Manufacturing method for an electron-emitting source of triode structure
    2.
    发明授权
    Manufacturing method for an electron-emitting source of triode structure 失效
    三极管结构电子发射源的制造方法

    公开(公告)号:US06705910B2

    公开(公告)日:2004-03-16

    申请号:US10067315

    申请日:2002-02-07

    IPC分类号: H01J902

    摘要: A manufacturing method for an electron-emitting source of triode structure, including forming a cathode layer on a substrate, forming a dielectric layer on the cathode layer, and positioning an opening in the dielectric layer to expose the cathode layer, wherein the opening has a surrounding region, forming a gate layer on the dielectric layer, except on the surrounding region, forming a hydrophilic layer in the opening, forming a hydrophobic layer on the gate layer and the surrounding region, wherein the hydrophobic layer contacts the ends of the hydrophilic layer, dispersing a carbon nanotube solution on the hydrophilic layer using ink jet printing, executing a thermal process step, and removing the hydrophobic layer. According to this method, carbon nanotubes are deposited over a large area in the gate hole.

    摘要翻译: 一种用于三极管结构的电子发射源的制造方法,包括在衬底上形成阴极层,在阴极层上形成电介质层,并在电介质层中定位开口以露出阴极层,其中开口具有 在所述电介质层上形成除了所述周围区域之外的栅极层,在所述开口中形成亲水层,在所述栅极层和所述周围区域形成疏水层,其中所述疏水层与所述亲水层的端部接触 使用喷墨印刷将碳纳米管溶液分散在亲水层上,执行热处理步骤,并除去疏水层。 根据该方法,碳纳米管沉积在栅极孔中的大面积上。

    Structure of a coplanar gate-cathode of a triode CNT-FED and method of manufacturing same
    3.
    发明申请
    Structure of a coplanar gate-cathode of a triode CNT-FED and method of manufacturing same 失效
    三极管CNT-FED的共面栅极阴极的结构及其制造方法

    公开(公告)号:US20060258252A1

    公开(公告)日:2006-11-16

    申请号:US11490179

    申请日:2006-07-21

    IPC分类号: B05D3/00 H01J9/24

    摘要: The present inventions provide a structure of coplanar gate-cathode of triode CNT-FED and the manufacturing method thereof by Imprint Lithography and ink jet. The structure includes a substrate, a plurality of cathode layers, a plurality of gate extended layers, a plastic dielectric layer, a plurality of dielectric openings, and a plurality of gate electrodes. The plurality of cathode layers and the plurality of gate extended layers are coplanar, made by forming on the substrate by Imprint Lithography and the plurality of dielectric opening made by Imprint Lithography too. Besides, the gate electrode, made by ink jet or screen print, can be extended through the plastic dielectric layer to the gate extended electrode to feature the coplanar gate-cathode.

    摘要翻译: 本发明提供三极管CNT-FED的共面栅极 - 阴极的结构及其制造方法,通过印刷光刻和喷墨。 该结构包括基板,多个阴极层,多个栅极延伸层,塑料电介质层,多个电介质开口和多个栅电极。 多个阴极层和多个栅极延伸层是共面的,其通过印记平版印刷在基板上形成,以及通过印刷光刻制造的多个电介质开口。 此外,通过喷墨或丝网印刷制造的栅电极可以通过塑料电介质层延伸到栅极延伸电极,以具有共面的栅极 - 阴极。

    Triode CNT-FED structure gate runner and cathode manufactured method
    4.
    发明申请
    Triode CNT-FED structure gate runner and cathode manufactured method 失效
    三极管CNT-FED结构闸流道和阴极制造方法

    公开(公告)号:US20050253501A1

    公开(公告)日:2005-11-17

    申请号:US10863279

    申请日:2004-06-09

    摘要: The present inventions provide a structure of coplanar gate-cathode of triode CNT-FED and the manufacturing method thereof by Imprint Lithography and ink jet. The structure includes a substrate, a plurality of cathode layers, a plurality of gate extended layers, a plastic dielectric layer, a plurality of dielectric openings, and a plurality of gate electrodes. The plurality of cathode layers and the plurality of gate extended layers are coplanar, made by forming on the substrate by Imprint Lithography and the plurality of dielectric opening made by Imprint Lithography too. Besides, the gate electrode, made by ink jet or screen print, can be extended through the plastic dielectric layer to the gate extended electrode to feature the coplanar gate-cathode.

    摘要翻译: 本发明提供三极管CNT-FED的共面栅极 - 阴极的结构及其制造方法,通过印刷光刻和喷墨。 该结构包括基板,多个阴极层,多个栅极延伸层,塑料电介质层,多个电介质开口和多个栅电极。 多个阴极层和多个栅极延伸层是共面的,其通过印记平版印刷在基板上形成,以及通过印刷光刻制造的多个电介质开口。 此外,通过喷墨或丝网印刷制造的栅电极可以通过塑料电介质层延伸到栅极延伸电极,以具有共面的栅极 - 阴极。

    Structure of a coplanar gate-cathode of a triode CNT-FED and method of manufacturing same
    5.
    发明授权
    Structure of a coplanar gate-cathode of a triode CNT-FED and method of manufacturing same 失效
    三极管CNT-FED的共面栅极阴极的结构及其制造方法

    公开(公告)号:US07154214B2

    公开(公告)日:2006-12-26

    申请号:US10863279

    申请日:2004-06-09

    IPC分类号: H01J1/14

    摘要: A structure of a coplanar gate-cathode of triode CNT-FED and a manufacturing method thereof by Imprint Lithography and ink jet. The structure includes a substrate, a plurality of cathode layers, a plurality of gate extended layers, a plastic dielectric layer, a plurality of dielectric openings, and a plurality of gate electrodes. The plurality of cathode layers and the plurality of gate extended layers are coplanar, and formed on the substrate by Imprint Lithography and the plurality of dielectric openings are made by Imprint Lithography. The gate electrode, made by ink jet or screen print, can be extended through the plastic dielectric layer to the gate extended electrode to feature the coplanar gate-cathode.

    摘要翻译: 三极管CNT-FED的共面栅极 - 阴极的结构及其制造方法,通过印刷光刻和喷墨。 该结构包括基板,多个阴极层,多个栅极延伸层,塑料电介质层,多个电介质开口和多个栅电极。 多个阴极层和多个栅极延伸层是共面的,并且通过印刷平版印刷法在基板上形成,并且通过印刷光刻制造多个电介质开口。 通过喷墨或丝网印刷制造的栅电极可以通过塑料电介质层延伸到栅极延伸电极,以具有共面的栅极 - 阴极。

    Structure of a coplanar gate-cathode of a triode CNT-FED and method of manufacturing same
    6.
    发明授权
    Structure of a coplanar gate-cathode of a triode CNT-FED and method of manufacturing same 失效
    三极管CNT-FED的共面栅极阴极的结构及其制造方法

    公开(公告)号:US07322869B2

    公开(公告)日:2008-01-29

    申请号:US11490179

    申请日:2006-07-21

    IPC分类号: H01J9/24 H01J1/62

    摘要: A structure of a coplanar gate-cathode of triode CNT-FED and a manufacturing method thereof by Imprint Lithography and ink jet. The structure includes a substrate, a plurality of cathode layers, a plurality of gate extended layers, a plastic dielectric layer, a plurality of dielectric openings, and a plurality of gate electrodes. The plurality of cathode layers and the plurality of gate extended layers are coplanar, and formed on the substrate by Imprint Lithography and the plurality of dielectric openings are made by Imprint Lithography. The gate electrode, made by ink jet or screen print, can be extended through the plastic dielectric layer to the gate extended electrode to feature the coplanar gate-cathode.

    摘要翻译: 三极管CNT-FED的共面栅极 - 阴极的结构及其制造方法,通过印刷光刻和喷墨。 该结构包括基板,多个阴极层,多个栅极延伸层,塑料电介质层,多个电介质开口和多个栅电极。 多个阴极层和多个栅极延伸层是共面的,并且通过印刷平版印刷法在基板上形成,并且通过印刷光刻制造多个电介质开口。 通过喷墨或丝网印刷制造的栅电极可以通过塑料电介质层延伸到栅极延伸电极,以具有共面的栅极 - 阴极。

    Method for carbon nanotube emitter surface treatment
    8.
    发明授权
    Method for carbon nanotube emitter surface treatment 失效
    碳纳米管发射体表面处理方法

    公开(公告)号:US07662428B2

    公开(公告)日:2010-02-16

    申请号:US10653990

    申请日:2003-09-04

    IPC分类号: B05D5/12

    摘要: A method for increasing the number of carbon nanotubes exposed on the triode structure device of a field emission display uses the technology of casting surface treatment. For advancing the current density and magnitude of CNT emitters, the method of casting surface treatment on the CNT emitters includes the steps of coating an adhesive material on the surface of the device; heating the adhesive material for adhibitting the surface; and lifting the adhesive material off the surface.

    摘要翻译: 用于增加在场致发射显示器的三极管结构器件上暴露的碳纳米管的数量的方法使用铸造表面处理技术。 为了提高CNT发射体的电流密度和幅度,在CNT发射体上进行表面处理的方法包括在器件表面上涂覆粘合剂材料的步骤; 加热用于粘合表面的粘合剂材料; 并将粘合剂材料从表面上提起。