公开(公告)号：US08000922B2

公开(公告)日：2011-08-16

申请号：US12128979

申请日：2008-05-29

申请人： Hong Chen ,  Michael J. Van Riet ,  Chien-Huei (Adam) Chen ,  Jason Z. Lin ,  Chris Maher ,  Michal Kowalski ,  Barry Becker ,  Stephanie Chen ,  Subramanian Balakrishnan ,  Suryanarayana Tummala

发明人： Hong Chen ,  Michael J. Van Riet ,  Chien-Huei (Adam) Chen ,  Jason Z. Lin ,  Chris Maher ,  Michal Kowalski ,  Barry Becker ,  Stephanie Chen ,  Subramanian Balakrishnan ,  Suryanarayana Tummala

IPC分类号： H01L21/66

CPC分类号： G01N21/9501 ,  G01N21/956 ,  G01N2021/8822 ,  G01N2021/8854

摘要： Methods and systems for generating information to be used for selecting values for parameter(s) of a detection algorithm are provided. One method includes without user intervention performing a scan of an area of a wafer using an inspection system and default values for parameter(s) of a detection algorithm to detect defects on the wafer. The method also includes selecting a portion of the defects from results of the scan based on a predetermined maximum number of total defects to be used for selecting values for the parameter(s) of the detection algorithm. The method further includes storing information, which includes values for the parameter(s) of the detection algorithm determined for the defects in the portion. The information can be used to select the values for the parameter(s) of the detection algorithm to be used for the inspection recipe without performing an additional scan of the wafer subsequent to the scan.

摘要翻译： 提供了用于生成用于选择检测算法的参数值的信息的方法和系统。 一种方法包括没有用户干预使用检查系统对晶片的区域进行扫描，以及用于检测算法的参数的默认值以检测晶片上的缺陷。 该方法还包括基于用于选择检测算法的参数的值的总缺陷的预定最大数量来从扫描结果中选择一部分缺陷。 该方法还包括存储信息，其包括为该部分中的缺陷确定的检测算法的参数的值。 该信息可以用于选择要用于检查配方的检测算法的参数的值，而不需要在扫描之后对晶片进行附加扫描。

公开(公告)号：US20090299681A1

公开(公告)日：2009-12-03

申请号：US12128979

申请日：2008-05-29

申请人： Hong Chen ,  Michael J. Van Riet ,  Chien-Huei (Adam) Chen ,  Jason Z. Lin ,  Chris Maher ,  Michal Kowalski ,  Barry Becker ,  Stephanie Chen ,  Subramanian Balakrishnan ,  Suryanarayana Tummala

发明人： Hong Chen ,  Michael J. Van Riet ,  Chien-Huei (Adam) Chen ,  Jason Z. Lin ,  Chris Maher ,  Michal Kowalski ,  Barry Becker ,  Stephanie Chen ,  Subramanian Balakrishnan ,  Suryanarayana Tummala

IPC分类号： G01N21/88

CPC分类号： G01N21/9501 ,  G01N21/956 ,  G01N2021/8822 ,  G01N2021/8854

摘要： Methods and systems for generating information to be used for selecting values for parameter(s) of a detection algorithm are provided. One method includes without user intervention performing a scan of an area of a wafer using an inspection system and default values for parameter(s) of a detection algorithm to detect defects on the wafer. The method also includes selecting a portion of the defects from results of the scan based on a predetermined maximum number of total defects to be used for selecting values for the parameter(s) of the detection algorithm. The method further includes storing information, which includes values for the parameter(s) of the detection algorithm determined for the defects in the portion. The information can be used to select the values for the parameter(s) of the detection algorithm to be used for the inspection recipe without performing an additional scan of the wafer subsequent to the scan.

摘要翻译： 提供了用于生成用于选择检测算法的参数值的信息的方法和系统。 一种方法包括没有用户干预使用检查系统对晶片的区域进行扫描，以及用于检测算法的参数的默认值以检测晶片上的缺陷。 该方法还包括基于用于选择检测算法的参数的值的总缺陷的预定最大数量来从扫描结果中选择一部分缺陷。 该方法还包括存储信息，其包括为该部分中的缺陷确定的检测算法的参数的值。 该信息可以用于选择要用于检查配方的检测算法的参数的值，而不需要在扫描之后对晶片进行附加扫描。

公开(公告)号：US08532949B2

公开(公告)日：2013-09-10

申请号：US11249144

申请日：2005-10-12

申请人： Cho Huak Teh ,  Tommaso Torelli ,  Dominic David ,  Chiuman Yeung ,  Michael Gordon Scott ,  Lalita A. Balasubramanian ,  Lisheng Gao ,  Tong Huang ,  Jianxin Zhang ,  Michal Kowalski ,  Jonathan Oakley

发明人： Cho Huak Teh ,  Tommaso Torelli ,  Dominic David ,  Chiuman Yeung ,  Michael Gordon Scott ,  Lalita A. Balasubramanian ,  Lisheng Gao ,  Tong Huang ,  Jianxin Zhang ,  Michal Kowalski ,  Jonathan Oakley

IPC分类号： G01N37/00

CPC分类号： G01N21/9501 ,  G06T7/0004 ,  G06T2207/30148

摘要： Various computer-implemented methods for classifying defects on a specimen are provided. One method includes assigning individual defects detected on the specimen to defect groups based on one or more characteristics of the individual defects. The method also includes displaying information about the defect groups to a user. In addition, the method includes allowing the user to assign a classification to each of the defect groups. Systems configured to classify defects on a specimen are also provided. One system includes program instructions executable on a processor for assigning individual defects detected on the specimen to defect groups based on one or more characteristics of the individual defects. The system also includes a user interface configured for displaying information about the defect groups to a user and allowing the user to assign a classification to each of the defect groups.

摘要翻译： 提供了用于对样本上的缺陷进行分类的各种计算机实现的方法。 一种方法包括基于单个缺陷的一个或多个特征将在样本上检测到的各个缺陷分配给缺陷组。 该方法还包括向用户显示关于缺陷组的信息。 此外，该方法包括允许用户为每个缺陷组分配分类。 还提供了配置为对样品上的缺陷进行分类的系统。 一个系统包括可在处理器上执行的程序指令，用于基于单个缺陷的一个或多个特征将在样本上检测到的各个缺陷分配给缺陷组。 该系统还包括被配置为向用户显示关于缺陷组的信息的用户界面，并允许用户为每个缺陷组分配分类。

公开(公告)号：US07142992B1

公开(公告)日：2006-11-28

申请号：US10954968

申请日：2004-09-30

申请人： Patrick Huet ,  Maruti Shanbhag ,  Sandeep Bhagwat ,  Michal Kowalski ,  Vivekanand Kini ,  David Randall ,  Sharon McCauley ,  Tong Huang ,  Jianxin Zhang ,  Kenong Wu ,  Lisheng Gao ,  Ariel Tribble ,  Ashok Kulkarni ,  Cecelia Anne Campochiaro

发明人： Patrick Huet ,  Maruti Shanbhag ,  Sandeep Bhagwat ,  Michal Kowalski ,  Vivekanand Kini ,  David Randall ,  Sharon McCauley ,  Tong Huang ,  Jianxin Zhang ,  Kenong Wu ,  Lisheng Gao ,  Ariel Tribble ,  Ashok Kulkarni ,  Cecelia Anne Campochiaro

IPC分类号： G01R31/00 ,  G06F19/00

CPC分类号： G06T7/0004 ,  G01R31/2846 ,  G06T2200/24 ,  G06T2207/30148

摘要： Hybrid methods for classifying defects in semiconductor manufacturing are provided. The methods include applying a flexible sequence of rules for defects to inspection data. The sequence of rules includes deterministic rules, statistical rules, hybrid rules, or some combination thereof. The rules included in the sequence may be selected by a user using a graphical interface. The method also includes classifying the defects based on results of applying the sequence of rules to the inspection data.

摘要翻译： 提供了用于分类半导体制造中的缺陷的混合方法。 这些方法包括将错误的规则序列应用于检查数据。 规则序列包括确定性规则，统计规则，混合规则或其某种组合。 序列中包括的规则可以由用户使用图形界面来选择。 该方法还包括基于将规则序列应用于检查数据的结果对缺陷进行分类。

公开(公告)号：US07729529B2

公开(公告)日：2010-06-01

申请号：US11005658

申请日：2004-12-07

申请人： Kenong Wu ,  David Randall ,  Kourosh Nafisi ,  Ramon Ynzunza ,  Ingrid B. Peterson ,  Ariel Tribble ,  Michal Kowalski ,  Lisheng Gao ,  Ashok Kulkarni

发明人： Kenong Wu ,  David Randall ,  Kourosh Nafisi ,  Ramon Ynzunza ,  Ingrid B. Peterson ,  Ariel Tribble ,  Michal Kowalski ,  Lisheng Gao ,  Ashok Kulkarni

IPC分类号： G06K9/00 ,  H01L21/66 ,  G06F17/50

CPC分类号： G03F1/84 ,  G01N21/95607 ,  G01N2021/95676 ,  G03F7/7065 ,  G03F7/70666

摘要： Various computer-implemented methods are provided. One method for sorting defects in a design pattern of a reticle includes searching for defects of interest in inspection data using priority information associated with individual defects in combination with one or more characteristics of a region proximate the individual defects. The priority information corresponds to modulation levels associated with the individual defects. The inspection data is generated by comparing images of the reticle generated for different values of a lithographic variable. The images include at least one reference image and at least one modulated image. A composite reference image can be generated from two or more reference images. The method also includes assigning one or more identifiers to the defects of interest. The identifier(s) may include, for example, a defect classification and/or an indicator identifying if the defects of interest are to be used for further processing.

摘要翻译： 提供了各种计算机实现的方法。 用于对掩模版的设计图案中的缺陷进行排序的一种方法包括使用与各个缺陷相关联的优先级信息，结合邻近各个缺陷的区域的一个或多个特征来搜索检查数据中的缺陷。 优先级信息对应于与各个缺陷相关联的调制级别。 通过比较为不同的光刻变量值生成的掩模版的图像来生成检查数据。 图像包括至少一个参考图像和至少一个调制图像。 可以从两个或更多个参考图像生成复合参考图像。 该方法还包括将一个或多个标识符分配给感兴趣的缺陷。 标识符可以包括例如缺陷分类和/或识别感兴趣的缺陷是否用于进一步处理的指标。

公开(公告)号：US20060265145A1

公开(公告)日：2006-11-23

申请号：US10954968

申请日：2004-09-30

申请人： Patrick Huet ,  Maruti Shanbhag ,  Sandeep Bhagwat ,  Michal Kowalski ,  Vivekanand Kini ,  David Randall ,  Sharon McCauley ,  Tong Huang ,  Jianxin Zhang ,  Kenong Wu ,  Lisheng Gao ,  Ariel Tribble ,  Ashok Kulkarni ,  Cecelia Anne Campochiaro

发明人： Patrick Huet ,  Maruti Shanbhag ,  Sandeep Bhagwat ,  Michal Kowalski ,  Vivekanand Kini ,  David Randall ,  Sharon McCauley ,  Tong Huang ,  Jianxin Zhang ,  Kenong Wu ,  Lisheng Gao ,  Ariel Tribble ,  Ashok Kulkarni ,  Cecelia Anne Campochiaro

IPC分类号： G01B5/28

CPC分类号： G06T7/0004 ,  G01R31/2846 ,  G06T2200/24 ,  G06T2207/30148

摘要： Hybrid methods for classifying defects in semiconductor manufacturing are provided. The methods include applying a flexible sequence of rules for defects to inspection data. The sequence of rules includes deterministic rules, statistical rules, hybrid rules, or some combination thereof. The rules included in the sequence may be selected by a user using a graphical interface The method also includes classifying the defects based on results of applying the sequence of rules to the inspection data.

摘要翻译： 提供了用于分类半导体制造中的缺陷的混合方法。 这些方法包括将错误的规则序列应用于检查数据。 规则序列包括确定性规则，统计规则，混合规则或其某种组合。 包括在序列中的规则可以由用户使用图形界面来选择。该方法还包括基于将规则序列应用于检查数据的结果对缺陷进行分类。

公开(公告)号：US20100226562A1

公开(公告)日：2010-09-09

申请号：US12780864

申请日：2010-05-15

申请人： Kenong Wu ,  David Randall ,  Kourosh Nafisi ,  Ramon Ynzunza ,  Ingrid B. Peterson ,  Ariel Tribble ,  Michal Kowalski ,  Lisheng Gao ,  Ashok Kulkami

发明人： Kenong Wu ,  David Randall ,  Kourosh Nafisi ,  Ramon Ynzunza ,  Ingrid B. Peterson ,  Ariel Tribble ,  Michal Kowalski ,  Lisheng Gao ,  Ashok Kulkami

IPC分类号： G06K9/62

CPC分类号： G03F1/84 ,  G01N21/95607 ,  G01N2021/95676 ,  G03F7/7065 ,  G03F7/70666

摘要： Various computer-implemented methods are provided. One method for sorting defects in a design pattern of a reticle includes searching for defects of interest in inspection data using priority information associated with individual defects in combination with one or more characteristics of a region proximate the individual defects. The priority information corresponds to modulation levels associated with the individual defects. The inspection data is generated by comparing images of the reticle generated for different values of a lithographic variable. The images include at least one reference image and at least one modulated image. A composite reference image can be generated from two or more reference images. The method also includes assigning one or more identifiers to the defects of interest. The identifier(s) may include, for example, a defect classification and/or an indicator identifying if the defects of interest are to be used for further processing.

摘要翻译： 提供了各种计算机实现的方法。 用于对掩模版的设计图案中的缺陷进行排序的一种方法包括使用与各个缺陷相关联的优先级信息，结合邻近各个缺陷的区域的一个或多个特征来搜索检查数据中的缺陷。 优先级信息对应于与各个缺陷相关联的调制级别。 通过比较为不同的光刻变量值生成的掩模版的图像来生成检查数据。 图像包括至少一个参考图像和至少一个调制图像。 可以从两个或更多个参考图像生成复合参考图像。 该方法还包括将一个或多个标识符分配给感兴趣的缺陷。 标识符可以包括例如缺陷分类和/或识别感兴趣的缺陷是否用于进一步处理的指示符。

公开(公告)号：US20060291714A1

公开(公告)日：2006-12-28

申请号：US11005658

申请日：2004-12-07

申请人： Kenong Wu ,  David Randall ,  Kourosh Nafisi ,  Ramon Ynzunza ,  Ingrid Peterson ,  Ariel Tribble ,  Michal Kowalski ,  Lisheng Gao ,  Ashok Kulkarni

发明人： Kenong Wu ,  David Randall ,  Kourosh Nafisi ,  Ramon Ynzunza ,  Ingrid Peterson ,  Ariel Tribble ,  Michal Kowalski ,  Lisheng Gao ,  Ashok Kulkarni

IPC分类号： G06K9/00

CPC分类号： G03F1/84 ,  G01N21/95607 ,  G01N2021/95676 ,  G03F7/7065 ,  G03F7/70666

摘要： Various computer-implemented methods are provided. One method for sorting defects in a design pattern of a reticle includes searching for defects of interest in inspection data using priority information associated with individual defects in combination with one or more characteristics of a region proximate the individual defects. The priority information corresponds to modulation levels associated with the individual defects. The inspection data is generated by comparing images of the reticle generated for different values of a lithographic variable. The images include at least one reference image and at least one modulated image. A composite reference image can be generated from two or more reference images. The method also includes assigning one or more identifiers to the defects of interest. The identifier(s) may include, for example, a defect classification and/or an indicator identifying if the defects of interest are to be used for further processing.

摘要翻译： 提供了各种计算机实现的方法。 用于对掩模版的设计图案中的缺陷进行排序的一种方法包括使用与各个缺陷相关联的优先级信息，结合邻近各个缺陷的区域的一个或多个特征来搜索检查数据中的缺陷。 优先级信息对应于与各个缺陷相关联的调制级别。 通过比较为不同的光刻变量值生成的掩模版的图像来生成检查数据。 图像包括至少一个参考图像和至少一个调制图像。 可以从两个或更多个参考图像生成复合参考图像。 该方法还包括将一个或多个标识符分配给感兴趣的缺陷。 标识符可以包括例如缺陷分类和/或识别感兴趣的缺陷是否用于进一步处理的指标。

公开(公告)号：US20060082763A1

公开(公告)日：2006-04-20

申请号：US11249144

申请日：2005-10-12

申请人： Cho Teh ,  Tommaso Torelli ,  Dominic David ,  Chiuman Yeung ,  Michael Scott ,  Lalita Balasubramanian ,  Lisheng Gao ,  Tong Huang ,  Jianxin Zhang ,  Michal Kowalski ,  Jonathan Oakley

发明人： Cho Teh ,  Tommaso Torelli ,  Dominic David ,  Chiuman Yeung ,  Michael Scott ,  Lalita Balasubramanian ,  Lisheng Gao ,  Tong Huang ,  Jianxin Zhang ,  Michal Kowalski ,  Jonathan Oakley

IPC分类号： G01N21/00 ,  H01J3/14

CPC分类号： G01N21/9501 ,  G06T7/0004 ,  G06T2207/30148

摘要： Various computer-implemented methods for classifying defects on a specimen are provided. One method includes assigning individual defects detected on the specimen to defect groups based on one or more characteristics of the individual defects. The method also includes displaying information about the defect groups to a user. In addition, the method includes allowing the user to assign a classification to each of the defect groups. Systems configured to classify defects on a specimen are also provided. One system includes program instructions executable on a processor for assigning individual defects detected on the specimen to defect groups based on one or more characteristics of the individual defects. The system also includes a user interface configured for displaying information about the defect groups to a user and allowing the user to assign a classification to each of the defect groups.

公开(公告)号：US08111900B2

公开(公告)日：2012-02-07

申请号：US12780864

申请日：2010-05-15

申请人： Kenong Wu ,  David Randall ,  Kourosh Nafisi ,  Ramon Ynzunza ,  Ingrid B. Peterson ,  Ariel Tribble ,  Michal Kowalski ,  Lisheng Gao ,  Ashok Kulkarni

发明人： Kenong Wu ,  David Randall ,  Kourosh Nafisi ,  Ramon Ynzunza ,  Ingrid B. Peterson ,  Ariel Tribble ,  Michal Kowalski ,  Lisheng Gao ,  Ashok Kulkarni

IPC分类号： G06K9/00 ,  G01R31/26 ,  G21K5/00 ,  G06F17/50

CPC分类号： G03F1/84 ,  G01N21/95607 ,  G01N2021/95676 ,  G03F7/7065 ,  G03F7/70666

摘要： Various computer-implemented methods are provided. One method for sorting defects in a design pattern of a reticle includes searching for defects of interest in inspection data using priority information associated with individual defects in combination with one or more characteristics of a region proximate the individual defects. The priority information corresponds to modulation levels associated with the individual defects. The inspection data is generated by comparing images of the reticle generated for different values of a lithographic variable. The images include at least one reference image and at least one modulated image. A composite reference image can be generated from two or more reference images. The method also includes assigning one or more identifiers to the defects of interest. The identifier(s) may include, for example, a defect classification and/or an indicator identifying if the defects of interest are to be used for further processing.

摘要翻译： 提供了各种计算机实现的方法。 用于对掩模版的设计图案中的缺陷进行排序的一种方法包括使用与各个缺陷相关联的优先级信息，结合邻近各个缺陷的区域的一个或多个特征来搜索检查数据中的缺陷。 优先级信息对应于与各个缺陷相关联的调制级别。 通过比较为不同的光刻变量值生成的掩模版的图像来生成检查数据。 图像包括至少一个参考图像和至少一个调制图像。 可以从两个或更多个参考图像生成复合参考图像。 该方法还包括将一个或多个标识符分配给感兴趣的缺陷。 标识符可以包括例如缺陷分类和/或识别感兴趣的缺陷是否用于进一步处理的指示符。