Manufacturing method of suspended microstructure
    8.
    发明申请
    Manufacturing method of suspended microstructure 审中-公开
    悬浮微结构的制造方法

    公开(公告)号:US20070224720A1

    公开(公告)日:2007-09-27

    申请号:US11640849

    申请日:2006-12-19

    IPC分类号: H01L21/00

    摘要: A manufacturing method of a suspended microstructure includes the steps of providing a substrate having a surface; forming a first depositing layer over a part of the surface; forming a second depositing layer over the first depositing layer and another part of the surface wherein an adhesion between the first depositing layer and the substrate is weaker than that between the second depositing layer and the substrate; forming a hole through the second depositing layer to partially expose the surface of the substrate; and filling the hole with an etchant to remove a part of the substrate so as to form a cavity.

    摘要翻译: 悬浮微结构的制造方法包括提供具有表面的基板的步骤; 在所述表面的一部分上形成第一沉积层; 在所述第一沉积层和所述表面的另一部分上形成第二沉积层,其中所述第一沉积层和所述衬底之间的粘附弱于所述第二沉积层和所述衬底之间的粘附; 通过所述第二沉积层形成孔以部分地暴露所述基底的表面; 并用蚀刻剂填充孔以去除衬底的一部分以形成空腔。

    METHOD FOR TREATING SURFACE OF ELEMENT
    9.
    发明申请
    METHOD FOR TREATING SURFACE OF ELEMENT 审中-公开
    处理元件表面的方法

    公开(公告)号:US20090117496A1

    公开(公告)日:2009-05-07

    申请号:US12171299

    申请日:2008-07-11

    IPC分类号: G03F7/20

    CPC分类号: G03F7/24

    摘要: A method for treating a surface of an element includes the steps of providing a photo-sensitive and flexible thin film, providing a planar photomask having a micro-structural pattern, transferring the micro-structural pattern to the thin film, attaching the thin film to the surface of the element and partially exposing a portion of the element, processing the exposed portion of the element, and removing the thin film to form a micro-structure on the surface of the element.

    摘要翻译: 用于处理元件表面的方法包括以下步骤:提供感光和柔性薄膜,提供具有微结构图案的平面光掩模,将微结构图案转印到薄膜上,将薄膜连接到 元件的表面并且部分地暴露元件的一部分,处理元件的暴露部分,以及去除薄膜以在元件的表面上形成微结构。