embodiment, a supercritical drying method for a semiconductor substrate, comprises introducing the semiconductor substrate into a chamber in a state, a surface of the semiconductor substrate being wet with alcohol, substituting the alcohol on the semiconductor substrate with a supercritical fluid of carbon dioxide by impregnating the semiconductor substrate to the supercritical fluid in the chamber, and discharging the supercritical fluid and the alcohol from the chamber and reducing a pressure inside the chamber. The method further comprises performing a baking treatment by supplying an oxygen gas or an ozone gas to the chamber after the reduction of the pressure inside the chamber.

摘要翻译： 根据一个实施方案，一种用于半导体衬底的超临界干燥方法包括将半导体衬底以一种状态将半导体衬底引入室中，该半导体衬底的表面被醇润湿，用半导体衬底上的醇代替超临界流体碳 通过将半导体衬底浸渍到腔室中的超临界流体中，并且将超临界流体和醇从腔室排出并且减小腔室内的压力，从而将二氧化碳稀释。 该方法还包括在减小室内的压力之后，通过向室内供应氧气或臭氧气体进行烘烤处理。

公开(公告)号：US07806989B2

公开(公告)日：2010-10-05

申请号：US11394337

申请日：2006-03-31

申请人： Kenji Sekiguchi ,  Noritaka Uchida ,  Satoru Tanaka ,  Hiroki Ohno

发明人： Kenji Sekiguchi ,  Noritaka Uchida ,  Satoru Tanaka ,  Hiroki Ohno

IPC分类号： B08B3/00 ,  B08B7/04

CPC分类号： H01L21/67051 ,  B08B3/02 ,  B08B3/024 ,  B08B3/04 ,  H01L21/6708 ,  Y10S134/902

摘要： A substrate (W) is processed with the use of a process liquid such as a deionized water. Then, a first fluid which is more volatile than the process liquid is supplied to an upper surface of the substrate (W) from a fluid nozzle (12) to form a liquid film. Next, a second fluid which is more volatile than the process liquid is supplied to the upper surface of the substrate (W) from the fluid nozzle (12), while the wafer (W) is being rotated. During this supply operation, a supply position (Sf) of the second fluid to the substrate (W) is moved radially outward from a rotational center (Po) of the substrate (W). As a result, it is possible to prevent the generation of particles on the substrate (W) after it is dried by using the first and second fluids.

摘要翻译： 使用诸如去离子水的工艺液体处理衬底（W）。 然后，从流体喷嘴（12）向基板（W）的上表面供给比处理液更易挥发的第一流体，形成液膜。 接下来，在晶片（W）旋转的同时，从流体喷嘴（12）向基板（W）的上表面供给比处理液更易挥发的第二流体。 在该供给动作中，第二流体与基板（W）的供给位置（Sf）从基板（W）的旋转中心（Po）向径向外侧移动。 结果，可以防止在通过使用第一和第二流体干燥基板（W）之后产生颗粒。

公开(公告)号：US20070175501A1

公开(公告)日：2007-08-02

申请号：US10593560

申请日：2005-04-05

申请人： Masaru Amai ,  Kenji Sekiguchi ,  Takehiko Orii ,  Hiroki Ohno ,  Satoru Tanaka ,  Takuya Mori

发明人： Masaru Amai ,  Kenji Sekiguchi ,  Takehiko Orii ,  Hiroki Ohno ,  Satoru Tanaka ,  Takuya Mori

IPC分类号： B08B3/00

CPC分类号： H01L21/67051 ,  B08B1/04 ,  H01L21/67046

摘要： In a substrate cleaning method and a substrate cleaning method according to the present invention, a brush 3 is brought into contact with a substrate W while rotating the same, and a cleaning position Sb of the brush 3 is moved relative to the substrate W from a center part of the substrate W toward a peripheral part thereof. A process fluid formed of liquid droplets and a gas is sprayed by a two-fluid nozzle 5 onto the substrate W, and a cleaning position Sn of the two-fluid nozzle 5 is moved relative to the substrate W from a center part of the substrate W toward a peripheral part thereof. During the movement of the cleaning position Sb of the brush 3 from the center part of the substrate W toward the peripheral part thereof, the cleaning position Sb of the two-fluid nozzle is positioned nearer to a center P0 than the cleaning position Sb of the brush 3. Since contaminations of the brush are prevented from adhering again to the wafer, it can be avoided that the wafer W is contaminated.

摘要翻译： 在根据本发明的基板清洗方法和基板清洗方法中，刷子3在旋转基板W的同时与基板W接触，并且刷子3的清洁位置Sb相对于基板W从 衬底W的中心部分朝向其周边部分。 由液滴和气体形成的工艺流体由双流体喷嘴5喷射到基板W上，并且双流体喷嘴5的清洁位置Sn相对于基板W从基板的中心部分移动 W朝向其周边部分。 在刷子3的清洁位置Sb从基板W的中心部朝向其周边部移动的过程中，双流体喷嘴的清洁位置Sb位于更靠近中心P 0 < >刷3的清洁位置Sb。 由于防止刷子的污染再次粘附到晶片上，所以可以避免晶片W被污染。

公开(公告)号：US06895979B2

公开(公告)日：2005-05-24

申请号：US10359208

申请日：2003-02-06

申请人： Kyouji Kohama ,  Eiji Shimbo ,  Yuji Kamikawa ,  Takayuki Toshima ,  Hiroki Ohno

发明人： Kyouji Kohama ,  Eiji Shimbo ,  Yuji Kamikawa ,  Takayuki Toshima ,  Hiroki Ohno

IPC分类号： H01L21/304 ,  B08B3/02 ,  B08B3/10 ,  H01L21/00

CPC分类号： H01L21/67086 ,  B08B3/02 ,  B08B3/102 ,  H01L21/67051 ,  H01L21/67057 ,  H01L21/6708 ,  Y10S134/902

摘要： A processing apparatus essentially includes a rotatable rotor 21 for carrying semiconductor wafers W, a motor 22 for driving to rotate the rotor 21, a plurality of processing chambers for surrounding the wafers W carried by the rotor 21, for example, an inner chamber 23 and an outer chamber 24, a chemical supplying unit 50, an IPA supplying unit 60, a rinse supplying unit 70 and a drying fluid supplying unit 80. With this constitution of the apparatus, it is possible to prevent the wafers from being contaminated due to the reaction of treatment liquids of different kinds, with the improvement of processing efficiency and miniaturization of the apparatus.

摘要翻译： 一种处理装置主要包括用于承载半导体晶片W的可旋转转子21，用于驱动转子21旋转的电动机22，用于围绕由转子21承载的晶片W的多个处理室，例如内室23和 外部室24，化学品供应单元50，IPA供应单元60，漂洗供应单元70和干燥流体供应单元80.通过该设备的这种结构，可以防止晶片被 不同种类的处理液的反应，提高了加工效率和设备的小型化。

公开(公告)号：US20050026454A1

公开(公告)日：2005-02-03

申请号：US10927102

申请日：2004-08-27

申请人： Nobuo Konishi ,  Mitsuaki Iwashita ,  Hiroki Ohno ,  Shigeru Kawamura ,  Masahito Sugiura

发明人： Nobuo Konishi ,  Mitsuaki Iwashita ,  Hiroki Ohno ,  Shigeru Kawamura ,  Masahito Sugiura

IPC分类号： H01L21/20 ,  H01L21/768 ,  H01L21/4763 ,  H01L21/31 ,  H01L21/469 ,  H01L23/48 ,  H01L23/52 ,  H01L29/40

CPC分类号： H01L21/76837 ,  H01L21/76825 ,  H01L21/76826 ,  H01L21/76828 ,  H01L21/76829

摘要： The present invention comprises the steps of performing a reforming process on a surface of a low dielectric constant insulation film formed on a substrate which includes one of a porous low dielectric constant insulation film and a non-porous low dielectric constant insulation film and forming an insulation film as at least one of an etching mask and a Chemical Mechanical Polishing stopper (CMP stopper) on the reformed surface of the low dielectric constant insulation film. For example, plasma is radiated as a reforming process mentioned above, the surface roughness of a low dielectric insulation film is increased and, as a result, adhesion between the films and also between the inter-layer insulation film and other neighboring films can be improved with so-called “anchor effect”.

摘要翻译： 本发明包括以下步骤：对形成在基板上的低介电常数绝缘膜的表面进行重整工序，该基板包括多孔低介电常数绝缘膜和无孔低介电常数绝缘膜之一，并形成绝缘层 薄膜作为低介电常数绝缘膜的重整表面上的蚀刻掩模和化学机械抛光终止剂（CMP止动器）中的至少一个。 例如，等离子体作为上述重整工序被照射，低介电绝缘膜的表面粗糙度增加，结果，可以改善膜之间以及层间绝缘膜和其它相邻膜之间的粘附性 具有所谓的“锚效应”。

公开(公告)号：US08056257B2

公开(公告)日：2011-11-15

申请号：US11984100

申请日：2007-11-13

申请人： Hiroki Ohno ,  Kenji Sekiguchi

发明人： Hiroki Ohno ,  Kenji Sekiguchi

IPC分类号： F26B3/00

CPC分类号： H01L21/02057 ,  H01L21/02052 ,  H01L21/67023 ,  H01L21/67051

摘要： A substrate processing apparatus includes a chamber, and a cleaning-liquid supply unit that supplies a cleaning liquid containing hydrofluoro ether onto a substrate to be processed placed in the chamber. In the chamber, there is further disposed a gas supply unit that supplies into the chamber a gas for preventing moisture from being adhered to a substrate to be processed, when a cleaning liquid containing hydrofluoro ether is supplied onto the substrate to be processed.

摘要翻译： 基板处理装置包括：室，以及清洗液供给单元，其将含有氢氟醚的清洗液供给到被处理的基板上。 在室内还设置有一个气体供给单元，当含有氢氟醚的清洗液体被供给到待处理的基板上时，该气体供给单元将用于防止湿气附着在被处理基板上的气体供给到室内。