公开(公告)号：US20230377837A1

公开(公告)日：2023-11-23

申请号：US18031359

申请日：2020-10-26

Applicant: Hitachi High-Tech Corporation

Inventor： Yohei NAKAMURA ,  Natsuki TSUNO ,  Yasuhiro SHIRASAKI ,  Minami SHOUJI ,  Shota MITSUGI ,  Yuko SASAKI

IPC: H01J37/26 ,  H01J37/244 ,  H01J37/22 ,  H01J37/28

CPC classification number: H01J37/265 ,  H01J37/244 ,  H01J37/226 ,  H01J37/28 ,  H01J2237/2448

Abstract: Charged particle beam apparatus includes: a charged particle optical system to irradiate a sample with a pulsed charged particle beam; an optical system to irradiate the sample with light; a detector configured to detect a secondary charged particle emitted by irradiating the sample with the pulsed charged particle beam; a control unit configured to control the charged particle optical system to irradiate the sample with the pulsed charged particle beam under a predetermined electron beam pulse condition, and control the optical system to irradiate the sample with the light under a predetermined light irradiation condition; and a computation device configured to set the predetermined light irradiation condition based on a difference between a secondary charged particle signal amount detected under a first electron beam pulse condition and a secondary charged particle signal amount detected under a second electron beam pulse condition different from the first electron beam pulse condition.

公开(公告)号：US20230273254A1

公开(公告)日：2023-08-31

申请号：US18026718

申请日：2020-09-30

Applicant: Hitachi High-Tech Corporation

Inventor： Shota MITSUGI ,  Yohei NAKAMURA ,  Daisuke BIZEN ,  Junichi FUSE ,  Satoshi TAKADA ,  Natsuki TSUNO

IPC: G01R31/265

CPC classification number: G01R31/2653 ,  G01R31/2656

Abstract: A control device controls a contact probe in synchronization with a pulse-controlled light having a predetermined wavelength, a measurement instrument measures a characteristic of a sample to be inspected or an analysis sample, and a circuit constant or a defect structure of the sample to be inspected is estimated based on a circuit model created by an electric characteristic analysis device configured to generate the circuit model based on a value measured by the measurement instrument and a detection signal of secondary electrons detected by the charged particle beam device.