Stage Apparatus and Charged Particle Radiation Apparatus Equipped with Stage Apparatus
    1.
    发明申请
    Stage Apparatus and Charged Particle Radiation Apparatus Equipped with Stage Apparatus 有权
    舞台装置和带电的粒子辐射装置配备舞台装置

    公开(公告)号:US20160284506A1

    公开(公告)日:2016-09-29

    申请号:US15075572

    申请日:2016-03-21

    Abstract: A stage apparatus includes a base. A table is movable relative to the base in a predetermined moving direction. A drive mechanism moves the table in the moving direction. A pressing mechanism presses the table in a direction different from the moving direction of the table. A position detection device detects a location of the table. A control device controls the pressing mechanism in accordance with table position information. The control device pinpoints a first location of the table before the table is pressed by the pressing mechanism and a second location of the table after the table is pressed by the pressing mechanism, and controls one or both of the drive mechanism and the pressing mechanism in accordance with a difference between the first and second locations of the table.

    Abstract translation: 舞台装置包括底座。 桌子可以相对于基座沿预定的移动方向移动。 驱动机构沿移动方向移动台。 按压机构沿与桌子的移动方向不同的方向按压桌子。 位置检测装置检测台的位置。 控制装置根据表位置信息控制按压机构。 所述控制装置在所述工作台被所述按压机构按压之前,将所述工作台的第一位置指向所述工作台的第一位置,并且在所述工作台被所述按压机构按压之后,所述工作台的第二位置被控制,并且驱动所述驱动机构和所述按压机构 根据表的第一和第二位置之间的差异。

    Charged Particle Beam Apparatus, Stage Controlling Method, and Stage System
    2.
    发明申请
    Charged Particle Beam Apparatus, Stage Controlling Method, and Stage System 有权
    带电粒子束装置,舞台控制方法和舞台系统

    公开(公告)号:US20160005568A1

    公开(公告)日:2016-01-07

    申请号:US14747364

    申请日:2015-06-23

    CPC classification number: H01J37/20 H01J2237/20221 H01J2237/20278

    Abstract: A stage system includes a stage that holds an object, a linear motor mechanism that moves the stage by a thrust force generated by a current flowing through the coil, and a control section that controls the current flowing through the coil. The current flowing through the coil in a state where the stage is maintained in the static state be greater than a minimum current amount required for generating the thrust force greater than a maximum static friction force of the stage with respect to the guide rails.

    Abstract translation: 舞台系统包括保持物体的平台,通过由流过线圈的电流产生的推力而移动舞台的线性电机机构,以及控制流过线圈的电流的控制部。 在台阶保持在静止状态的状态下流过线圈的电流大于产生大于相对于导轨的台的最大静摩擦力的推力所需的最小电流量。

    Stage Device and Charged Particle Beam Apparatus Using the Stage Device
    4.
    发明申请
    Stage Device and Charged Particle Beam Apparatus Using the Stage Device 有权
    使用舞台装置的舞台装置和带电粒子束装置

    公开(公告)号:US20150248991A1

    公开(公告)日:2015-09-03

    申请号:US14626041

    申请日:2015-02-19

    Abstract: To attain the above object, in the present invention, proposed are a stage apparatus including a sample stage that mounts a sample, a first position detection device that detects a position of the sample stage, a second position detection device that detects a position of the sample stage when the sample stage is positioned in a part of a stage movement range that the first position detection device is capable of detecting, and a control device that adjusts an offset amount of the first position detection device on the basis of a position detection result obtained by the second position detection device, and a charged particle beam apparatus using the stage apparatus.

    Abstract translation: 为了实现上述目的,在本发明中,提出了一种舞台装置,其包括安装样本的样本台,检测样品台的位置的第一位置检测装置,检测样品台的位置的第二位置检测装置 所述样品台位于所述第一位置检测装置能够检测的台架移动范围的一部分中的控制装置;以及控制装置,其基于位置检测结果来调整所述第一位置检测装置的偏移量 由第二位置检测装置获得的带电粒子束装置和使用该平台装置的带电粒子束装置。

    CHARGED PARTICLE BEAM DEVICE
    7.
    发明申请

    公开(公告)号:US20190108970A1

    公开(公告)日:2019-04-11

    申请号:US16099494

    申请日:2017-06-14

    Abstract: An object of the present invention is to provide a charged particle beam device capable of correcting an image drift caused by stage deformation or the like during imaging immediately after stage movement. In order to achieve the above object, proposed is a charged particle beam device including: a sample chamber; a sample stage arranged in the sample chamber; a charged particle beam source which releases a charged particle beam; a deflector which deflects the charged particle beam released from the charged particle beam source; a focusing lens which focuses the charged particle beam; and a control device that controls the sample stage and the deflector, in which the control device calculates a deflection signal to be supplied to the deflector based on a thrust information when driving of the sample stage and a coefficient assigned for each position of the sample stage.

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