公开(公告)号：US20240128047A1

公开(公告)日：2024-04-18

申请号：US18286607

申请日：2021-04-13

申请人： Hitachi High-Tech Corporation

发明人： Masahiro YOSHIDA ,  Junichi FUSE ,  Norio SATO ,  Hirotsugu KAJIYAMA

IPC分类号： H01J37/20 ,  H01J37/22 ,  H01J37/244 ,  H01J37/26 ,  H01J37/28

CPC分类号： H01J37/20 ,  H01J37/222 ,  H01J37/244 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/2448 ,  H01J2237/24564 ,  H01J2237/24592 ,  H01J2237/2817

摘要： A sample inspection apparatus is provided. The invention is directed to a sample inspection apparatus 200 that includes an inspection means that is executed when a sample 11 is placed on a stage 8, the inspection means including the steps of (a) scanning a surface of the sample 11 with an electron beam EB1 with a probe 10a in contact with a conductor 11a and a probe 10b in contact with a conductor 11b, (b) measuring a differential value of a change in potential difference between the probes 10a and 10b while synchronizing with the scanning of the electron beam EB1, (c) acquiring a DI-EBAC image in which a fault spot 12 existing between the conductors 11a and 11b is shown as a bright part and a dark part based on the differential value of the change in the potential difference, and (d) specifying a direction of the fault spot 12 from the DI-EBAC image.

公开(公告)号：US20240255556A1

公开(公告)日：2024-08-01

申请号：US18560608

申请日：2021-05-21

申请人： Hitachi High-Tech Corporation

发明人： Tomoko SHIMAMORI ,  Yasuhiko NARA ,  Junichi FUSE ,  Akira KAGEYAMA

IPC分类号： G01R23/12 ,  G01N23/2251 ,  G01R1/067 ,  G01R1/28 ,  G01R31/305 ,  H01J37/22

CPC分类号： G01R23/12 ,  G01N23/2251 ,  G01R1/06766 ,  G01R1/28 ,  G01R31/305 ,  H01J37/222 ,  H01J2237/221

摘要： Provided is a sample inspection apparatus capable of identifying a capacitive fault or a potential faulty point where an electrical tolerance is low. The sample inspection apparatus includes: a charged particle optical system configured to irradiate a sample 19 with a charged particle beam; a first probe 21a configured to come into contact with the sample; an amplifier 23 having an input terminal to which the first probe is connected; and a phase detection unit 40 to which an output signal of the amplifier is input, in which an AC voltage is applied to the first probe, and the phase detection unit detects the output signal of the amplifier using a reference signal synchronized with the AC voltage and having the same frequency as the AC voltage.

公开(公告)号：US20230273254A1

公开(公告)日：2023-08-31

申请号：US18026718

申请日：2020-09-30

申请人： Hitachi High-Tech Corporation

发明人： Shota MITSUGI ,  Yohei NAKAMURA ,  Daisuke BIZEN ,  Junichi FUSE ,  Satoshi TAKADA ,  Natsuki TSUNO

IPC分类号： G01R31/265

CPC分类号： G01R31/2653 ,  G01R31/2656

摘要： A control device controls a contact probe in synchronization with a pulse-controlled light having a predetermined wavelength, a measurement instrument measures a characteristic of a sample to be inspected or an analysis sample, and a circuit constant or a defect structure of the sample to be inspected is estimated based on a circuit model created by an electric characteristic analysis device configured to generate the circuit model based on a value measured by the measurement instrument and a detection signal of secondary electrons detected by the charged particle beam device.