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公开(公告)号：US20050211789A1
公开(公告)日：2005-09-29
申请号：US11092230
申请日：2005-03-28
申请人： Ho-Li Hsieh , Hung-Wen Yang , Ching-Lung Wang , Yu-Ying Chan , Tseng-Kuei Tseng
发明人： Ho-Li Hsieh , Hung-Wen Yang , Ching-Lung Wang , Yu-Ying Chan , Tseng-Kuei Tseng
IPC分类号： G06K19/06
CPC分类号： G06K19/06028
摘要： A glass substrate includes a two-dimensional barcode, which is provided on a peripheral region of a major surface of the glass substrate. A side of the two-dimensional barcode is oblique to a nearest side of the glass substrate. The two-dimensional barcode includes a reference line, and is for recording identification information of the glass substrate. If the two-dimensional barcode sustains partial damage at the nearest side of the glass substrate, there is a reasonable likelihood that only part of the side of the two-dimensional barcode will sustain damage. In such case, the risk of damage occurring to the reference line of the two-dimensional barcode is minimized. If the reference line remains intact, then the two-dimensional barcode can still be properly read.
摘要翻译： 玻璃基板包括设置在玻璃基板的主表面的周边区域上的二维条形码。 二维条形码的一侧与玻璃基板的最近侧倾斜。 二维条形码包括参考线，用于记录玻璃基板的识别信息。 如果二维条形码在玻璃基板的最近侧保持部分损伤，那么二维条形码只有部分侧面会有损坏的合理可能性。 在这种情况下，二维条形码的参考线发生损坏的危险被最小化。 如果参考线保持原样，则二维条形码仍然可以正确读取。
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公开(公告)号：US20050235910A1
公开(公告)日：2005-10-27
申请号：US11111101
申请日：2005-04-20
申请人： Chen Teng , Ching-Lung Wang , Wen-Cheng Hsu , Yu-Ying Chan , Tseng-Kuei Tseng , Ho-Li Hsieh
发明人： Chen Teng , Ching-Lung Wang , Wen-Cheng Hsu , Yu-Ying Chan , Tseng-Kuei Tseng , Ho-Li Hsieh
CPC分类号： B08B5/04 , B05C5/0254 , B05C9/10 , B08B7/028 , G03F7/16
摘要： A coating apparatus (20) for forming a photoresist film on a substrate (21) includes a flat table (30), a nozzle unit (40), and a particle cleaning unit (50). The flat table is used for supporting the substrate. The nozzle unit is used for dispensing photoresist material on a top surface of the substrate. The particle cleaning unit is used for removing particles from the top surface before the photoresist material is coated thereon. The coating apparatus can timely clean the substrate before coating. The coating performance is improved, and the nozzle unit is protected from being scratched or damaged.
摘要翻译： 用于在基板（21）上形成光致抗蚀剂膜的涂布装置（20）包括平台（30），喷嘴单元（40）和颗粒清洁单元（50）。 平台用于支撑基板。 喷嘴单元用于在基板的顶表面上分配光致抗蚀剂材料。 颗粒清洁单元用于在光致抗蚀剂材料被涂覆之前从顶表面去除颗粒。 涂布装置可以在涂布之前及时清洁基材。 改善了涂层性能，并且防止喷嘴单元被划伤或损坏。
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公开(公告)号：US20050233076A1
公开(公告)日：2005-10-20
申请号：US11111100
申请日：2005-04-20
申请人： Shao-Ming Hsu , Ching-Lung Wang , Wen-Cheng Hsu , Yu-Ying Chan , Tseng-Kuei Tseng , Ho-Li Hsieh , Chen-Kun Teng
发明人： Shao-Ming Hsu , Ching-Lung Wang , Wen-Cheng Hsu , Yu-Ying Chan , Tseng-Kuei Tseng , Ho-Li Hsieh , Chen-Kun Teng
CPC分类号： H01L21/68735 , H01L21/67034 , H01L21/6875 , H01L21/68757
摘要： An apparatus (20) for supporting a substrate (S2) includes a number of slats (28), a number of connecting blocks (24) separately positioned on the slats, and a number of soft sleeves (22) connected with the connecting blocks, respectively. Because top surfaces of the soft sleeves are shaped as annular, the force applied between the substrate and the soft sleeves is distributed, and is reduced at each contact point. The surface of the substrate is hardly if at all deformed by the soft sleeves, thereby reducing the risk of or even altogether preventing the formation of undulations. The quality of the pattern to be processed is improved.
摘要翻译： 用于支撑基板（S 2）的装置（20）包括多个板条（28），分开定位在板条上的多个连接块（24）和与连接块连接的多个软套筒（22） ， 分别。 由于软套筒的顶面形状为环形，所以施加在基体和软套之间的力分布，并在每个接触点处被减小。 如果通过软套筒变形，基材的表面几乎不变，从而降低或甚至完全防止起伏形成的风险。 要处理的图案的质量得到改善。
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公开(公告)号：US20050238350A1
公开(公告)日：2005-10-27
申请号：US11111141
申请日：2005-04-20
申请人： Wen-Cheng Hsu , Ching-Lung Wang , Yu-Ying Chan , Tseng-Kuei Tseng
发明人： Wen-Cheng Hsu , Ching-Lung Wang , Yu-Ying Chan , Tseng-Kuei Tseng
CPC分类号： G03F7/32 , G03D5/04 , G03F7/0007 , G03F7/30 , G03F7/322
摘要： An apparatus (3) for removing developing solution from a substrate (30) includes a working table (36) for placing the substrate, a supporting frame (33) positioned on the working table, a gas dispensing nozzle (31) mounted on the supporting frame, and a water dispensing nozzle (32) mounted on the supporting frame. The apparatus can remove the residual developing solution from the substrate and needs not to lift the substrate. The substrate is safely processed and the working time is improved.
摘要翻译： 一种用于从基板（30）去除显影液的装置（3），包括：放置基板的工作台（36），位于工作台上的支撑框架（33），安装在支撑件上的气体分配喷嘴 框架和安装在支撑框架上的水分配喷嘴（32）。 该装置可以从基板上除去残留的显影液，并且不需要提起基板。 基板被安全处理，工作时间得到改善。
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公开(公告)号：US07367725B2
公开(公告)日：2008-05-06
申请号：US11111141
申请日：2005-04-20
申请人： Wen-Cheng Hsu , Ching-Lung Wang , Yu-Ying Chan , Tseng-Kuei Tseng
发明人： Wen-Cheng Hsu , Ching-Lung Wang , Yu-Ying Chan , Tseng-Kuei Tseng
IPC分类号： G03D5/00
CPC分类号： G03F7/32 , G03D5/04 , G03F7/0007 , G03F7/30 , G03F7/322
摘要： An apparatus (3) for removing developing solution from a substrate (30) includes a working table (36) for placing the substrate, a supporting frame (33) positioned on the working table, a gas dispensing nozzle (31) mounted on the supporting frame, and a water dispensing nozzle (32) mounted on the supporting frame. The apparatus can remove the residual developing solution from the substrate and needs not to lift the substrate. The substrate is safely processed and the working time is improved.
摘要翻译： 一种用于从基板（30）去除显影液的装置（3），包括：放置基板的工作台（36），位于工作台上的支撑框架（33），安装在支撑件上的气体分配喷嘴 框架和安装在支撑框架上的水分配喷嘴（32）。 该装置可以从基板上除去残留的显影液，并且不需要提起基板。 基板被安全处理，工作时间得到改善。
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公开(公告)号：US20050016449A1
公开(公告)日：2005-01-27
申请号：US10710395
申请日：2004-07-07
申请人： Wang-Sheng Chen , Tseng-Kuei Tseng
发明人： Wang-Sheng Chen , Tseng-Kuei Tseng
CPC分类号： B05C11/1042 , B05C11/08 , G03F7/16 , G03F7/162
摘要： The present invention discloses a photoresist coating system. The photoresist coating system mainly includes a chemical tank for positioning at least one photoresist bottle that is used for storing photoresist solution supplied to the photoresist coating system, a cooling system for chilling the photoresist solution in the photoresist bottle to a low temperature, a heating system for heating the photoresist solution transferred from the photoresist bottle to an adequate temperature, and an automatic photoresist feed system for draining and delivering the photoresist solution.
摘要翻译： 本发明公开了一种光刻胶涂覆系统。 光致抗蚀剂涂覆系统主要包括用于定位至少一个光致抗蚀剂瓶的化学罐，用于存储提供给光致抗蚀剂涂覆系统的光致抗蚀剂溶液，用于将光致抗蚀剂瓶中的光致抗蚀剂溶液冷却至低温的冷却系统，加热系统 用于将从光致抗蚀剂瓶转移的光致抗蚀剂溶液加热到足够的温度，以及用于排出和递送光致抗蚀剂溶液的自动光致抗蚀剂进料系统。
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