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    STABLE METAL COMPOUNDS AS HARDMASKS AND FILLING MATERIALS, THEIR COMPOSITIONS AND METHODS OF USE
    1.
    发明申请
    STABLE METAL COMPOUNDS AS HARDMASKS AND FILLING MATERIALS, THEIR COMPOSITIONS AND METHODS OF USE 有权
    稳定的金属化合物作为硬质合金和填充材料，其组成和使用方法

    公开(公告)号：US20150064904A1

    公开(公告)日：2015-03-05

    申请号：US14015222

    申请日：2013-08-30

    申请人： Huirong YAO ,  Salem K. MULLEN ,  Elizabeth WOLFER ,  Douglas MCKENZIE ,  JoonYeon CHO ,  Munirathna PADMANABAN

    发明人： Huirong YAO ,  Salem K. MULLEN ,  Elizabeth WOLFER ,  Douglas MCKENZIE ,  JoonYeon CHO ,  Munirathna PADMANABAN

    IPC分类号： C09D185/00 ,  H01L21/033

    CPC分类号： C09D185/00 ,  C07F7/08 ,  C08G77/58 ,  G03F7/0752 ,  G03F7/091 ,  G03F7/094 ,  H01L21/0332 ,  H01L21/0337 ,  H01L21/0338

    摘要： The present invention relates to novel, soluble, multi-ligand-substituted metal oxide compounds to form metal oxide films with improved stability as well as compositions made from them and methods of their use.Specifically, the invention pertains to a compounds having the following structure (I): wherein M is a metal and n is 1 to 20, and wherein at least one of R1, R2, R3, and R4 is i) and at least at least one of R1, R2, R3, and R4 is ii), where i) is a silicon bearing organic moiety having at least 2 carbons, and ii) is an organic moiety.The invention also relates to spin-coatable composition of compounds of structure (I) dissolved into a solvent. The present invention further relates to processes using this spin coatable composition to form a coating on a patterned substrate.

    摘要翻译： 本发明涉及新颖的可溶性多配体取代的金属氧化物化合物，以形成具有改进的稳定性的金属氧化物膜以及由它们制备的组合物及其使用方法。 具体地说，本发明涉及具有以下结构（I）的化合物：其中M为金属，n为1至20，并且其中R 1，R 2，R 3和R 4中的至少一个为i）并且至少至少为 R1，R2，R3和R4之一是ii），其中i）是具有至少2个碳的含硅有机部分，和ii）是有机部分。 本发明还涉及溶解在溶剂中的结构（I）化合物的可旋涂组合物。 本发明还涉及使用该可旋涂组合物在图案化基材上形成涂层的方法。

    ANTIREFLECTIVE COATING COMPOSITION AND PROCESS THEREOF
    5.
    发明申请
    ANTIREFLECTIVE COATING COMPOSITION AND PROCESS THEREOF 有权
    抗反射涂料组合物及其工艺

    公开(公告)号：US20140370444A1

    公开(公告)日：2014-12-18

    申请号：US13917022

    申请日：2013-06-13

    申请人： M. Dalil RAHMAN ,  Clement ANYADIEGWU ,  Douglas MCKENZIE ,  Takanori KUDO ,  Elizabeth WOLFER ,  Salem K. MULLEN

    发明人： M. Dalil RAHMAN ,  Clement ANYADIEGWU ,  Douglas MCKENZIE ,  Takanori KUDO ,  Elizabeth WOLFER ,  Salem K. MULLEN

    IPC分类号： G03F7/09 ,  C09D165/00

    CPC分类号： G03F7/091 ,  C08G2261/314 ,  C08G2261/3424 ,  C09D5/006 ,  C09D165/00 ,  G03F7/0752 ,  G03F7/0757 ,  G03F7/30

    摘要： The present invention relates to an absorbing hard mask antireflective coating composition comprising a novel polymer, where the novel polymer comprises in the backbone of the polymer four repeat units -A-, -B-, -C- and -D-, where A is repeat unit which comprises a fused aromatic ring in its backbone, B has the structure (1), C is a hydroxylbiphenyl of structure (2) and D is a derivatized fluorene of structure (3), where R1 is C1-C4alkyl, R2 is C1-C4alkyl, R3 and R4 are independently hydrogen or C1-C4 alkyl, and Ar′ and Ar″ are independently phenylenic, or naphthalenic derived moieties, R5 and R6 are independently —OH or —CH2)nOH where n=2-4, and R7 and R8 are independently hydrogen or C1-C4 alkyl. This invention also relates to a process for forming an image using the novel antireflective coating composition.

    摘要翻译： 本发明涉及一种包含新型聚合物的吸收性硬掩模抗反射涂料组合物，其中新型聚合物在聚合物的主链中包含四个重复单元-A-， - B - ， - C-和-D-，其中A为 重复单元在其骨架中包含稠合芳环，B具有结构（1），C是结构（2）的羟基联苯，D是结构式（3）的衍生化芴，其中R 1是C 1 -C 4烷基，R 2是 C 1 -C 4烷基，R 3和R 4独立地为氢或C 1 -C 4烷基，Ar'和Ar“独立地为亚苯基或萘衍生部分，R 5和R 6独立地为-OH或-CH 2）n OH，其中n = 并且R 7和R 8独立地为氢或C 1 -C 4烷基。 本发明还涉及使用新型抗反射涂料组合物形成图像的方法。