公开(公告)号：US20240242917A1

公开(公告)日：2024-07-18

申请号：US18559408

申请日：2021-05-17

Applicant: Hitachi High-Tech Corporation

Inventor： Yasuchika SUZUKI ,  Shinichi KATO ,  Takashi OHNISHI ,  Shunichi WATANABE

IPC: H01J37/065 ,  H01J37/248 ,  H01J37/28

CPC classification number: H01J37/065 ,  H01J37/248 ,  H01J37/28 ,  H01J2237/2802

Abstract: The purpose of the present disclosure is to provide a high-voltage insulating structure capable of reducing an electric field around a conductor to which a high voltage is applied. In this high-voltage insulating structure, an electrically conductive part, to which a high voltage is applied and which extends in an axial direction, is surrounded by an insulator, wherein the insulator comprises a first insulator 105, a second insulator 203 positioned on the opposite side from the first insulator in the axial direction, and a third insulator 205 positioned between the first and second insulators. The electrical resistivity of the third insulator 205 is smaller than the electrical resistivities of the first and second insulators. As for the thickness of the third insulator 205 in the axial direction, a first thickness at the outer side farther from the electrically conductive part is less than a second thickness at the inner side closer to the electrically conductive part.

公开(公告)号：US20250079112A1

公开(公告)日：2025-03-06

申请号：US18285457

申请日：2021-04-15

Applicant: Hitachi High-Tech Corporation

Inventor： Hiroshi MORITA ,  Takashi KUBO ,  Minoru SAKAMAKI ,  Shuhei ISHIKAWA ,  Shunichi WATANABE

IPC: H01J37/07 ,  H01J37/09 ,  H01J37/16 ,  H01J37/24 ,  H01J37/295

Abstract: Provided is a charged particle beam apparatus capable of realizing a highly reliable insulating structure. This charged particle beam apparatus emits a charged particle beam from a charged particle beam emission device onto a sample, detects charged particles generated from the sample, and creates a sample image or processes the sample. The charged particle beam emission device is provided with a charged particle source and a shield arranged in an interior of a metal housing that is filled with an insulating gas, and an acceleration electrode arranged below the charged particle source, power being supplied to the acceleration electrode via the shield.

公开(公告)号：US20240379318A1

公开(公告)日：2024-11-14

申请号：US18691071

申请日：2021-10-19

Applicant: Hitachi High-Tech Corporation

Inventor： Keigo KASUYA ,  Shuhei ISHIKAWA ,  Kenji TANIMOTO ,  Shunichi WATANABE ,  Takashi DOI ,  Yusuke SAKAI

IPC: H01J37/073 ,  H01J37/28

Abstract: Provided is a charged particle beam device that can precisely manage a temperature at which a cold field emitter is heated. A charged particle beam device includes: a cold field emitter including a tip having a sharpened distal end, a filament connected to the tip, and an auxiliary electrode covering the filament and having an opening from which the tip protrudes; an extraction electrode to which an extraction voltage for extracting electrons from the cold field emitter is applied; and an acceleration electrode to which an acceleration voltage for accelerating the electrons extracted from the cold field emitter is applied. When the tip and the filament are heated, thermionic electrons emitted from the tip and the filament are collected by the auxiliary electrode to measure a current by applying a positive voltage with respect to the tip to the auxiliary electrode.